International Conference
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Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, A. Saito,Y. Sano, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku and T. Ishikawa, M. Shimura, and Y. Ishizaka
Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy
Proc. SPIE, San Diego (2003).
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Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku and T. Ishikawa
Developement of figure correction method having spatial resolution close to 0.1mm.
Proc. SPIE 4, San Diego (2003).
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Yuzo Mori, Kazuya Yamamura, Katsuyoshi Endo, Kazuto Yamauchi, Kiyoshi Yasutake, Hidekazu Goto, Hiroaki Kakiuchi, Yasuhisa Sano, Hidekazu Mimura
Creation of perfect surfaces
The 14th international conference on crystal growth
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K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, S. Matsuyama, H. Yumoto, K. Ueno, M. Shibahara, K. Endo, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and Y. Mori
Fabrication technology of ultraprecise mirror optics to realize hard X-ray nanobeam
Proc. of SPIE, 5533, Denver, 116 (2004).
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H. Mimura, H. Yumoto, K. Yamamura, Y. Sano, S. Matsuyama, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and K. Yamauchi
Microstitching Interferometry for hard X-ray nanofocusing mirrors
Proc. of SPIE, 5533, 171 Denver, (2004).
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S. Matsuyama, H. Mimura, K. Yamamura, H. Yumoto, Y. Sano, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and K. Yamauchi
Wave-optical and ray-tracing analysis to establish a two dimensional focusing unit using K-B arrangement
Proc. of SPIE, 5533, Denver, 181 (2004).
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Y. Ichii, K. Yagi, T. Ono, H. Goto, K. Inagaki, K. Yamauchi, K. Endo, Y. Mori and K. Hirose
First-Principles Molecular-Dynamics Simulations of Electrochemical Etching Process on Al(001) Cathode Surface
The 7th Asian Workshop on First-Principles Electronic Structure Calculations, pp. 84-84, (November 1-3, 2004 Taipei, Taiwan).
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K. Yagi, Y. Ichii, T. Ono, H. Goto, K. Inagaki, K. Yamauchi, K. Endo, Y. Mori and K. Hirose
First-Principles Molecular-Dynamics Simulations of Dissociation Process of Water Molecule by Catalytic Reaction of Ion-Exchange Group
The 7th Asian Workshop on First-Principles Electronic Structure Calculations, pp. 140-140, (November 1-3, 2004 Taipei, Taiwan).
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K. Yamauchi
Surface figure metrology of X-ray mirrors using optical interferometry
Production Metrology for Precision Surface
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H. Mimura
Development of hard X-ray nanofocusing system using ultraprecisely figured mirrors at SPring-8
The 9th SPring-8, ESRF, APS Workshop
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H. Mimura
Development of surface figuring and smoothing technologies for ultraprecise X-ray mirror fabrication at Osaka university.
The 9th SPring-8, ESRF, APS Workshop
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K. Arima, K. Yamauchi, H. Mimura, A. Kubota, K. Inagaki, Y. Mori and K. Endo
Atomic-Scale Evaluation of Si(001) Surfaces Finished by Novel Global Planarization Process
13th International Conference on Scanning Tunneling Microscopy/Spectroscopy and Related Techniques (STM'05) (July 3-8, 2005 Sapporo Convention Center, Japan), 335.
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J. Katoh, A. Kubota, H. Mimura, K. Yamauchi, K. Arima, K. Inagaki, Y. Mori and K. Endo
Investigation of machining mechanism in Elastic Emission Machining (EEM) on the atomic scale
13th International Conference on Scanning Tunneling Microscopy/Spectroscopy and Related Techniques (STM'05) (July 3-8, 2005 Sapporo Convention Center, Japan), 89.
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M. Shibahara, K. Yamamura, Y. Sano, T. Sugiyama, K. Endo and Y. Mori
Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM
Proc. SPIE 5869, 58690I (July 31- August 4, 2005 San Diego, USA).
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S. Matsuyama, H. Mimura, H, Yumoto, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
Hard x-ray nanofocusing at 40-nm level using K-B mirror optics for nanoscopy/spectroscopy
Proc. SPIE 5918, 591804 (July 31- August 4, 2005 San Diego, USA).
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Y. Higashi, Y. Takaie, K. Endo, T. Kume, K. Enami, K. Yamauchi, K. Yamamura, Y. Sano, K. Ueno, Y. Mori
A new designed ultra-high precision profiler
Proc. SPIE 5921, 592107 San Diego (July 31- August 4, 2005 San Diego, USA).
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H. Mimura, H, Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
Surface figuring and measurement methods with spatial resolution close to 0.1 mm for x-ray mirror fabrication
Proc. SPIE 5921, 59210M (July 31- August 4, 2005 San Diego, USA).
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Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
Scanning hard-X-ray microscope with spatial resolution better than 50nm using K-B mirror optics
Program and Abstracts, 8th International Conference on X-ray Microscopy, 109 (July 26-30, 2005 Himeji, Japan).
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Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
Hard X-ray diffraction-limited nanofocusing with unprecedentedly accurate mirrors
Program and Abstracts, 8th International Conference on X-ray Microscopy, 26 (July 26-30, 2005 Himeji, Japan).
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Yasuo Higashi, Yuichi Takaie, Katsuyoshi Endo, Tatsuya Kume, Kazuhiro Enami, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano, Kenji Ueno, Yuzo Mori
A New Designed Ultra-high Precision Profiler - Study on slope error measurement of a mandrel for Wolter type-I mirror fabrication -
Program and Abstracts, 8th International Conference on X-ray Microscopy, 264 (July 26-30, 2005 Himeji, Japan).
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Y. Sano, K. Yamamura, K. Endo, Y. Mori
Plasma Chemical Vaporization Machining (PCVM)
Book of Lecture Note, IWCGT-3, 305-316 (September 10-18, 2005 Beatenberg, Switzerland).
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K. Yamauchi, H. Mimura, K. Endo, Y. Mori
Elastic Emission Machining (EEM)
Book of Lecture Note, IWCGT-3, 317-326 (September 10-18, 2005 Beatenberg, Switzerland).
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H. Mimura, H. Yumoto, S. Matsuyama, H. Hara, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi
Stitching Interferometry for Surface Figure Measurement of X-ray Reflective Optics
The 89th OSA Annual Meeting, 2005 Frontiers in Optics/Laser Science conferences (October 16-20, 2005, Tuscon, Arizona, USA).
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H. Yumoto, H. Mimura, S. Matsuyama, H. Hara, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi
Focusing Hard X-rays to Sub-50 nm Size by Elliptically Figured Mirror
The 89th OSA Annual Meeting, 2005 Frontiers in Optics/Laser Science conferences (October 16-20, 2005, Tuscon, Arizona, USA)
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K. Yamauchi, H. Mimura, T. Matsuyama, H. Yumoto, K. Yamamura, Y. Sano, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, and Y. Mori
Development of Elliptical Kirkpatrick-Baez Mirrors for Hard X-ray Nanofocusing
The 89th OSA Annual Meeting, 2005 Frontiers in Optics/Laser Science conferences (October 16-20, 2005, Tuscon, Arizona,USA)
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Y. Ichii, Y. Mori, H. Hirose, K. Endo, K. Yamauchi, K. Yagi and H. Goto
Electrochemical Etching Using Surface Modified Graphite Electrodes in Ultrapure Water
Proceedings of ACEC2005 (The 5th Asian Conference on Electrochemistry), Shanghai, China, 1P14, (2005).
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K. Yamamura, Y. Sano, M. Shibahara, K. Yamauchi, H. Mimura, K. Endo
Ultra precision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma
Proc. ICRP6/SPP23, Sendai, Japan, 81-82, (2006)
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Kenta Arima, Kazuto Yamauchi, Hidekazu Mimura, Akihisa Kubota, Kouji Inagaki, Yuzo Mori, and Katsuyoshi Endo
Atomic-level STM analyses of Si(001) surfaces prepared in aqueous environment
Abstract Book of 33rd Conference on the Physics & Chemistry of Semiconductor Interfaces, Florida, USA, Mo1355, (2006).
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Y. Sano, M. Watanabe, K. Yamamura, K. Yamauchi, T. Ishida, K. Arima, A. Kubota, and Y. Mori
Polishing characteristics of silicon carbide by plasma chemical vaporization machining
Proc. ICRP-6/SPP-23, 303-304 (January 24-27, 2006, Matsushima, Japan).
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Yoshio Ichii and Hidekazu Goto
Development of Low-emission Chemical Etching Method for Nano-structure Fabrication on Silicon
Handai Nanoscience and Nanotechnology International Symposium, p.95 (Osaka, January, 30th 2006)
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Y. Sano, K. Yamamura, H. Mimura, K. Yamauchi, A. Kubota, and Y. Mori
Cutting of functional materials by plasma chemical vaporization machining with inner-diameter blade electrode
Proc. ICRP-6/SPP-23, 305-306 (January 24-27, 2006, Matsushima, Japan).
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Yoshio Ichii and Hidekazu Goto
Development of Low-emission MEMS Process
4th ISE(The International Society of Electrochemistry) Spring Meeting 2006, P.167 (Singapore, April, 17th to 20th, 2006)
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Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Soichiro Handa,Keiko Katagishi, Akihiko Shibatani, Kazuya Yamamura, Yasuhisa Sano,Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa and Kazuto Yamauchi
Development of K-B Mirror Manipulator for Hard X-ray Sub-50nm Focusing
International Workshop on Mechanical Engineering Design of Synchrotron Radiation Equipment and Instrumentation 2006 (MEDSI2006), (May 24 - 26, 2006, Hygo, Japan)
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H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, and K. Yamauchi
Development of Surface Measurement Technologies for Hard X-ray Nanofocusing Mirror at Osaka University and SPring-8
The 3rd International Workshop on Metrology for X-ray Optics, (May 27-May 28, 2006, Daegu, Korea).
- K. Yamauchi, H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa(Invited)
Hard X-ray Focusing less than 50nm for Nanoscopy/spectroscopy
SRI2006(The Ninth International Conference on Synchrotron Radiation Instrumentation), (May 28-June 2, 2006, Daegu, Korea).
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Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Soichiro Handa, Akihiko Shibatani, Keiko Katagishi, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, and Kazuto Yamauchi
Fabrication of X-ray Mirror for Hard X-ray Diffraction Limited Nanofocusing
SRI2006(The Ninth International Conference on Synchrotron Radiation Instrumentation) EP-095 (May 28-June 2, 2006, Daegu, Korea).
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Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Keiko Katagishi, Soichiro Handa, Akihiko Shibatani, Yasuhisa Sano, Kazuya Yamamura, Katsuyoshi Endo, Yuzo Mori, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa and Kazuto Yamauchi
Development of a Scanning X-ray Fluorescence Microscope Using Size-Controllable Focused X-ray Beam from 50 to 1500nm
The 9th International Conference on Synchrotron Radiation Instrumentation (SRI 2006), (May 28 - June 03, Deagu, Korea)
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K. Yamauchi, H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, Y. Sano, K. Yamamura, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa(Invited)
Diffraction-limited X-ray nanobeam with KB mirrors
ERL X-ray Science Workshops 6, Workshop on New Science Opportunities with Nanometer-Sized X-Ray Beams, (June23, June24, 2006, Ithaka, NewYork, USA).
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H. Mimura and K. Yamauchi
Hard X-ray nano-focusing with ultraprecisely figured mirrors, ESRF, APS, SPring-8
The 10 the Three-Way Meeting (June19-June21 2006, ESRF, Grenoble, France).
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H. Mimura, H. Yumoto, S. Matsuyama, S. Handa, Y. Sano, K. Yamamura, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
Hard X-ray focusing with a beam size less than 30 nm by total reflection mirror
ERL X-ray Science Workshops 6, Workshop on New Science Opportunities with Nanometer-Sized X-Ray Beams, (June23-June24, 2006, Ithaca, NewYork, USA).
