International Conference

　　　
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  • Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, A. Saito,Y. Sano, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku and T. Ishikawa, M. Shimura, and Y. Ishizaka
    Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy
    Proc. SPIE, San Diego (2003).

  • Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku and T. Ishikawa
    Developement of figure correction method having spatial resolution close to 0.1mm.
    Proc. SPIE 4, San Diego (2003).

  • Yuzo Mori, Kazuya Yamamura, Katsuyoshi Endo, Kazuto Yamauchi, Kiyoshi Yasutake, Hidekazu Goto, Hiroaki Kakiuchi, Yasuhisa Sano, Hidekazu Mimura
    Creation of perfect surfaces
    The 14th international conference on crystal growth

  • K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, S. Matsuyama, H. Yumoto, K. Ueno, M. Shibahara, K. Endo, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and Y. Mori
    Fabrication technology of ultraprecise mirror optics to realize hard X-ray nanobeam
    Proc. of SPIE, 5533, Denver, 116 (2004).

  • H. Mimura, H. Yumoto, K. Yamamura, Y. Sano, S. Matsuyama, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and K. Yamauchi
    Microstitching Interferometry for hard X-ray nanofocusing mirrors
    Proc. of SPIE, 5533, 171 Denver, (2004).

  • S. Matsuyama, H. Mimura, K. Yamamura, H. Yumoto, Y. Sano, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and K. Yamauchi
    Wave-optical and ray-tracing analysis to establish a two dimensional focusing unit using K-B arrangement
    Proc. of SPIE, 5533, Denver, 181 (2004).

  • Y. Ichii, K. Yagi, T. Ono, H. Goto, K. Inagaki, K. Yamauchi, K. Endo, Y. Mori and K. Hirose
    First-Principles Molecular-Dynamics Simulations of Electrochemical Etching Process on Al(001) Cathode Surface
    The 7th Asian Workshop on First-Principles Electronic Structure Calculations, pp. 84-84, (November 1-3, 2004 Taipei, Taiwan).

  • K. Yagi, Y. Ichii, T. Ono, H. Goto, K. Inagaki, K. Yamauchi, K. Endo, Y. Mori and K. Hirose
    First-Principles Molecular-Dynamics Simulations of Dissociation Process of Water Molecule by Catalytic Reaction of Ion-Exchange Group
    The 7th Asian Workshop on First-Principles Electronic Structure Calculations, pp. 140-140, (November 1-3, 2004 Taipei, Taiwan).

  • K. Yamauchi
    Surface figure metrology of X-ray mirrors using optical interferometry
    Production Metrology for Precision Surface

  • H. Mimura
    Development of hard X-ray nanofocusing system using ultraprecisely figured mirrors at SPring-8
    The 9th SPring-8, ESRF, APS Workshop

  • H. Mimura
    Development of surface figuring and smoothing technologies for ultraprecise X-ray mirror fabrication at Osaka university.
    The 9th SPring-8, ESRF, APS Workshop

  • K. Arima, K. Yamauchi, H. Mimura, A. Kubota, K. Inagaki, Y. Mori and K. Endo
    Atomic-Scale Evaluation of Si(001) Surfaces Finished by Novel Global Planarization Process
    13th International Conference on Scanning Tunneling Microscopy/Spectroscopy and Related Techniques (STM'05) (July 3-8, 2005 Sapporo Convention Center, Japan), 335.

  • J. Katoh, A. Kubota, H. Mimura, K. Yamauchi, K. Arima, K. Inagaki, Y. Mori and K. Endo
    Investigation of machining mechanism in Elastic Emission Machining (EEM) on the atomic scale
    13th International Conference on Scanning Tunneling Microscopy/Spectroscopy and Related Techniques (STM'05) (July 3-8, 2005 Sapporo Convention Center, Japan), 89.

  • M. Shibahara, K. Yamamura, Y. Sano, T. Sugiyama, K. Endo and Y. Mori
    Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM
    Proc. SPIE 5869, 58690I (July 31- August 4, 2005 San Diego, USA).

