International Conference

　　　
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  • Yukio Takahashi
    Development of coherent x-ray diffraction microscopy and its application in materials science
    TMS annual meeting (February 14-18 2010, Seattle, Washington, USA)

  • S. Matsuyama
    Nanometer Focusing of Coherent Hard X-rays with Ultraprecise Mirrors
    EuroFEL Workshop on Photon Beamlines & Diagnostics (28-30 June 2010, Hamburg, Germany)

  • H. Mimura (Invited)
    Hard X-ray sub-10nm focusing by adaptive optical system
    International workshop on Phase retrieval and Coherent Scattering (Coherence 2010), (6-10 July 2010, Rostock-Warnemunde, Germany)

  • Yukio Takahashi
    Development of coherent x-ray diffraction microscopy and its application in materials science
    The 7th International Conference on Synchrotron Radiation in Materials Science (July 11-14 2010, Oxford, UK)

  • H. Mimura, T. Kimura, H. Yokoyama, H. Yumoto, S. Matsuyama, K. Tamasaku, Y. Koumura, M. Yabashi, T. Ishikawa, K. Yamauchi
    An adaptive optical system for sub-10nm hard x-ray focusing
    SPIE Optics+Photonics, Proc SPIE, 7803, 780304, 2010 (1-5 August 2010, SanDiego, USA)

  • S. Matsuyama, T. Wakioka, H. Mimura, T. Kimura, N. Kidani, Y. Sano, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa and K. Yamauchi
    Hard X-ray Imaging Optics with Elliptical mirrors and Hyperbolic Mirrors
    SPIE Optics+Photonics, Technical Program, p191, 7802-01 (1-5 August 2010, SanDiego, USA)

  • Yasuhisa Sano, Kohei Aida, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, and Kazuto Yamauchi
    Dicing of SiC wafer by atmospheric-pressure plasma etching process with wire electrode
    The 16th International Conference on Crystal Growth (ICCG-16) (August 8-13, 2010, Beijing, China)

  • Yukio Takahashi, Yoshinori Nishino, Eiichiro Matsubara, Tetsuya Ishikawa, Kazuto Yamauchi
    Development and application of high-resolution diffraction microscopy using focused hard X-ray beam
    the 10th International Conference of X-ray Microscopy (Aug. 15-20 2010, elbour, elbourn, U.S.A.)

  • Y. Sano, T. Kato, K. Yamamura, H. Mimura, S. Matsuyama, and K. Yamauchi
    Thinning of 2-inch SiC wafer by plasma chemical vaporization machining
    The 8th European Conference on Silicon Carbide and Related Materials，Abstract Booklet, TP-155 (Aug 29-Sep 2, 2010, Oslo, Norway)

  • T. Okamoto, Y. Sano, K. Tachibana, K. Arima, A. N. Hattori, K. Yagi, J. Murata, S. Sadakuni and K. Yamauchi
    Abrasive-free planarization of 3-inch 4H-SiC substrate by catalyst-referred etching
    The 8th European Conference on Silicon Carbide and Related Materials，Abstract Booklet, TP-160 (Aug 29-Sep 2, 2010, Oslo, Norway)

  • S. Sadakuni, N. X. Dai, Y. Sano, K. Arima, A. N. Hattori, K. Yagi, J. Murata, T. Okamoto, K. Tachibana, and K. Yamauchi
    High-resolution TEM observation of SiC surface flattened by catalyst-referred etching
    The 8th European Conference on Silicon Carbide and Related Materials，Abstract Booklet, TP-158 (Aug 29-Sep 2, 2010, Oslo, Norway)

  • Shun Sadakuni, Junji Murata, Keita Yagi, Kenta Arima, Yasuhisa Sano, Takeshi Okamoto, Kazuma Tachibana, and Kazuto Yamauchi
    Abrasive-free planarization of GaN using photoelectrochemical reaction
    International Workshop on Nitride Semiconductors (IWN2010), Program & Abstracts, 166 (19-24 Sep. 2010, Tampa, USA)

  • Yasuhisa Sano, Keinosuke Yoshinaga, Shohei Kamisaka, Hidekazu Mimura, Satoshi Matsuyama, and Kazuto Yamauchi (invited)
    Numerically Controlled Sacrificial Plasma Oxidation Using Array-Type Electrode toward High-Throughput Deterministic Machining
    The 2nd International Conference on Nanomanufacturing, proceedings, 169 (24-26 SEP, 2010，Tianjin, China)

  • K. Yamauchi (invited)
    Atomically Controlled Polishing of Single-Crystalline SiC and GaN
    The 2nd International Conference on Nanomanufacturing (24-26 SEP, 2010，Tianjin, China)

