International Conference

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  • Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, A. Saito,Y. Sano, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku and T. Ishikawa, M. Shimura, and Y. Ishizaka
    Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy
    Proc. SPIE, San Diego (2003).

  • Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku and T. Ishikawa
    Developement of figure correction method having spatial resolution close to 0.1mm.
    Proc. SPIE 4, San Diego (2003).

  • Yuzo Mori, Kazuya Yamamura, Katsuyoshi Endo, Kazuto Yamauchi, Kiyoshi Yasutake, Hidekazu Goto, Hiroaki Kakiuchi, Yasuhisa Sano, Hidekazu Mimura
    Creation of perfect surfaces
    The 14th international conference on crystal growth

  • K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, S. Matsuyama, H. Yumoto, K. Ueno, M. Shibahara, K. Endo, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and Y. Mori
    Fabrication technology of ultraprecise mirror optics to realize hard X-ray nanobeam
    Proc. of SPIE, 5533, Denver, 116 (2004).

  • H. Mimura, H. Yumoto, K. Yamamura, Y. Sano, S. Matsuyama, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and K. Yamauchi
    Microstitching Interferometry for hard X-ray nanofocusing mirrors
    Proc. of SPIE, 5533, 171 Denver, (2004).

  • S. Matsuyama, H. Mimura, K. Yamamura, H. Yumoto, Y. Sano, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and K. Yamauchi
    Wave-optical and ray-tracing analysis to establish a two dimensional focusing unit using K-B arrangement
    Proc. of SPIE, 5533, Denver, 181 (2004).

  • Y. Ichii, K. Yagi, T. Ono, H. Goto, K. Inagaki, K. Yamauchi, K. Endo, Y. Mori and K. Hirose
    First-Principles Molecular-Dynamics Simulations of Electrochemical Etching Process on Al(001) Cathode Surface
    The 7th Asian Workshop on First-Principles Electronic Structure Calculations, pp. 84-84, (November 1-3, 2004 Taipei, Taiwan).

  • K. Yagi, Y. Ichii, T. Ono, H. Goto, K. Inagaki, K. Yamauchi, K. Endo, Y. Mori and K. Hirose
    First-Principles Molecular-Dynamics Simulations of Dissociation Process of Water Molecule by Catalytic Reaction of Ion-Exchange Group
    The 7th Asian Workshop on First-Principles Electronic Structure Calculations, pp. 140-140, (November 1-3, 2004 Taipei, Taiwan).

  • K. Yamauchi
    Surface figure metrology of X-ray mirrors using optical interferometry
    Production Metrology for Precision Surface

  • H. Mimura
    Development of hard X-ray nanofocusing system using ultraprecisely figured mirrors at SPring-8
    The 9th SPring-8, ESRF, APS Workshop

  • H. Mimura
    Development of surface figuring and smoothing technologies for ultraprecise X-ray mirror fabrication at Osaka university.
    The 9th SPring-8, ESRF, APS Workshop

  • K. Arima, K. Yamauchi, H. Mimura, A. Kubota, K. Inagaki, Y. Mori and K. Endo
    Atomic-Scale Evaluation of Si(001) Surfaces Finished by Novel Global Planarization Process
    13th International Conference on Scanning Tunneling Microscopy/Spectroscopy and Related Techniques (STM'05) (July 3-8, 2005 Sapporo Convention Center, Japan), 335.

  • J. Katoh, A. Kubota, H. Mimura, K. Yamauchi, K. Arima, K. Inagaki, Y. Mori and K. Endo
    Investigation of machining mechanism in Elastic Emission Machining (EEM) on the atomic scale
    13th International Conference on Scanning Tunneling Microscopy/Spectroscopy and Related Techniques (STM'05) (July 3-8, 2005 Sapporo Convention Center, Japan), 89.

  • M. Shibahara, K. Yamamura, Y. Sano, T. Sugiyama, K. Endo and Y. Mori
    Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM
    Proc. SPIE 5869, 58690I (July 31- August 4, 2005 San Diego, USA).

  • S. Matsuyama, H. Mimura, H, Yumoto, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Hard x-ray nanofocusing at 40-nm level using K-B mirror optics for nanoscopy/spectroscopy
    Proc. SPIE 5918, 591804 (July 31- August 4, 2005 San Diego, USA).