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Yasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi, Akihisa Kubota and Yuzo Mori
Fabrication of ultra thin and highly uniform silicon-on-insulator by numerically controlled plasma chemical vaporization machining
8th Asia-Pacific Conference on Plasma Science and Technology and 19th Symposium on Plasma Science for Materials (APCPST-8/SPSM-19), (2-5th July, 2006, Cairns, Australia)
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H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, A. Shibatani, K. Katagishi, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, and K. Yamauchi
Waveoptical simulation for designing and evaluating hard X-ray nanofocusing mirror
Proc. SPIE Vol.6317, 631718 (2006). (August 13-17 2006, San Diego, California USA).
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Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Soichiro Handa, Akihiko Shibatani, Keiko Katagishi, Yasuhisa Sano, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, and Kazuto Yamauchi
At-wavelength figure metrology of total reflection mirrors in hard x-ray region
Proc. SPIE Vol.6317, 631709 (2006). (August 13-17 2006, San Diego, California USA).
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Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Souichiro Handa, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, and Kazuto Yamauchi
Fabrication of ultraprecisely figured mirror for nano focusing hard-x-ray
The 11th International Conference on Precision Engineering (ICPE), 295-300 (August 16-18, 2006, Tokyo, Japan)
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Hideyuki Hara, Yasuhisa Sano, Hidekazu Mimura, Kenta Arima, Akihisa Kubota, Keita Yagi, Junji Murata and Kazuto Yamauchi
Novel abrasive-free planarization of Si and SiC using catalyst
The 11th International Conference on Precision Engineering (ICPE), 267-270 (August 16-18, 2006, Tokyo, Japan)
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Satoshi Matsuyama, Hidekazu Mimura, Mari Shimura, Hirokatsu Yumoto, Keiko Katagishi, Soichiro Handa, Akihiko Shibatani, Yasuhis Sano, Kazuya Yamamura, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa and Kazuto Yamauchi
High-spatial-resolution scanning X-ray fluorescence microscope with Kirkpatrick-Baez mirrors
Proc. SPIE 6317, 631719, (August 13- 17, 2006 San Diego, USA).
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Keiko Katagishi, Satoshi Matsuyama, Hidekazu Mimura, Mari Shimura, Hirokatsu Yumoto, Soichiro Handa, Akihiko Shibatani, Yasuhisa Sano, Kazuya Yamamura, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa and Kazuto Yamauchi
Observation of Intracellular Elements by Scanning X-ray Fluorescence Microscopy with Spatial Resolution of 50nm
The 16th International Microscopy Congress (IMC16), Vol2, 1049, (September 3 - 8, 2006, Sapporo, Japan)
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Satoshi Matsuyama, Hidekazu Mimura, Mari Shimura, Hirokatsu Yumoto, Keiko Katagishi, Soichiro Handa, Akihiko Shibatani, Yasuhisa Sano, Kazuya Yamamura, Katsuyoshi Endo, Yuzo Mori, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa and Kazuto Yamauchi
Scanning X-ray Fluorescence Microscope Using Kirkpatrick-Baez Optics with Spatial Resolution Better than 50nm
The 16th International Microscopy Congress (IMC16), Vol2, 1030, (September 3 - 8, 2006, Sapporo, Japan)
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Hideyuki Hara, Yasuhisa Sano, Hidekazu Mimura, Kenta Arima, Akihisa Kubota, Keita Yagi, Junji Murata and Kazuto Yamauchi
Damage-free Planarization of 4H-SiC (0001) by Catalyst-Referred Etching
Programme of The 6th European Conference on Silicon Carbide and Related Materials (ECSCRM 2006), 28, (Sep 3-7, 2006, Newcastle upon Tyne, UK)
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Yasuhisa Sano, Masayo Watanabe, Kazuya Yamamura, Kazuto Yamauchi, Takeshi Ishida, Kenta Arima, Akihisa Kubota and Yuzo Mori
Polishing characteristics of 4H-SiC Si-face and C-face by plasma chemical vaporization machining
Programme of The 6th European Conference on Silicon Carbide and Related Materials (ECSCRM 2006), 34, (Sep 3-7, 2006, Newcastle upon Tyne, UK)
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K. Yamauchi(Invited)
Elastic Emission Machining for the Fabrication of X-ray and EUV Mirrors
OSA Optical Fabrication and Testing Topical Meeting, (October 9 - 11, 2006, Rochester USA).
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H. Yumoto, H. Mimura, S. Matsuyama, S. Handa, A. Shibatani, K. Katagishi, Y. Sano, K. Yamamura, Y. Mori, K. Tamasaku, M. Yabashi, Y. Nishino, T. Ishikawa and K. Yamauchi
Fabrication Technology of Total Reflection Mirrors to Realize Hard-x-ray Sub-30-nm Focusing
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 2.4, (2006).
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S. Matsuyama, H. Mimura, H. Yumoto, Y. Sano, K. Yamamura, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa and K. Yamauchi
Development of Scanning X-ray Fluorescencs Microscope with Spatial Resolution Better Than 30nm Using K-B Mirror Optics
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 2.5, (2006).
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Y. Sano, T. Masuda, H. Mimura and K. Yamauchi
Development of Numerically Controlled Sacrificed Oxidation Using Atmospheric Pressure Plasma
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 3.2, (2006).
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Y. Ichii and H. Goto
Fabrication of Flat Silicon Surfaces Using Eco-friendly Electrochemical Etching Process on Cathode
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 3.3, (2006).
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H. Hara, Y. Sano, K. Arima, K. Yagi, J. Murata, A. Kubota, H. Mimura and K. Yamauchi
Development of CAtalyst-Referred Etching
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 3.4, (2006).
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H. Mimura , H. Yumoto, S. Matsuyama, Y. Sano, K. Yamamura, Y. Mori, K. Tamasaku, M. Yabashi, Y. Nishino, T. Ishikawa and K. Yamauchi
Development of High-resolution Computer-controlled Figuring System and Application to X-ray Reflective Optics
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, P12, (2006).
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K. Yagi, J. Murata, H. Hara, Y. Sano, K. Yamauchi and H. Goto
Fabrication of Damascene Cu Wiring Using Solid Acid Catalyst
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, P13, (2006).
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K. Arima, H. Hara, K. Yagi, R. Okamoto, H. Mimura, A. Kubota, K. Yamauchi
Atomic-scale Characterization of HF-treated 4H-SiC (0001) 1x1 Surfaces by Scanning Tunneling Microscopy
Materials Research Society Abstract No. H7.6 2007, San Francisco, CA, USA (2007)
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H. Takino, K. Ara, N. Shibata, K. Yamamura, Y. Sano, and Y. Mori
Shape correction of steep curved surface using plasma chemical vaporization machining with a hemispherical tip electrode
Proceedings of the 7th euspen International Conference, 193-196 (May 20-24, 2007, Bremen, Germany).
-
S. Matsuyama
Scanning Hard X-ray Microscopy with Spatial Resolution Better than 50 nm
NSF-MEXT Exchange program for Japan-US young researchers (June 1, 2007, Osaka, Japan)
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M. Kanaoka, C, Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi
Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics
Abstracts of 51th Int. Conf. on Electron, Ion, Photon Beam Technology and Nanofabrication, PM-11.(May 29 - June 1, 2007)
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K. Yamauchi(Invited)
Recent achievement in nano-focusing of hard X-rays,
Workshop on X-ray optics and application(Japan, Tsukuba, Jul, 2007).
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Yasuhisa Sano, Takaya Masuda, Hidekazu Mimura, and Kazuto Yamauchi
Ultraprecision Finishing Technique by Numerically Controlled Sacrificial Oxidation
Proceedings of 15th International Conference on Crystal Growth, Abstract#586 (August 12-17, 2007, Salt Lake City, USA).
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Junji Murata, Akihisa Kubota, Keita Yagi, Yasuhisa Sano, Hideyuki Hara, Kenta Arima, Takeshi Okamoto, Hidekazu Mimura and Kazuto Yamauchi
Damage-free planarization of GaN using a catalyst plate
Proceedings of 15th International Conference on Crystal Growth, Abstract#789 (August 12-17, 2007, Salt Lake City, USA).
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Hideyuki Hara, Yasuhisa Sano, Kenta Arima, Keita Yagi, Junji Murata, Takeshi Okamoto, Hidekazu Mimura and Kazuto Yamauchi
New Crystal Planarization Technique using a catalyst plate
Proceedings of 15th International Conference on Crystal Growth, Abstract#769 (August 12-17, 2007, Salt Lake City, USA).
-
Y. Takahashi, Y. Nishino, T. Ishikawa, E. Matsubara
A new technique for three-dimensional internal structure analysis in metallic materials: Coherent x-ray diffraction microscopy
Book of abstracts of 56th Denver x-ray conference, Colorado, U.S.A, 207, (2007).
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Soichiro Handa, Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi
Hard x-ray wavefront measurement and control for hard x-ray nanofocusing
SPIE Optics + Photonics 2007, August 26-30 2007, San Diego, California USA, (2007).
-
K. Yamauchi.(Invited)
Recent achievements and next strategies in hard-X-ray nano-focusing
Advanced X-Ray Optics Metrology for Nano-focusing and Coherence Preservation(USA,
Lawrence Berkeley National Laboratory, Oct. 5, 2007)
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Y. Sano, T. Masuda, H. Mimura, and K. Yamauchi
Ultra-precision Finishing of SOI wafer by Numerically Controlled Sacrificial Oxidation Using Atmospheric Pressure Plasma
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, 33-34 (October 15-17, 2007, Osaka, Japan).
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Hidekazu Mimura, Hirokatsu Yumoto, Soichiro Handa,Takashi Kimura, Satoshi Matsuyama, Yasuhisa Sano, Yoshinori Nishino, Kenji Tamasaku, Yabashi Makina, Tetsuya Ishikawa and Kazuto Yamauchi
Experimental determination of the wave field of X-ray nanobeam
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, 17-18 (Oct 15-17, 2007, Osaka, Japan)
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H. Furukawa, Y. Takahashi, H. Kubo, Y. Nishino, K. Yamauchi, T. Ishikawa, E. Matsubara
Coherent x-ray diffraction measurements of Cu thin line
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, P64 (2007)
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Y. Takahashi, H. Furukawa, H. Kubo, Y. Nishino, K. Yamauchi, T. Ishikawa, E. Matsubara
Three-dimensional observation of internal structures in metallic materials by coherent x-ray diffraction microscopye
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 6.7 (2007)
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Junji Murata, Akihisa Kubota, Keita Yagi, Yasuhisa Sano, Hideyuki Hara, Kenta Arima, Takeshi Okamoto, Hidekazu Mimura and Kazuto Yamauchi
Novel abrasive-free planarization of GaN using a catalytic reference plate
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, P19 (2007)
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Hideyuki Hara, Yasuhisa Sano, Kenta Arima, Keita Yagi, Junji Murata, Akihisa Kubota, Hidekazu Mimura, Kazuto Yamauchi
Planarization Mechanism of Catalyst-Referred Etching
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, 37-38 (Oct 15-17, 2007, Osaka, Japan)
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Soichiro Handa, Hidekazu Mimura, Hirokatsu Yumoto, Takashi Kimura, Satoshi Matsuyama, Yasuhisa Sano, and Kazuto Yamauchi
Highly accurate differential deposition for X-ray reflective optics
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, 19-20 (Oct 15-17, 2007, Osaka, Japan)
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Satoshi Matsuyama, Hidekazu Mimura, Keiko Katagishi, Mari Shimura, Masaki Fujii, Hirokatsu Yumoto, Soichiro Handa, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi
High-resolution and Highly Sensitive Scanning X-ray Fluorescence Microscopy Using Kirkpatrick-Baez Mirror Optics
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, 81-82 (Oct 15-17, 2007, Osaka, Japan)
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Masaki Fujii, Satoshi Matsuyama, Mari Shimura, Keiko Katagishi, Hidekazu Mimura, Hirokatsu Yumoto, Soichiro Handa, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishin, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi
Development of Cryo Scanning X-ray Fluorescent Microscopy to Observe Frozen Hydrated Cells and Tissues
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, P62 (2007)
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M. Kanaoka, C, Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi
Processing efficiency of elastic emission machining for low-thermal-expansion material
Extended Abstracts of International 21st Century COE Symposium on Atomic Fabrication Technology 2007, 25-26
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Y. Sano, M. Watanabe, T. Kato, K. Yamamura, H. Mimura, and K. Yamauchi
Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide
International Conference on Silicon Carbide and Related Materials 2007, Mo-P-55 (October 15-19, 2007, Otsu, Japan).
