Masafumi Miyake: (Oral) Development of an etching technique using atmospheric pressure plasma to realize a distortion-free Ge channel-cut crystal monochromator

Kiho Takemura: (Poster) X-ray nanobeam scanner for high-resolution ptychography using Advanced KB mirror and Risley Prism

Arata Iwano: (Poster) Development of X-ray two-color multilayer for XFEL nanofocusing mirrors

Ryuji Oda: (Poster) Surface finishing of a micro channel-cut crystal monochromator for self-seeding using high-pressure plasma etching

Atsuya Nagamatsu: (Poster) Development of scanning-imaging X-ray microscope using advanced Kirkptrick-Baez mirror