  • S. Matsuyama, H. Mimura, H, Yumoto, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Hard x-ray nanofocusing at 40-nm level using K-B mirror optics for nanoscopy/spectroscopy
    Proc. SPIE 5918, 591804 (July 31- August 4, 2005 San Diego, USA).

  • Y. Higashi, Y. Takaie, K. Endo, T. Kume, K. Enami, K. Yamauchi, K. Yamamura, Y. Sano, K. Ueno, Y. Mori
    A new designed ultra-high precision profiler
    Proc. SPIE 5921, 592107 San Diego (July 31- August 4, 2005 San Diego, USA).

  • H. Mimura, H, Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Surface figuring and measurement methods with spatial resolution close to 0.1 mm for x-ray mirror fabrication
    Proc. SPIE 5921, 59210M (July 31- August 4, 2005 San Diego, USA).

  • Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
    Scanning hard-X-ray microscope with spatial resolution better than 50nm using K-B mirror optics
    Program and Abstracts, 8th International Conference on X-ray Microscopy, 109 (July 26-30, 2005 Himeji, Japan).

  • Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
    Hard X-ray diffraction-limited nanofocusing with unprecedentedly accurate mirrors
    Program and Abstracts, 8th International Conference on X-ray Microscopy, 26 (July 26-30, 2005 Himeji, Japan).

  • Yasuo Higashi, Yuichi Takaie, Katsuyoshi Endo, Tatsuya Kume, Kazuhiro Enami, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano, Kenji Ueno, Yuzo Mori
    A New Designed Ultra-high Precision Profiler - Study on slope error measurement of a mandrel for Wolter type-I mirror fabrication -
    Program and Abstracts, 8th International Conference on X-ray Microscopy, 264 (July 26-30, 2005 Himeji, Japan).

  • Y. Sano, K. Yamamura, K. Endo, Y. Mori
    Plasma Chemical Vaporization Machining (PCVM)
    Book of Lecture Note, IWCGT-3, 305-316 (September 10-18, 2005 Beatenberg, Switzerland).

  • K. Yamauchi, H. Mimura, K. Endo, Y. Mori
    Elastic Emission Machining (EEM)
    Book of Lecture Note, IWCGT-3, 317-326 (September 10-18, 2005 Beatenberg, Switzerland).

  • H. Mimura, H. Yumoto, S. Matsuyama, H. Hara, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi
    Stitching Interferometry for Surface Figure Measurement of X-ray Reflective Optics
    The 89th OSA Annual Meeting, 2005 Frontiers in Optics/Laser Science conferences (October 16-20, 2005, Tuscon, Arizona, USA).

  • H. Yumoto, H. Mimura, S. Matsuyama, H. Hara, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi
    Focusing Hard X-rays to Sub-50 nm Size by Elliptically Figured Mirror
    The 89th OSA Annual Meeting, 2005 Frontiers in Optics/Laser Science conferences (October 16-20, 2005, Tuscon, Arizona, USA)

  • K. Yamauchi, H. Mimura, T. Matsuyama, H. Yumoto, K. Yamamura, Y. Sano, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, and Y. Mori
    Development of Elliptical Kirkpatrick-Baez Mirrors for Hard X-ray Nanofocusing
    The 89th OSA Annual Meeting, 2005 Frontiers in Optics/Laser Science conferences (October 16-20, 2005, Tuscon, Arizona,USA)

  • Y. Ichii, Y. Mori, H. Hirose, K. Endo, K. Yamauchi, K. Yagi and H. Goto
    Electrochemical Etching Using Surface Modified Graphite Electrodes in Ultrapure Water
    Proceedings of ACEC2005 (The 5th Asian Conference on Electrochemistry), Shanghai, China, 1P14, (2005).