  • Y. Higashi, Y. Takaie, K. Endo, T. Kume, K. Enami, K. Yamauchi, K. Yamamura, Y. Sano, K. Ueno, Y. Mori
    A new designed ultra-high precision profiler
    Proc. SPIE 5921, 592107 San Diego (July 31- August 4, 2005 San Diego, USA).

  • H. Mimura, H, Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Surface figuring and measurement methods with spatial resolution close to 0.1 mm for x-ray mirror fabrication
    Proc. SPIE 5921, 59210M (July 31- August 4, 2005 San Diego, USA).

  • Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
    Scanning hard-X-ray microscope with spatial resolution better than 50nm using K-B mirror optics
    Program and Abstracts, 8th International Conference on X-ray Microscopy, 109 (July 26-30, 2005 Himeji, Japan).

  • Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
    Hard X-ray diffraction-limited nanofocusing with unprecedentedly accurate mirrors
    Program and Abstracts, 8th International Conference on X-ray Microscopy, 26 (July 26-30, 2005 Himeji, Japan).

  • Yasuo Higashi, Yuichi Takaie, Katsuyoshi Endo, Tatsuya Kume, Kazuhiro Enami, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano, Kenji Ueno, Yuzo Mori
    A New Designed Ultra-high Precision Profiler - Study on slope error measurement of a mandrel for Wolter type-I mirror fabrication -
    Program and Abstracts, 8th International Conference on X-ray Microscopy, 264 (July 26-30, 2005 Himeji, Japan).

  • Y. Sano, K. Yamamura, K. Endo, Y. Mori
    Plasma Chemical Vaporization Machining (PCVM)
    Book of Lecture Note, IWCGT-3, 305-316 (September 10-18, 2005 Beatenberg, Switzerland).

  • K. Yamauchi, H. Mimura, K. Endo, Y. Mori
    Elastic Emission Machining (EEM)
    Book of Lecture Note, IWCGT-3, 317-326 (September 10-18, 2005 Beatenberg, Switzerland).

  • H. Mimura, H. Yumoto, S. Matsuyama, H. Hara, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi
    Stitching Interferometry for Surface Figure Measurement of X-ray Reflective Optics
    The 89th OSA Annual Meeting, 2005 Frontiers in Optics/Laser Science conferences (October 16-20, 2005, Tuscon, Arizona, USA).

  • H. Yumoto, H. Mimura, S. Matsuyama, H. Hara, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi
    Focusing Hard X-rays to Sub-50 nm Size by Elliptically Figured Mirror
    The 89th OSA Annual Meeting, 2005 Frontiers in Optics/Laser Science conferences (October 16-20, 2005, Tuscon, Arizona, USA)

  • K. Yamauchi, H. Mimura, T. Matsuyama, H. Yumoto, K. Yamamura, Y. Sano, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, and Y. Mori
    Development of Elliptical Kirkpatrick-Baez Mirrors for Hard X-ray Nanofocusing
    The 89th OSA Annual Meeting, 2005 Frontiers in Optics/Laser Science conferences (October 16-20, 2005, Tuscon, Arizona,USA)

  • Y. Ichii, Y. Mori, H. Hirose, K. Endo, K. Yamauchi, K. Yagi and H. Goto
    Electrochemical Etching Using Surface Modified Graphite Electrodes in Ultrapure Water
    Proceedings of ACEC2005 (The 5th Asian Conference on Electrochemistry), Shanghai, China, 1P14, (2005).

  • K. Yamamura, Y. Sano, M. Shibahara, K. Yamauchi, H. Mimura, K. Endo
    Ultra precision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma
    Proc. ICRP6/SPP23, Sendai, Japan, 81-82, (2006)

  • Kenta Arima, Kazuto Yamauchi, Hidekazu Mimura, Akihisa Kubota, Kouji Inagaki, Yuzo Mori, and Katsuyoshi Endo
    Atomic-level STM analyses of Si(001) surfaces prepared in aqueous environment
    Abstract Book of 33rd Conference on the Physics & Chemistry of Semiconductor Interfaces, Florida, USA, Mo1355, (2006).

