International Conference

  • Y. Sano (invited)
    Fabrication technology for atomically flat SiC surfaces
    Symposium on Surface and Nano Science 2012, G-4 (9-12 Jan, Iwate, Japan)

  • K. Yamauchi(invited)
    10KeV mirror project
    XTS - Breakout Meeting (2 Feb, National Astronomical Observatory of Japan, Tokyo, Japan)

  • K. Yamauchi(invited)
    Current status of mirror-based optics for coherent x-ray science
    Third Ringberg Workshop on Science with FELs, (May 2012, Bavaria, Germany)

  • Yukio Takahashi, Akihiro Suzuki, Shin Furutaku, Kazuto Yamauchi, Yoshiki Kohmura and Tetsuya Ishikawa(invited)
    High-resolution X-ray ptychography using focused hard X-ray beam
    Coherence 2012, P13 (18-21 June 2012, Hilton Fukuoka Sea Hawk, Fukuoka, Japan)

  • K. Yamauchi(invited)
    Nanofocusing and wavefront analysis of SACLA
    Coherence 2012 (18-21 June 2012, Hilton Fukuoka Sea Hawk, Fukuoka, Japan)

  • Akihiro Suzuki, Yukio Takahashi, Nobuyuki Zettsu, Yoshiki Kohmura, Kazuto Yamauchi and Tetsuya Ishikawa
    Development of high-resolution X-ray ptychography using drift-compensation method
    Coherence 2012, PS-2 (18-21 June 2012, Hilton Fukuoka Sea Hawk, Fukuoka, Japan)

  • H. Nakamori, S. Matsuyama, S. Imai, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of piezoelectric deformable mirrors for X-ray focusing
    Coherence 2012, PS-16, (18-21 June 2012, Hilton Fukuoka Sea Hawk, Fukuoka, Japan)

  • Taito Osaka, Makina Yabashi, Yasuhisa Sano, Kensuke Tono, Yuichi Inubushi, Takahiro Sato, Satoshi Matsuyama, Tetsuya Ishikawa, and Kazuto Yamauchi
    Fabrication of a Bragg beam splitter for an X-ray autocorrelator
    Coherence 2012, PS-17, (18-21 June 2012, Hilton Fukuoka Sea Hawk, Fukuoka, Japan)

  • K. Yamauchi(invited)
    Progress of Mirror-based Focusing Optics for X-ray Free Electron Laser
    5th Asian Workshop on Generation and Application of Coherent XUV and X-ray Radiation (5th AWCXR), (27-29 June 2012, Kashiwa, Chiba, Japan)

  • K. Yamauchi(invited)
    Hard X-ray nanofocusing and wavefront diagnosis
    4th international workshop on Metrology for X-ray Optics, Mirror Design, and Fabrication Barcelona IWXM, (4-6 July 2012, Barcelona, Spain)

  • H. Nakamori, S. Matsuyama, S. Imai, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of an ultra-precise deformable mirror for x-ray focusing
    4th international workshop on Metrology for X-ray Optics, Mirror Design, and Fabrication Barcelona IWXM, P59 (4-6 July 2012, Barcelona, Spain)

  • OSAKA Taito, YABASHI Makina, SANO Yasuhisa, TONO Kensuke, INUBUSHI Yuichi, SATO Takahiro, MATSUYAMA Satoshi, ISHIKAWA Tetsuya, YAMAUCHI Kazuto
    Fabrication of a Bragg beam splitter for hard X-ray free-electron laser
    11th International Conference on Synchrotron Radiation Instrumentation, WE-E-P-37 (9-13 July 2012, the Centre de Congres, Lyon, France)

  • Satoshi Matsuyama, Youji Emi, Naotaka Kidani, Yoshiki Kohmura, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
    Development of Achromatic Full-Field Hard X-ray Microscopy Using Four Total-Reflection Mirrors
    11th International Conference on X-ray Microscopy, P60 (5-10 Aug 2012, Shanghai, China)

  • Yukio Takahashi, Akihiro Suzuki, Nobuyuki Zettsu, Yoshiki Kohmura, Yasunori Senba, Haruhiko Ohashi, Kazuto Yamauchi and Tetsuya Ishikawa
    High-resolution ptychography using focused hard X-ray beam
    11th International Conference on X-ray Microscopy, P82 (5-10 Aug 2012, Shanghai, China)

