International Conference

  • K. Yamauchi (invited)
    Mirror optics of beam delivery & spectrometers
    European XFEL Users' Meeting (Jan, DESY, Humburg, Germany)

  • H. Takei, S. Kurio, Y. Sano, S. Matsuyama, and K. Yamauchi
    Numerically controlled sacrificial oxidation using atmospheric-pressure plasma to improve SOI layer uniformity
    8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing (ICRP-8/SPP-31), 4P-PM-S07-P08 (4-7 Feb, Fukuoka, Japan)

  • K. Yamauchi (invited), M. Yabashi, H. Mimura, H. Yumoto, T. Koyama, K. Tono, T. Togashi, Y. Inubushi, T. Sato, T. Katayama, S. Matsuyama, J. Kim, R. Fukui, Y. Sano, W. Yashiro, T. Ohmori, S. Goto, H. Ohashi, A. Momose, and T. Ishikawa
    Nanofocusing and single shot wavefront diagnosis of SACLA
    SPIE Optics+Optelectronics, Technical Abstracts, pp. 105, 8778-14 (17-18 Apr, Clarion Congress Hotel, Prague, Czech)

  • Y. Takahashi(invited)
    High-resolution and High-sensitivity X-ray Ptychography Using Focused Hard X-ray Beam
    International conference on the state and future of ptychography (5-7 May, Hohenkammer, Germany)

  • A. Suzuki, S. Furutaku, K. Yamauchi, Y. Kohmura, T. Ishikawa, and Y. Takahashi
    Multimode X-ray Ptychography: Complementary Use of Focused and Defocused X-ray Beams
    International conference on the state and future of ptychography (5-7 May, Hohenkammer, Germany)

  • K. Yamauchi (invited)
    Progress on mirror-based optical systems for XFEL science
    The 25th Synchrotron Radiation User's Workshop, (Aug. Pohan, Korea)

  • H. Nakamori, S. Matsuyama, S. Imai, T. Goto, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of ultra-precise piezoelectric deformable mirrors for x-ray nanofocusing
    SPIE Optics+Photonics, Technical Program, p182, 8848-2 (26-29 Aug, San Diego, USA)

  • T. Osaka, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, K. Yamauchi
    Thin crystal development and applications for hard x-ray free-electron lasers
    SPIE Optics+Photonics, Technical Program, p182, 8848-3 (26-29 Aug, San Diego, USA)

  • J. Kim, T. Koyama, H. Yumoto, A. Nagahira, S. Matsuyama, Y. Sano, M. Yabashi, H. Ohashi, T. Ishikawa, K. Yamauchi
    Damage characteristics of platinum/carbon multilayers under focused x-ray free-electron laser irradiation
    SPIE Optics+Photonics, Technical Program, p183, 8848-26 (26-29 Aug, San Diego, USA)

  • S. Matsuyama (invited), Y. Emi, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of full-field hard x-ray microscopy with four aspherical mirrors
    SPIE Optics+Photonics, Technical Program, p190, 8851-6 (26-29 Aug, San Diego, USA)

  • Y. Takahashi (invited)
    High-resolution ptychographic imaging
    22nd International Congress on X-ray Optics and Microanalysis (2-6 Sep, Hamburg, Germany)

  • Y. Sano (invited), K. Arima, and K. Yamauchi
    Planarization of GaN Wafer Using Novel Polishing Technique Utilizing Catalyst Surface Reaction
    2013 JSPA-MRS Joint Symposia, Symposium J, 17p-M6-5 (16-19 Sep, Kyoto, Japan)

  • A. Isohashi, Y. Sano, S. Sadakuni, K. Yamauchi
    Chemical Etching of 4H-SiC using Catalyst-referred etching with pure water
    The International Conference on Silicon Carbide and Related Materials, Th-3A-02 (29 Sep - 4 Oct, Miyazaki, Japan)

  • Y. Okada, H. Nishikawa, Y. Sano, K. Yamamura, K. Yamauchi
    Thinning of a two-inch silicon carbide wafer by plasma chemical vaporization machining using a slit electrode
    The International Conference on Silicon Carbide and Related Materials, Th-3A-04 (29 Sep - 4 Oct, Miyazaki, Japan)

  • Y. Sano, H. Nishikawa, Y. Okada, K. Yamamura, S. Matsuyama, and K. Yamauchi
    Dicing of SiC Wafer by Atmospheric-Pressure Plasma Etching Process with Slit Mask for Plasma Confinement
    The International Conference on Silicon Carbide and Related Materials, Th-P-23 (29 Sep - 4 Oct, Miyazaki, Japan)

  • P. V. Bui, K. Inagaki, Y. Sano, K. Yamauchi, and Y. Morikawa
    Barrier Heights Investigation of Dissociative Adsorption of HF on SiC
    The International Conference on Silicon Carbide and Related Materials, Th-P-25 (29 Sep - 4 Oct, Miyazaki, Japan)