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Junji Murata, Akihisa Kubota, Keita Yagi, Yasuhisa Sano, Hideyuki Hara, Kenta Arima, Takeshi Okamoto, Hidekazu Mimura and Kazuto Yamauchi
New Chemical Planarization of SiC and GaN Using Fe Plate in H2O2 solution
International Conference on Silicon Carbide and Related Materials 2007, Th-0B-3 (October 15-19, 2007, Otsu, Japan).
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T. Okamoto, Y. Sano, H. Hara, K. Arima, K. Yagi, J. Murata, H. Mimura and K. Yamauchi
Damage-free Planarization of 2-inch 4H-SiC Wafer Using Pt Catalyst Plate and HF Solution
International Conference on Silicon Carbide and Related Materials 2007 Technical Digest (ICSCRM 2007),We-94,(Oct.14-19,2007,Otsu,Japan)
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Takehiro Kato, Yasuhisa Sano, Hideyuki Hara, Hidekazu Mimura, Kazuya Yamamura and Kazuto Yamauchi
Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining
International Conference Silicon Carbide and Related Materials 2007(ICSCRM2007), We-98, (Oct 14-19,2007,Otsu,Japan)
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K. Yamauchi
Focusing hard X-ray to sub-10nm by reflective optics
ESRF, SPring-8, APS Three-Way Meeting(March, 17-19,2008,Chicago,USA)
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H. Mimura, S. Morita, T. Kimura, D. Yamakawa, W. Lin, T. Uehara, H. Yumoto, S. Matsuyama, Y. Nishino, K. Tamasaku, H. Ohashi, M. Yabashi, T. Ishikawa, H. Omori, K. Yamauchi
Focusing mirror for X-ray free electron laser
ESRF, SPring-8, APS Three-Way Meeting(March, 17-19,2008,Chicago,USA)
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Y. Sano, K. Yamamura, K. Yamauchi and Y. Mori (Invited)
Crystal machining using atmospheric pressure plasma
4th International Workshop on Crystal Growth Technology(May 18 - 25, 2008, Beatenberg, Switzerland)
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K. Yamauchi, Y. Sano, K. Arima and H. Hara(Invited)
Catalyst-referred etching - novel abrasive-free polishing method
4th International Workshop on Crystal Growth Technology(May 18 - 25, 2008, Beatenberg, Switzerland)
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Takehiro Kato, Yasuhisa Sano, Tsutomu Hori, Kazuya Yamamura, Hidekazu Mimura, Yoshiaki Katsuyama, Kazuto Yamauchi
Thinning of SiC wafers by Plasma Chemical Vaporization Machining
The 4th Asian Conference on Crystal Growth and Crystal Technology, 189 (May 21-24, 2008, Sendai, Japan)
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K. Yamauchi, H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, T. Kimura, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku and T. Ishikawa (Invited)
Synchrotron-radiation-based hard X-ray nanobeam by Kirkpatrick-Baez mirrors
European Conference on X-ray Spectrometry (16-20 June 2008, Cavtat, Dubrovnik, CROATIA), Abstract p100(I13).
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S. Matsuyama, M. Shimura, H. Mimura, M. Fujii, H. Yumoto, S. Handa, T. Kimura, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa and K. Yamauchi
Trace element mapping using hard X-ray nanobeam focused by a Kirkpatrick Baez mirror system
European Conference on X-ray Spectrometry (16-20 June 2008, Cavtat, Dubrovnik, CROATIA), Abstract p88(O11-1).
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Y. Takahashi, H. Kubo, H. Furukawa, K. Yamauchi, E. Matsubara, T. Ishikawa, Y. Nishino
Development of element-specific hard-x-ray diffraction microscopy
9th International Conference of X-ray Microscopy, ETH Zentrum, Zurich, Switzerland, July 21-25, 2008
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Y. Takahashi, H. Furukawa, H. Kubo, K. Yamauchi, Y. Nishino, T. Ishikawa, E. Matsubara
Nanotstructure analysis of metallic materials by coherent x-ray diffraction microscopy
2008 denver x-ray conference, denver marriot tech center hotel, denver, colorad, USA, 4-8 August 2008
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K. Yamauchi(Invited)
X-ray focusing with Kirkpatrick-Baez optics
Workshop: Focus on X-ray Focusing, SPIE Optics + Photonics 2008(August 11-14 2007San, Diego, California USA)
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H. Mimura, S. Morita, T. Kimura, D. Yamakawa, W. Lin, Y. Uehara, S. Matsuyama, H. Yumoto, H. Ohashi, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, H. Ohmori, and K. Yamauchi
Fabrication of a 400-mm-long mirror for focusing x-ray free-electron lasers to sub-100 nm
SPIE Optics + Photonics 2008(August 11-14 2007San, Diego, California USA) Proc. SPIE, Vol. 7077, 70770R (2008).
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T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
Development of adaptive mirror for wavefront correction of hard x-ray nanobeam
SPIE Optics + Photonics 2008 (August 11-14 2007San, Diego, California USA) Proc. SPIE, 7077 (2008) 707709.
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Y. Sano, T. Masuda, S. Kamisaka, H. Mimura, S. Matsuyama, and K. Yamauchi
Improvement of Thickness Uniformity of SOI by Numerically Controlled Sacrificial Oxidation Using Atmospheric-Pressure Plasma
2008 IEEE International SOI Conference (October 6-9, 2008/ Mohonk Moutain House, New Paltz, New York, USA) Proceedings 165-166
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T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
Development of adaptive mirror for wavefront control of hard x-ray nanobeam
2nd workshop on X-ray and XUV active optics (October 9-11, 2008, Torieste, Itary) Book of abstract pp.45-46
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H. Mimura (Invited)
Fabrication of 400mm long X-ray mirror by Electrolytic In-process Dressing Grinding and Elastic Emission Machining
The 6th CHINA-JAPAN, International Conference on Ultraprecision Machining, Extended Abstract 22-26 (Nov. 24-25, 2008, Hunan Univ. ,Changsha, China)
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Y. Sano, K. Yamamura, and K. Yamauchi
Development of Ultraprecision Machining Technologies for Semiconductor Substrates
Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 16-17 (Feb 16-17, 2009, Osaka, Japan)
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H. Hara, Y. Morikawa, Y. Sano, and K. Yamauchi
First-principles Calculation of Surface Energy at 4H-SiC(0001)-1×1
Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 62-63 (Feb 16-17, 2009, Osaka, Japan)
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S. Handa, T. Kimura, H. Mimura, H. Yumoto, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, and K. Yamauchi
Development of Graded Multilayer Mirrors for Hard-X-ray Focusing
Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 56-57 (Feb 16-17, 2009, Osaka, Japan)
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J. Murata, S. Sadakuni, K. Yagi, H. Hara, K. Arima, T. Okamoto, H. Mimura, K. Yamauchi
Photo-enhanced Chemical Planarization of Gallium Nitride Using a Solid Acidic Catalyst
Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 60-61 (Feb 16-17, 2009, Osaka, Japan)
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T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, Y. Sano, K. Tamasaku1, Y. Nishino, M. Yabashi, T. Ishikawa, and K. Yamauchi
Development of an Adaptive Mirror for Controlling Wavefront of X-ray Beam
Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 58-59 (Feb 16-17, 2009, Osaka, Japan)
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T. Okamoto, Y. Sano, H. Hara, T. Hatayama, K. Arima, K. Yagi, J. Murata, H. Mimura, T. Fuyuki and K. Yamauchi
Novel Abrasive-Free Chemical Planarization of 4H-SiC 8°off Wafer Using a Catalyst
Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 64-65 (Feb 16-17, 2009, Osaka, Japan)
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T. Kato, Y. Sano, T. Hori, K. Yamamura, H. Mimura, Y. Katsuyama, and K. Yamauchi
Thinning of SiC Wafers by Plasma Chemical Vaporization Machining
Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 72-73 (Feb 16-17, 2009, Osaka, Japan)
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H. Ishikura, H. Mimura, S, Matsuyama, Y. Sano, and K. Yamauchi
Development of Electroforming for Ultraprecise Mirror Fabrication
Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 74-75 (Feb 16-17, 2009, Osaka, Japan)
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S. Kamisaka, Y. Sano, H. Mimura, S. Matsuyama, and K. Yamauchi
Improvement of Thickness Uniformity of SOI (Silicon On Insulator) Layer by Numerically Controlled Sacrificial Oxidation Using Atmospheric-Pressure Plasma
Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 70-71 (Feb 16-17, 2009, Osaka, Japan)
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H. Kubo, H. Furukawa, R. Tsutsumi, K. Yamauchi, Y. Nishino, T. Ishikawa, E. Matsubara, and Y. Takahashi
Recent Progress of Coherent X-ray Diffraction Microscophy for Nanostructure Analysis of Metallic Materials
Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 76-77 (Feb 16-17, 2009, Osaka, Japan)
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M. Fujii, S. Matsuyama, T. Wakioka, H. Mimura, Y. Sano, and K. Yamauchi
Development of Advanced Kirkpatrick-Baez System for X-ray Nano-Imaging
First International Symposium on Atomically Controlled Fabrication Technology, p2.6, (2009).