  • Akihiro Suzuki, Yukio Takahashi, Nobuyuki Zettsu, Yoshiki Kohmura, Yasunori Senba, Haruhiko Ohashi, Kazuto Yamauchi and Tetsuya Ishikawa
    Drift-Compensation method for High-Resolution X-ray Ptychography
    11th International Conference on X-ray Microscopy, P205 (5-10 Aug 2012, Shanghai, China)

  • K. Yamauchi(invited)
    Nanofocusing optics for hard x-ray free electron laser
    SPIE Optics+Photonics, Technical Program (Aug 2012, SanDiego, USA)

  • S. Matsuyama, T. Kimura, H. Nakamori, S. Imai, H. Yokoyama, J. Kim, R. Fukui, H. Mimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of piezoelectric deformable mirror for hard X-ray nanofocusing
    SPIE Optics+Photonics, Technical Program, P197, 8503-02 (Aug 2012, SanDiego, USA)

  • Yasuhisa Sano, Hiroaki Nishikawa, Kohei Aida, Chaiyapat Tangpatjaroen, Kazuya Yamamura, Satoshi Matsuyama, Kazuto Yamauchi
    Basic experiment on atmospheric-pressure plasma etching with slit aperture for high-efficiency dicing of SiC wafer
    The 9th European Conference on Silicon Carbide and Related Materials, We8-5 (2-6 Sep 2012, Saint-Petersburg, Russia)

  • P. V. Bui, S. Sadakuni, T. Okamoto, K. Arima, Y. Sano, K. Yamauchi
    A Study of Terminated Species on 4H-SiC (0001) Surfaces Planarized using Hydrofluoric Acid
    The 9th European Conference on Silicon Carbide and Related Materials, TuP-42 (2-6 Sep 2012, Saint-Petersburg, Russia)

  • Ai Isohashi, Yasuhisa Sano, Takeshi Okamoto, Kazuma Tachibana, Kenta Arima, Koji Inagaki, Keita Yagi, Shun Sadakuni, Yoshitada Morikawa and Kazuto Yamauchi
    Study on Reactive Species in Catalyst-Referred Etching of 4H-SiC using Platinum and Hydrofluoric Acid
    The 9th European Conference on Silicon Carbide and Related Materials, TuP-71 (2-6 Sep 2012, Saint-Petersburg, Russia)

  • H. Takei, K. Yoshinaga, Y. Sano, S. Matsuyama, and K. Yamauchi
    Improving the Accuracy of Numerically Controlled Sacrificial Plasma Oxidation Using Array of Electrodes to Improve the Thickness Uniformity of SOI
    2012 IEEE International SOI Conference, 4.7 (1-4 Oct, Napa, CA USA)