  • K. Yamamura, Y. Sano, M. Shibahara, K. Yamauchi, H. Mimura, K. Endo
    Ultra precision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma
    Proc. ICRP6/SPP23, Sendai, Japan, 81-82, (2006)

  • Kenta Arima, Kazuto Yamauchi, Hidekazu Mimura, Akihisa Kubota, Kouji Inagaki, Yuzo Mori, and Katsuyoshi Endo
    Atomic-level STM analyses of Si(001) surfaces prepared in aqueous environment
    Abstract Book of 33rd Conference on the Physics & Chemistry of Semiconductor Interfaces, Florida, USA, Mo1355, (2006).

  • Y. Sano, M. Watanabe, K. Yamamura, K. Yamauchi, T. Ishida, K. Arima, A. Kubota, and Y. Mori
    Polishing characteristics of silicon carbide by plasma chemical vaporization machining
    Proc. ICRP-6/SPP-23, 303-304 (January 24-27, 2006, Matsushima, Japan).

  • Yoshio Ichii and Hidekazu Goto
    Development of Low-emission Chemical Etching Method for Nano-structure Fabrication on Silicon
    Handai Nanoscience and Nanotechnology International Symposium, p.95 (Osaka, January, 30th 2006)

  • Y. Sano, K. Yamamura, H. Mimura, K. Yamauchi, A. Kubota, and Y. Mori
    Cutting of functional materials by plasma chemical vaporization machining with inner-diameter blade electrode
    Proc. ICRP-6/SPP-23, 305-306 (January 24-27, 2006, Matsushima, Japan).

  • Yoshio Ichii and Hidekazu Goto
    Development of Low-emission MEMS Process
    4th ISE(The International Society of Electrochemistry) Spring Meeting 2006, P.167 (Singapore, April, 17th to 20th, 2006)

  • Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Soichiro Handa,Keiko Katagishi, Akihiko Shibatani, Kazuya Yamamura, Yasuhisa Sano,Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa and Kazuto Yamauchi
    Development of K-B Mirror Manipulator for Hard X-ray Sub-50nm Focusing
    International Workshop on Mechanical Engineering Design of Synchrotron Radiation Equipment and Instrumentation 2006 (MEDSI2006), (May 24 - 26, 2006, Hygo, Japan)

  • H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, and K. Yamauchi
    Development of Surface Measurement Technologies for Hard X-ray Nanofocusing Mirror at Osaka University and SPring-8
    The 3rd International Workshop on Metrology for X-ray Optics, (May 27-May 28, 2006, Daegu, Korea).

  • K. Yamauchi, H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa(Invited)
    Hard X-ray Focusing less than 50nm for Nanoscopy/spectroscopy
    SRI2006(The Ninth International Conference on Synchrotron Radiation Instrumentation), (May 28-June 2, 2006, Daegu, Korea).

  • Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Soichiro Handa, Akihiko Shibatani, Keiko Katagishi, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, and Kazuto Yamauchi
    Fabrication of X-ray Mirror for Hard X-ray Diffraction Limited Nanofocusing
    SRI2006(The Ninth International Conference on Synchrotron Radiation Instrumentation) EP-095 (May 28-June 2, 2006, Daegu, Korea).

  • Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Keiko Katagishi, Soichiro Handa, Akihiko Shibatani, Yasuhisa Sano, Kazuya Yamamura, Katsuyoshi Endo, Yuzo Mori, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa and Kazuto Yamauchi
    Development of a Scanning X-ray Fluorescence Microscope Using Size-Controllable Focused X-ray Beam from 50 to 1500nm
    The 9th International Conference on Synchrotron Radiation Instrumentation (SRI 2006), (May 28 - June 03, Deagu, Korea)

  • K. Yamauchi, H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, Y. Sano, K. Yamamura, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa(Invited)
    Diffraction-limited X-ray nanobeam with KB mirrors
    ERL X-ray Science Workshops 6, Workshop on New Science Opportunities with Nanometer-Sized X-Ray Beams, (June23, June24, 2006, Ithaka, NewYork, USA).

  • H. Mimura and K. Yamauchi
    Hard X-ray nano-focusing with ultraprecisely figured mirrors, ESRF, APS, SPring-8
    The 10 the Three-Way Meeting (June19-June21 2006, ESRF, Grenoble, France).

