Publication

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  • 山内和人，稲垣耕司，三村秀和，杉山和久，広瀬喜久治，森　勇藏
    Elastic Emission Machiningにおける表面原子除去過程の解析とその機構の電子論的な解釈
    精密工学会誌，68, 456-460 (2002).

  • 森 勇藏，山内和人，山村和也，三村秀和，佐野泰久，齋藤　彰，Alexei Souvorov, 玉作賢治, 矢橋牧名,石川哲也
    プラズマCVMおよびEEMによるシンクロトロン放射X線用楕円ミラーの作製と集光特性の評価
    精密工学会誌，68, 1347-1350 (2002).

  • Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku and T. Ishikawa
    Sub-micron focusing by reflective optics for scanning x-ray microscopy
    Proc. SPIE 4782, Seattle 58-64 (2002).

  • K. Yamamura, H. Mimura, K. Yamauchi, Y. Sano, A. Saito, T. Kinoshita, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa and Y. Mori
    Aspheric surface fabrication in nm-level accuracy by numerically controlled plasma CVM and EEM
    Proc. SPIE 4782, Seattle 265-270 (2002).

  • K. Yamauchi, K. Yamamura, H. MimuraY. Sano, A. Saito, M. Kanaoka, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa and Y. Mori
    Wave-optical analysis of sub-micron focusing by reflective optics
    Proc. SPIE 4782, Seattle 271-275 (2002).

  • Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Alexei Souvorov, Makina Yabashi, Kenji Tamasaku, Tetsuya Ishikawa and Yuzo Mori
    Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror
    J. Synchrotron rad., 9, 313-316 (2002).

  • A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori, K. Yamauchi, K. Yamamura, and A. Saito
    Deterministic retrieval of surface waviness by means of topography with coherent x-rays
    J. Synchrotron Rad, 9, 223-228 (2002).

  • K. Yamauchi, H. Mimura, K. Inagaki, and Y. Mori
    Figuring with subnanometer-level accuracy by numerically controlled elastic emission machining
    Rev. Sci. Instrum., 73, 4028-4033 (2002).

  • 森 勇藏, 山村和也, 佐野泰久
    数値制御プラズマCVM (Chemical Vaporization Machining)によるSOIの薄膜化−加工装置の開発と超薄膜SOIウエハの試作−
    精密工学会誌, 68 (12), 1590-1594 (2002).

  • K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori
    Microstitching interferometry for x-ray reflective optics
    Rev. Sci. Instrum., 74 (5), 2894-2898 (2003).

  • 森 勇藏, 佐野泰久, 山村和也, 森田論, 森田瑞穂, 大嶋一郎, 斉藤祐司, 須川成利, 大見忠弘
    数値制御プラズマCVM (Chemical Vaporization Machining)によるSOIの薄膜化−デバイス用基板としての加工面の評価−
    精密工学会誌, 69 (5), 721-725 (2003).

  • 山内和人, 山村和也, 三村秀和, 佐野泰久, 久保田章亀, 関戸康裕, 上野一匡, Alexei Souvorov, 玉作賢治, 矢橋牧名, 石川哲也, 森 勇藏
    高精度X線ミラーのための干渉計を利用した形状計測システムの開発
    精密工学会誌, 69 (6), 856-860 (2003).

  • 山内和人,　山村和也,　三村秀和,　佐野泰久,　齋藤　彰,　久保田章亀,　金岡政彦,　Alexei Souvorov,　玉作賢治,　矢橋牧名,　石川哲也,　森 勇藏
    硬X線用斜入射平面ミラーの形状誤差が反射X線強度・位相分布に及ぼす影響の波動光学的評価
    精密工学会誌，69 (7), 997-1001 (2003).

  • Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, A. Saito,Y. Sano, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku and T. Ishikawa M. Shimura, Y. Ishizaka Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy
    Proc. SPIE 5193, pp.11-17, San Diego (2003).

  • Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku and T. Ishikawa
    Developement of figure correction method having spatial resolution close to 0.1mm.
    Proc. SPIE 5193, 105-111, San Diego (2003).

  • Y. Mori, K. Hirose, K. Yamauchi, H. Goto, K. Yamamura and Y. Sano
    Ultra-Precision Machining based on Physics and Chemistry
    Sensors and Materials, 15 (1) 1-19 (2003).

  • K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori
    Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining
    Rev. Sci. Instrum., 74 (10), 4549-4553 (2003).

  • K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku,T. Ishikawa and Y. Mori
    Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining
    Jpn. J. Appl. Phys. Part1. 42 (11), 7129-7134 (2003).

  • 森勇藏、山内和人、三村秀和、稲垣耕司、久保田章亀、遠藤勝義
    EEM（Elastic Emission Machining)によるSi（001）表面の平坦化（第１報）-超清浄EEM加工システムの開発ー
    精密工学会誌論文集,70, 391-396 (2004).

  • 山内和人、三村秀和、久保田章亀、有馬健太、稲垣耕司、遠藤勝義、森勇藏
    EEM（Elastic Emission Machining)によるSi（001）表面の平坦化（第2報）-加工表面の原子像観察と構造評価ー
    精密工学会誌論文集, 70, 547-551 (2004).

  • Y. Mori, K. Yamamura, and Y. Sano
    Thinning of Silicon-on-Insulator Wafer by Numerically Controlled Plasma Chemical Vaporization Machining,
    Review of scientific instruments, Volume 75 (4), 942-946 (2004).

  • H. Mimura, K. Yamauchi, K. Yamamura, A. Kubota, S. Matsuyama, Y. Sano, K. Ueno, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa and Y. Mori
    Image quality improvement in hard X-ray projection microscope using total reflection mirror optics
    Journal of Synchrotoron Radiation, 11, 343-346 (2004).

  • K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, S. Matsuyama, H. Yumoto, K. Ueno, M. Shibahara, K. Endo, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and Y. Mori
    Fabrication technology of ultraprecise mirror optics to realize hard X-ray nanobeam
    Proc. SPIE Int. Soc. Opt. Eng, 5533, 116-123 (2004).

  • H. Mimura, H. Yumoto, K. Yamamura, Y. Sano, S. Matsuyama, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and K. Yamauchi
    Microstitching Interferometry for hard X-ray nanofocusing mirrors
    Proc. SPIE Int. Soc. Opt. Eng, 5533, 171-180 (2004) .

  • S. Matsuyama, H. Mimura, K. Yamamura, H. Yumoto, Y. Sano, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and K. Yamauchi
    Wave-optical and ray-tracing analysis to establish a two dimensional focusing unit using K-B arrangement.
    Proc. SPIE Int. Soc. Opt. Eng. 5533, 181-191 (2004) .

  • H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa and K. Yamauchi
    Relative angle determinable stitching interferometry for hard X-ray reflective optics
    Review of Scientfic Instruments, 76, 045102 (2005).

  • H. Mimura, S. Matsuyama, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, M. Shibahara, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa and K. Yamauchi
    Hard X-ray Diffraction-Limited Nanofocusing with Kirkpatrick-Baez Mirrors
    Japanese Journal of Applied Physics Part 2, 44 (18), L539-L542 (2005).

  • 久保田章亀, 三村秀和，佐野泰久，山村和也，山内和人，森 勇藏
    EEM (Elastic Emission Machining)による4H-SiC(0001)表面の平滑化
    精密工学会誌論文集, 71（4）, 477-480 (2005).

  • A. Kubota, H. Mimura, K. Inagaki, Y. Mori and K. Yamauchi
    Preparation of Ultrasmooth and defect-free 4H-SiC(0001) Surfaces by Elastic Emission Machining,
    Journal of Electronic Material, 34(4), 439-443 (2005).

  • 久保田章亀, 三村秀和, 湯本博勝，森 勇藏, 山内和人
    EEM (Elastic Emission Machining)プロセスにおける加工液がSi(001)表面のラフネスに及ぼす影響
    精密工学会誌論文集,71 (5), 628-632 (2005).

  • H. Yumoto, H. Mimura, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, Y. Nishino, M. Yabashi, K. Tamasaku, T. Ishikawa, and K. Yamauchi
    Fabrication of elliptically figured mirror for focusing hard X-rays to size less than 50 nm
    Review of Scientific Instruments, 76, 063708 (2005).

  • M. Shimura, A. Saito, S. Matsuyama, T. Sakuma, Y. Terui, K. Ueno, H. Yumoto, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, M. Yabashi, K. Tamasaku, K. Nishio, Y. Nishino, K. Endo, K. Hatake, Y. Mori, Y. Ishizaka and T. Ishikawa
    Element Array by Scanning X-ray Fluorescence Microscopy after Cis-Diamminedichloro-Platinum(II) Treatment
    Cancer Research, 65 (12),. 4998-5002, (2005).