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D. Yamakawa, H. Mimura, T. Kimura, S. Matsuyama, Y. Sano, and K. Yamauchi
Development of X-ray Free Electron Lasers Focusing System with 400mm Long Mirror
Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 68-69 (Feb 16-17, 2009, Osaka, Japan)
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T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
Development of an adaptive mirror for synchrotron x-ray optics
The 13th Hiroshima International Symposium on Synchrotron Radiation (March 10-11, Hiroshima, Japan) Abstracts pp.45
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K. Yamauchi
Recent Progress of Hard X-ray Focusing using Mirror Optics
GCOE International Workshop on Phase Retrieval in the Visible to Hard X-ray Regions (March 26th, 2009, Osaka, Japan)
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H. Mimura
Surface figure Measurement of X-ray mirror Using Phase Retrieval
GCOE International Workshop on Phase Retrieval in the Visible to Hard X-ray Regions (March 26th, 2009, Osaka, Japan)
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Y. Takahashi
Nanostructure Analysis of Metallic Materials by Coherent X-ray Diffraction Microscopy
GCOE International Workshop on Phase Retrieval in the Visible to Hard X-ray Regions (March 26th, 2009, Osaka, Japan)
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T. Kimura
Development of Adaptive Mirror System for Controlling Wavefront of Hard X-ray Focused Beam
GCOE International Workshop on Phase Retrieval in the Visible to Hard X-ray Regions (March 26th, 2009, Osaka, Japan)
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H. Mimura, S. Handa, T. Kimura, H. Yumoto, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T, Ishikawa, K. Yamauchi
Graded multilayer mirror for sub-10nm hard x-ray focusing
SPIE Optics Photonics 2009,7448-11 (Aug, 2009, San Diego, USA)
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K. Yamauchi
Development and application of X-ray mirror in Japan
International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)
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D. Yamakawa, H. Mimura, T. Kimura, S. Matsuyama, Y. Sano and K. Yamauchi
Development of X-ray Free Electron Lasers focusing system with 400mm long mirror
International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)
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H. Ishikura, H. Mimura, S, Matsuyama, Y. Sano, K. Yamauchi
Development of electroforming for ultraprecise mirror fabrication
International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)
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H. Yumoto, H. Mimura, S. Handa, T. Kimura, S. Matsuyama, Y. Sano, H. Ohashi, T. Ishikawa, and K. Yamauchi
Stitching-angle measurable microscope-interferometer:surface-figure metrology tool for hard x-ray nanofocusing mirrors with large curvature
International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)
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T. Kimura, H. Ohashi, H. Mimura, H, Yumoto, D. Yamakawa, T. Tsumura, H. Okada, T. Masunaga, Y. Senba, T. Goto, T. Ishikawa and K. Yamauchi
Development of Stitching Interferometric System for Large-Size X-Ray Mirror
International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)
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H. Yumoto, H. Mimura, S. Handa, T. Kimura, S. Matsuyama, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, H. Ohashi, T. Ishikawa, and K. Yamauchi
Recording of interference fringe nano-patterns of hard-x-ray focusing beam
International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)
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S. Handa, T. Kimura, H. Mimura, H. Yumoto, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, and K. Yamauchi
A Method for High-Precision Determination of the Wavefields of X-ray Nanobeams
International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)
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H. Mimura, S. Handa, H. Yokoyama, T. Kimura, K. Yamauchi
Ray-tracing analysis of aberration of a depth-graded multilayer mirror
International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)
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H. Mimura, T. Kimura, S. Handa, H. Yumoto, D. Yamakawa, H. Yokoyama, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
Hard X-ray Nanofocusing with Adaptive Optical System
The 10th international conference on synchrotoron radiation instrumentation (Sep, 2009, Melbourne, Australia)
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T. Kimura, S. Handa, H. Mimura, H, Yumoto, D. Yamakawa, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa and K. Yamauchi
Development of Wavefront Determination Method for Hard X-ray Nanobeam
The 10th international conference on synchrotoron radiation instrumentation (Sep, 2009, Melbourne, Australia)
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H. Yokoyama, H. Soichiro, H. Mimura, T. Kimura, S. Matsuyama, K. Tamasaku, T. Ishikawa, K. Yamauchi
Design and Performance Simulation of Graded Multilayer Mirror for Hard X-ray focusing
The 10th international conference on synchrotoron radiation instrumentation (Sep, 2009, Melbourne, Australia)
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K. Yamauchi (invited)
Ultraprecision deterministic figuring methods to fabricate X-ray nanofocusing optics
Colloquium at Tianjin University (Apr, 2009, Tianjin, China)
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Y. Sano (invited)
Machining of Semiconductor Substrates Using Atmospheric Pressure Plasma
Colloquium at Tianjin University (Apr, 2009, Tianjin, China)
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J. Murata (invited)
Planarization of SiC and GaN Surface by Catalyst-referred Etching
Colloquium at Tianjin University (Apr, 2009, Tianjin, China)
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Y. Sano, T. Kato, K. Yamamura, H. Mimura, S. Matsuyama, K. Yamauchi
Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma
Proceedings of 31st International Symposium on Dry Process,215-216 (Sep, 2009, Busan, Korea)
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S. Kamisaka, Y. Sano, H. Mimura, S. Matsuyama, and K. Yamauchi
Improvement of Thickness Uniformity of SOI Layer by Numerically Controlled Sacrificial Oxidation using Atmospheric-Pressure Plasma with Electrode Array System
Proceedings of 31st International Symposium on Dry Process,217-218 (Sep, 2009, Busan, Korea)
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Y. Sano, T. Kato, T. Hori, K. Yamamura, H. Mimura, Y. Katsuyama, and K. Yamauchi
Thinning of SiC wafer by plasma chemical vaporization machining
Technical Digest of International Conference on Silicon Carbide and Related Materials 2009,II108 (Oct, 2009, Nurnberg, Germany)
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T. Okamoto, Y. Sano, H. Hara, T. Hatayama, K. Arima, K. Yagi, J. Murata, H. Mimura, T. Fuyuki and K. Yamauchi
Reduction of surface roughness by catalyst-referred etching
Technical Digest of International Conference on Silicon Carbide and Related Materials 2009,I156 (Oct, 2009, Nurnberg, Germany)
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S. Sadakuni, J. Murata, K. Yagi, Y. Sano, T. Okamoto, K. Arima, H. Mimura, and K. Yamauchi
Planarization of GaN using photoelectrochemical process and solid catalyst
Technical Digest of International Conference on Silicon Carbide and Related Materials 2009,I160 (Oct, 2009, Nurnberg, Germany)
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Y. Sano (invited)
Machining of semiconductor substrates using atmospheric pressure plasma
Colloquium at the Leibniz Institute of Surface Modification (Oct, 2009, Leipzig, Germany)
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Yukio Takahashi, Yoshinori Nishino, Ryosuke Tsutsumi, Hideto Kubo, Hayato Furukawa, Hidekazu Mimura, Satoshi Matsuyama, Nobuyuki Zettsu, Tetsuya Ishikawa, Kazuto Yamauchi
Development and application of high-resolution diffraction microscopy using syhncrotron x-ray beam focused Kirkpatrick-Baez mirros
The 10th international conference on synchrotron radiation instrumentation 173 (Sep, 2009, Melbourne,Australia)
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S. Matsuyama, M. Fujii, T. Wakioka, H. Mimura, S. Handa, T. Kimura, Y. Nishino, K. Tamasaku, Y. Makina, T. Ishikawa and K. Yamauchi
Development of Hard X-ray Imaging Optics with Two Pairs of Elliptical and Hyperbolic Mirrors
The 10th international conference on synchrotron radiation instrumentation 78-79 (Sep, 2009, Melbourne,Australia)
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K. Yamauchi (invited)
Mirror Optics for Coherent X-rays and Overview of the Osaka International Workshop on X-ray Mirror Design, Fabrication and Metrology
The 10th international conference on synchrotron radiation instrumentation (Sep, 2009, Melbourne,Australia)
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Yukio Takahashi, Yoshinori Nishino, Ryosuke Tsutsumi, Hideto Kubo, Hayato Furukawa, Hidekazu Mimura, Satoshi Matsuyama, Nobuyuki Zettsu, Tetsuya Ishikawa, Kazuto Yamauchi
High-resolution diffraction microscopy using synchrotron X-ray beam focused by Kirkpatrick-Baez mirrors
International Workshop on X-ray Mirror Design, Fabrication, and Metrology 94-95 (Sep, 2009, Osaka. Japan)
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S. Matsuyama, M. Fujii T. Wakioka, H. Mimura, T. Kimura, S. Handa, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa and K. Yamauchi
Development of Advanced Kirkpatrick-Baez System for Hard X-ray Nano-Imaging
International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka. Japan)
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K. Yamauchi (invited)
Hard X-ray Nanofocusing by Kirkpatrick-Baez (KB) mirrors
ICXOM20 XO-l1 (Sep, 2009, Krlsruhe, Germany)
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K. Yamauchi (invited)
Hard X-ray Nanofocusing by Kirkpatrick-Baez (KB) mirrors
ICXOM20 XO-l1 (Sep, 2009, Krlsruhe, Germany)
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K. Yamauchi (invited)
10nm-Level Focusing of Hard X-Rays by KB Mirrors
OSA'S 93rd ANNUAL MEETING FThG3 (Oct, 2009, San Jose, California, USA)
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Masahiko Kanaoka, Hideo Takino, Kazushi Nomura, Hidekazu Mimura, Kazuto Yamauchi, Yuzo Mori (invited)
Spatial wavelength range of surface roughness improved using elastic emission machining
The 9th International euspen Conference O8.1 (Jun, 2009, San Sebastian, Spanish)
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T. Okamoto, Y. Sano, H. Hara, T. Hatayama, K. Arima, K. Yagi, J. Murata, T. Fuyuki and K. Yamauchi
Abrasive-free Planarization of 4H-SiC Substrates for Epitaxial Growth
3rd International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN2009) 1B-13 (Nov, 2009, Kitakyusyu, Japan)
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Shun Sadakuni, Junji Murata, Keita Yagi, Kenta Arima, Yasuhisa Sano, Takeshi Okamoto, Hidekazu Mimura and Kazuto Yamauchi
Planarization of GaN Surface using Photo-electro Chemical Process and Solid Acid Catalyst
3rd International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN2009) 1B-14 (Nov, 2009, Kitakyusyu, Japan)
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Kohei Aida, Yasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama and Kazuto Yamauchi
Dicing of SiC wafer by Plasma Chemical Vaporization Machining
3rd International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN2009) 2P1-9 (Nov, 2009, Kitakyusyu, Japan)
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T. Okamoto, Y. Sano, K. Tachibana, K. Arima, A. N. Hattori, K. Yagi, J. Murata, S. Sadakuni and K. Yamauchi
Abrasive-Free Chemical Planarization of 4H-SiC 8°off Wafer Using a Catalyst
Second International Symposium on Atomically Controlled Fabrication Technology, 172-173 (Nov, 2009, Osaka, Japan)
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J. Murata, Y. Shirasawa, Y. Sano, S. Sadakuni, K. Yagi, T. Okamoto, and K. Yamauchi
Improvement of Schottky Diode Properties on GaN(0001) Surface Using Damage-free Planarization
Second International Symposium on Atomically Controlled Fabrication Technology, 174-175 (Nov, 2009, Osaka, Japan)
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S. Sadakuni, J. Murata, K. Yagi, Y. Sano, K. Arima, A. Hattori, T. Okamoto, H. Mimura and K. Yamauchi
Development of palanarization method for gallium nitrideusing photoelectrochemical process
Second International Symposium on Atomically Controlled Fabrication Technology, 184-185 (Nov, 2009, Osaka, Japan)
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K. Aida, Y. Sano, K. Yamamura, H. Mimura, S. Matsuyama and K. Yamauchi
Dicing of SiC wafer by Plasma Chemical Vaporization Machining with wire electrode
Second International Symposium on Atomically Controlled Fabrication Technology, 188-189 (Nov, 2009, Osaka, Japan)
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S. Kamisaka, Y. Sano, K. Yoshinaga, H. Mimura, S. Matsuyama, and K. Yamauchi
Improvement of Thickness Uniformity of SOI Layer by Numerically Controlled Sacrificial Oxidation using Arrayed Atmospheric-Pressure Plasma
Second International Symposium on Atomically Controlled Fabrication Technology, 190-191 (Nov, 2009, Osaka, Japan)
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Y. Shirasawa, Y. Sano, T. Okamoto, and K. Yamauchi
Evaluation of Schottky Barrier Diodes on Surface of Processed 4H-SiC(0001)
Second International Symposium on Atomically Controlled Fabrication Technology, 192-193 (Nov, 2009, Osaka, Japan)
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Hiroki Fujiwara & Kenji Tamada
Study of a long-life thrust needle roller bearing lubricated with low viscous lubricant
World Tribology Congress 2009, p. 350
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Hiroki Fujiwara, Takuji Kobayashi, Tatsuo Kawase & Kazuto Yamauchi
Optimized Logarithmic Roller Crowning Design of Cylindrical Roller Bearings and Its Experimental Demonstration
The ASME/STLE International Joint Tribology Conference 2009 (CD-ROM)
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Yukio Takahashi
Development of coherent x-ray diffraction microscopy and its application in materials science
TMS annual meeting (February 14-18 2010, Seattle, Washington, USA)
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S. Matsuyama
Nanometer Focusing of Coherent Hard X-rays with Ultraprecise Mirrors
EuroFEL Workshop on Photon Beamlines & Diagnostics (28-30 June 2010, Hamburg, Germany)
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H. Mimura (Invited)
Hard X-ray sub-10nm focusing by adaptive optical system
International workshop on Phase retrieval and Coherent Scattering (Coherence 2010), (6-10 July 2010, Rostock-Warnemunde, Germany)
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Yukio Takahashi
Development of coherent x-ray diffraction microscopy and its application in materials science
The 7th International Conference on Synchrotron Radiation in Materials Science (July 11-14 2010, Oxford, UK)
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H. Mimura, T. Kimura, H. Yokoyama, H. Yumoto, S. Matsuyama, K. Tamasaku, Y. Koumura, M. Yabashi, T. Ishikawa, K. Yamauchi
An adaptive optical system for sub-10nm hard x-ray focusing
SPIE Optics+Photonics, Proc SPIE, 7803, 780304, 2010 (1-5 August 2010, SanDiego, USA)
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S. Matsuyama, T. Wakioka, H. Mimura, T. Kimura, N. Kidani, Y. Sano, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa and K. Yamauchi
Hard X-ray Imaging Optics with Elliptical mirrors and Hyperbolic Mirrors
SPIE Optics+Photonics, Technical Program, p191, 7802-01 (1-5 August 2010, SanDiego, USA)
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Yasuhisa Sano, Kohei Aida, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, and Kazuto Yamauchi
Dicing of SiC wafer by atmospheric-pressure plasma etching process with wire electrode
The 16th International Conference on Crystal Growth (ICCG-16) (August 8-13, 2010, Beijing, China)
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Yukio Takahashi, Yoshinori Nishino, Eiichiro Matsubara, Tetsuya Ishikawa, Kazuto Yamauchi
Development and application of high-resolution diffraction microscopy using focused hard X-ray beam
the 10th International Conference of X-ray Microscopy (Aug. 15-20 2010, elbour, elbourn, U.S.A.)
