Department of Precision Science and Technology Graduate School of Engineering Osaka University 2-1 Yamadaoka, Suita, Osaka 565-0871 Japan Phone and FAX number: +81-6-6879-7286

Japanese page

Original Paper

International Conference

2009

2008

2007

2006

2005

2004・2003

• Y. Sano, K. Yamamura, and K. Yamauchi
  Development of Ultraprecision Machining Technologies for Semiconductor Substrates
  Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 16-17 (Feb 16-17, 2009, Osaka, Japan)
  
  
• H. Hara, Y. Morikawa, Y. Sano, and K. Yamauchi
  First-principles Calculation of Surface Energy at 4H-SiC(0001)-1×1
  Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 62-63 (Feb 16-17, 2009, Osaka, Japan)
  
  
• S. Handa, T. Kimura, H. Mimura, H. Yumoto, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, and K. Yamauchi
  Development of Graded Multilayer Mirrors for Hard-X-ray Focusing
  Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 56-57 (Feb 16-17, 2009, Osaka, Japan)
  
  
• J. Murata, S. Sadakuni, K. Yagi, H. Hara, K. Arima, T. Okamoto, H. Mimura, K. Yamauchi
  Photo-enhanced Chemical Planarization of Gallium Nitride Using a Solid Acidic Catalyst
  Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 60-61 (Feb 16-17, 2009, Osaka, Japan)
  
  
• T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, Y. Sano, K. Tamasaku1, Y. Nishino, M. Yabashi, T. Ishikawa, and K. Yamauchi
  Development of an Adaptive Mirror for Controlling Wavefront of X-ray Beam
  Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 58-59 (Feb 16-17, 2009, Osaka, Japan)
  
  
• T. Okamoto, Y. Sano, H. Hara, T. Hatayama, K. Arima, K. Yagi, J. Murata, H. Mimura, T. Fuyuki and K. Yamauchi
  Novel Abrasive-Free Chemical Planarization of 4H-SiC 8°off Wafer Using a Catalyst
  Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 64-65 (Feb 16-17, 2009, Osaka, Japan)
  
  
• T. Kato, Y. Sano, T. Hori, K. Yamamura, H. Mimura, Y. Katsuyama, and K. Yamauchi
  Thinning of SiC Wafers by Plasma Chemical Vaporization Machining
  Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 72-73 (Feb 16-17, 2009, Osaka, Japan)
  
  
• H. Ishikura, H. Mimura, S, Matsuyama, Y. Sano, and K. Yamauchi
  Development of Electroforming for Ultraprecise Mirror Fabrication
  Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 74-75 (Feb 16-17, 2009, Osaka, Japan)
  
  
• S. Kamisaka, Y. Sano, H. Mimura, S. Matsuyama, and K. Yamauchi
  Improvement of Thickness Uniformity of SOI (Silicon On Insulator) Layer by Numerically Controlled Sacrificial Oxidation Using Atmospheric-Pressure Plasma
  Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 70-71 (Feb 16-17, 2009, Osaka, Japan)
  
  
• H. Kubo, H. Furukawa, R. Tsutsumi, K. Yamauchi, Y. Nishino, T. Ishikawa, E. Matsubara, and Y. Takahashi
  Recent Progress of Coherent X-ray Diffraction Microscophy for Nanostructure Analysis of Metallic Materials
  Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 76-77 (Feb 16-17, 2009, Osaka, Japan)
  
  
• M. Fujii, S. Matsuyama, T. Wakioka, H. Mimura, Y. Sano, and K. Yamauchi
  Development of Advanced Kirkpatrick-Baez System for X-ray Nano-Imaging
  First International Symposium on Atomically Controlled Fabrication Technology, p2.6, (2009).
  
  
• D. Yamakawa, H. Mimura, T. Kimura, S. Matsuyama, Y. Sano, and K. Yamauchi
  Development of X-ray Free Electron Lasers Focusing System with 400mm Long Mirror
  Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 68-69 (Feb 16-17, 2009, Osaka, Japan)
  
  
• T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
  Development of an adaptive mirror for synchrotron x-ray optics
  The 13th Hiroshima International Symposium on Synchrotron Radiation (March 10-11, Hiroshima, Japan) Abstracts pp.45
  
  
• K. Yamauchi
  Recent Progress of Hard X-ray Focusing using Mirror Optics
  GCOE International Workshop on Phase Retrieval in the Visible to Hard X-ray Regions (March 26th, 2009, Osaka, Japan)
  
  
• H. Mimura
  Surface figure Measurement of X-ray mirror Using Phase Retrieval
  GCOE International Workshop on Phase Retrieval in the Visible to Hard X-ray Regions (March 26th, 2009, Osaka, Japan)
  
  
• Y. Takahashi
  Nanostructure Analysis of Metallic Materials by Coherent X-ray Diffraction Microscopy
  GCOE International Workshop on Phase Retrieval in the Visible to Hard X-ray Regions (March 26th, 2009, Osaka, Japan)
  
  
• T. Kimura
  Development of Adaptive Mirror System for Controlling Wavefront of Hard X-ray Focused Beam
  GCOE International Workshop on Phase Retrieval in the Visible to Hard X-ray Regions (March 26th, 2009, Osaka, Japan)