  • A. Kubota, H. Mimura, K. Inagaki, H. Yumoto, Y. Mori and K. Yamauchi
    Morphological Stability of Si (001) Surface in Mixture Fluid of Ultrapure Water and Silica Powder Particles in Elastic Emission Machining
    Japanese Journal of Applied Physics, Vol. 44, No. 8, 2005, pp. 5893-5897

  • S. Matsuyama, H. Mimura, H. Yumoto, K. Yamamura, Y. Sano, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and K. Yamauchi
    Diffraction-limited two-dimensional hard-X-rays focusing in 100nm level using K-B mirror arrangement
    Revew of Scientific Instrument. 76, 083114 (2005).

  • Y. Ichii, Y. Mori , K. Hirose, K. Endo, K. Yamauchi and H. Goto
    Electrochemical Etching Using Surface Carboxylated Graphite Electrodes in Ultrapure Water
    Electrochemica Acta, 50(27), 5379-5383 (2005).

  • K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano,A. Saito, K. Ueno, A. Souvorov, K. Tamasaku, M. Yabashi, T. Ishikawa, Y. Mori,
    Wave-optical evaluation of interference fringes and wavefront phase in hard X-ray beam totally reflected by mirror optics
    Appl. Opt. 44, 6927-6932 (2005)

  • 湯本博勝, 三村秀和, 松山智至, 山村和也, 佐野泰久, 上野一匡, 遠藤勝義, 森 勇藏, 西野吉則, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人
    硬X線ナノ集光用超高精度楕円ミラーの作製と1次元集光性能の評価,
    精密工学会誌論文集, 71(9), 1137-1140 (2005).

  • L. Assoufid, A. Rommeveaux, H. Ohashi, K. Yamauchi, H. Mimura, J. Qian, O. Hignette, T. Ishikawa, C. Morawe, A. Macrander, A. Khounsary and S. Goto
    Results of x-ray mirror round-robin metrology measurements at the APS, ESRF, and SPring-8 optical metrology laboratories
    Proc. SPIE Int. Soc. Opt. Eng. 5921, 59210J (2005)

  • S. Matsuyama, H. Mimura, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi
    Hard x-ray nano-focusing at 40nm level using K-B mirror optics for nanoscopy/spectroscopy
    Proc. SPIE Int. Soc. Opt. Eng. 5918, 591804 (2005)

  • Jun Katoh, Kenta Arima, Akihisa Kubota, Hidekazu Mimura, Kouji Inagaki, Yuzo Mori, Kazuto Yamauchi, and Katsuyoshi Endo
    Atomic-Scale Evaluation of Si(111) Surfaces Finished by the Planarization Process Utilizing SiO2 Particles Mixed with Water
    Journal of The Electrochemical Society, vol. 153, no. 6, G560-G565 (2006).

  • H. Hara, Y. Sano, H. Mimura, K. Arima, A. Kubota, K.Yagi, J. Murata and K.Yamauchi
    Novel abrasive-free planarization of 4H-SiC (0001) using catalyst
    Journal of Electronic Materials, 35, L11-L14 (2006)

  • Makina Yabashi, Jerome B. Hastings, Max S. Zolotorev, Hidekazu Mimura, Hirokatsu Yumoto, Satoshi Matsuyama, Kazuto Yamauchi, and Tetsuya Ishikawa
    Single-Shot Spectrometry for X-Ray Free-Electron Lasers
    Phys. Rev. Lett. 97, 084802 (2006)

  • Kenta Arima, Akihisa Kubota, Hidekazu Mimura, Kouji Inagaki, Katsuyoshi Endo, Yuzo Mori and Kazuto Yamauchi
    Highly resolved scanning tunneling microscopy study of Si(001) surfaces flattened in aqueous environment
    Surface Science Letters 600 (15) L185-L188 (2006)

  • Yasuhisa Sano, Masayo Watanabe, Kazuya Yamamura, Kazuto Yamauchi,Takeshi Ishida, Kenta Arima, Akihisa Kubota and Yuzo Mori
    Polishing characteristics of silicon carbide by plasma chemical vaporization machining
    Japanese Journal of Applied Physics, Vol. 45, No. 10B, 8277-8280(2006).

  • Yoshio Ichii, Yuzo Mori, Kikuji Hirose, Katsuyoshi Endo, Kazuto Yamauchi and Hidekazu Goto
    Electrochemical Etching Using Surface-Sulfonated Electrodes in Ultrapure Water
    Journal of The Electrochemical Society, 153 (5), C344-C348

  • Yoshio Ichii and Hidekazu Goto
    Development of Eco-Friendly Electrochemical Etching Process of Silicon on Cathode
    Journal of The Electrochemical Society, 153 (10), C694-C700 (2006)

  • Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Soichiro Handa, Yasuhisa Sano, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, and Kazuto Yamauchi.
    At-wavelength figure metrology of hard x-ray focusing mirrors
    Review of Scientific Instruments 77, 063712 (2006).

  • Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
    Development of mirror manipulator for hard X-ray nanofocusing at sub-50 nm level
    Review of Scientfic Instruments, 77, 093107 (2006).

  • Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Yasuhisa Sano, Kazuya Yamamura, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
    Development of scanning X-ray fluorescence microscope with spatial resolution of 30nm using K-B mirrors optics
    Review of Scientific Instruments, 77, 103102 (2006)

  • 森田健一、後藤英和、山内和人、遠藤勝義、森　勇藏
    超純水・高速せん断流による洗浄法の開発（第2報）−超純水・高速せん断流によるCu除去メカニズムの研究ー
    精密工学会誌(2006)

  • Kazuya Yamamura, Yasuhisa Sano, Masafumi Shibahara, Kazuto Yamauchi, Hidekazu Mimura, Katsuyoshi Endo and Yuzo Mori
    Ultraprecision Machining Utilizing Numerically Controlled Scanning of Localized Atmospheric Pressure Plasma
    Japanese Journal of Applied Physics, Vol. 45, No. 10B, 2006, pp. 8270-8276

  • A. Kubota, H. Mimura, K. Inagaki, Y. Mori and K. Yamauchi
    Effect of Particle Morphology on Removal Rate and Surface Topography in Elastic Emission Machining
    Journal of Electrochemical Society, 153, G874-G878 (2006)

  • H. Mimura, H. Yumoto, S. Matsuyama, Y. Sano, K. Yamamura, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi
    Efficient focusing of hard x rays to 25 nm by a total reflection mirror
    Applied Physics Letters 90, 051903 (2007)

  • A. Kubota, Y. Shinbayashi, H. Mimura, Y. Sano, K. Inagaki, Y. Mori and K. Yamauchi
    Investigation of Surface Removal Process of Silicon Carbide in Elastic Emission Machining
    Journal of Electronic Materials, 36, 92-97 (2007)

  • Yoshio Ichii and Hidekazu Goto
    Fabrication of flat silicon surfaces using ion-exchange particles in ultrapure water
    Electrochimica Acta, 52, 2927-2932 (2007)

  • Yasuhisa Sano, Masayo Watanabe, Kazuya Yamamura, Kazuto Yamauchi, Takeshi Ishida, Kenta Arima, Akihisa Kubota, Yuzo Mori
    Polishing Characteristics of 4H-SiC Si-Face and C-Face by Plasma Chemical Vaporization Machining
    Materials Science Forum, 556-557, 757-760 (2007)

  • Hideyuki Hara, Yasuhisa Sano, Hidekazu Mimura, Kenta Arima, Akihisa Kubota, Keita Yagi, Junji Murata and Kazuto Yamauchi
    Damage-free Planarization of 4H-SiC (0001) by Catalyst-Referred Etching
    Materials Science Forum, 556-557, 749-751 (2007)

  • Kenta Arima, Hideyuki Hara, Junji Murata, Takeshi Ishida, Ryota Okamoto, Keita Yagi, Yasuhisa Sano, Hidekazu Mimura and Kazuto Yamauchi
    Atomic-scale flattening of SiC surfaces by electroless chemical etching in HF solution with Pt catalyst
    Applied Physics Letters, Vol. 90, No. 20, 202106 1-3 (2007).

  • Yasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi, and Yuzo Mori
    Fabrication of ultrathin and highly uniform silicon on insulator by numerically controlled plasma chemical vaporization machining
    Rev. Sci. Instrum. 78, 086102 (2007).

  • H. Hara, Y. Sano, K. Arima, K. Yagi, J. Murata, A. Kubota, H. Mimura, K. Yamauchi
    CAtalyst-Referred Etching of Silicon
    Science and Technology of Advanced Materials 8 162-165 (2007).

  • K. Yagi, J. Murata, H. Hara, Y. Sano, K. Yamauchi, H. Goto.
    Fabrication of damascene Cu wirings using solid acidic catalyst
    Science and Technology of Advanced Materials 8 166-169 (2007).