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Y. Sano, T. Kato, K. Yamamura, H. Mimura, S. Matsuyama, and K. Yamauchi
Thinning of 2-inch SiC wafer by plasma chemical vaporization machining
The 8th European Conference on Silicon Carbide and Related Materials,Abstract Booklet, TP-155 (Aug 29-Sep 2, 2010, Oslo, Norway)
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T. Okamoto, Y. Sano, K. Tachibana, K. Arima, A. N. Hattori, K. Yagi, J. Murata, S. Sadakuni and K. Yamauchi
Abrasive-free planarization of 3-inch 4H-SiC substrate by catalyst-referred etching
The 8th European Conference on Silicon Carbide and Related Materials,Abstract Booklet, TP-160 (Aug 29-Sep 2, 2010, Oslo, Norway)
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S. Sadakuni, N. X. Dai, Y. Sano, K. Arima, A. N. Hattori, K. Yagi, J. Murata, T. Okamoto, K. Tachibana, and K. Yamauchi
High-resolution TEM observation of SiC surface flattened by catalyst-referred etching
The 8th European Conference on Silicon Carbide and Related Materials,Abstract Booklet, TP-158 (Aug 29-Sep 2, 2010, Oslo, Norway)
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Shun Sadakuni, Junji Murata, Keita Yagi, Kenta Arima, Yasuhisa Sano, Takeshi Okamoto, Kazuma Tachibana, and Kazuto Yamauchi
Abrasive-free planarization of GaN using photoelectrochemical reaction
International Workshop on Nitride Semiconductors (IWN2010), Program & Abstracts, 166 (19-24 Sep. 2010, Tampa, USA)
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Yasuhisa Sano, Keinosuke Yoshinaga, Shohei Kamisaka, Hidekazu Mimura, Satoshi Matsuyama, and Kazuto Yamauchi (invited)
Numerically Controlled Sacrificial Plasma Oxidation Using Array-Type Electrode toward High-Throughput Deterministic Machining
The 2nd International Conference on Nanomanufacturing, proceedings, 169 (24-26 SEP, 2010,Tianjin, China)
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K. Yamauchi (invited)
Atomically Controlled Polishing of Single-Crystalline SiC and GaN
The 2nd International Conference on Nanomanufacturing (24-26 SEP, 2010,Tianjin, China)
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Y. Sano, S. Kamisaka, K. Yoshinaga, H. Mimura, S. Matsuyama, and K. Yamauchi
Numerically Controlled Sacrificial Plasma Oxidation Using Array of Electrodes for Improving Thickness Uniformity of SOI
2010 IEEE International SOI Conference, Proceedings 68-69(October 11-14, 2010/ Catamaran Resort Hotel & Spa, San Diego, California, USA)
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Ryosuke Tsutsumi, Yukio Takahashi, Nobuyuki Zettsu, Akihiro Suzuki, Yoshinori Nishino, Eiichiro Matsubara, Tetsuya Ishikawa, Kazuto Yamauchi
Development of high-resolution X-ray diffraction microscopy using Kirkpatrick and Baez mirrors
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 84-85(24-26 Nov, 2010, Osaka, Japan)
-
Yukio Takahashi
Development and application of high-resolution X-ray diffraction microscopy using advanced mirror optics
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 8-9(24-26 Nov, 2010, Osaka, Japan)
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T. Okamoto, Y. Sano, K. Tachibana, K. Arima, A. N. Hattori, K. Yagi, J. Murata, S. Sadakuni, and K. Yamauchi
Processing Characteristics in Catalyst-Referred Etching of 4H-SiC (0001) Substrates
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 28-29(24-26 Nov, 2010, Osaka, Japan)
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Y. Sano, K. Yamamura, K. Arima and K. Yamauchi
Development of Chemical Processing Methods for Silicon Carbide Wafering and Device Processing
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 54-55(24-26 Nov, 2010, Osaka, Japan)
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K. Yoshinaga, Y. Sano, H. Mimura, S. Matsuyama, and K. Yamauchi
Improvement of Thickness Uniformity of Si Layer in SOI Wafer by Numerically Controlled Sacrificial Oxidation Using Atmospheric-Pressure Plasma with Electrode Array System
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 102-103(24-26 Nov, 2010, Osaka, Japan)
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S. Sadakuni, J. Murata, K. Yagi, Y. Sano, K. Arima, T. Okamoto, K. Tachibana and K. Yamauchi
Improvement of the Removal Rate of Planarization Technique for GaN by Applying Bias
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 186-187(24-26 Nov, 2010, Osaka, Japan)
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K. Aida, Y. Sano, H. Nishikawa, K. Yamamura, H. Mimura, S. Matsuyama and K. Yamauchi
Thinning of SiC Wafer by Plasma Chemical Vaporization Machining
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 190-191(24-26 Nov, 2010, Osaka, Japan)
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S. Matsuyama, T. Wakioka, H. Mimura, T. Kimura, N. Kidani, Y. Sano, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
One-Dimensional Wolter Mirror for Achromatic Hard X-ray Microscopy
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 60-61(24-26 Nov, 2010, Osaka, Japan)
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T. Wakioka, S. Matsuyama, N. Kidani, H. Mimura, Y. Sano and K. Yamauchi
Development of Side-By-Side Kirkpatrick-Baez mirror for high-density X-ray nanobeam
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 70-71(24-26 Nov, 2010, Osaka, Japan)
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N. Kidani, S. Matsuyama, T. Wakioka, S. Kitamura, H. Mimura and K. Yamauchi
Development of Advanced Kirkpatrick-Baez mirror for achromatic hard X-ray microscopy
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 62-63(24-26 Nov, 2010, Osaka, Japan)
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T. Kimura, S. Handa, H. Mimura, H. Yumoto, H. Yokoyama, S. Imai, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Kohmura, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
Development of Wavefront Measurement Method for Hard X-ray Adaptive Optics System
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 86-87(24-26 Nov, 2010, Osaka, Japan)
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H. Yokoyama, H. Mimura, T. Kimura, S. Imai, S. Matsuyama, Y. Sano, K. Yamauchi
Ray-tracing Analysis of a Graded Multilayer Mirror
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 74-75(24-26 Nov, 2010, Osaka, Japan)
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K. Yoshinaga, Y. Sano, H. Mimura, S. Matsuyama, K. Yamauchi
Improved Thickness Uniformity of Si Layer in SOI wafer by Numerically Controlled Sacrificial Oxidation using Atmospheric-Pressure Plasma with Electrode Array System
Proceedings of 32nd International Symposium on Dry Process 91-92(Nov, 2010, Tokyo, Japan)
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S. Matsuyama, T. Wakioka, H. Mimura, T. Kimura, N. Kidani, Y. Sano, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
Hard X-ray Imaging Optics with Elliptical mirrors and Hyperbolic Mirrors
SPIE Optics+Photonics, Technical Program 191(Aug, 2010, San Diego, California, USA)
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K. Yamauchi(invited)
Crystallographically highly-ordered GaN (0001) surface prepared by catalyst referred etching
IWBNS7 (15-20 March 2011, Koyasan, Wakayama, Japan)
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K. Yamauchi, H. Mimura, T. Kimura, H. Yokoyama, H. Yumoto, S. Matsuyama, H. Nakamori, Y. Sano, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa(invited)
Single-nanometer focusing of hard x-rays using novel adaptive optical system
Programme of ACTOP11 (15-20 April 2011, Diamond Light Source, Oxfordshire, UK)
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Hiroki Nakamori, Satoshi Matsuyama, Takashi Kimura, Shouta Imai, Hidekazu Mimura, Yasuhisa Sano, Kazuto Yamauchi
Simulation Study of Adaptive Mirror for Hard X-ray Focusing
Programme of ACTOP11, P46 (15-20 April 2011, Diamond Light Source, Oxfordshire, UK)
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K. Yamauchi(invited)
Current status of precision mirror development for coherent X-rays
SPIE Optics + Optoelectronics (18-21 April 2011, Clarion Congress Hotel, Prague, Czech Republic)
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S. Matsuyama, N. Kidani, H. Mimura, Y. Sano, K. Tamasaku, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi
Development of hard x-ray imaging optics with four aspherical mirrors
SPIE Optics+Photonics, Technical Program, pp. 181, 8139-04 (21-25 May 2011, SanDiego, California, USA)
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K. Yamauchi(invited)
Deterministic fabrication process for precision X-ray mirrors
The 2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011) (23-25 May 2011, ICM, Munich, Germany)
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Yukio Takahashi(invited)
Development of high-resolution coherent X-ray diffraction microscopy and its application in materials science
International Conference on Processing & Manufacturing of Advanced Materials, Abstracts, pp. 411 (1-5 Aug 2011, Quebec, Canada)
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K. Yamauchi(invited)
Mirror‐based optical systems for nanofocusing and nanoimaging of hard x‐rays
The 4th International Workshop on FEL Science (29 Aug-2 Sep 2011, Palm Cove, Cairns, Australia)
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Yukio Takahashi(invited)
Development and application of high-resolution diffraction microscopy using focused hard x-ray beam
The 4th International Workshop on FEL Science "Science Challenges of XFEL", pp. 21 (29 Aug-2 Sep 2011, Palm Cove, Cairns, Australia)
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Yasuhisa Sano, Kohei Aida, Takehiro Kato, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, and Kazuto Yamauchi
Cutting of SiC Wafer by Atmospheric-Pressure Plasma Etching with Wire Electrode
International Conference on Silicon Carbide and Related Materials 2011, We-P-28 (11-16 Sep 2011, Cleveland, Ohio, USA)
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Bui Van Pho, Shun Sadakuni, Takeshi Okamoto, Kenta Arima, Yasuhisa Sano, and Kazuto Yamauchi
HRTEM observation of 4H-SiC (0001) surface planarized by catalyst-referred etching
International Conference on Silicon Carbide and Related Materials 2011, We-P-32 (11-16 Sep 2011, Cleveland, Ohio, USA)
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Yukio Takahashi(invited)
High-resolution coherent diffraction imaging using focused hard x-ray beam at SPring-8
ARC Center of Excellence for Coherent X-ray Science 6th Annual Workshop, pp. 22 (10-12 Oct, The University of Melboume, Melboume, Australia)
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T. Osaka, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, K. Yamauchi
Thin-crystal & auto-correlator development at SPring-8
Fourth XFEL 3-Site Meeting (30 Oct-3 Nov, RIKEN SPring-8 Center, Hyogo, Japan)
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Akihiro Suzuki, Yukio Takahashi, Nobuyuki Zettsu, Yoshiki Kohmura, Kazuto Yamauchi, and Tetsuya Ishikawa
Development of High-Resolution Ptychographic X-ray Diffraction Microscopy using Focused Hard X-ray Beam
Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and
Nanotechnology, pp. 76-77 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)
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Yukio Takahashi, Akihiro Suzuki, Nobuyuki Zettsu, Yoshiki Kohmura, Kazuto Yamauchi, and Tetsuya Ishikawa
Element-Specific Ptychographic X-ray Diffraction Microscopy using Anomalous Scattering
Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and
Nanotechnology, pp. 78-79 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)
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Satoshi Matsuyama, Naotaka Kidani, Yoji Emi, Yasuhisa Sano, Yoshiki Kohmura, Tetsuya Ishikawa, and Kazuto Yamauchi
Development of Hard X-ray Imaging Optics for Achromatic Full-Field X-ray Microscopy
Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and
Nanotechnology, pp. 84-85, P-5 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)
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H. Nakamori, S. Matsuyama, S. Imai, H. Yokoyama, T. Kimura, H. Mimura, Y. Sano, Y. Kohmura, T. Ishikawa, K. Yamauchi
Development of an Adaptive X-Ray Focusing Mirror with Large NA -Evaluation of Reproducibility of Deformable Mirror
Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and
Nanotechnology, pp. 86-87, P-6 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)
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S. Imai, S. Matsuyama, H. Nakamori, T. Kimura, H. Yokoyama, H. Mimura, Y. Sano, Y. Kohmura, T. Ishikawa, K. Yamauchi
