International Conference

  • K. Yamauchi
    Focusing hard X-ray to sub-10nm by reflective optics
    ESRF, SPring-8, APS Three-Way Meeting(March, 17-19,2008,Chicago,USA)

  • H. Mimura, S. Morita, T. Kimura, D. Yamakawa, W. Lin, T. Uehara, H. Yumoto, S. Matsuyama, Y. Nishino, K. Tamasaku, H. Ohashi, M. Yabashi, T. Ishikawa, H. Omori, K. Yamauchi
    Focusing mirror for X-ray free electron laser
    ESRF, SPring-8, APS Three-Way Meeting(March, 17-19,2008,Chicago,USA)

  • Y. Sano, K. Yamamura, K. Yamauchi and Y. Mori (Invited)
    Crystal machining using atmospheric pressure plasma
    4th International Workshop on Crystal Growth Technology(May 18 - 25, 2008, Beatenberg, Switzerland)

  • K. Yamauchi, Y. Sano, K. Arima and H. Hara(Invited)
    Catalyst-referred etching - novel abrasive-free polishing method
    4th International Workshop on Crystal Growth Technology(May 18 - 25, 2008, Beatenberg, Switzerland)

  • Takehiro Kato, Yasuhisa Sano, Tsutomu Hori, Kazuya Yamamura, Hidekazu Mimura, Yoshiaki Katsuyama, Kazuto Yamauchi
    Thinning of SiC wafers by Plasma Chemical Vaporization Machining
    The 4th Asian Conference on Crystal Growth and Crystal Technology, 189 (May 21-24, 2008, Sendai, Japan)

  • K. Yamauchi, H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, T. Kimura, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku and T. Ishikawa (Invited)
    Synchrotron-radiation-based hard X-ray nanobeam by Kirkpatrick-Baez mirrors
    European Conference on X-ray Spectrometry (16-20 June 2008, Cavtat, Dubrovnik, CROATIA), Abstract p100(I13).

  • S. Matsuyama, M. Shimura, H. Mimura, M. Fujii, H. Yumoto, S. Handa, T. Kimura, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa and K. Yamauchi
    Trace element mapping using hard X-ray nanobeam focused by a Kirkpatrick Baez mirror system
    European Conference on X-ray Spectrometry (16-20 June 2008, Cavtat, Dubrovnik, CROATIA), Abstract p88(O11-1).

  • Y. Takahashi, H. Kubo, H. Furukawa, K. Yamauchi, E. Matsubara, T. Ishikawa, Y. Nishino
    Development of element-specific hard-x-ray diffraction microscopy
    9th International Conference of X-ray Microscopy, ETH Zentrum, Zurich, Switzerland, July 21-25, 2008

  • Y. Takahashi, H. Furukawa, H. Kubo, K. Yamauchi, Y. Nishino, T. Ishikawa, E. Matsubara
    Nanotstructure analysis of metallic materials by coherent x-ray diffraction microscopy
    2008 denver x-ray conference, denver marriot tech center hotel, denver, colorad, USA, 4-8 August 2008

  • K. Yamauchi(Invited)
    X-ray focusing with Kirkpatrick-Baez optics
    Workshop: Focus on X-ray Focusing, SPIE Optics + Photonics 2008(August 11-14 2007San, Diego, California USA)

  • H. Mimura, S. Morita, T. Kimura, D. Yamakawa, W. Lin, Y. Uehara, S. Matsuyama, H. Yumoto, H. Ohashi, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, H. Ohmori, and K. Yamauchi
    Fabrication of a 400-mm-long mirror for focusing x-ray free-electron lasers to sub-100 nm
    SPIE Optics + Photonics 2008(August 11-14 2007San, Diego, California USA) Proc. SPIE, Vol. 7077, 70770R (2008).

  • T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, S. Matsuyama, Y. Sano, K.@Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of adaptive mirror for wavefront correction of hard x-ray nanobeam
    SPIE Optics + Photonics 2008 (August 11-14 2007San, Diego, California USA) Proc. SPIE, 7077 (2008) 707709.

  • Y. Sano, T. Masuda, S. Kamisaka, H. Mimura, S. Matsuyama, and K. Yamauchi
    Improvement of Thickness Uniformity of SOI by Numerically Controlled Sacrificial Oxidation Using Atmospheric-Pressure Plasma
    2008 IEEE International SOI Conference (October 6-9, 2008/ Mohonk Moutain House, New Paltz, New York, USA) Proceedings 165-166

  • T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, S. Matsuyama, Y. Sano, K.@Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of adaptive mirror for wavefront control of hard x-ray nanobeam
    2nd workshop on X-ray and XUV active optics (October 9-11, 2008, Torieste, Itary) Book of abstract pp.45-46

  • H. Mimura (Invited)
    Fabrication of 400mm long X-ray mirror by Electrolytic In-process Dressing Grinding and Elastic Emission Machining
    The 6th CHINA-JAPAN, International Conference on Ultraprecision Machining, Extended Abstract 22-26 (Nov. 24-25, 2008, Hunan Univ. ,Changsha, China)