  • Y. Takahashi, Y. Nishino, T. Ishikawa, E. Matsubara
    Coherent x-ray diffraction pattern of a SnZn cast alloy
    Journal of Physics: Conference Series 83, 012018 (2007)

  • M. Kanaoka, C, Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi
    Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics
    J. Vac. Sci. Technol. B 25(6), Nov/Dec 2007, 2110-2113.

  • J. Murata, A. Kubota, K. Yagi, Y. Sano, H. Hara, K. Arima, T. Okamoto, H. Mimura, K. Yamauchi
    Chemical planarization of GaN using hydroxyl radicals generated on a catalyst plate in H2O2 solution
    Journal of Crstal Growth, 310 (2008) 1637-1641

  • H. Jiang, D. Ramunno-Johnson, C. Song, H. Wang, B. Amirbekian, Y. Kohmura, Y. Nishino, Y. Takahashi, T. Ishikawa, Lila Graham, M. J. Glimcher, J. Miao
    Nanoscale imaging of mineral crystals inside biological composite materials using x-ray diffraction microscopy
    Physical Review Letters, 100 (2008) 038103

  • S. Matsuyama, H. Mimura, K. Katagishi, H. Yumoto, S. Handa, M. Fujii, Y. Sano, M. Shimura, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, and K. Yamauchi
    Trace element mapping using a high-resolution scanning X-ray fluorescence microscope equipped with a Kirkpatrick-Baez mirror system
    Surfece and Interface Analysis, 40 (2008) 1042-1045

  • H. Mimura, H. Yumoto,S. Matsuyama, S. Handa, T. Kimura, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, and K. Yamauchi
    Direct Determination of the Wave Field of an X-ray Nanobeam
    Physical Review A, 77 (2008) 015812

  • M. Kanaoka, C, Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, and K. Yamauchi
    Processing efficiency of elastic emission machining for low-thermal-expansion material
    Surface and Interface Analysis, 40 (2008) 1002-1006

  • Y. Sano, T. Masuda, H. Mimura, and K. Yamauchi
    Ultraprecision finishing technique by numerically controlled sacrificial oxidation
    Journal of Crystal Growth, 310 (2008) 2173-2177

  • H. Mimura, S. Morita, T. Kimura, D. Yamakawa, W. Lin, Y. Uehara, S. Matsuyama, H. Yumoto, H. Ohashi, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, H. Ohmori, and K. Yamauchi
    Focusing mirror for x-ray free-electron lasers
    Review of Scientific Instruments, 79 (2008) 083104
    Press release (Japanese)

  • Y. Takahashi, H. Furukawa, H. Kubo, K. Yamauchi, Y. Nishino, T. Ishikawa, and E. Matsubara
    Coherent x-ray diffraction measurements of Cu thin lines
    Surface and Interface Analysis, 40 (2008) 1046-1049

  • Y. Takahashi, H. Kubo, H. Furukawa, K. Yamauchi, E. Matsubara, T. Ishikawa, and Y. Nishino
    Element-specific hard-x-ray diffraction microscopy
    Physical Review B, 78 (2008) 092105

  • S. Handa, H. Mimura, H. Yumoto, T. Kimura, S. Matsuyama, Y. Sano, and K. Yamauchi
    Highly accurate differential deposition for X-ray reflective optics
    Surface and Interface Analysis, 40 (2008) 1019-1022

  • 藤原宏樹，山内和人
    円筒ころ軸受における部分円弧クラウニングと対数クラウニングの実験的比較
    日本機械学会論文集，72C(2008)，2308-2314．

  • A. Kubota, K. Yagi, J. Murata, H. Yasui, S. Miyamoto, H. Hara, Y. Sano and K. Yamauchi
    A Study on a Surface Preparation Method for Single-Crystal SiC Using an Fe Catalyst
    Journal of ELECTRONIC MATERIALS 38 (2009) 159

  • J. Murata, A. Kubota, K. Yagi, Y. Sano, H. Hara, K. Arima, T. Okamoto, H. Mimura, and K. Yamauchi
    New chemical planarization of SiC and GaN using an Fe plate in H2O2 solution
    Materials Science Forum Vols. 600-603 (2009) pp 815-818

  • T. Okamoto, Y. Sano, H. Hara, K. Arima, K. Yagi, J. Murata, H. Mimura and K. Yamauchi
    Damage-free Planarization of 2-inch 4H-SiC Wafer Using Pt Catalyst Plate and HF Solution
    Materials Science Forum Vols. 600-603 (2009) pp 835-838

  • T. Kato, Y. Sano, H. Hara, H. Mimura, K. Yamamura, and K. Yamauchi
    Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining
    Materials Science Forum Vols. 600-603 (2009) pp 843-846

  • Y. Sano, M. Watanabe, T. Kato, K. Yamamura, H. Mimura, and K. Yamauchi
    Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide
    Materials Science Forum Vols. 600-603 (2009) pp 847-850

  • S. Matsuyama, M. Shimura, H. Mimura, M. Fujii, H. Yumoto, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa and K. Yamauchi
    Trace element mapping of a single cell using a hard x-ray nanobeam focused by a Kirkpatrick-Baez mirror system
    X-ray Spectrometry 38, 89-94, (2009).

  • Y. Nishino, Y. Takahashi, N. Imamoto, T. Ishikawa, K. Maeshima
    Three-dimensional visualisation of a human chromosome using coherent x-ray diffraction
    Physical Review Letters 102 (2009) 018101
    Press release (Japanese)

  • 藤原宏樹，山内和人
    円筒ころ軸受における対数クラウニングの公差設計
    日本機械学会論文集，75C(2009)，1-7

  • H. Hara, Y. Morikawa, Y. Sano, and K. Yamauchi
    Termination dependence of surface stacking at 4H-SiC(0001)-1×1: Density functional theory calculations
    Phys. Rev. B 79, 153306 (2009)

  • Y. Takahashi, Y. Nishino, H. Mimura, R. Tsutsumi, H. Kubo, T. Ishikawa, and K. Yamauchi
    Feasibility study of high-resolution coherent diffraction microscopy using synchrotron x rays focused by Kirkpatrick-Baez mirrors
    Journal of Applied Physics 105 (2009) 083106

  • S. Handa, H. Mimura, H. Yumoto, T. Kimura, S. Matsuyama, Y. Sano, K. Yamamura, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, and K. Yamauchi
    Novel Scheme of Figure-Error Correction for X-ray Nanofocusing Mirror
    Japanese Journal of Applied Physics 48 (2009) 096507

  • T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, S. Matsuyama, Y. Sano, K. Inagaki, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, and K. Yamauchi
    Wavefront Control System for Phase Compensation in Hard X-ray Optics
    Jpn. J. Appl. Phys. 48 (2009) 072503

  • Y. Takahashi, Y. Nishino, H. Furukawa, H. Kubo, K. Yamauchi, T. Ishikawa, E. Matsubara
    Observation of electromigration voids in a Cu thin line by in situ coherent x-ray diffraction microscopy
    Journal of Applied Physics 105 (2009) 124911

  • Y. Takahashi, Y. Nishino, R. Tsutsumi, H. Kubo, H. Furukawa, H. Mimura, S. Matsuyama, N. Zettsu, E. Matsubara, T. Ishikawa, K. Yamauchi
    High-Resolution Diffraction Microscopy Using the Plane-Wave Field of a Nearly Diffraction-Limited Focusing X ray
    Physical Review B 80 (2009) 054103

  • Y. Takahashi, H. Kubo, H. Furukawa, K. Yamauchi, E. Matsubara, T. Ishikawa, Y. Nishino
    Development of incident x-ray flux monitor for coherent x-ray diffraction microscopy
    Journal of Physics: Conference Series 186 (2009) 12060

  • Y. Nishino, Y. Takahashi, H. Kubo, H. Furukawa, K. Yamauchi, N. Imamoto, R. Hirohata, E. Matsubara, and T. Ishikawa
    Nanostructure analysis by coherent hard X-ray diffraction
    Journal of Physics: Conference Series 186 (2009) 12056

  • 藤原宏樹，辻本崇，山内和人
    円すいころ軸受ころ大端面の最適曲率半径
    日本機械学会論文集，75C (2009)，225

  • J. Murata, S. Sadakuni, K. Yagi, Y. Sano, T. Okamoto, K. Arima, A. N. Hattori, H. Mimura, and K. Yamauchi
    Planarization of GaN(0001) Surface by Photo-Electrochemical Method with Solid Acidic or Basic Catalyst
    Japanese Journal of Applied Physics 48 (2009) 121001