  • Y. Sano, M. Watanabe, K. Yamamura, K. Yamauchi, T. Ishida, K. Arima, A. Kubota, and Y. Mori
    Polishing characteristics of silicon carbide by plasma chemical vaporization machining
    Proc. ICRP-6/SPP-23, 303-304 (January 24-27, 2006, Matsushima, Japan).

  • Yoshio Ichii and Hidekazu Goto
    Development of Low-emission Chemical Etching Method for Nano-structure Fabrication on Silicon
    Handai Nanoscience and Nanotechnology International Symposium, p.95 (Osaka, January, 30th 2006)

  • Y. Sano, K. Yamamura, H. Mimura, K. Yamauchi, A. Kubota, and Y. Mori
    Cutting of functional materials by plasma chemical vaporization machining with inner-diameter blade electrode
    Proc. ICRP-6/SPP-23, 305-306 (January 24-27, 2006, Matsushima, Japan).

  • Yoshio Ichii and Hidekazu Goto
    Development of Low-emission MEMS Process
    4th ISE(The International Society of Electrochemistry) Spring Meeting 2006, P.167 (Singapore, April, 17th to 20th, 2006)

  • Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Soichiro Handa,Keiko Katagishi, Akihiko Shibatani, Kazuya Yamamura, Yasuhisa Sano,Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa and Kazuto Yamauchi
    Development of K-B Mirror Manipulator for Hard X-ray Sub-50nm Focusing
    International Workshop on Mechanical Engineering Design of Synchrotron Radiation Equipment and Instrumentation 2006 (MEDSI2006), (May 24 - 26, 2006, Hygo, Japan)

  • H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, and K. Yamauchi
    Development of Surface Measurement Technologies for Hard X-ray Nanofocusing Mirror at Osaka University and SPring-8
    The 3rd International Workshop on Metrology for X-ray Optics, (May 27-May 28, 2006, Daegu, Korea).

  • K. Yamauchi, H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa(Invited)
    Hard X-ray Focusing less than 50nm for Nanoscopy/spectroscopy
    SRI2006(The Ninth International Conference on Synchrotron Radiation Instrumentation), (May 28-June 2, 2006, Daegu, Korea).

  • Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Soichiro Handa, Akihiko Shibatani, Keiko Katagishi, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, and Kazuto Yamauchi
    Fabrication of X-ray Mirror for Hard X-ray Diffraction Limited Nanofocusing
    SRI2006(The Ninth International Conference on Synchrotron Radiation Instrumentation) EP-095 (May 28-June 2, 2006, Daegu, Korea).

  • Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Keiko Katagishi, Soichiro Handa, Akihiko Shibatani, Yasuhisa Sano, Kazuya Yamamura, Katsuyoshi Endo, Yuzo Mori, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa and Kazuto Yamauchi
    Development of a Scanning X-ray Fluorescence Microscope Using Size-Controllable Focused X-ray Beam from 50 to 1500nm
    The 9th International Conference on Synchrotron Radiation Instrumentation (SRI 2006), (May 28 - June 03, Deagu, Korea)

  • K. Yamauchi, H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, Y. Sano, K. Yamamura, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa(Invited)
    Diffraction-limited X-ray nanobeam with KB mirrors
    ERL X-ray Science Workshops 6, Workshop on New Science Opportunities with Nanometer-Sized X-Ray Beams, (June23, June24, 2006, Ithaka, NewYork, USA).

  • H. Mimura and K. Yamauchi
    Hard X-ray nano-focusing with ultraprecisely figured mirrors, ESRF, APS, SPring-8
    The 10 the Three-Way Meeting (June19-June21 2006, ESRF, Grenoble, France).

  • H. Mimura, H. Yumoto, S. Matsuyama, S. Handa, Y. Sano, K. Yamamura, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
    Hard X-ray focusing with a beam size less than 30 nm by total reflection mirror
    ERL X-ray Science Workshops 6, Workshop on New Science Opportunities with Nanometer-Sized X-Ray Beams, (June23-June24, 2006, Ithaca, NewYork, USA).

  • Yasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi, Akihisa Kubota and Yuzo Mori
    Fabrication of ultra thin and highly uniform silicon-on-insulator by numerically controlled plasma chemical vaporization machining
    8th Asia-Pacific Conference on Plasma Science and Technology and 19th Symposium on Plasma Science for Materials (APCPST-8/SPSM-19), (2-5th July, 2006, Cairns, Australia)

  • H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, A. Shibatani, K. Katagishi, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, and K. Yamauchi
    Waveoptical simulation for designing and evaluating hard X-ray nanofocusing mirror
    Proc. SPIE Vol.6317, 631718 (2006). (August 13-17 2006, San Diego, California USA).

  • Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Soichiro Handa, Akihiko Shibatani, Keiko Katagishi, Yasuhisa Sano, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, and Kazuto Yamauchi
    At-wavelength figure metrology of total reflection mirrors in hard x-ray region
    Proc. SPIE Vol.6317, 631709 (2006). (August 13-17 2006, San Diego, California USA).

  • Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Souichiro Handa, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, and Kazuto Yamauchi
    Fabrication of ultraprecisely figured mirror for nano focusing hard-x-ray
    The 11th International Conference on Precision Engineering (ICPE), 295-300 (August 16-18, 2006, Tokyo, Japan)

  • Hideyuki Hara, Yasuhisa Sano, Hidekazu Mimura, Kenta Arima, Akihisa Kubota, Keita Yagi, Junji Murata and Kazuto Yamauchi
    Novel abrasive-free planarization of Si and SiC using catalyst
    The 11th International Conference on Precision Engineering (ICPE), 267-270 (August 16-18, 2006, Tokyo, Japan)

  • Satoshi Matsuyama, Hidekazu Mimura, Mari Shimura, Hirokatsu Yumoto, Keiko Katagishi, Soichiro Handa, Akihiko Shibatani, Yasuhis Sano, Kazuya Yamamura, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa and Kazuto Yamauchi
    High-spatial-resolution scanning X-ray fluorescence microscope with Kirkpatrick-Baez mirrors
    Proc. SPIE 6317, 631719, (August 13- 17, 2006 San Diego, USA).

  • Keiko Katagishi, Satoshi Matsuyama, Hidekazu Mimura, Mari Shimura, Hirokatsu Yumoto, Soichiro Handa, Akihiko Shibatani, Yasuhisa Sano, Kazuya Yamamura, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa and Kazuto Yamauchi
    Observation of Intracellular Elements by Scanning X-ray Fluorescence Microscopy with Spatial Resolution of 50nm
    The 16th International Microscopy Congress (IMC16), Vol2, 1049, (September 3 - 8, 2006, Sapporo, Japan)

  • Satoshi Matsuyama, Hidekazu Mimura, Mari Shimura, Hirokatsu Yumoto, Keiko Katagishi, Soichiro Handa, Akihiko Shibatani, Yasuhisa Sano, Kazuya Yamamura, Katsuyoshi Endo, Yuzo Mori, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa and Kazuto Yamauchi
    Scanning X-ray Fluorescence Microscope Using Kirkpatrick-Baez Optics with Spatial Resolution Better than 50nm
    The 16th International Microscopy Congress (IMC16), Vol2, 1030, (September 3 - 8, 2006, Sapporo, Japan)

  • Hideyuki Hara, Yasuhisa Sano, Hidekazu Mimura, Kenta Arima, Akihisa Kubota, Keita Yagi, Junji Murata and Kazuto Yamauchi
    Damage-free Planarization of 4H-SiC (0001) by Catalyst-Referred Etching
    Programme of The 6th European Conference on Silicon Carbide and Related Materials (ECSCRM 2006), 28, (Sep 3-7, 2006, Newcastle upon Tyne, UK)

  • Yasuhisa Sano, Masayo Watanabe, Kazuya Yamamura, Kazuto Yamauchi, Takeshi Ishida, Kenta Arima, Akihisa Kubota and Yuzo Mori
    Polishing characteristics of 4H-SiC Si-face and C-face by plasma chemical vaporization machining
    Programme of The 6th European Conference on Silicon Carbide and Related Materials (ECSCRM 2006), 34, (Sep 3-7, 2006, Newcastle upon Tyne, UK)

  • K. Yamauchi(Invited)
    Elastic Emission Machining for the Fabrication of X-ray and EUV Mirrors
    OSA Optical Fabrication and Testing Topical Meeting, (October 9 - 11, 2006, Rochester USA).