  • Shun Sadakuni, Hiroya Asano, Bui Van Pho, Ai Isohashi, Yasuhisa Sano, Satoshi Matsuyama, and Kazuto Yamauchi
    Catalyst-referred etching and an investigation of the reaction mechanism
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 24-25, S1-1, P-2 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • K. Yamauchi
    Recent progress on mirror-based optics for the 3rd and 4th generation synchrotron radiation sources
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 48-49, 3.3 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Yukio Takahashi
    Coherent X-ray Diffractive Imaging at SPring-8: Recent Progress and Outlook
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 52-53, 3.5 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Hiroki Nakamori, Satoshi Matsuyama, Shota Imai, Takashi Kimura, Yasuhisa Sano, Yoshiki Kohmura, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi
    Development of ultraprecise piezoelectric deformable mirror for adaptive X-ray focusing
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 58-59, S2-3, P-34 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Ai Isohashi, Yasuhisa Sano, Mari Oue, Shun Sadakuni, Yoshitada Morikawa, and Kazuto Yamauchi
    Etching Mechanism of Catalyst-Referred Etching with Pure Water
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 112-113, P-1 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • H. Asano, S. Sadakuni, Y. Sano, K. Yagi, S. Matsuyama, and K. Yamauchi
    Planarization of Gallium Nitride Wafers Using a Platinum Catalyst and Characterization of the Step-and-Terrace Structure
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 116-117, P-3 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Bui Van Pho, Kouji Inagaki, Yasuhisa Sano, Kazuto Yamauchi, Yoshitada Morikawa
    First-Principle Study of Platinum Catalyst-Assisted Hydrogen Fluoride Adsorption on SiC surfaces
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 122-123, P-6 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Ryosuke Fukui, Hikaru Yokoyama, Satoshi Matsuyama, Yoshiki Kohmura, Kenji Tamasaku, Makina Yabashi, Wataru Yashiro, Atsushi Momose, Tetsuya Ishikawa, and Kazuto Yamauchi
    Wavefront measurement for a hard-X-ray nanobeam using single-grating interferometry based on a phase grating and Fourier transform method
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 166-167, P-28 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Yoji Emi, Satoshi Matsuyama, Yoshiki Kohmura, Tetsuya Ishikawa, and Kazuto Yamauchi
    Development of a High-resolution Full-field Hard X-ray Imaging Microscope Based On Four Aspherical Mirrors
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 170-171, P-30 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Taito Osaka, Makina Yabashi, Yasuhisa Sano, Kensuke Tono, Yuichi Inubushi, Takahiro Sato, Satoshi Matsuyama, Tetsuya Ishikawa, and Kazuto Yamauchi
    Fabrication of a Bragg Beam Splitter Based on Ultrathin Silicon Single Crystal
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 172-173, P-31 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Jangwoo Kim, Ayaka Nagahira, Satoshi Matsuyama, Yasuhisa Sano, and Kazuto Yamauchi
    Study of Pt/C multilayers for X-ray mirrors improvement of reflectivity
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 176-177, P-33 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Shin Furutaku, Yukio Takahashi, Akihiro Suzuki, Kazuto Yamauchi, Yoshiki Kohmura, and Tetsuya Ishikawa
    Visualization of Dislocation Strain Fields in Silicon by Bragg X-ray Ptychography
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 180-181, P-35 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Akihiro Suzuki, Yukio Takahashi, Shin Furutaku, Kazuto Yamauchi, Yoshiki Kohmura, and Tetsuya Ishikawa
    X-ray Ptychography Using Defocused Hard X-ray Beam
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 182-183, P-36 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Shinichi Kitamura, Satoshi Matsuyama, Yasuhisa Sano, and Kazuto Yamauchi
    Fabrication of ultraprecise X-ray mirrors by ion beam figuring system: Fabrication and evaluation of aspheric shape on silicon surface
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 184-185, P-37 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Shota Imai, Hiroki Nakamori, Satoshi Matsuyama, Takashi Kimura, Yoshiki Kohmura, Tetsuya Ishikawa, and Kazuto Yamauchi
    Development of an adaptive hard X-ray focusing system with deformable mirrors
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 188-189, P-39 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • H. Nishikawa, Y. Sano, K. Aida, T. Chaiyapat, Y. Okada, K. Yamamura, S. Matsuyama, and K. Yamauchi
    Cutting of SiC substrates by atmospheric-pressure plasma etching with slit mask for plasma confinement
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 192-193, P-41 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • T. Osaka, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, K. Yamauchi
    Fabrication of ultrathin Bragg beam splitter by plasma chemical vaporization machining
    14th International Conference on Precision Engineering (ICPE2012), A13 (8-10 Nov 2012, Awaji Yumebutai International Conference Center, Hyogo, Japan)

  • H. Asano, S. Sadakuni, K. Yagi, Y. Sano, S. Matsuyama, T. Okamoto, K. Tachibana, K. Yamauchi
    Rapid planarization method by ultraviolet light irradiation for gallium nitride using platinum catalyst
    14th International Conference on Precision Engineering (ICPE2012), A14 (8-10 Nov 2012, Awaji Yumebutai International Conference Center, Hyogo, Japan)

  • H. Nakamori, S. Matsuyama, S. Imai, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of an ultraprecise piezoelectric deformable mirror for adaptive X-ray optics
    14th International Conference on Precision Engineering (ICPE2012), A15 (8-10 Nov 2012, Awaji Yumebutai International Conference Center, Hyogo, Japan)

  • P. V. Bui, K. Inagaki, Y. Sano, K. Yamauchi, Y. Morikawa
    First-Principles Study of Reaction Process of SiC and HF Molecules in Catalyst-Referred Etching
    14th International Conference on Precision Engineering (ICPE2012), A37 (8-10 Nov 2012, Awaji Yumebutai International Conference Center, Hyogo, Japan)

  • J. Kim, S. Matsuyama, Y. Sano, K. Yamauchi
    Improvement of interface roughness in platinum/carbon multilayers for X-ray mirrors
    14th International Conference on Precision Engineering (ICPE2012), E11 (8-10 Nov 2012, Awaji Yumebutai International Conference Center, Hyogo, Japan)