  • W. Yamaguchi, S. Sadakuni, A. Isohashi, H. Asano, Y. Sano, M. Imade, M. Maruyama, M. Yoshimura, Y. Mori, K. Yamauchi
    Planarization of the gallium nitride substrate grown by the Na flux method applying the catalyst-referred etching
    The International Conference on Silicon Carbide and Related Materials, We-P-59 (29 Sep - 4 Oct, Miyazaki, Japan)

  • K. Yamauchi (invited)
    Nanofocusing of X-ray free electron laser for coherent X-ray science
    X-ray lasers in biology (14-15 Oct, The Royal Society, London, UK)

  • Y. Sano (invited)
    Planarization of Gallium Nitride Wafers Using Novel Polishing Technique Utilizing Catalyst Surface Reaction
    WUPP for III-Nitride (Workshop on Ultra-Precision Processing for III-Nitride), 2013 (16-18 Oct, Santa Barbara, USA)

  • A. Isohashi, Y. Sano, T. Okamoto, S. Sadakuni, P. V. Bui, K. Yagi, and K. Yamauchi
    Wet Chemical Planarization of Single-Crystalline SiC Using Catalyst-Referred Etching
    28th The American Society for Precision Engineering Annual Meeting, Extended Abstracts, pp153-156 (20-25 Oct, St. Paul, USA)

  • T. Osaka, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, and K. Yamauchi
    Fabrication of Thin Si Crystal for X-Ray Beam Splitter
    28th The American Society for Precision Engineering Annual Meeting, Extended Abstracts, pp239-242 (20-25 Oct, St. Paul, USA)

  • Y. Emi
    Development of a full-field hard X-ray imaging microscope based on Advanced Kirkpatrick-Baez mirror optics
    The MEADOW 2013 (MEtrology, Astronomy, Diagnostics and Optics Workshop), (28-30 Oct, Trieste, Italy)

  • K. Yamauchi
    Adaptive focusing optics of hard X-rays with piezoelectric deformable KB mirrors
    The MEADOW 2013 (MEtrology, Astronomy, Diagnostics and Optics Workshop), (28-30 Oct, Trieste, Italy)

  • A. Kime
    Development of an X-ray slope profiler for Wolter type telescope mirrors - Performance evaluation using geometric and wave-optical simulator
    The MEADOW 2013 (MEtrology, Astronomy, Diagnostics and Optics Workshop), (28-30 Oct, Trieste, Italy)

  • Y. Sano (invited), K. Arima, and K. Yamauchi
    Abrasive-Free Polishing of SiC Wafer Utilizing Catalyst Surface Reaction
    224th ECS (The Electrochemical Society) Meeting, 1952 (27 Oct-01 Nov, San Francisco, CA, USA)

  • Y. Sano, T. Doi, S. Kurokawa, H. Aida, O. Ohnishi, M. Ueda, Y. Okada, H. Nishikawa, and K. Yamauchi
    Basic Study on Etching Selectivity of Plasma Chemical Vaporization Machiningby Introducing Crystallographic Damage into Work Surface
    5th International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN2013), 1207 (12-15 Nov, Taipei, Taiwan)

  • Y. Takahashi (invited)
    High-resolution ptychography using focused hard X-ray beam
    The 12th symposium on X-ray Imaging Optics, Abstract pp. 37-38, O-22 (18-20 Nov, Osaka, Japan)

  • S. Matsuyama (invited)
    Development of achromatic full-field hard X-ray microscopy using four total-reflection mirrors
    The 12th symposium on X-ray Imaging Optics, Abstract pp. 51-52, O-29 (18-20 Nov, Osaka, Japan)

  • Y. Emi, S. Matsuyama, H. Kino, Y. Kohmura, T. Ishikawa, and K. Yamauchi
    Development of a High-resolution Full-field Hard X-ray Imaging Microscope with Compact AKB Mirror Optics
    The 12th symposium on X-ray Imaging Optics, Abstract pp. 67-68, P-11 (18-20 Nov, Osaka, Japan)

  • H. Kino, S. Matsuyama, Y. Emi, H. Okada, Y. Sano, and K. Yamauchi
    Development of one-dimensional Wolter Mirror figured on a single substrate for full-field X-ray microscopy
    The 12th symposium on X-ray Imaging Optics, Abstract pp. 93-94, P-25 (18-20 Nov, Osaka, Japan)

  • R. Fukui, J. Kim, S. Matsuyama, H. Yumoto, Y. Inubushi, K. Tono, T. Koyama, T. Kimura, H. Mimura, H. Ohashi, M. Yabashi, T. Ishikawa, and K. Yamauchi
    Single-shot wavefront measurement of XFEL nanobeam
    The 12th symposium on X-ray Imaging Optics, Abstract pp. 97-98, P-27 (18-20 Nov, Osaka, Japan)

  • H. Nakamori, S. Matsuyama, T. Goto, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi
    Two-dimensional X-ray nanofocusing using piezoelectric deformable mirrors
    The 12th symposium on X-ray Imaging Optics, Abstract pp. 99-100, P-28 (18-20 Nov, Osaka, Japan)

  • K. Yamauchi (invited)
    Recent progress of the K-B nano-focusing system
    ALBA-SSRF Bilateral Workshop (16-18 Dec. Shanghai, China)