  • H. Mimura, H. Yumoto, S. Matsuyama, S. Handa, Y. Sano, K. Yamamura, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
    Hard X-ray focusing with a beam size less than 30 nm by total reflection mirror
    ERL X-ray Science Workshops 6, Workshop on New Science Opportunities with Nanometer-Sized X-Ray Beams, (June23-June24, 2006, Ithaca, NewYork, USA).

  • Yasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi, Akihisa Kubota and Yuzo Mori
    Fabrication of ultra thin and highly uniform silicon-on-insulator by numerically controlled plasma chemical vaporization machining
    8th Asia-Pacific Conference on Plasma Science and Technology and 19th Symposium on Plasma Science for Materials (APCPST-8/SPSM-19), (2-5th July, 2006, Cairns, Australia)

  • H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, A. Shibatani, K. Katagishi, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, and K. Yamauchi
    Waveoptical simulation for designing and evaluating hard X-ray nanofocusing mirror
    Proc. SPIE Vol.6317, 631718 (2006). (August 13-17 2006, San Diego, California USA).

  • Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Soichiro Handa, Akihiko Shibatani, Keiko Katagishi, Yasuhisa Sano, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, and Kazuto Yamauchi
    At-wavelength figure metrology of total reflection mirrors in hard x-ray region
    Proc. SPIE Vol.6317, 631709 (2006). (August 13-17 2006, San Diego, California USA).

  • Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Souichiro Handa, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, and Kazuto Yamauchi
    Fabrication of ultraprecisely figured mirror for nano focusing hard-x-ray
    The 11th International Conference on Precision Engineering (ICPE), 295-300 (August 16-18, 2006, Tokyo, Japan)

  • Hideyuki Hara, Yasuhisa Sano, Hidekazu Mimura, Kenta Arima, Akihisa Kubota, Keita Yagi, Junji Murata and Kazuto Yamauchi
    Novel abrasive-free planarization of Si and SiC using catalyst
    The 11th International Conference on Precision Engineering (ICPE), 267-270 (August 16-18, 2006, Tokyo, Japan)

  • Satoshi Matsuyama, Hidekazu Mimura, Mari Shimura, Hirokatsu Yumoto, Keiko Katagishi, Soichiro Handa, Akihiko Shibatani, Yasuhis Sano, Kazuya Yamamura, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa and Kazuto Yamauchi
    High-spatial-resolution scanning X-ray fluorescence microscope with Kirkpatrick-Baez mirrors
    Proc. SPIE 6317, 631719, (August 13- 17, 2006 San Diego, USA).

  • Keiko Katagishi, Satoshi Matsuyama, Hidekazu Mimura, Mari Shimura, Hirokatsu Yumoto, Soichiro Handa, Akihiko Shibatani, Yasuhisa Sano, Kazuya Yamamura, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa and Kazuto Yamauchi
    Observation of Intracellular Elements by Scanning X-ray Fluorescence Microscopy with Spatial Resolution of 50nm
    The 16th International Microscopy Congress (IMC16), Vol2, 1049, (September 3 - 8, 2006, Sapporo, Japan)

  • Satoshi Matsuyama, Hidekazu Mimura, Mari Shimura, Hirokatsu Yumoto, Keiko Katagishi, Soichiro Handa, Akihiko Shibatani, Yasuhisa Sano, Kazuya Yamamura, Katsuyoshi Endo, Yuzo Mori, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa and Kazuto Yamauchi
    Scanning X-ray Fluorescence Microscope Using Kirkpatrick-Baez Optics with Spatial Resolution Better than 50nm
    The 16th International Microscopy Congress (IMC16), Vol2, 1030, (September 3 - 8, 2006, Sapporo, Japan)