  • H. Yumoto, H. Mimura, S. Matsuyama, S. Handa, A. Shibatani, K. Katagishi, Y. Sano, K. Yamamura, Y. Mori, K. Tamasaku, M. Yabashi, Y. Nishino, T. Ishikawa and K. Yamauchi
    Fabrication Technology of Total Reflection Mirrors to Realize Hard-x-ray Sub-30-nm Focusing
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 2.4, (2006).

  • S. Matsuyama, H. Mimura, H. Yumoto, Y. Sano, K. Yamamura, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa and K. Yamauchi
    Development of Scanning X-ray Fluorescencs Microscope with Spatial Resolution Better Than 30nm Using K-B Mirror Optics
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 2.5, (2006).

  • Y. Sano, T. Masuda, H. Mimura and K. Yamauchi
    Development of Numerically Controlled Sacrificed Oxidation Using Atmospheric Pressure Plasma
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 3.2, (2006).

  • Y. Ichii and H. Goto
    Fabrication of Flat Silicon Surfaces Using Eco-friendly Electrochemical Etching Process on Cathode
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 3.3, (2006).

  • H. Hara, Y. Sano, K. Arima, K. Yagi, J. Murata, A. Kubota, H. Mimura and K. Yamauchi
    Development of CAtalyst-Referred Etching
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 3.4, (2006).

  • H. Mimura , H. Yumoto, S. Matsuyama, Y. Sano, K. Yamamura, Y. Mori, K. Tamasaku, M. Yabashi, Y. Nishino, T. Ishikawa and K. Yamauchi
    Development of High-resolution Computer-controlled Figuring System and Application to X-ray Reflective Optics
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, P12, (2006).

  • K. Yagi, J. Murata, H. Hara, Y. Sano, K. Yamauchi and H. Goto
    Fabrication of Damascene Cu Wiring Using Solid Acid Catalyst
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, P13, (2006).

  • K. Arima, H. Hara, K. Yagi, R. Okamoto, H. Mimura, A. Kubota, K. Yamauchi
    Atomic-scale Characterization of HF-treated 4H-SiC (0001) 1x1 Surfaces by Scanning Tunneling Microscopy
    Materials Research Society Abstract No. H7.6 2007, San Francisco, CA, USA (2007)

  • H. Takino, K. Ara, N. Shibata, K. Yamamura, Y. Sano, and Y. Mori
    Shape correction of steep curved surface using plasma chemical vaporization machining with a hemispherical tip electrode
    Proceedings of the 7th euspen International Conference, 193-196 (May 20-24, 2007, Bremen, Germany).

  • S. Matsuyama
    Scanning Hard X-ray Microscopy with Spatial Resolution Better than 50 nm
    NSF-MEXT Exchange program for Japan-US young researchers (June 1, 2007, Osaka, Japan)

  • M. Kanaoka, C, Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi
    Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics
    Abstracts of 51th Int. Conf. on Electron, Ion, Photon Beam Technology and Nanofabrication, PM-11.(May 29 - June 1, 2007)

  • K. Yamauchi(Invited)
    Recent achievement in nano-focusing of hard X-rays,
    Workshop on X-ray optics and application(Japan, Tsukuba, Jul, 2007).

  • Yasuhisa Sano, Takaya Masuda, Hidekazu Mimura, and Kazuto Yamauchi
    Ultraprecision Finishing Technique by Numerically Controlled Sacrificial Oxidation
    Proceedings of 15th International Conference on Crystal Growth, Abstract#586 (August 12-17, 2007, Salt Lake City, USA).

  • Junji Murata, Akihisa Kubota, Keita Yagi, Yasuhisa Sano, Hideyuki Hara, Kenta Arima, Takeshi Okamoto, Hidekazu Mimura and Kazuto Yamauchi
    Damage-free planarization of GaN using a catalyst plate
    Proceedings of 15th International Conference on Crystal Growth, Abstract#789 (August 12-17, 2007, Salt Lake City, USA).