  • H. Mimura, S. Handa, T. Kimura, H. Yumoto, D. Yamakawa, H. Yokoyama, S. Matsuyama, K. Inagaki, K. Yamamura, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, and K. Yamauchi
    Breaking the 10 nanometer barrier in hard X-ray focusing
    Nature Physics, 6 (2) (2010) 122-125
    Press release (Japanese)

  • T. Okamoto, Y. Sano, H. Hara, T. Hatayama, K. Arima, K. Yagi, J. Murata, S. Sadakuni, K. Tachibana, Y. Shirasawa, H. Mimura, T. Fuyuki and K. Yamauchi
    Reduction of surface roughness of 4H-SiC by catalyst-referred etching
    Materials Science Forum, 645-648 (2010) pp. 775-778

  • S. Sadakuni, J. Murata, K. Yagi, Y. Sano, K. Arima, A. Hattori, T. Okamoto, and K. Yamauchi
    Influence of the UV Light Intensity on the Photoelectrochemical Planarization Technique for Gallium Nitride
    Materials Science Forum, 645-648 (2010) pp. 795-798

  • Y. Sano, T. Kato, T. Hori, K. Yamamura, H. Mimura, Y. Katsuyama, and K. Yamauchi
    Thinning of SiC wafer by plasma chemical vaporization machining
    Materials Science Forum, 645-648 (2010) pp. 857-860

  • S. Matsuyama, M. Shimura, M. Fujii, K. Maeshima, H. Yumoto, H. Mimura, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, Y. Ishizaka, T. Ishikawa and K. Yamauchi
    Elemental mapping of frozen hydrated cells with cryo-scanning X-ray fluorescence microscopy
    X-Ray Spectrometry 39 (2010) 260-266

  • S. Matsuyama, M. Fujii, T. Wakioka, H. Mimura, S. Handa, T. Kimura, Y. Nishino, K. Tamasaku, Y. Makina, T. Ishikawa, and K. Yamauchi
    Development of Hard X-ray Imaging Optics with Two Pairs of Elliptical and Hyperbolic Mirrors
    AIP Conf. Proc. 1234 (2010) 267-270

  • S. Matsuyama, T. Wakioka, H. Mimura, T. Kimura, N. Kidani, Y. Sano, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa and K. Yamauchi
    Development of a one-dimensional Wolter mirror for an advanced Kirkpatrick-Baez mirror
    Proc. SPIE 7802 (2010) 780202

  • S. Matsuyama, T. Wakioka, N. Kidani, T. Kimura, H. Mimura, Y. Sano, Y. Nishino, M. Yabashi, K. Tamasaku, T. Ishikawa and K. Yamauchi
    One-dimensional Wolter optics with a sub-50-nm spatial resolution
    Optics Letters, 35 (2010) 3583-3585.

  • Y. Sano, T. Kato, K. Yamamura, H. Mimura, S. Matsuyama, and K. Yamauchi
    Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma
    Japanese Journal of Applied Physics 49 (2010) 08JJ03

  • S. Kamisaka, K. Yoshinaga, Y. Sano, H. Mimura, S. Matsuyama, and K. Yamauchi
    Improvement of Thickness Uniformity of Silicon on Insulator Layer by Numerically Controlled Sacrificial Oxidation Using Atmospheric-Pressure Plasma with Electrode Array System
    Japanese Journal of Applied Physics 49 (2010) 08JJ04

  • H. Takino, K. Yamamura, Y. Sano, and Y. Mori
    Removal characteristics of plasma chemical vaporization machining with a pipe electrode for optical fabrication
    Appl. Opt. 49 (2010) pp. 4434-4440

  • H. Fujiwara and K. Yamauchi
    Tolerance Design of Logarithmic Roller Profiles in Cylindrical Roller Bearings
    Journal of Advanced Mechanical Design, Systems and Manufacturing, 4 (2010) 728

  • H. Fujiwara, T. Kawase, T. Kobayashi, and K. Yamauchi
    Optimized Logarithmic Roller Crowning Design of Cylindrical Roller Bearings and Its Experimental Demonstration
    Tribology Transactions, 53(2010), 909

  • 三村秀和, 湯本博勝, 松山智至, 佐野泰久, 山内和人
    Ｘ線ミラー用ナノ精度表面創成法の開発-形状修正加工の高分解能化とＸ線集光ミラーへの適応
    精密工学会誌,76 (3), 338-342, 2010.

  • Y. Takahashi, N. Zettsu, Y. Nishino, R. Tsutsumi, E. Matsubara, T. Ishikawa, K. Yamauchi
    Three-dimensional electron density mapping of shape-controlled nanoparticle by focused hard x-ray diffraction microscopy
    Nano Letters 10 (2010) 1922-1926
    Press release (Japanese)

  • Y. Takahashi, H. Kubo, R. Tsutsumi, S. Sakaki, N. Zettsu, Y. Nishino, T. Ishikawa, and K. Yamauchi
    Two-dimensional measurement of focused x-ray beam profile using coherent x-ray diffraction of isolated nanoparticle
    Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment 616 (2010) 266-269

  • Y. Takahashi, H. Kubo, Y. Nishino, H. Furukawa, R. Tsutsumi, K. Yamauchi, T. Ishikawa, and E. Matsubara
    An experimental procedure for precise evaluation of electron density distribution of a nanostructured material by coherent x-ray diffraction microscopy
    Review of Scientific Instruments 81 (2010) 033707

  • T. Kimura, H. Ohashi, H. Mimura, D. Yamakawa, H. Yumoto, S. Matsuyama, N. Tsumura, H. Okada, T. Masunaga, Y. Senba, S. Goto, T. Ishikawa, and K. Yamauchi
    A Stitching Figure Profiler of Large X-ray Mirrors Using RADSI for Subaperture Data Acquisition
    Nuclear Instruments and Methods in Physics Reserch A, 616 (2010) 229-232.

  • S. Handa, H. Mimura, H. Yumoto, T. Kimura, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, and K. Yamauchi
    Extended knife-edge method for characterizing Sub-10-nm X-ray beams
    Nuclear Instruments and Methods in Physics Reserch A, 616 (2010) 246-250.

  • H. Yumoto, H. Mimura, S. Handa, T. Kimura, S. Matsuyama, Y. Sano, H. Ohashi, K. Yamauchi, and T. Ishikawa
    Stitching-angle measurable microscopic-interferometer: surface-figure metrology tool for hard X-ray nanofocusing mirrors with large curvature
    Nuclear Instruments and Methods in Physics Reserch A, 616 (2010) 203-206.

  • S. Matsuyama, M. Fujii, and K. Yamauchi
    Simulation study of four-mirror alignment of advanced Kirkpatrick-Baez optics
    Nuclear Instruments and Methods in Physics Reserch A, 616 (2010) 241-245.

  • H. Mimura, S. Handa, C. Morawe, H. Yokoyama, T. Kimura, S. Matsuyam, K. Yamauchi
    Ray-tracing analysis in aberration of a depth-graded multilayer mirror
    Nuclear Instruments and Methods in Physics Reserch A, 616 (2010) 251-254.

  • T. Matsuura, K. Udaka, Y. Oshikane, H. Inoue, M. Nakano, K. Yamauchi, and T. Kataoka
    Spherical concave mirror measurement by phase-shifting point diffraction interferometer with two optical fibers
    Nuclear Instruments and Methods in Physics Reserch A, 616 (2010) 233-236.

  • Y. Terada, H. Yumoto, A. Takeuchi, Y. Suzuki, K. Yamauchi, and T. Uruga
    New X-ray microprobe system for trace heavy element analysis using ultraprecise X-ray mirror optics of long working distance
    Nuclear Instruments and Methods in Physics Reserch A, 616 (2010) 270-272.

  • A. Suvorov, H. Ohashi, S. Goto, K. Yamauchi, and T. Ishikawa
    One-dimensional surface profile retrieval from grazing incidence images under coherent X-ray illumination
    Nuclear Instruments and Methods in Physics Reserch A, 616 (2010) 277-280.

  • Y. Takahashi, Y. Nishino, R. Tsutsumi, N. Zettsu, E. Matsubara, K. Yamauchi, T. Ishikawa
    High-Resolution Projection Image Reconstruction of Thick Objects by Hard X-ray Diffraction Microscopy
    Physical Review B, 82 (2010) 214102.

  • T. Kimura, H. Mimura, S. Handa, H. Yumoto, H. Yokoyam, S. Imai, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Kohmura, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
    Wavefield characterization of nearly diffraction-limited focused hard x-ray beam with size less than 10 nm
    Review of Science Instruments, 81 (2010) 123704.