Development of an adaptive hard X-ray focusing system with adaptive mirrors
Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and
Nanotechnology, pp. 90-91, P-8 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)
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H. Yokoyama, T. Kimura, H. Mimura, S. Imai, S. Matsuyama, Y. Kohmura, T. Ishikawa, K. Yamauchi
Determination of Had X-ray Focusing Mirror Aberration using Phase Retrieval with Transverse Translation Diversity
Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and
Nanotechnology, pp. 98-99, P-12 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)
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Jangwoo Kim, Hikaru Yokoyama, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi
Reflectivity improvement using PtC/C multilayers for X-ray mirrors
Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and
Nanotechnology, pp. 100-101, P-13 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)
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S. Sadakuni, J. Murata, T. Okamoto, Y. Sano, K. Yagi, K. Tachibana, H. Asano and K. Yamauchi
Fabrication of Atomically Controlled Flat GaN (0001) Surfaces Using Catalyst-Referred Etching in Water
Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and
Nanotechnology, P-28 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)
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T. Okamoto, Y. Sano, K. Tachibana, K. Arima, K. Inagaki, K. Yagi, S. Sadakuni, A. Isohashi, Y. Morikawa and K. Yamauchi
Improvement of the removal rate in catalyst-referred etching of 4H-SiC using catalytic platinum and hydrofluoric acid
Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and
Nanotechnology, P-33 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)
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Bui Van Pho, Shun Sadakuni, Takeshi Okamoto, Ryusuke Sagawa, Kenta Arima, Yasuhisa Sano , Kazuto Yamauchi
Atomic Structure of 4H-SiC (0001) Surface Planarized by Catalyst-Referred Etching
Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and
Nanotechnology, P-38 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)
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K. Tachibana, Y. Sano, T. Okamoto, K. Arima, K. Inagaki, K. Yagi, S. Sadakuni, A. Isohashi, Y. Morikawa and K. Yamauchi
Study of Reactive Species in Catalyst-referred Etching of 4H-SiC Using Platinum and Hydrofluoric Acid
Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and
Nanotechnology, P-41 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)
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H. Nishikawa, Y. Sano, K. Aida, T. Chaiyapat, K. Yamamura, S. Matsuyama, and K. Yamauchi
Cutting of SiC substrates by atmospheric-pressure plasma etching with slit mask for plasma confinement
Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and
Nanotechnology, P-49 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)
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H. Asano, S. Sadakuni, K. Yagi, Y. Sano, T. Okamoto, K. Tachibana and K. Yamauchi
Removal rate improvement by an ultraviolet irradiation in GaN (0001) surface planarization using catalyst-referred etching
Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and
Nanotechnology, P-61 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)
-
K. Yamauchi(invited)
X-ray nanofocusing by mirror optical systems
JSPS-DFG二国間セミナー (Oct, Kyoto University, Kyoto, Japan)
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Hiroki Nakamori, Satoshi Matsuyama, Takashi Kimura, Shouta Imai, Yoshiki Kohmura, Tetsuya Ishikawa, Yoshinori Nishino, Kazuto Yamauchi
Development of an ultra-precise deformable mirror for hard X-ray nanofocusing
Program of 7th Handai Nanoscience and Nanotechnology International Symposium, pp. 172-173, PII-46 (10-11 Nov, Osaka University, Osaka, Japan)
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Y. Sano, K. Aida , H. Nishikawa, K. Yamamura, S. Matsuyama, and K. Yamauchi
Back-Side Thinning of Silicon Carbide Wafer by Plasma Etching using Atmospheric-Pressure Plasma
4th International Conference of Asian Society for Precision Engineering and
Nanotechnology, 0038 (16-18 Nov, Langham Place Kong Hotel, Hong Kong, China)
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S. Sadakuni, B.V. Pho, N.X. Dai, Y. Sano, K. Yagi, J. Murata, T. Okamoto, K.Tachibana and K. Yamauchi
Surface Observation of 4H-SiC (0001) Planarized by Catalyst-Referred Etching
4th International Conference of Asian Society for Precision Engineering and
Nanotechnology, 0176 (16-18 Nov, Langham Place Kong Hotel, Hong Kong, China)
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Yasuhisa Sano, Kohei Aida, Hiroaki Nishikawa, Kazuya Yamamura, Satoshi
Matsuyama, and Kazuto Yamauchi(invited)
Plasma Chemical Vaporization Machining of Silicon Carbide Wafer Using Flat-bar Electrode with Multiple Gas Nozzles
The 8th CHINA-JAPAN Conference on Ultra-Precision Machining (Nov, Hangzhou, China)
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Y. Sano (invited)
Fabrication technology for atomically flat SiC surfaces
Symposium on Surface and Nano Science 2012, G-4 (9-12 Jan, Iwate, Japan)
-
K. Yamauchi(invited)
10KeV mirror project
XTS - Breakout Meeting (2 Feb, National Astronomical Observatory of Japan, Tokyo, Japan)
-
K. Yamauchi(invited)
Current status of mirror-based optics for coherent x-ray science
Third Ringberg Workshop on Science with FELs, (May 2012, Bavaria, Germany)
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Yukio Takahashi, Akihiro Suzuki, Shin Furutaku, Kazuto Yamauchi, Yoshiki Kohmura and Tetsuya Ishikawa(invited)
High-resolution X-ray ptychography using focused hard X-ray beam
Coherence 2012, P13 (18-21 June 2012, Hilton Fukuoka Sea Hawk, Fukuoka, Japan)
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K. Yamauchi(invited)
Nanofocusing and wavefront analysis of SACLA
Coherence 2012 (18-21 June 2012, Hilton Fukuoka Sea Hawk, Fukuoka, Japan)
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Akihiro Suzuki, Yukio Takahashi, Nobuyuki Zettsu, Yoshiki Kohmura, Kazuto Yamauchi and Tetsuya Ishikawa
Development of high-resolution X-ray ptychography using drift-compensation method
Coherence 2012, PS-2 (18-21 June 2012, Hilton Fukuoka Sea Hawk, Fukuoka, Japan)
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H. Nakamori, S. Matsuyama, S. Imai, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
Development of piezoelectric deformable mirrors for X-ray focusing
Coherence 2012, PS-16, (18-21 June 2012, Hilton Fukuoka Sea Hawk, Fukuoka, Japan)
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Taito Osaka, Makina Yabashi, Yasuhisa Sano, Kensuke Tono, Yuichi Inubushi, Takahiro Sato, Satoshi Matsuyama, Tetsuya Ishikawa, and Kazuto Yamauchi
Fabrication of a Bragg beam splitter for an X-ray autocorrelator
Coherence 2012, PS-17, (18-21 June 2012, Hilton Fukuoka Sea Hawk, Fukuoka, Japan)
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K. Yamauchi(invited)
Progress of Mirror-based Focusing Optics for X-ray Free Electron Laser
5th Asian Workshop on Generation and Application of Coherent XUV and X-ray Radiation (5th AWCXR), (27-29 June 2012, Kashiwa, Chiba, Japan)
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K. Yamauchi(invited)
Hard X-ray nanofocusing and wavefront diagnosis
4th international workshop on Metrology for X-ray Optics, Mirror Design, and Fabrication
Barcelona IWXM, (4-6 July 2012, Barcelona, Spain)
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H. Nakamori, S. Matsuyama, S. Imai, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
Development of an ultra-precise deformable mirror for x-ray focusing
4th international workshop on Metrology for X-ray Optics, Mirror Design, and Fabrication
Barcelona IWXM, P59 (4-6 July 2012, Barcelona, Spain)
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OSAKA Taito, YABASHI Makina, SANO Yasuhisa, TONO Kensuke, INUBUSHI Yuichi, SATO Takahiro, MATSUYAMA Satoshi, ISHIKAWA Tetsuya, YAMAUCHI Kazuto
Fabrication of a Bragg beam splitter for hard X-ray free-electron laser
11th International Conference on Synchrotron Radiation Instrumentation, WE-E-P-37 (9-13 July 2012, the Centre de Congres, Lyon, France)
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Satoshi Matsuyama, Youji Emi, Naotaka Kidani, Yoshiki Kohmura, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
Development of Achromatic Full-Field Hard X-ray Microscopy Using Four Total-Reflection Mirrors
11th International Conference on X-ray Microscopy, P60 (5-10 Aug 2012, Shanghai, China)
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Yukio Takahashi, Akihiro Suzuki, Nobuyuki Zettsu, Yoshiki Kohmura, Yasunori Senba, Haruhiko Ohashi, Kazuto Yamauchi and Tetsuya Ishikawa
High-resolution ptychography using focused hard X-ray beam
11th International Conference on X-ray Microscopy, P82 (5-10 Aug 2012, Shanghai, China)
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Akihiro Suzuki, Yukio Takahashi, Nobuyuki Zettsu, Yoshiki Kohmura, Yasunori Senba, Haruhiko Ohashi, Kazuto Yamauchi and Tetsuya Ishikawa
Drift-Compensation method for High-Resolution X-ray Ptychography
11th International Conference on X-ray Microscopy, P205 (5-10 Aug 2012, Shanghai, China)
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K. Yamauchi(invited)
Nanofocusing optics for hard x-ray free electron laser
SPIE Optics+Photonics, Technical Program (Aug 2012, SanDiego, USA)
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S. Matsuyama, T. Kimura, H. Nakamori, S. Imai, H. Yokoyama, J. Kim, R. Fukui, H. Mimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
Development of piezoelectric deformable mirror for hard X-ray nanofocusing
SPIE Optics+Photonics, Technical Program, P197, 8503-02 (Aug 2012, SanDiego, USA)
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Yasuhisa Sano, Hiroaki Nishikawa, Kohei Aida, Chaiyapat Tangpatjaroen, Kazuya Yamamura, Satoshi Matsuyama, Kazuto Yamauchi
Basic experiment on atmospheric-pressure plasma etching with slit aperture for high-efficiency dicing of SiC wafer
The 9th European Conference on Silicon Carbide and Related Materials, We8-5 (2-6 Sep 2012, Saint-Petersburg, Russia)
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P. V. Bui, S. Sadakuni, T. Okamoto, K. Arima, Y. Sano, K. Yamauchi
A Study of Terminated Species on 4H-SiC (0001) Surfaces Planarized using Hydrofluoric Acid
The 9th European Conference on Silicon Carbide and Related Materials, TuP-42 (2-6 Sep 2012, Saint-Petersburg, Russia)
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Ai Isohashi, Yasuhisa Sano, Takeshi Okamoto, Kazuma Tachibana, Kenta Arima, Koji Inagaki, Keita Yagi, Shun Sadakuni, Yoshitada Morikawa and Kazuto Yamauchi
Study on Reactive Species in Catalyst-Referred Etching of 4H-SiC using Platinum and Hydrofluoric Acid
The 9th European Conference on Silicon Carbide and Related Materials, TuP-71 (2-6 Sep 2012, Saint-Petersburg, Russia)
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H. Takei, K. Yoshinaga, Y. Sano, S. Matsuyama, and K. Yamauchi
Improving the Accuracy of Numerically Controlled Sacrificial Plasma Oxidation Using Array of Electrodes to Improve the Thickness Uniformity of SOI
2012 IEEE International SOI Conference, 4.7 (1-4 Oct, Napa, CA USA)
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Shun Sadakuni, Hiroya Asano, Bui Van Pho, Ai Isohashi, Yasuhisa Sano, Satoshi Matsuyama, and Kazuto Yamauchi
Catalyst-referred etching and an investigation of the reaction mechanism
Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 24-25, S1-1, P-2 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)
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K. Yamauchi
Recent progress on mirror-based optics for the 3rd and 4th generation synchrotron radiation sources
Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 48-49, 3.3 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)
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Yukio Takahashi
Coherent X-ray Diffractive Imaging at SPring-8: Recent Progress and Outlook
Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 52-53, 3.5 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)
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Hiroki Nakamori, Satoshi Matsuyama, Shota Imai, Takashi Kimura, Yasuhisa Sano, Yoshiki Kohmura, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi
Development of ultraprecise piezoelectric deformable mirror for adaptive X-ray focusing
Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 58-59, S2-3, P-34 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)
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Ai Isohashi, Yasuhisa Sano, Mari Oue, Shun Sadakuni, Yoshitada Morikawa, and Kazuto Yamauchi
Etching Mechanism of Catalyst-Referred Etching with Pure Water
Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 112-113, P-1 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)
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H. Asano, S. Sadakuni, Y. Sano, K. Yagi, S. Matsuyama, and K. Yamauchi
Planarization of Gallium Nitride Wafers Using a Platinum Catalyst and Characterization of the Step-and-Terrace Structure
Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 116-117, P-3 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)
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Bui Van Pho, Kouji Inagaki, Yasuhisa Sano, Kazuto Yamauchi, Yoshitada Morikawa
First-Principle Study of Platinum Catalyst-Assisted Hydrogen Fluoride Adsorption on SiC surfaces
Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 122-123, P-6 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)
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Ryosuke Fukui, Hikaru Yokoyama, Satoshi Matsuyama, Yoshiki Kohmura, Kenji Tamasaku, Makina Yabashi, Wataru Yashiro, Atsushi Momose, Tetsuya Ishikawa, and Kazuto Yamauchi
Wavefront measurement for a hard-X-ray nanobeam using single-grating interferometry based on a phase grating and Fourier transform method
Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 166-167, P-28 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)
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Yoji Emi, Satoshi Matsuyama, Yoshiki Kohmura, Tetsuya Ishikawa, and Kazuto Yamauchi
Development of a High-resolution Full-field Hard X-ray Imaging Microscope Based On Four Aspherical Mirrors
Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 170-171, P-30 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)
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Taito Osaka, Makina Yabashi, Yasuhisa Sano, Kensuke Tono, Yuichi Inubushi, Takahiro Sato, Satoshi Matsuyama, Tetsuya Ishikawa, and Kazuto Yamauchi
Fabrication of a Bragg Beam Splitter Based on Ultrathin Silicon Single Crystal
Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 172-173, P-31 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)
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Jangwoo Kim, Ayaka Nagahira, Satoshi Matsuyama, Yasuhisa Sano, and Kazuto Yamauchi
Study of Pt/C multilayers for X-ray mirrors improvement of reflectivity
Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 176-177, P-33 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)
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Shin Furutaku, Yukio Takahashi, Akihiro Suzuki, Kazuto Yamauchi, Yoshiki Kohmura, and Tetsuya Ishikawa
Visualization of Dislocation Strain Fields in Silicon by Bragg X-ray Ptychography
Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 180-181, P-35 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)
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Akihiro Suzuki, Yukio Takahashi, Shin Furutaku, Kazuto Yamauchi, Yoshiki Kohmura, and Tetsuya Ishikawa
X-ray Ptychography Using Defocused Hard X-ray Beam
Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 182-183, P-36 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)
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Shinichi Kitamura, Satoshi Matsuyama, Yasuhisa Sano, and Kazuto Yamauchi
Fabrication of ultraprecise X-ray mirrors by ion beam figuring system: Fabrication and evaluation of aspheric shape on silicon surface
Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 184-185, P-37 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)
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Shota Imai, Hiroki Nakamori, Satoshi Matsuyama, Takashi Kimura, Yoshiki Kohmura, Tetsuya Ishikawa, and Kazuto Yamauchi
Development of an adaptive hard X-ray focusing system with deformable mirrors
Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 188-189, P-39 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)
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H. Nishikawa, Y. Sano, K. Aida, T. Chaiyapat, Y. Okada, K. Yamamura, S. Matsuyama, and K. Yamauchi
Cutting of SiC substrates by atmospheric-pressure plasma etching with slit mask for plasma confinement
Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 192-193, P-41 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)
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T. Osaka, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, K. Yamauchi
Fabrication of ultrathin Bragg beam splitter by plasma chemical vaporization machining
14th International Conference on Precision Engineering (ICPE2012), A13 (8-10 Nov 2012, Awaji Yumebutai International Conference Center, Hyogo, Japan)
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H. Asano, S. Sadakuni, K. Yagi, Y. Sano, S. Matsuyama, T. Okamoto, K. Tachibana, K. Yamauchi
Rapid planarization method by ultraviolet light irradiation for gallium nitride using platinum catalyst
14th International Conference on Precision Engineering (ICPE2012), A14 (8-10 Nov 2012, Awaji Yumebutai International Conference Center, Hyogo, Japan)
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H. Nakamori, S. Matsuyama, S. Imai, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
Development of an ultraprecise piezoelectric deformable mirror for adaptive X-ray optics
14th International Conference on Precision Engineering (ICPE2012), A15 (8-10 Nov 2012, Awaji Yumebutai International Conference Center, Hyogo, Japan)
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P. V. Bui, K. Inagaki, Y. Sano, K. Yamauchi, Y. Morikawa
First-Principles Study of Reaction Process of SiC and HF Molecules in Catalyst-Referred Etching
14th International Conference on Precision Engineering (ICPE2012), A37 (8-10 Nov 2012, Awaji Yumebutai International Conference Center, Hyogo, Japan)
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J. Kim, S. Matsuyama, Y. Sano, K. Yamauchi
Improvement of interface roughness in platinum/carbon multilayers for X-ray mirrors
14th International Conference on Precision Engineering (ICPE2012), E11 (8-10 Nov 2012, Awaji Yumebutai International Conference Center, Hyogo, Japan)
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K. Yamauchi (invited)
Mirror optics of beam delivery & spectrometers
European XFEL Users' Meeting (Jan, DESY, Humburg, Germany)
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H. Takei, S. Kurio, Y. Sano, S. Matsuyama, and K. Yamauchi
Numerically controlled sacrificial oxidation using atmospheric-pressure plasma to improve SOI layer uniformity
8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing (ICRP-8/SPP-31), 4P-PM-S07-P08 (4-7 Feb, Fukuoka, Japan)
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K. Yamauchi (invited), M. Yabashi, H. Mimura, H. Yumoto, T. Koyama, K. Tono, T. Togashi, Y. Inubushi, T. Sato, T. Katayama, S. Matsuyama, J. Kim, R. Fukui, Y. Sano, W. Yashiro, T. Ohmori, S. Goto, H. Ohashi, A. Momose, and T. Ishikawa
Nanofocusing and single shot wavefront diagnosis of SACLA
SPIE Optics+Optelectronics, Technical Abstracts, pp. 105, 8778-14 (17-18 Apr, Clarion Congress Hotel, Prague, Czech)
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Y. Takahashi(invited)
High-resolution and High-sensitivity X-ray Ptychography Using Focused Hard X-ray Beam
International conference on the state and future of ptychography (5-7 May, Hohenkammer, Germany)
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A. Suzuki, S. Furutaku, K. Yamauchi, Y. Kohmura, T. Ishikawa, and Y. Takahashi
Multimode X-ray Ptychography: Complementary Use of Focused and Defocused X-ray Beams
International conference on the state and future of ptychography (5-7 May, Hohenkammer, Germany)
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K. Yamauchi (invited)
Progress on mirror-based optical systems for XFEL science
The 25th Synchrotron Radiation User's Workshop, (Aug. Pohan, Korea)
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H. Nakamori, S. Matsuyama, S. Imai, T. Goto, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
Development of ultra-precise piezoelectric deformable mirrors for x-ray nanofocusing
SPIE Optics+Photonics, Technical Program, p182, 8848-2 (26-29 Aug, San Diego, USA)
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T. Osaka, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, K. Yamauchi
Thin crystal development and applications for hard x-ray free-electron lasers
SPIE Optics+Photonics, Technical Program, p182, 8848-3 (26-29 Aug, San Diego, USA)
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J. Kim, T. Koyama, H. Yumoto, A. Nagahira, S. Matsuyama, Y. Sano, M. Yabashi, H. Ohashi, T. Ishikawa, K. Yamauchi
Damage characteristics of platinum/carbon multilayers under focused x-ray free-electron laser irradiation
SPIE Optics+Photonics, Technical Program, p183, 8848-26 (26-29 Aug, San Diego, USA)
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S. Matsuyama (invited), Y. Emi, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
Development of full-field hard x-ray microscopy with four aspherical mirrors
SPIE Optics+Photonics, Technical Program, p190, 8851-6 (26-29 Aug, San Diego, USA)
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Y. Takahashi (invited)
High-resolution ptychographic imaging
22nd International Congress on X-ray Optics and Microanalysis (2-6 Sep, Hamburg, Germany)
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Y. Sano (invited), K. Arima, and K. Yamauchi
Planarization of GaN Wafer Using Novel Polishing Technique Utilizing Catalyst Surface Reaction
2013 JSPA-MRS Joint Symposia, Symposium J, 17p-M6-5 (16-19 Sep, Kyoto, Japan)
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A. Isohashi, Y. Sano, S. Sadakuni, K. Yamauchi
Chemical Etching of 4H-SiC using Catalyst-referred etching with pure water
The International Conference on Silicon Carbide and Related Materials, Th-3A-02 (29 Sep - 4 Oct, Miyazaki, Japan)
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Y. Okada, H. Nishikawa, Y. Sano, K. Yamamura, K. Yamauchi
Thinning of a two-inch silicon carbide wafer by plasma chemical vaporization machining using a slit electrode
The International Conference on Silicon Carbide and Related Materials, Th-3A-04 (29 Sep - 4 Oct, Miyazaki, Japan)
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Y. Sano, H. Nishikawa, Y. Okada, K. Yamamura, S. Matsuyama, and K. Yamauchi
Dicing of SiC Wafer by Atmospheric-Pressure Plasma Etching Process with Slit Mask for Plasma Confinement
The International Conference on Silicon Carbide and Related Materials, Th-P-23 (29 Sep - 4 Oct, Miyazaki, Japan)
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P. V. Bui, K. Inagaki, Y. Sano, K. Yamauchi, and Y. Morikawa
Barrier Heights Investigation of Dissociative Adsorption of HF on SiC
The International Conference on Silicon Carbide and Related Materials, Th-P-25 (29 Sep - 4 Oct, Miyazaki, Japan)
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W. Yamaguchi, S. Sadakuni, A. Isohashi, H. Asano, Y. Sano, M. Imade, M. Maruyama, M. Yoshimura, Y. Mori, K. Yamauchi
Planarization of the gallium nitride substrate grown by the Na flux method applying the catalyst-referred etching
The International Conference on Silicon Carbide and Related Materials, We-P-59 (29 Sep - 4 Oct, Miyazaki, Japan)
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K. Yamauchi (invited)
Nanofocusing of X-ray free electron laser for coherent X-ray science
X-ray lasers in biology (14-15 Oct, The Royal Society, London, UK)
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Y. Sano (invited)
Planarization of Gallium Nitride Wafers Using Novel Polishing Technique Utilizing Catalyst Surface Reaction
WUPP for III-Nitride (Workshop on Ultra-Precision Processing for III-Nitride), 2013 (16-18 Oct, Santa Barbara, USA)
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A. Isohashi, Y. Sano, T. Okamoto, S. Sadakuni, P. V. Bui, K. Yagi, and K. Yamauchi
Wet Chemical Planarization of Single-Crystalline SiC Using Catalyst-Referred Etching
28th The American Society for Precision Engineering Annual Meeting, Extended Abstracts, pp153-156 (20-25 Oct, St. Paul, USA)
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T. Osaka, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, and K. Yamauchi