  • Hideyuki Hara, Yasuhisa Sano, Hidekazu Mimura, Kenta Arima, Akihisa Kubota, Keita Yagi, Junji Murata and Kazuto Yamauchi
    Damage-free Planarization of 4H-SiC (0001) by Catalyst-Referred Etching
    Programme of The 6th European Conference on Silicon Carbide and Related Materials (ECSCRM 2006), 28, (Sep 3-7, 2006, Newcastle upon Tyne, UK)

  • Yasuhisa Sano, Masayo Watanabe, Kazuya Yamamura, Kazuto Yamauchi, Takeshi Ishida, Kenta Arima, Akihisa Kubota and Yuzo Mori
    Polishing characteristics of 4H-SiC Si-face and C-face by plasma chemical vaporization machining
    Programme of The 6th European Conference on Silicon Carbide and Related Materials (ECSCRM 2006), 34, (Sep 3-7, 2006, Newcastle upon Tyne, UK)

  • K. Yamauchi(Invited)
    Elastic Emission Machining for the Fabrication of X-ray and EUV Mirrors
    OSA Optical Fabrication and Testing Topical Meeting, (October 9 - 11, 2006, Rochester USA).

  • H. Yumoto, H. Mimura, S. Matsuyama, S. Handa, A. Shibatani, K. Katagishi, Y. Sano, K. Yamamura, Y. Mori, K. Tamasaku, M. Yabashi, Y. Nishino, T. Ishikawa and K. Yamauchi
    Fabrication Technology of Total Reflection Mirrors to Realize Hard-x-ray Sub-30-nm Focusing
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 2.4, (2006).

  • S. Matsuyama, H. Mimura, H. Yumoto, Y. Sano, K. Yamamura, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa and K. Yamauchi
    Development of Scanning X-ray Fluorescencs Microscope with Spatial Resolution Better Than 30nm Using K-B Mirror Optics
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 2.5, (2006).

  • Y. Sano, T. Masuda, H. Mimura and K. Yamauchi
    Development of Numerically Controlled Sacrificed Oxidation Using Atmospheric Pressure Plasma
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 3.2, (2006).

  • Y. Ichii and H. Goto
    Fabrication of Flat Silicon Surfaces Using Eco-friendly Electrochemical Etching Process on Cathode
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 3.3, (2006).

  • H. Hara, Y. Sano, K. Arima, K. Yagi, J. Murata, A. Kubota, H. Mimura and K. Yamauchi
    Development of CAtalyst-Referred Etching
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 3.4, (2006).

  • H. Mimura , H. Yumoto, S. Matsuyama, Y. Sano, K. Yamamura, Y. Mori, K. Tamasaku, M. Yabashi, Y. Nishino, T. Ishikawa and K. Yamauchi
    Development of High-resolution Computer-controlled Figuring System and Application to X-ray Reflective Optics
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, P12, (2006).

  • K. Yagi, J. Murata, H. Hara, Y. Sano, K. Yamauchi and H. Goto
    Fabrication of Damascene Cu Wiring Using Solid Acid Catalyst
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, P13, (2006).

  • K. Arima, H. Hara, K. Yagi, R. Okamoto, H. Mimura, A. Kubota, K. Yamauchi
    Atomic-scale Characterization of HF-treated 4H-SiC (0001) 1x1 Surfaces by Scanning Tunneling Microscopy
    Materials Research Society Abstract No. H7.6 2007, San Francisco, CA, USA (2007)

  • H. Takino, K. Ara, N. Shibata, K. Yamamura, Y. Sano, and Y. Mori
    Shape correction of steep curved surface using plasma chemical vaporization machining with a hemispherical tip electrode
    Proceedings of the 7th euspen International Conference, 193-196 (May 20-24, 2007, Bremen, Germany).

  • S. Matsuyama
    Scanning Hard X-ray Microscopy with Spatial Resolution Better than 50 nm
    NSF-MEXT Exchange program for Japan-US young researchers (June 1, 2007, Osaka, Japan)

  • M. Kanaoka, C, Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi
    Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics
    Abstracts of 51th Int. Conf. on Electron, Ion, Photon Beam Technology and Nanofabrication, PM-11.(May 29 - June 1, 2007)

  • K. Yamauchi(Invited)
    Recent achievement in nano-focusing of hard X-rays,
    Workshop on X-ray optics and application(Japan, Tsukuba, Jul, 2007).