  • Y. Sano*, Y. Shirasawa, T. Okamoto, and K. Yamauchi
    "Evaluation of Schottky Barrier Diodes Fabricated Directly on Processed 4H-SiC(0001) Surfaces"
    Journal of Nanoscience and Nanotechnology, 11 (2011) 2809-2813

  • H. Mimura*, H. Ishikura, S. Matsuyama, Y. Sano, and K. Yamauchi
    "Electroforming for Replicating Nanometer-Level Smooth Surface"
    Journal of Nanoscience and Nanotechnology, 11 (2011) 2886-2889

  • J. Murata*, Y. Shirasawa, Y. Sano, S. Sadakuni, K. Yagi, T. Okamoto, A. N. Hattori, K. Arima, and K. Yamauchi
    "Improved Optical and Electrical Characteristics of Free-Standing GaN Substrates by Chemical Polishing Utilizing Photo-Electrochemical Method"
    Journal of Nanoscience and Nanotechnology, 11 (2011) 2882-2885

  • T. Okamoto*, Y. Sano, K. Tachibana, K. Arima, A. N. Hattori, K. Yagi, J. Murata, S. Sadakuni, and K. Yamauchi
    "Dependence of Process Characteristics on Atomic-Step Density in Catalyst-Referred Etching of 4H-SiC(0001) Surface"
    Journal of Nanoscience and Nanotechnology, 11 (2011) 2928-2930

  • S. Sadakuni*, J. Murata, K. Yagi, Y. Sano, T. Okamoto, A. Kenta, A. N. Hattori, and K. Yamauchi
    "Efficient Wet Etching of GaN (0001) Substrate with Subsurface Damage Layer"
    Journal of Nanoscience and Nanotechnology, 11 (2011) 2979-2982

  • A. N. Hattori*, T. Okamoto, S. Sadakuni, J. Murata, H. Oi, K. Arima, Y. Sano, K. Hattori, H. Daimon, K. Endo, and K. Yamauchi
    "Structure and Magnetic Properties of Mono- and Bi-Layer Graphene Films on Ultraprecision Figured 4H-SiC(0001) Surfaces"
    Journal of Nanoscience and Nanotechnology, 11 (2011) 2897-2902

  • S. Sadakuni*, J. Murata, K. Yagi, Y. Sano, K. Arima, T. Okamoto, K. Tachibana, and K. Yamauchi
    "Influence of gallium additives on surface roughness for photoelectrochemical planarization of GaN"
    Physica Status Solidi C 8, No. 7?8, 2223-2225 (2011)

  • S. Matsuyama*, N. Kidani, H. Mimura, J. Kim, Y. Sano, K. Tamasaku, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi
    "Development of a one-dimensional Wolter mirror for achromatic full-field X-ray microscopy"
    Proc. SPIE, 8139 (2011) 813905

  • H. Mimura*, T. Kimura, H. Yumoto, H. Yokoyama, H. Nakamori, S. Matsuyama, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa and K. Yamauchi
    "One-dimensional sub-10-nm hard X-ray focusing using laterally graded multilayer mirror"
    Nuclear Instruments and Methods in Physics Reserch A, 635(1) (2011) S16-S18

  • R. Xu*, S. Salha, K. Raines, H. Jiang, C-.C. Chen, Y. Takahashi, Y. Kohmura, Y. Nishino, C. Song, T. Ishikawa, J. Miao
    "Coherent diffraction microscopy at SPring-8: instrumentation, data acquisition and data analysis"
    Journal of Synchrotron Radiation, 18 (2011) 293-298

  • Y. Takahashi*, Y. Nishino, R. Tsutsumi, H. Kubo, N. Zettsu, K. Yamauchi, T. Ishikawa, E. Matsubara
    "Element-specific High-resolution Diffraction Microscopy using Focused Hard X-ray Beam"
    Diamond Light Source Proceedings (SRMS-7 2011), 11 (2011) e136, 1-3

  • Y. Takahashi*, R. Tsutsumi, H. Kubo, Y. Nishino, H. Mimura, S. Matsuyama, T. Ishikawa, K. Yamauchi
    "Development of Coherent X-ray Diffraction Apparatus with Kirkpatrick-Baez Mirror Optics"
    AIP Conference Proceedings (The 10th International Conference on x-ray microscopy), 1365 (2011) 231-234

  • Y. Takahashi*, A. Suzuki, N. Zettsu, Y. Kohmura, Y. Senba, H. Ohashi, K. Yamauchi, T. Ishikawa
    "Towards High-Resolution Ptychographic X-ray Diffraction Microscopy"
    Physical Review B, 83 (2011) 214109

  • Y. Takahashi*, A. Suzuki, N. Zettsu, Y. Kohmura, K. Yamauchi, T. Ishikawa
    "Multiscale element mapping of buried structures by ptychographic x-ray diffraction microscopy using anomalous scattering"
    Applied Physics Letters, 99 (2011) 131905
    Press release (Japanese)

  • K. Yamauchi*, H. Mimura, T. Kimura, H. Yumoto, S. Handa, S. Matsuyama, K. Arima, Y. Sano, K. Yamamura, K. Inagaki, H. Nakamori, J. Kim, K. Tamasaku, Y. Nishino, M. Yabashi, and T. Ishikawa
    "Single-nanometer focusing of hard x-rays by Kirkpatrick?Baez mirrors"
    JOURNAL OF PHYSICS: CONDENSED MATTER, 23 (2011) 394206

  • Y. Sano*, K. Yoshinaga, S. Kamisaka, H. Mimura, S. Matsuyama, and K. Yamauchi
    "Numerically controlled sacrificial plasma oxidation using array-type electrode toward high-throughput deterministic machining"
    International Journal of Nanomanufacturing, 7 (2011) 289-297

  • Y. Sano*, T. Kato, K. Aida, K. Yamamura, H. Mimura, S. Matsuyama, and K. Yamauchi
    "Thinning of 2-inch SiC Wafer by Plasma Chemical Vaporization Machining Using Cylindrical Rotary Electrode"
    Materials Science Forum, 679-680 (2011) 481-484

  • S. Sadakuni*, N. X. Dai, Y. Sano, K. Arima, K. Yagi, J. Murata, T. Okamoto, K. Tachibana, and K. Yamauchi
    "TEM Observation of 8 Deg Off-Axis 4H-SiC (0001) Surfaces Planarized by Catalyst-Referred Etching"
    Materials Science Forum, 679-680 (2011) 489-492

  • T. Okamoto*, Y. Sano, K. Tachibana, K. Arima, A. N. Hattori, K. Yagi, J. Murata, S. Sadakuni, K. Yamauchi
    "Abrasive-Free Planarization of 3-Inch 4H-SiC Substrate Using Catalyst-Referred Etching"
    Materials Science Forum, 679-680 (2011) 493-495

  • Y. Nishino, M. Eltsov, Y. Joti, K. Ito, H. Takata, Y. Takahashi, S. Hihara, A. S Frangakis, N. Imamoto, T. Ishikawa and K. Maeshima*
    "Human mitotic chromosomes consist predominantly of irregularly folded nucleosome fibres without a 30-nm chromatin structure"
    The EMBO Journal, 31 (2012) 1644-1653

  • S. Sadakuni*, J. Murata, Y. Sano, K. Yagi, T. Okamoto, K. Tachibana, H. Asano, and K. Yamauchi
    "Atomically controlled chemical polishing of GaN using platinum and hydrofluoric acid"
    Physica Status Solidi C 9, No. 3-4, 433-435 (2012)

  • H. Nakamori, S. Matsuyama*, S. Imai, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Experimental and simulation study of undesirable short-period deformation in piezoelectric deformable x-ray mirrors"
    Review of Scientific Instruments, 83 (2012) 053701

  • S. Matsuyama*, N. Kidani, H. Mimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Hard-X-ray imaging optics based on four aspherical mirrors with 50 nm resolution"
    Optics Express, 20 (2012) 10310-10319

  • J. Murata*, T. Okamoto, S. Sadakuni, A. N. Hattori, K. Yagi, Y. Sano, K. Arima, and K. Yamauchi
    Atomically Smooth Gallium Nitride Surfaces Prepared by Chemical Etching with Platinum Catalyst in Water
    Journal of Electrochemical Society, 159 (2012) H417-H420

  • T. Okamoto*, Y. Sano, K. Tachibana, B. V. Pho, K. Arima, K. Inagaki, K. Yagi, J. Murata, S. Sadakuni, H. Asano, A. Isohashi, and K. Yamauchi
    "Improvement of Removal Rate in Abrasive-Free Planarization of 4H-SiC Sub-strates Using Catalytic Platinum and Hydrofluoric Acid"
    Japanese Journal of Applied Physics, 51 (2012) 046501

  • Y. Sano*, K. Aida, T. Kato, K. Yamamura, H. Mimura, S. Matsuyama, and K. Yamauchi
    "Cutting of SiC Wafer by Atmospheric-Pressure Plasma Etching With Wire Electrode"
    Materials Science Forum, 717-720 (2012) 865-868

