Department of Precision Science and Technology Graduate School of Engineering Osaka University 2-1 Yamadaoka, Suita, Osaka 565-0871 Japan Phone and FAX number: +81-6-6879-7286 |
Japanese page |
Research Strategy |
We research
atomic-scale production technologies through investigation of physic and
chemistry on surfaces to apply them for industry. Our research area includes equipment
development of surface evaluation and new atomic-scale processes/measurements. |
Research targets |
1. Atomistic production technology |
1-1. EEM (Elastic emission machining) 1-2. PCVM (Plasma chemical vaporization machining) 1-3. Electrolytic machining in ultrapure water 1-4. CARE(CAtalyst-Referred Etching) |
2. Giant-scale nanotechnology |
2-1. Microstitching interferometry 2-2. X-ray multilayer deposition 2-3. Large-scale figure transfer process 2-4. NC sacrificed oxidation process |
3. Application to semiconducor device processing |
3-1. super-thin SOI(Silicon on insulator) film fabrication 3-2. Mirror fabrication for EUVL lithography system. 3-3. Cu damascene process using environmental harmony process 3-4. High efficiency dry process for wide-band-gap semiconductor 3-5. Atomic-scale planarization of Silicon Carbide and Gallium nitride |
4. X-ray optics and optical system |
4-1. Hard X-ray focusing mirror fabrication 4-2. High-resolution and Highly Sensitive Scanning X-ray Fluorescence Microscopy system development |
5. X-ray nano-scale biology |
5-1. Element distribution measurement inside the cell using canning X-ray Fluorescence Microscopy |