  • Yasuhisa Sano, Takaya Masuda, Hidekazu Mimura, and Kazuto Yamauchi
    Ultraprecision Finishing Technique by Numerically Controlled Sacrificial Oxidation
    Proceedings of 15th International Conference on Crystal Growth, Abstract#586 (August 12-17, 2007, Salt Lake City, USA).

  • Junji Murata, Akihisa Kubota, Keita Yagi, Yasuhisa Sano, Hideyuki Hara, Kenta Arima, Takeshi Okamoto, Hidekazu Mimura and Kazuto Yamauchi
    Damage-free planarization of GaN using a catalyst plate
    Proceedings of 15th International Conference on Crystal Growth, Abstract#789 (August 12-17, 2007, Salt Lake City, USA).

  • Hideyuki Hara, Yasuhisa Sano, Kenta Arima, Keita Yagi, Junji Murata, Takeshi Okamoto, Hidekazu Mimura and Kazuto Yamauchi
    New Crystal Planarization Technique using a catalyst plate
    Proceedings of 15th International Conference on Crystal Growth, Abstract#769 (August 12-17, 2007, Salt Lake City, USA).

  • Y. Takahashi, Y. Nishino, T. Ishikawa, E. Matsubara
    A new technique for three-dimensional internal structure analysis in metallic materials: Coherent x-ray diffraction microscopy
    Book of abstracts of 56th Denver x-ray conference, Colorado, U.S.A, 207, (2007).

  • Soichiro Handa, Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi
    Hard x-ray wavefront measurement and control for hard x-ray nanofocusing
    SPIE Optics + Photonics 2007, August 26-30 2007, San Diego, California USA, (2007).

  • K. Yamauchi.(Invited)
    Recent achievements and next strategies in hard-X-ray nano-focusing
    Advanced X-Ray Optics Metrology for Nano-focusing and Coherence Preservation(USA, Lawrence Berkeley National Laboratory, Oct. 5, 2007)

  • Y. Sano, T. Masuda, H. Mimura, and K. Yamauchi
    Ultra-precision Finishing of SOI wafer by Numerically Controlled Sacrificial Oxidation Using Atmospheric Pressure Plasma
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, 33-34 (October 15-17, 2007, Osaka, Japan).

  • Hidekazu Mimura, Hirokatsu Yumoto, Soichiro Handa,Takashi Kimura, Satoshi Matsuyama, Yasuhisa Sano, Yoshinori Nishino, Kenji Tamasaku, Yabashi Makina, Tetsuya Ishikawa and Kazuto Yamauchi
    Experimental determination of the wave field of X-ray nanobeam
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, 17-18 (Oct 15-17, 2007, Osaka, Japan)

  • H. Furukawa, Y. Takahashi, H. Kubo, Y. Nishino, K. Yamauchi, T. Ishikawa, E. Matsubara
    Coherent x-ray diffraction measurements of Cu thin line
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, P64 (2007)

  • Y. Takahashi, H. Furukawa, H. Kubo, Y. Nishino, K. Yamauchi, T. Ishikawa, E. Matsubara
    Three-dimensional observation of internal structures in metallic materials by coherent x-ray diffraction microscopye
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 6.7 (2007)

  • Junji Murata, Akihisa Kubota, Keita Yagi, Yasuhisa Sano, Hideyuki Hara, Kenta Arima, Takeshi Okamoto, Hidekazu Mimura and Kazuto Yamauchi
    Novel abrasive-free planarization of GaN using a catalytic reference plate
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, P19 (2007)

  • Hideyuki Hara, Yasuhisa Sano, Kenta Arima, Keita Yagi, Junji Murata, Akihisa Kubota, Hidekazu Mimura, Kazuto Yamauchi
    Planarization Mechanism of Catalyst-Referred Etching
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, 37-38 (Oct 15-17, 2007, Osaka, Japan)