  • Hideyuki Hara, Yasuhisa Sano, Kenta Arima, Keita Yagi, Junji Murata, Takeshi Okamoto, Hidekazu Mimura and Kazuto Yamauchi
    New Crystal Planarization Technique using a catalyst plate
    Proceedings of 15th International Conference on Crystal Growth, Abstract#769 (August 12-17, 2007, Salt Lake City, USA).

  • Y. Takahashi, Y. Nishino, T. Ishikawa, E. Matsubara
    A new technique for three-dimensional internal structure analysis in metallic materials: Coherent x-ray diffraction microscopy
    Book of abstracts of 56th Denver x-ray conference, Colorado, U.S.A, 207, (2007).

  • Soichiro Handa, Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi
    Hard x-ray wavefront measurement and control for hard x-ray nanofocusing
    SPIE Optics + Photonics 2007, August 26-30 2007, San Diego, California USA, (2007).

  • K. Yamauchi.(Invited)
    Recent achievements and next strategies in hard-X-ray nano-focusing
    Advanced X-Ray Optics Metrology for Nano-focusing and Coherence Preservation(USA, Lawrence Berkeley National Laboratory, Oct. 5, 2007)

  • Y. Sano, T. Masuda, H. Mimura, and K. Yamauchi
    Ultra-precision Finishing of SOI wafer by Numerically Controlled Sacrificial Oxidation Using Atmospheric Pressure Plasma
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, 33-34 (October 15-17, 2007, Osaka, Japan).

  • Hidekazu Mimura, Hirokatsu Yumoto, Soichiro Handa,Takashi Kimura, Satoshi Matsuyama, Yasuhisa Sano, Yoshinori Nishino, Kenji Tamasaku, Yabashi Makina, Tetsuya Ishikawa and Kazuto Yamauchi
    Experimental determination of the wave field of X-ray nanobeam
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, 17-18 (Oct 15-17, 2007, Osaka, Japan)

  • H. Furukawa, Y. Takahashi, H. Kubo, Y. Nishino, K. Yamauchi, T. Ishikawa, E. Matsubara
    Coherent x-ray diffraction measurements of Cu thin line
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, P64 (2007)

  • Y. Takahashi, H. Furukawa, H. Kubo, Y. Nishino, K. Yamauchi, T. Ishikawa, E. Matsubara
    Three-dimensional observation of internal structures in metallic materials by coherent x-ray diffraction microscopye
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, 6.7 (2007)

  • Junji Murata, Akihisa Kubota, Keita Yagi, Yasuhisa Sano, Hideyuki Hara, Kenta Arima, Takeshi Okamoto, Hidekazu Mimura and Kazuto Yamauchi
    Novel abrasive-free planarization of GaN using a catalytic reference plate
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, P19 (2007)

  • Hideyuki Hara, Yasuhisa Sano, Kenta Arima, Keita Yagi, Junji Murata, Akihisa Kubota, Hidekazu Mimura, Kazuto Yamauchi
    Planarization Mechanism of Catalyst-Referred Etching
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, 37-38 (Oct 15-17, 2007, Osaka, Japan)

  • Soichiro Handa, Hidekazu Mimura, Hirokatsu Yumoto, Takashi Kimura, Satoshi Matsuyama, Yasuhisa Sano, and Kazuto Yamauchi
    Highly accurate differential deposition for X-ray reflective optics
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, 19-20 (Oct 15-17, 2007, Osaka, Japan)

  • Satoshi Matsuyama, Hidekazu Mimura, Keiko Katagishi, Mari Shimura, Masaki Fujii, Hirokatsu Yumoto, Soichiro Handa, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi
    High-resolution and Highly Sensitive Scanning X-ray Fluorescence Microscopy Using Kirkpatrick-Baez Mirror Optics
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, 81-82 (Oct 15-17, 2007, Osaka, Japan)

  • Masaki Fujii, Satoshi Matsuyama, Mari Shimura, Keiko Katagishi, Hidekazu Mimura, Hirokatsu Yumoto, Soichiro Handa, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishin, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi
    Development of Cryo Scanning X-ray Fluorescent Microscopy to Observe Frozen Hydrated Cells and Tissues
    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, P62 (2007)

  • M. Kanaoka, C, Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi
    Processing efficiency of elastic emission machining for low-thermal-expansion material
    Extended Abstracts of International 21st Century COE Symposium on Atomic Fabrication Technology 2007, 25-26

  • Y. Sano, M. Watanabe, T. Kato, K. Yamamura, H. Mimura, and K. Yamauchi
    Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide
    International Conference on Silicon Carbide and Related Materials 2007, Mo-P-55 (October 15-19, 2007, Otsu, Japan).