  • B. V. Pho*, S. Sadakuni, T. Okamoto, R. Sagawa, K. Arima, Y. Sano, and K. Yamauchi
    "High-Resolution TEM Observation of 4H-SiC (0001) Surface Planarized by Catalyst-Referred Etching"
    Materials Science Forum, 717-720 (2012) 873-876

  • Y. Sano*, K. Aida, H. Nishikawa, K. Yamamura, S. Matsuyama, K. Yamauchi
    "Back-side thinning of silicon carbide wafer by plasma etching using atmospheric-pressure plasma"
    Key Engineering Materials, 516 (2012) 108-112

  • Y. Sano*, K. Aida, H. Nishikawa, K. Yamamura, S. Matsuyama, K. Yamauchi
    "Plasma Chemical Vaporization Machining of Silicon Carbide Wafer Using Flat-bar Electrode with Multiple Gas Nozzles"
    Advanced Materials Research, 497 (2012) 160-164

  • J. Murata*, S. Sadakuni, T. Okamoto, A. N. Hattori, K. Yagi, Y. Sano, K. Arima, and K. Yamauchi
    "Structural and chemical characteristics of atomically smooth GaN surfaces prepared by abrasive-free polishing with Pt catalyst"
    Journal of Crystal Growth, 349 (2012) 83-88

  • S. Matsuyama*, H. Yokoyama, R. Fukui, Y. Kohmura, K. Tamasaku, M. Yabashi, W. Yashiro, A. Momose, T. Ishikawa, and K. Yamauchi
    "Wavefront measurement for a hard-X-ray nanobeam using single-grating interferometry"
    Optics Express, 20 (2012) 24977-24986

  • T. Osaka*, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, and K. Yamauchi
    "Fabrication of ultrathin Bragg beam splitter by plasma chemical vaporization machining"
    Key Engineering Materials, 523-524 (2012) 40-45

  • H. Asano*, S. Sadakuni, K. Yagi, Y. Sano, S. Matsuyama, T. Okamoto, K. Tachibana, and K. Yamauchi
    "Rapid planarization method by ultraviolet light irradiation for gallium nitride using platinum catalyst"
    Key Engineering Materials, 523-524 (2012) 46-49

  • H. Nakamori*, S. Matsuyama, S. Imai, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Development of an ultraprecise piezoelectric deformable mirror for adaptive X-ray optics"
    Key Engineering Materials, 523-524 (2012) 50-53

  • P. V. Bui*, K. Inagaki, Y. Sano, K. Yamauchi, and Y. Morikawa
    "First-principles study of reaction process of SiC and HF molecules in Catalyst-referred Etching"
    Key Engineering Materials, 523-524 (2012) 173-177

  • J. Kim*, S. Matsuyama, Y. Sano, K. Yamauchi
    "Improvement of interface roughness in platinum/carbon multilayers for X-ray mirrors"
    Key Engineering Materials, 523-524 (2012) 1076-1079

  • J. Kim*, H. Yokoyama, S. Matsuyama, Y. Sano, K. Yamauchi
    "Improved reflectivity of platinum/carbon multilayers for X-ray mirrors by carbon doping into platinum layer"
    Current Applied Physics, 12 (2012) S20-S23

  • P. V. Bui*, K. Inagaki, Y. Sano, K. Yamauchi, and Y. Morikawa
    "Adsorption of hydrogen fluoride on SiC surfaces: A density functional theory study"
    Current Applied Physics, 12 (2012) S42-S46

  • 山内和人*，佐野泰久，有馬健太
    "触媒表面基準エッチングによる単結晶SiC，GaN表面の平滑化"
    精密工学会誌，78 (2012) 947-951

  • 八木圭太*，辻村学，佐野泰久，山内和人
    半導体SiC基板の新しい研磨技術―触媒表面反応を利用した研磨技術の開発―
    日本機械学会誌，115 (2012) 767-771

  • 山内和人*，佐野泰久，有馬健太
    触媒表面基準エッチングによるt何結晶SiC，GaN，ZnO表面の平滑化
    表面科学， 33 (2012) 334-338

  • H. Yumoto*, H. Mimura, T. Koyama, S. Matsuyama, K. Tono, T. Togashi, Y. Inubushi, T. Sato, T. Tanaka, T. Kimura, H. Yokoyama, J. Kim, Y. Sano, Y. Hachisu, M. Yabashi, H. Ohashi, H. Ohmori, T. Ishikawa and K. Yamauchi
    "Focusing of X-ray free-electron laser pulses with reflective optics"
    Nature Photonics, 7 (2012) 43-47
    Press release (Japanese)

  • A. Isohashi*, Y. Sano, T. Okamoto, K. Tachibana, K. Arima, K. Inagaki, K. Yagi, S. Sadakuni, Y. Morikawa, and K. Yamauchi
    "Study on Reactive Species in Catalyst-Referred Etching of 4H-SiC using Platinum and Hydrofluoric Acid"
    Materials Science Forum, 740-742 (2013) 847-850

  • T. Osaka*, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, and K. Yamauchi
    "A Bragg beam splitter for hard x-ray free-electron lasers"
    Optics Express, 21 (2013) 2823-2831

  • H. Nakamori, S. Matsuyama*, S. Imai, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "X-ray nanofocusing using a piezoelectric deformable mirror and at-wavelength metrology methods"
    Nuclear Instruments and Methods in Physics Research Section A, 710 (2013) 93-97

  • Y. Sano*, K. Arima, and K. Yamauchi
    "Planarization of SiC and GaN Wafers Using Polishing Technique Utilizing Catalyst Surface Reaction"
    ECS Journal of Solid State Science and Technology, 2 (2013) N3028-N3035

  • Y. Sano*, H. Nishikawa, K. Aida, C. Tanpatjaroen, K. Yamamura, S. Matsuyama, and K. Yamauchi
    "Basic Experiment on atmospheric-pressure plasma etching with slit aperture for high-efficiency dicing of SiC wafer"
    Materials Science Forum, 740-742 (2013) 813-816

  • P. V. Bui*, S. Sadakuni, T. Okamoto, K. Arima, Y. Sano, and K. Yamauchi
    "Study of Terminated Species on 4H-SiC (0001) Surface Planarized by Catalyst-Referred Etching"
    Materials Science Forum, 740-742 (2013) 510-513

  • S. Sadakuni*, J. Murata, Y. Sano, K. Yagi, S. Matsuyama, and K. Yamauchi
    "Bias-Assisted Photochemical Planarization of GaN(0001) Substrate with Damage Layer"
    Japanese Journal of Applied Physics, 52 (2013) 036504

  • Y. Takahashi*, A. Suzuki, S. Furutaku, K. Yamauchi, Y. Kohmura, and T. Ishikawa
    "High-resolution and high-sensitivity phase-contrast imaging by focused hard x-ray ptychography with a spatial filter"
    Applied Physics Letters, 102 (2013) 094102
    Press release (Japanese)

  • Y. Takahashi*, A. Suzuki, S. Furutaku, K. Yamauchi, Y. Kohmura, and T. Ishikawa
    "Bragg x-ray ptychography of a silicon crystal: Visualization of the dislocation strain field and the production of a vortex beam"
    Physical Review B, 87 (2013) 121201
    Press release (Japanese)

  • T. Osaka*, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, K. Yamauchi
    "Fabrication of a Bragg beam splitter for hard x-ray free-electron lasers"
    Journal of Physics: Conference Series, 425 (2013) 052014

  • K. Ogi*, J. Kim, K. Ono, and N. Uda
    "Impact damage and residual tensile strength of a CF-SMC composite"
    Advanced Composite Materials, 22 (2013) 29-47

  • S. Matsuyama, A. Matsunaga, S. Sakamoto, Y. Iida, Y. Suzuki, Y. Ishizaka, K. Yamauchi, T. Ishikawa, and M. Shimura*
    "Scanning protein analysis of electrofocusing gels using X-ray fluorescence"
    Metallomics, 5 (2013) 492-500

  • T. Kimura, S. Matsuyama, K. Yamauchi, and Y. Nishino*
    "Coherent x-ray zoom condenser lens for diffractive and scanning microscopy"
    Optics Express, 21 (2013) 9267-9276

  • 山内和人*，佐野泰久，有馬健太
    "ウエットエッチングによる原子スケール平坦化　触媒表面基準エッチング法の開発"
    応用物理，82 (2013) 403-406

  • M. Oue, K. Inagaki, K. Yamauchi, and Y. Morikawa*
    "First-principles theoretical study of hydrolysis of stepped and kinked Ga-terminated GaN surfaces"
    Nanoscale Research Letters, 8 (2013) 323