Fabrication of Thin Si Crystal for X-Ray Beam Splitter
28th The American Society for Precision Engineering Annual Meeting, Extended Abstracts, pp239-242 (20-25 Oct, St. Paul, USA)
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Y. Emi
Development of a full-field hard X-ray imaging microscope based on Advanced Kirkpatrick-Baez mirror optics
The MEADOW 2013 (MEtrology, Astronomy, Diagnostics and Optics Workshop), (28-30 Oct, Trieste, Italy)
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K. Yamauchi
Adaptive focusing optics of hard X-rays with piezoelectric deformable KB mirrors
The MEADOW 2013 (MEtrology, Astronomy, Diagnostics and Optics Workshop), (28-30 Oct, Trieste, Italy)
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A. Kime
Development of an X-ray slope profiler for Wolter type telescope mirrors - Performance evaluation using geometric and wave-optical simulator
The MEADOW 2013 (MEtrology, Astronomy, Diagnostics and Optics Workshop), (28-30 Oct, Trieste, Italy)
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Y. Sano (invited), K. Arima, and K. Yamauchi
Abrasive-Free Polishing of SiC Wafer Utilizing Catalyst Surface Reaction
224th ECS (The Electrochemical Society) Meeting, 1952 (27 Oct-01 Nov, San Francisco, CA, USA)
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Y. Sano, T. Doi, S. Kurokawa, H. Aida, O. Ohnishi, M. Ueda, Y. Okada, H. Nishikawa, and K. Yamauchi
Basic Study on Etching Selectivity of Plasma Chemical Vaporization Machiningby Introducing Crystallographic Damage into Work Surface
5th International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN2013), 1207 (12-15 Nov, Taipei, Taiwan)
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Y. Takahashi (invited)
High-resolution ptychography using focused hard X-ray beam
The 12th symposium on X-ray Imaging Optics, Abstract pp. 37-38, O-22 (18-20 Nov, Osaka, Japan)
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S. Matsuyama (invited)
Development of achromatic full-field hard X-ray microscopy using four total-reflection mirrors
The 12th symposium on X-ray Imaging Optics, Abstract pp. 51-52, O-29 (18-20 Nov, Osaka, Japan)
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Y. Emi, S. Matsuyama, H. Kino, Y. Kohmura, T. Ishikawa, and K. Yamauchi
Development of a High-resolution Full-field Hard X-ray Imaging Microscope with Compact AKB Mirror Optics
The 12th symposium on X-ray Imaging Optics, Abstract pp. 67-68, P-11 (18-20 Nov, Osaka, Japan)
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H. Kino, S. Matsuyama, Y. Emi, H. Okada, Y. Sano, and K. Yamauchi
Development of one-dimensional Wolter Mirror figured on a single substrate for full-field X-ray microscopy
The 12th symposium on X-ray Imaging Optics, Abstract pp. 93-94, P-25 (18-20 Nov, Osaka, Japan)
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R. Fukui, J. Kim, S. Matsuyama, H. Yumoto, Y. Inubushi, K. Tono, T. Koyama, T. Kimura, H. Mimura, H. Ohashi, M. Yabashi, T. Ishikawa, and K. Yamauchi
Single-shot wavefront measurement of XFEL nanobeam
The 12th symposium on X-ray Imaging Optics, Abstract pp. 97-98, P-27 (18-20 Nov, Osaka, Japan)
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H. Nakamori, S. Matsuyama, T. Goto, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi
Two-dimensional X-ray nanofocusing using piezoelectric deformable mirrors
The 12th symposium on X-ray Imaging Optics, Abstract pp. 99-100, P-28 (18-20 Nov, Osaka, Japan)
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K. Yamauchi (invited)
Recent progress of the K-B nano-focusing system
ALBA-SSRF Bilateral Workshop (16-18 Dec. Shanghai, China)
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T. Sugiura, A. Isohashi, W. Yamaguchi, S. Matsuyama, Y. Sano, and K. Yamauchi
"A novel abrasive-free chemical planarization of oxide materials using pure water and Pt catalyst"
European society for precision engineering & nanotechnology 2014 (Euspen 2014), Extended Abstracts, pp. 351-354, P7-14 (2-6 June, Dubrovnik, Croatia)
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S. Matsuyama (invited)
"Development of Achromatic Full-field X-ray Microscopy Based on Total Reflection Mirrors"
Collaborative Conference on 3D & Materials Research (CC3DMR 2014), Abstract, pp. 142 (23-27 June, Incheon/Soul, South Korea)
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H. Takei, S. Kurio, Y. Sano, S. Matsuyama, and K. Yamauchi
"Improving the Accuracy of Numerically Controlled Sacrificial Plasma Oxidation Using an Array of Electrodes to Produce Ultra-uniform SOI"
15th International Conference on Precision Engineering (ICPE2014), Abstracts, pp. 32, B15 (22-25 July, Kanazawa, Japan)
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P. V. Bui, K. Inagaki, Y. Sano, K. Yamauchi, and Y. Morikawa
"Removal Mechanism in Catalyst-Referred Etching Process for SiC Planarization"
15th International Conference on Precision Engineering (ICPE2014), Abstracts, pp. 50, P05 (22-25 July, Kanazawa, Japan)
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K. Shiozawa, Y. Sano, T. Doi, S. Kurokawa, H. Aida, O. Ohnishi, M. Uneda, Y. Okada, and K. Yamauchi
"Removal Rate of Plasma Chemical Vaporization Machining of Intentionally Damaged Surface by Mechanical Action"
15th International Conference on Precision Engineering (ICPE2014), Abstracts, pp. 53, P22 (22-25 July, Kanazawa, Japan)
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Y. Takahashi (invited)
"Coherent Diffraction Imaging with Focused Hard X-ray Beams"
NSS-8 (The 8th International Workshop on Nanoscale Spectroscopy and Nanotechnology), (28-31 July, Chicago, US)
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J. Kim, S. Matsuyama, Y. Sano, and K. Yamauchi
"Development of high-precision figure measurement system for x-ray optics using laser focus microscope"
SPIE Optics+Photonics2014, 9206-11 (17-21 August, San Diego, CA, US)
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S. Matsuyama, Y. Emi, H. Kino, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi
"Development of achromatic full-field hard X-ray microscopy and its application to X-ray absorption near edge structure spectromicroscopy"
SPIE Optics+Photonics2014, 9207-27 (17-21 August, San Diego, CA, US)
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T. Goto, S. Matsuyama, H. Nakamori, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi
"Development of a two-stage x-ray focusing system with ultraprecise deformable mirrors"
SPIE Optics+Photonics2014, 9208-1 (17-21 August, San Diego, CA, US)
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T. Osaka (invited), T. Hirano, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, K. Ogawa, S. Matsuyama, T. Ishikawa, and K. Yamauchi
"Development of split-delay x-ray optics using Si(220) crystals at SACLA"
SPIE Optics+Photonics2014, 9210-8 (17-21 August, San Diego, CA, US)
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Y. Sano (invited)
"High-speed Etching of Wide-gap Semiconductors Using Atmospheric Pressure Plasma"
Workshop on Ultra-Precision Processing (WUPP) for Wide-gap Semiconductors 2014, Abstracts pp. 8 (20-22 August, Bath, United Kingdom)
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Y. Takahashi (invited)
"Recent Progress of Hard X-ray Ptychography at SPring-8"
International Workshop on Phase Retrieval and Coherent Scattering (Coherence2014), (2-5 September, Northwestern University, Evanston, Illinois, US)
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W. Roseker, S. Lee, M. Walther, H. Schulte-Schrepping, T. Osaka, M. Sikorski, S. Song, P. H. Fuoss, G. B. Stephenson, A. Robert, and G. Grubel
"Hard X-ray Delay Line for X-ray Photon Correlation Spectroscopy"
International Workshop on Phase Retrieval and Coherent Scattering (Coherence2014), (2-5 September, Northwestern University, Evanston, Illinois, US)
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A. Suzuki and Y. Takahashi
"A Method for Ptychographic X-ray Imaging of Weak-Phase Objects"
International Workshop on Phase Retrieval and Coherent Scattering (Coherence2014), (2-5 September, Northwestern University, Evanston, Illinois, US)
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K. Shimomura, A. Suzuki, M. Hirose, and Y. Takahashi
"High-resolution multislice x-ray ptychography in combination with precession measurement"
International Workshop on Phase Retrieval and Coherent Scattering (Coherence2014), Poster number 28, (2-5 September, Northwestern University, Evanston, Illinois, US)
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T. Osaka, T. Hirano, Y. Inubushi, M. Yabashi, Y. Sano, S. Matsuyama, K. Tono, T. Sato, K. Ogawa, T. Ishikawa, and K. Yamauchi
"Development of Hard X-Ray Split-Delay Optics Based on Si(220) Crystals"
JSAP-OSA Joint Symposia 2014 (The 75th JSAP Autumn Meeting 2014), Extended Abstracts pp.18-136, 17p-C4-3 (17-20 September, Hokkaido University, Hokkaido, Japan)
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A. Isohashi, Y. Sano, T. Kato, and K. Yamauchi
"Planarization of 6-in 4H-SiC wafer by Catalyst-referred etching"
2014 European Conference on Silicon Carbide and Relative Materials (ECSCRM2014), Extended Abstracts pp.77, TU-P-20 (21-25 September, Grenoble, France)
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P. V. Bui, K. Inagaki, Y. Sano, K. Yamauchi, and Y. Morikawa
"First-Principles Study of HF Etching at Step Edges SiC Surfaces in Catalyst-Referred Etching Process"
2014 European Conference on Silicon Carbide and Relative Materials (ECSCRM2014), Extended Abstracts pp.85, TU-P-48 (21-25 September, Grenoble, France)
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A. Suzuki, K. Shimomura, S. Furutaku, K. Yamauchi, Y. Kohmura, T. Ishikawa, and Y. Takahashi
"High-resolution hard x-ray ptychography of extended thick objects using multislice approach"
International Conference on X-ray Microscopy (XRM2014), Conference Program Handbook pp.97 (26-31 October, Melbourne Convention and Exibition Center, Melbourne, Australia)
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S. Matsuyama, Y. Emi, H. Kino, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi
"Achromatic full-field X-ray microscopy using four total-reflection mirror"
International Conference on X-ray Microscopy (XRM2014), Conference Program Handbook pp.103 (26-31 October, Melbourne Convention and Exibition Center, Melbourne, Australia)
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K. Shimomura, A. Suzuki, M. Hirose, and Y. Takahashi
"High-resolution multislice x-ray ptychography with precession measurement"
International Conference on X-ray Microscopy (XRM2014), Conference Program Handbook pp.198 (26-31 October, Melbourne Convention and Exibition Center, Melbourne, Australia)
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T. Hirano, T. Osaka, Y. Inubushi, M. Yabashi, Y. Sano, S. Matsuyama, K. Tono, K. Ogawa, T. Ishikawa, and K. Yamauchi
"Development of Autocorrelator for Hard X-ray Free-Electron Laser"
The 1st International Symposium on Interactive Materials Science Cadet Program (iSIMSC), PP-13 (16-19 November, Osaka, Japan)
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K. Yamauchi (invited)
"Atomically Controlled Surfacing of Single Crystalline SiC and GaN by Catalyst-Referred Etching"
2014 International Conference on Planarization/CMP Technology (ICPT2014), Proceedings pp. 139-141, 8-1 (19-21 November, Kobe, Japan)
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A. Isohashi, Y. Sano, and K. Yamauchi
"Planarization of 4H-SiC(0001) by Catalyst-Referred Etching Using Pure Water Etchant"
2014 International Conference on Planarization/CMP Technology (ICPT2014), Proceedings pp. 273-274, P25 (19-21 November, Kobe, Japan)
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K. Shiozawa, Y. Sano, T. Doi, S. Kurokawa, H. Aida, K. Oyama, T. Miyashita, H. Sumizawa, and K. Yamauchi
"Development of Basic-Type CMP/P-CVM Fusion Processing System (Type A) and Its Fundamental Characteristics"
2014 International Conference on Planarization/CMP Technology (ICPT2014), Proceedings pp. 275-278, P26 (19-21 November, Kobe, Japan)
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W. Yamaguchi, S. Sadakuni, A. Isohashi, H. Asano, Y. Sano, M. Imade, M. Maruyama, M. Yoshimura, Y. Mori, and K. Yamauchi
"Atomic scale flattening of gallium nitride substrate grown by Na flux method applying catalyst referred etching"
2014 International Conference on Planarization/CMP Technology (ICPT2014), Proceedings pp. 337-339, P47 (19-21 November, Kobe, Japan)