  • Soichiro Handa, Hidekazu Mimura, Hirokatsu Yumoto, Takashi Kimura, Satoshi Matsuyama, Yasuhisa Sano, and Kazuto Yamauchi
    Highly accurate differential deposition for X-ray reflective optics
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, 19-20 (Oct 15-17, 2007, Osaka, Japan)

  • Satoshi Matsuyama, Hidekazu Mimura, Keiko Katagishi, Mari Shimura, Masaki Fujii, Hirokatsu Yumoto, Soichiro Handa, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi
    High-resolution and Highly Sensitive Scanning X-ray Fluorescence Microscopy Using Kirkpatrick-Baez Mirror Optics
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, 81-82 (Oct 15-17, 2007, Osaka, Japan)

  • Masaki Fujii, Satoshi Matsuyama, Mari Shimura, Keiko Katagishi, Hidekazu Mimura, Hirokatsu Yumoto, Soichiro Handa, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishin, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi
    Development of Cryo Scanning X-ray Fluorescent Microscopy to Observe Frozen Hydrated Cells and Tissues
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, P62 (2007)

  • M. Kanaoka, C, Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi
    Processing efficiency of elastic emission machining for low-thermal-expansion material
    Extended Abstracts of International 21st Century COE Symposium on Atomic Fabrication Technology 2007, 25-26

  • Y. Sano, M. Watanabe, T. Kato, K. Yamamura, H. Mimura, and K. Yamauchi
    Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide
    International Conference on Silicon Carbide and Related Materials 2007, Mo-P-55 (October 15-19, 2007, Otsu, Japan).

  • Junji Murata, Akihisa Kubota, Keita Yagi, Yasuhisa Sano, Hideyuki Hara, Kenta Arima, Takeshi Okamoto, Hidekazu Mimura and Kazuto Yamauchi
    New Chemical Planarization of SiC and GaN Using Fe Plate in H2O2 solution
    International Conference on Silicon Carbide and Related Materials 2007, Th-0B-3 (October 15-19, 2007, Otsu, Japan).

  • T. Okamoto, Y. Sano, H. Hara, K. Arima, K. Yagi, J. Murata, H. Mimura and K. Yamauchi
    Damage-free Planarization of 2-inch 4H-SiC Wafer Using Pt Catalyst Plate and HF Solution
    International Conference on Silicon Carbide and Related Materials 2007 Technical Digest (ICSCRM 2007),We-94,(Oct.14-19,2007,Otsu,Japan)

  • Takehiro Kato, Yasuhisa Sano, Hideyuki Hara, Hidekazu Mimura, Kazuya Yamamura and Kazuto Yamauchi
    Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining
    International Conference Silicon Carbide and Related Materials 2007(ICSCRM2007), We-98, (Oct 14-19,2007,Otsu,Japan)

  • K. Yamauchi
    Focusing hard X-ray to sub-10nm by reflective optics
    ESRF, SPring-8, APS Three-Way Meeting(March, 17-19,2008,Chicago,USA)

  • H. Mimura, S. Morita, T. Kimura, D. Yamakawa, W. Lin, T. Uehara, H. Yumoto, S. Matsuyama, Y. Nishino, K. Tamasaku, H. Ohashi, M. Yabashi, T. Ishikawa, H. Omori, K. Yamauchi
    Focusing mirror for X-ray free electron laser
    ESRF, SPring-8, APS Three-Way Meeting(March, 17-19,2008,Chicago,USA)

  • Y. Sano, K. Yamamura, K. Yamauchi and Y. Mori (Invited)
    Crystal machining using atmospheric pressure plasma
    4th International Workshop on Crystal Growth Technology(May 18 - 25, 2008, Beatenberg, Switzerland)

  • K. Yamauchi, Y. Sano, K. Arima and H. Hara(Invited)
    Catalyst-referred etching - novel abrasive-free polishing method
    4th International Workshop on Crystal Growth Technology(May 18 - 25, 2008, Beatenberg, Switzerland)