  • T. Koyama*, H. Yumoto, Y. Senba, K. Tono, T. Sato, T. Togashi, Y. Inubushi, T. Katayama, J. Kim, S. Matsuyama, H. Mimura, M. Yabashi, K. Yamauchi, H. Ohashi, and T. Ishikawa
    "Investigation of ablation thresholds of optical materials using 1-um-focusing beam at hard X-ray free electron laser"
    Optics Express, 21 (2013) 15382-15388

  • M. Nakasako*, Y. Takayama, T. Oroguchi, Y. Sekiguchi, A. Kobayashi, K. Shirahama, M. Yamamoto, T. Hikima, K. Yonekura, S. Maki-Yonekura, Y. Kohmura, Y. Inubushi, Y. Takahashi, A. Suzuki, S. Matsunaga, Y. Inui, K. Tono, T. Kameshima, Y. Joti, and T. Hoshi
    "KOTOBUKI-1 apparatus for cryogenic coherent X-ray diffraction imaging"
    Review of Scientific Instruments, 84 (2013) 093705
    Press release (Japanese)

  • 山内和人*
    "X線自由電子レーザー集光技術の現状と将来"
    高圧力の科学と技術，23 (2013) 220-226

  • 高橋幸生*
    "コヒーレントX線回折イメージング"
    高圧力の科学と技術，23 (2013) 237-244

  • S. Matsuyama*, Y. Emi, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Development of achromatic full-field hard X-ray microscopy using four total-reflection mirrors"
    Journal of Physics: Conference Series, 463 (2013) 012017

  • A. Suzuki*, Y. Senba, H. Ohashi, Y. Kohmura, K. Yamauchi, T. Ishikawa, and Y. Takahashi
    "Development of high-accuracy X-ray ptychography apparatus"
    Journal of Physics: Conference Series, 463 (2013) 012039

  • T. Koyama*, H. Yumoto, Y. Senba, K. Tono, T. Sato, T. Togashi, Y. Inubushi, J. Kim, T. Kimura, S. Matsuyama, H. Mimura, M. Yabashi, K. Yamauchi, H. Ohashi, and T. Ishikawa
    "Damage study of optical substrates using 1-um-focusing beam of hard X-ray free-electron laser"
    Journal of Physics: Conference Series, 463 (2013) 012043

  • R. Fukui, J. Kim, S. Matsuyama, H. Yumoto, Y. Inubushi, K. Tono, T. Koyama, T. Kimura, H. Mimura, H. Ohashi, M. Yabashi, T. Ishikawa, and K. Yamauchi*
    A Precision Grazing-incidence Angle Error Measurement of a Hard X-ray Condenser Mirror Using Single-grating Interferometry
    Synchrotron Radiation News, 26 (2013) 13-16

  • T. Osaka*, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, K. Ogawa, S. Matsuyama, T. Ishikawa, K. Yamauchi
    "Thin crystal development and applications for hard x-ray free-electron lasers"
    Proceedings of SPIE, 8848 (2013) 884804

  • J. Kim*, T. Koyama, H. Yumoto, A. Nagahira, S. Matsuyama, Y. Sano, M. Yabashi, H. Ohashi, T. Ishikawa, K. Yamauchi
    Damage characteristics of platinum/carbon multilayers under x-ray free-electron laser irradiation
    Proceedings of SPIE, 8848 (2013) 88480S

  • T. Koyama*, H. Yumoto, K. Tono, T. Sato, T. Togashi, Y. Inubushi, T. Katayama, J. Kim, S. Matsuyama, H. Mimura, M. Yabashi, K. Yamauchi, H. Ohashi
    "Damage threshold investigation using grazing incidence irradiation by hard x-ray free electron laser"
    Proceedings of SPIE, 8848 (2013) 88480T

  • S. Matsuyama*, Y. Emi, H. Kino, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    "Development of achromatic full-field x-ray microscopy with compact imaging mirror system"
    Proceedings of SPIE, 8851 (2013) 885107

  • Y. Takahashi*, A. Suzuki, N. Zettsu, T. Oroguchi, Y. Takayama, Y. Sekiguchi, A. Kobayashi, M. Yamamoto, and M. Nakasako
    Coherent Diffraction Imaging Analysis of Shape-Controlled Nanoparticles with Focused Hard X-ray Free-Electron Laser Pulses
    Nano Lett., 13(12) (2013) 6028-6032
    Press release (Japanese)

  • 山内和人*
    "グローバルCOEプログラムを振り返って―自然現象の精緻さによって製造技術をかえる―"
    精密工学会誌，80 (2014) 47-51

  • A. N. Hattori*, K. Hattori, Y. Morikawa, A. Yamamoto, S. Sadakuni, J. Murata, K. Arima, Y. Sano, K. Yamauchi, H. Daimon, and K. Endo
    "Enhancement of photoluminescence efficiency from GaN(0001) by surface treatments"
    Japanese Journal of Applied Physics, 53 (2014) 021001

  • 松山智至*
    "全反射ミラーを用いた色収差のない結像型硬X線顕微鏡の開発"
    日本放射光学会誌，27 (2014) 39-46

  • A. Suzuki, S. Furutaku, K. Shimomura, K. Yamauchi, Y. Kohmura, T. Ishikawa, and Y. Takahashi*
    "High-resolution Multi-slice X-ray Ptychography of Extended Thick Objects"
    Physical Review Letters, 112 (2014) 053903
    Press release (Japanese)

  • K. Tamasaku*, E. Shigemasa, Y. Inubushi, T. Katayama, K. Sawada, H. Yumoto, H. Ohashi, H. Mimura, M. Yabashi, K. Yamauchi, and T. Ishikawa
    "X-ray two-photon absorption competing against single and sequential multiphoton processes"
    Nature Photonics, 8 (2014) 313-316
    Press release (Japanese)

  • A. Isohashi*, Y. Sano, S. Sadakuni, and K. Yamauchi
    "4H-SiC planarization using catalyst-referred etching with pure water"
    Materials Science Forum, 778-780 (2014) 722-725

  • P. V. Bui*, K. Inagaki, Y. Sano, K. Yamauchi, and Y. Morikawa
    "Investigation of the Barrier Heights for Dissociative Adsorption of HF on SiC Surfaces in the Catalyst-Referred Etching Process"
    Materials Science Forum, 778-780 (2014) 726-729

  • Y. Okada*, H. Nishikawa, Y. Sano, K. Yamamura, and K. Yamauchi
    "Thinning of a two-inch silicon carbide wafer by plasma chemical vaporization machining using a slit electrode"
    Materials Science Forum, 778-780 (2014) 750-753

  • Y. Sano*, H. Nishikawa, Y. Okada, K. Yamamura, S. Matsuyama, and K. Yamauchi
    "Dicing of SiC wafer by atmospheric-pressure plasma etching process with slit mask for plasma confinement"
    Materials Science Forum, 778-780 (2014) 759-762

  • W. Yamaguchi*, S. Sadakuni, A. Isohashi, H. Asano, Y. Sano, M. Imade, M. Maruyama, M. Yoshimura, Y. Mori, and K. Yamauchi
    "Planarization of the gallium nitride substrate grown by the Na flux method applying catalyst-referred etching"
    Materials Science Forum, 778-780 (2014) 1193-1196

  • H. Mimura*, H. Yumoto, S. Matsuyama, T. Koyama, K. Tono, Y. Inubushi, T. Togashi, T. Sato, J. Kim, R. Fukui, Y. Sano, M. Yabashi, H. Ohashi, T. Ishikawa, and K. Yamauchi
    "Generation of 1020 W/cm2 Hard X-ray Laser Pulses with Two-Stage Reflective Focusing System"
    Nature Communications, 5 (2014) 3539
    Media release (Japanese)

  • R. Xu, H. Jiang, C. Song, J. A. Rodriguez, Z. Huang, C.-C. Chen, D. Nam, J. Park, M. Gallagher-Jones, Sangsoo Kim, Sunam Kim, A. Suzuki, Y. Takayama, T. Oroguchi, Y. Takahashi, J. Fan, Y. Zou, T. Hatsui, Y. Inubushi, T. Kameshima, K. Yonekura, K. Tono, T. Togashi, T. Sato, M. Yamamoto, M. Nakasako, M. Yabashi, T. Ishikawa, and J. Miao*
    "Single-shot three-dimensional structure determination of nanocrystals with femtosecond X-ray free-electron laser pulses"
    Nature Communications, 5 (2014) 4061

  • T. K. Doi*, Y. Sano, S. Kurokawa, H. Aida, O. Ohnishi, M. Uneda, and K. Ohyama
    "Novel Chemical Mechanical Polishing/Plasma-Chemical Vaporization Machining (CMP/P-CVM) Combined Processing of Hard-to-Process Crystals Based on Innovative Concepts"
    Sensors and Materials, 26 (6) (2014) 403-415