  • Junji Murata, Akihisa Kubota, Keita Yagi, Yasuhisa Sano, Hideyuki Hara, Kenta Arima, Takeshi Okamoto, Hidekazu Mimura and Kazuto Yamauchi
    New Chemical Planarization of SiC and GaN Using Fe Plate in H2O2 solution
    International Conference on Silicon Carbide and Related Materials 2007, Th-0B-3 (October 15-19, 2007, Otsu, Japan).

  • T. Okamoto, Y. Sano, H. Hara, K. Arima, K. Yagi, J. Murata, H. Mimura and K. Yamauchi
    Damage-free Planarization of 2-inch 4H-SiC Wafer Using Pt Catalyst Plate and HF Solution
    International Conference on Silicon Carbide and Related Materials 2007 Technical Digest (ICSCRM 2007),We-94,(Oct.14-19,2007,Otsu,Japan)

  • Takehiro Kato, Yasuhisa Sano, Hideyuki Hara, Hidekazu Mimura, Kazuya Yamamura and Kazuto Yamauchi
    Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining
    International Conference Silicon Carbide and Related Materials 2007(ICSCRM2007), We-98, (Oct 14-19,2007,Otsu,Japan)

  • K. Yamauchi
    Focusing hard X-ray to sub-10nm by reflective optics
    ESRF, SPring-8, APS Three-Way Meeting(March, 17-19,2008,Chicago,USA)

  • H. Mimura, S. Morita, T. Kimura, D. Yamakawa, W. Lin, T. Uehara, H. Yumoto, S. Matsuyama, Y. Nishino, K. Tamasaku, H. Ohashi, M. Yabashi, T. Ishikawa, H. Omori, K. Yamauchi
    Focusing mirror for X-ray free electron laser
    ESRF, SPring-8, APS Three-Way Meeting(March, 17-19,2008,Chicago,USA)

  • Y. Sano, K. Yamamura, K. Yamauchi and Y. Mori (Invited)
    Crystal machining using atmospheric pressure plasma
    4th International Workshop on Crystal Growth Technology(May 18 - 25, 2008, Beatenberg, Switzerland)

  • K. Yamauchi, Y. Sano, K. Arima and H. Hara(Invited)
    Catalyst-referred etching - novel abrasive-free polishing method
    4th International Workshop on Crystal Growth Technology(May 18 - 25, 2008, Beatenberg, Switzerland)

  • Takehiro Kato, Yasuhisa Sano, Tsutomu Hori, Kazuya Yamamura, Hidekazu Mimura, Yoshiaki Katsuyama, Kazuto Yamauchi
    Thinning of SiC wafers by Plasma Chemical Vaporization Machining
    The 4th Asian Conference on Crystal Growth and Crystal Technology, 189 (May 21-24, 2008, Sendai, Japan)

  • K. Yamauchi, H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, T. Kimura, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku and T. Ishikawa (Invited)
    Synchrotron-radiation-based hard X-ray nanobeam by Kirkpatrick-Baez mirrors
    European Conference on X-ray Spectrometry (16-20 June 2008, Cavtat, Dubrovnik, CROATIA), Abstract p100(I13).

  • S. Matsuyama, M. Shimura, H. Mimura, M. Fujii, H. Yumoto, S. Handa, T. Kimura, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa and K. Yamauchi
    Trace element mapping using hard X-ray nanobeam focused by a Kirkpatrick Baez mirror system
    European Conference on X-ray Spectrometry (16-20 June 2008, Cavtat, Dubrovnik, CROATIA), Abstract p88(O11-1).