  • Takehiro Kato, Yasuhisa Sano, Tsutomu Hori, Kazuya Yamamura, Hidekazu Mimura, Yoshiaki Katsuyama, Kazuto Yamauchi
    Thinning of SiC wafers by Plasma Chemical Vaporization Machining
    The 4th Asian Conference on Crystal Growth and Crystal Technology, 189 (May 21-24, 2008, Sendai, Japan)

  • K. Yamauchi, H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, T. Kimura, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku and T. Ishikawa (Invited)
    Synchrotron-radiation-based hard X-ray nanobeam by Kirkpatrick-Baez mirrors
    European Conference on X-ray Spectrometry (16-20 June 2008, Cavtat, Dubrovnik, CROATIA), Abstract p100(I13).

  • S. Matsuyama, M. Shimura, H. Mimura, M. Fujii, H. Yumoto, S. Handa, T. Kimura, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa and K. Yamauchi
    Trace element mapping using hard X-ray nanobeam focused by a Kirkpatrick Baez mirror system
    European Conference on X-ray Spectrometry (16-20 June 2008, Cavtat, Dubrovnik, CROATIA), Abstract p88(O11-1).

  • Y. Takahashi, H. Kubo, H. Furukawa, K. Yamauchi, E. Matsubara, T. Ishikawa, Y. Nishino
    Development of element-specific hard-x-ray diffraction microscopy
    9th International Conference of X-ray Microscopy, ETH Zentrum, Zurich, Switzerland, July 21-25, 2008

  • Y. Takahashi, H. Furukawa, H. Kubo, K. Yamauchi, Y. Nishino, T. Ishikawa, E. Matsubara
    Nanotstructure analysis of metallic materials by coherent x-ray diffraction microscopy
    2008 denver x-ray conference, denver marriot tech center hotel, denver, colorad, USA, 4-8 August 2008

  • K. Yamauchi(Invited)
    X-ray focusing with Kirkpatrick-Baez optics
    Workshop: Focus on X-ray Focusing, SPIE Optics + Photonics 2008(August 11-14 2007San, Diego, California USA)

  • H. Mimura, S. Morita, T. Kimura, D. Yamakawa, W. Lin, Y. Uehara, S. Matsuyama, H. Yumoto, H. Ohashi, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, H. Ohmori, and K. Yamauchi
    Fabrication of a 400-mm-long mirror for focusing x-ray free-electron lasers to sub-100 nm
    SPIE Optics + Photonics 2008(August 11-14 2007San, Diego, California USA) Proc. SPIE, Vol. 7077, 70770R (2008).

  • T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, S. Matsuyama, Y. Sano, K.　Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of adaptive mirror for wavefront correction of hard x-ray nanobeam
    SPIE Optics + Photonics 2008 (August 11-14 2007San, Diego, California USA) Proc. SPIE, 7077 (2008) 707709.

  • Y. Sano, T. Masuda, S. Kamisaka, H. Mimura, S. Matsuyama, and K. Yamauchi
    Improvement of Thickness Uniformity of SOI by Numerically Controlled Sacrificial Oxidation Using Atmospheric-Pressure Plasma
    2008 IEEE International SOI Conference (October 6-9, 2008/ Mohonk Moutain House, New Paltz, New York, USA) Proceedings 165-166

  • T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, S. Matsuyama, Y. Sano, K.　Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of adaptive mirror for wavefront control of hard x-ray nanobeam
    2nd workshop on X-ray and XUV active optics (October 9-11, 2008, Torieste, Itary) Book of abstract pp.45-46

  • H. Mimura (Invited)
    Fabrication of 400mm long X-ray mirror by Electrolytic In-process Dressing Grinding and Elastic Emission Machining
    The 6th CHINA-JAPAN, International Conference on Ultraprecision Machining, Extended Abstract 22-26 (Nov. 24-25, 2008, Hunan Univ. ,Changsha, China)