  • Y. Sano*, T. K. Doi, S. Kurokawa, H. Aida, O. Ohnishi, M. Ueda, K. Shiozawa, Y. Okada, and K. Yamauchi
    "Dependence of GaN Removal Rate of Plasma Chemical Vaporization Machining on Mechanically Introduced Damage"
    Sensors and Materials, 26 (6) (2014) 429-434

  • H. Yoneda*, Y. Inubushi, M. Yabashi*, T. Katayama, T. Ishikawa, H. Ohashi, H. Yumoto, K. Yamauchi, H. Mimura, and H. Kitamura
    "Saturable absorption of intense hard X-rays in iron"
    Nature Communications, 5 (2014) 5080

  • N. Saito, D. Mori, A. Imafuku, K. Nishitani, H. Sakane, K. Kawai, Y. Sano, M. Morita, and K. Arima*
    "Aggregation of Carbon Atoms on SiO2/SiC(0001) Interface by Plasma Oxidation toward Formation of Pit-free Graphene"
    Carbon, 80 (2014) 440-445

  • N. Saito, D. Mori, A. Imafuku, K. Kawai, Y. Sano, M. Morita, and K. Arima*
    "Behaviors of Carbon Atoms during Plasma Oxidation of 4H-SiC(0001) Surfaces near Room Temperature"
    ECS Transactions, 64(17) (2014) 23-28

  • 鈴木明大, 高橋幸生
    "マルチスライス法を利用した高分解能X線タイコグラフィー"
    Isotope News, 725 (2014) 12-14

  • S. Matsuyama*, Y. Emi, H. Kino, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Development of achromatic full-field hard x-ray microscopy and its application to x-ray absorption near edge structure spectroscopy"
    Proceedings of SPIE, 9207 (2014) 92070Q

  • T. Goto, S. Matsuyama*, H. Nakamori, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Development of a one-dimensional two-stage focusing system with two deformable mirrors"
    Proceedings of SPIE, 9208 (2014) 920802

  • T. Osaka*, T. Hirano, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, K. Ogawa, S. Matsuyama, T. Ishikawa, and K. Yamauchi
    "Development of split-delay x-ray optics using Si(220) crystals at SACLA"
    Proceedings of SPIE, 9210 (2014) 921009

  • Y. Sano*, T. Doi, S. Kurokawa, H. Aida, O. Ohnishi, M. Uneda, Y. Okada, H. Nishikawa, and K. Yamauchi
    "Basic Study on Etching Selectivity of Plasma Chemical Vaporization Machining by Introducing Crystallographic Damage into Work Surface"
    Key Engineering Materials, 625 (2014) 550-553

  • H. Matsui*, F. Matsui, N. Maejima, T. Matsushita, T. Okamoto, A. N. Hattori, Y. Sano, K. Yamauchi, and H. Daimon
    "Local atomic configuration of graphene, buffer layer, and precursor layer on SiC(0001) by photoelectron diffraction"
    Surface Science, 632 (2015) 98-102

  • H. Takei*, K. Yoshinaga, S. Matsuyama, K. Yamauchi, and Y. Sano
    "Numerically controlled atmospheric-pressure plasma sacrificial oxidation using electrode arrays for improving silicon-on-insulator layer uniformity"
    Japanese Journal of Applied Physics, 54(1S) (2015) 01AE03

  • T. Goto, H. Nakamori, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi, and S. Matsuyama*
    "Hard X-ray nanofocusing using adaptive focusing optics based on piezoelectric deformable mirrors"
    Review of Scientific Instruments, 86 (2015) 043102

  • S. Matsuyama*, Y. Emi, H. Kino, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Achromatic and high-resolution full-field X-ray microscopy based on total-reflection mirrors"
    Optics Express, 23(8) (2015) 9746-9752

  • K. Yamauchi*, M. Yabashi, H. Ohashi, T. Koyama, and T. Ishikawa
    "Nanofocusing of X-ray free-electron lasers by grazing-incidence reflective optics"
    Journal of Synchrotron Radiation, 22 (2015) 592-598
    Press release (Japanese)

  • Z. Huang, M. Bartels, R. Xu, M. Osterhoff, S. Kalbfleisch, M. Sprung, A. Suzuki, Y. Takahashi, T. N. Blanton, T. Salditt and J. Miao*
    "Grain rotation and lattice deformation during photoinduced chemical reactions revealed by in situ X-ray nanodiffraction"
    Nature Materials 14 (2015) 691-695
    Press release (Japanese)

  • T. Koyama*, H. Yumoto, K. Tono, T. Togashi, Y. Inubushi, T. Katayama, J. Kim, S. Matsuyama, M. Yabashi, K. Yamauchi and H. Ohashi
    "Damage to inorganic materials illuminated by focused beam of X-ray free-electron laser radiation"
    Proceedings of SPIE, 9511 (2015) 951107

  • A. Suzuki and Y. Takahashi*
    "Dark-field X-ray ptychography"
    Optics Express, 23(12) (2015) 16429-16438

  • K. Shimomura, A. Suzuki, M. Hirose and Y. Takahashi*
    "Precession X-ray Ptychography with Multislice Approach"
    Physical Review B, 91 (2015) 214114

  • H. Yoneda*, Y. Inubushi, K. Nagamine, Y. Michine, H. Ohashi, H. Yumoto, K. Yamauchi, H. Mimura, H. Kitamura, T. Katayama, T. Ishikawa and M. Yabashi
    "Atomic inner-shell laser at 1.5-ångström wavelength pumped by an X-ray free-electron laser"
    Nature, 524 (2015) 446-449
    News & Views in Nature
    Press release (Japanese) Media release (Japanese)

  • L. Szyrwiel*, M. Shimura*, J. Shirataki, S. Matsuyama, A. Matsunaga, B. Setner, Szczukowski, Z. Szewczuk, K. Yamauchi, W. Malinka, L. Chavatte and R. Lobinski
    "A novel branched TAT 47-57 peptide for selective Ni 2+ introduction into the human fibrosarcoma cell nucleus"
    Metallomics, 7(7) (2015) 1155-1162

  • J. Yamada, S. Matsuyama*, Y. Sano and K. Yamauchi
    "Development of ion beam figuring system with electrostatic deflection for ultraprecise X-ray reflective optics"
    Review of Scientific Instruments, 86 (2015) 093103

  • J. Kim*, A. Nagahira, T. Koyama, S. Matsuyama, Y. Sano, M. Yabashi, H. Ohashi, T. Ishikawa and K. Yamauchi
    "Damage threshold of platinum/carbon multilayers under hard X-ray free-electron laser irradiation"
    Optics Express, 23(22) (2015) 29032-29037

  • K. P Khakurel, T. Kimura, Y. Joti, S. Matsuyama, K. Yamauchi and Y. Nishino*
    "Coherent diffraction imaging of non-isolated object with apodized illumination"
    Optics Express, 23(22) (2015) 28182-28190

  • T. Sakao*, S. Matsuyama, A. Kime, T. Goto, A. Nishihara, H. Nakamori, K. Yamauchi, Y. Kohmura, A. Miyake, H. Hashizume, T. Maezawa, Y. Suematsu and N. Narukage
    "Development of precision Wolter mirrors for future solar x-ray observations"
    Proceedings of SPIE, 9603 (2015) 96030U

  • S. Matsuyama*, H. Kino, S. Yasuda, Y, Kohmura, H. Ohashi, T. Ishikawa and K. Yamauchi
    "Development of achromatic full-field hard x-ray microscopy with two monolithic imaging mirrors"
    Proceedings of SPIE, 9592 (2015) 959208

  • T. Pikuz*, A. Faenov, T. Matsumoto, S. Matsuyama, K. Yamauchi, N. Ozaki, B. Albertazzi, Y. Inubushi, M. Yabashi, K. Tono, Y. Sato, H. Yumoto, H. Ohashi, S. Pikuz, A. N. Grum-Grzhimailo, M. Nishikino, T. Ishikawa and R. Kodama
    "3D visualization of XFEL beam focusing properties using LiF crystal X-ray detector"
    Scientific Reports, 5 (2015) 17713

  • T. Kawase, Y. Saito, A. Mura, T. Okamoto, K. Kawai, Y. Sano, M. Morita, K. Yamauchi and K. Arima*
    "Catalyst-Assisted Electroless Flattening of Ge Surfaces in Dissolved-O2-Containing Water"
    ChemElectroChem, 2 (2015) 1656-1659

  • P. V. Bui, A. Isohashi, H. Kizaki, Y. Sano, K. Yamauchi*, Y. Morikawa* and K. inagaki
    "Study on the mechanism of platinum-assisted hydrofluoric acid etching of SiC using density functional theory calculations"
    Applied Physics Letters, 107 (2015) 201601

bold: authors who belong to Yamauchi Lab., *: corresponding author(s)