  • Y. Sano, S. Kamisaka, K. Yoshinaga, H. Mimura, S. Matsuyama, and K. Yamauchi
    Numerically Controlled Sacrificial Plasma Oxidation Using Array of Electrodes for Improving Thickness Uniformity of SOI
    2010 IEEE International SOI Conference, Proceedings 68-69(October 11-14, 2010/ Catamaran Resort Hotel & Spa, San Diego, California, USA)

  • Ryosuke Tsutsumi, Yukio Takahashi, Nobuyuki Zettsu, Akihiro Suzuki, Yoshinori Nishino, Eiichiro Matsubara, Tetsuya Ishikawa, Kazuto Yamauchi
    Development of high-resolution X-ray diffraction microscopy using Kirkpatrick and Baez mirrors
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 84-85(24-26 Nov, 2010, Osaka, Japan)

  • Yukio Takahashi
    Development and application of high-resolution X-ray diffraction microscopy using advanced mirror optics
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 8-9(24-26 Nov, 2010, Osaka, Japan)

  • T. Okamoto, Y. Sano, K. Tachibana, K. Arima, A. N. Hattori, K. Yagi, J. Murata, S. Sadakuni, and K. Yamauchi
    Processing Characteristics in Catalyst-Referred Etching of 4H-SiC (0001) Substrates
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 28-29(24-26 Nov, 2010, Osaka, Japan)

  • Y. Sano, K. Yamamura, K. Arima and K. Yamauchi
    Development of Chemical Processing Methods for Silicon Carbide Wafering and Device Processing
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 54-55(24-26 Nov, 2010, Osaka, Japan)

  • K. Yoshinaga, Y. Sano, H. Mimura, S. Matsuyama, and K. Yamauchi
    Improvement of Thickness Uniformity of Si Layer in SOI Wafer by Numerically Controlled Sacrificial Oxidation Using Atmospheric-Pressure Plasma with Electrode Array System
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 102-103(24-26 Nov, 2010, Osaka, Japan)

  • S. Sadakuni, J. Murata, K. Yagi, Y. Sano, K. Arima, T. Okamoto, K. Tachibana and K. Yamauchi
    Improvement of the Removal Rate of Planarization Technique for GaN by Applying Bias
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 186-187(24-26 Nov, 2010, Osaka, Japan)

  • K. Aida, Y. Sano, H. Nishikawa, K. Yamamura, H. Mimura, S. Matsuyama and K. Yamauchi
    Thinning of SiC Wafer by Plasma Chemical Vaporization Machining
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 190-191(24-26 Nov, 2010, Osaka, Japan)

  • S. Matsuyama, T. Wakioka, H. Mimura, T. Kimura, N. Kidani, Y. Sano, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    One-Dimensional Wolter Mirror for Achromatic Hard X-ray Microscopy
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 60-61(24-26 Nov, 2010, Osaka, Japan)

  • T. Wakioka, S. Matsuyama, N. Kidani, H. Mimura, Y. Sano and K. Yamauchi
    Development of Side-By-Side Kirkpatrick-Baez mirror for high-density X-ray nanobeam
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 70-71(24-26 Nov, 2010, Osaka, Japan)

  • N. Kidani, S. Matsuyama, T. Wakioka, S. Kitamura, H. Mimura and K. Yamauchi
    Development of Advanced Kirkpatrick-Baez mirror for achromatic hard X-ray microscopy
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 62-63(24-26 Nov, 2010, Osaka, Japan)

  • T. Kimura, S. Handa, H. Mimura, H. Yumoto, H. Yokoyama, S. Imai, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Kohmura, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of Wavefront Measurement Method for Hard X-ray Adaptive Optics System
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 86-87(24-26 Nov, 2010, Osaka, Japan)

  • H. Yokoyama, H. Mimura, T. Kimura, S. Imai, S. Matsuyama, Y. Sano, K. Yamauchi
    Ray-tracing Analysis of a Graded Multilayer Mirror
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 74-75(24-26 Nov, 2010, Osaka, Japan)

  • K. Yoshinaga, Y. Sano, H. Mimura, S. Matsuyama, K. Yamauchi
    Improved Thickness Uniformity of Si Layer in SOI wafer by Numerically Controlled Sacrificial Oxidation using Atmospheric-Pressure Plasma with Electrode Array System
    Proceedings of 32nd International Symposium on Dry Process 91-92(Nov, 2010, Tokyo, Japan)

  • S. Matsuyama, T. Wakioka, H. Mimura, T. Kimura, N. Kidani, Y. Sano, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Hard X-ray Imaging Optics with Elliptical mirrors and Hyperbolic Mirrors
    SPIE Optics+Photonics, Technical Program 191(Aug, 2010, San Diego, California, USA)