Yamauchi Department of Precision Science and Technology
Graduate School of Engineering
Osaka University
2-1 Yamadaoka, Suita, Osaka 565-0871 Japan
Phone and FAX number: +81-6-6879-7286
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Research Strategy

We research atomic-scale production technologies through investigation of physic and chemistry on surfaces to apply them for industry. Our research area includes equipment development of surface evaluation and new atomic-scale processes/measurements.

  Based on these researches, we collaborate with different research area such as medical science, biology, synchrotronradiation physics, semiconductor device processes.


Research targets
1. Atomistic production technology
1-1. EEM (Elastic emission machining)
1-2. PCVM (Plasma chemical vaporization machining)
1-3. Electrolytic machining in ultrapure water
1-4. CARE(CAtalyst-Referred Etching)


2. Giant-scale nanotechnology
2-1. Microstitching interferometry
2-2. X-ray multilayer deposition
2-3. Large-scale figure transfer process
2-4. NC sacrificed oxidation process


3. Application to semiconducor device processing
3-1. super-thin SOI(Silicon on insulator) film fabrication
3-2. Mirror fabrication for EUVL lithography system.
3-3. Cu damascene process using environmental harmony process
3-4. High efficiency dry process for wide-band-gap semiconductor
3-5. Atomic-scale planarization of Silicon Carbide and Gallium nitride


4. X-ray optics and optical system
4-1. Hard X-ray focusing mirror fabrication
4-2. High-resolution and Highly Sensitive Scanning X-ray Fluorescence Microscopy system development

5. X-ray nano-scale biology
5-1. Element distribution measurement inside the cell using canning X-ray Fluorescence Microscopy