  • Y. Takahashi, H. Kubo, H. Furukawa, K. Yamauchi, E. Matsubara, T. Ishikawa, Y. Nishino
    Development of element-specific hard-x-ray diffraction microscopy
    9th International Conference of X-ray Microscopy, ETH Zentrum, Zurich, Switzerland, July 21-25, 2008

  • Y. Takahashi, H. Furukawa, H. Kubo, K. Yamauchi, Y. Nishino, T. Ishikawa, E. Matsubara
    Nanotstructure analysis of metallic materials by coherent x-ray diffraction microscopy
    2008 denver x-ray conference, denver marriot tech center hotel, denver, colorad, USA, 4-8 August 2008

  • K. Yamauchi(Invited)
    X-ray focusing with Kirkpatrick-Baez optics
    Workshop: Focus on X-ray Focusing, SPIE Optics + Photonics 2008(August 11-14 2007San, Diego, California USA)

  • H. Mimura, S. Morita, T. Kimura, D. Yamakawa, W. Lin, Y. Uehara, S. Matsuyama, H. Yumoto, H. Ohashi, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, H. Ohmori, and K. Yamauchi
    Fabrication of a 400-mm-long mirror for focusing x-ray free-electron lasers to sub-100 nm
    SPIE Optics + Photonics 2008(August 11-14 2007San, Diego, California USA) Proc. SPIE, Vol. 7077, 70770R (2008).

  • T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, S. Matsuyama, Y. Sano, K.　Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of adaptive mirror for wavefront correction of hard x-ray nanobeam
    SPIE Optics + Photonics 2008 (August 11-14 2007San, Diego, California USA) Proc. SPIE, 7077 (2008) 707709.

  • Y. Sano, T. Masuda, S. Kamisaka, H. Mimura, S. Matsuyama, and K. Yamauchi
    Improvement of Thickness Uniformity of SOI by Numerically Controlled Sacrificial Oxidation Using Atmospheric-Pressure Plasma
    2008 IEEE International SOI Conference (October 6-9, 2008/ Mohonk Moutain House, New Paltz, New York, USA) Proceedings 165-166

  • T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, S. Matsuyama, Y. Sano, K.　Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of adaptive mirror for wavefront control of hard x-ray nanobeam
    2nd workshop on X-ray and XUV active optics (October 9-11, 2008, Torieste, Itary) Book of abstract pp.45-46

  • H. Mimura (Invited)
    Fabrication of 400mm long X-ray mirror by Electrolytic In-process Dressing Grinding and Elastic Emission Machining
    The 6th CHINA-JAPAN, International Conference on Ultraprecision Machining, Extended Abstract 22-26 (Nov. 24-25, 2008, Hunan Univ. ,Changsha, China)

  • Y. Sano, K. Yamamura, and K. Yamauchi
    Development of Ultraprecision Machining Technologies for Semiconductor Substrates
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 16-17 (Feb 16-17, 2009, Osaka, Japan)

  • H. Hara, Y. Morikawa, Y. Sano, and K. Yamauchi
    First-principles Calculation of Surface Energy at 4H-SiC(0001)-1×1
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 62-63 (Feb 16-17, 2009, Osaka, Japan)

  • S. Handa, T. Kimura, H. Mimura, H. Yumoto, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, and K. Yamauchi
    Development of Graded Multilayer Mirrors for Hard-X-ray Focusing
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 56-57 (Feb 16-17, 2009, Osaka, Japan)

  • J. Murata, S. Sadakuni, K. Yagi, H. Hara, K. Arima, T. Okamoto, H. Mimura, K. Yamauchi
    Photo-enhanced Chemical Planarization of Gallium Nitride Using a Solid Acidic Catalyst
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 60-61 (Feb 16-17, 2009, Osaka, Japan)

  • T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, Y. Sano, K. Tamasaku1, Y. Nishino, M. Yabashi, T. Ishikawa, and K. Yamauchi
    Development of an Adaptive Mirror for Controlling Wavefront of X-ray Beam
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 58-59 (Feb 16-17, 2009, Osaka, Japan)

  • T. Okamoto, Y. Sano, H. Hara, T. Hatayama, K. Arima, K. Yagi, J. Murata, H. Mimura, T. Fuyuki and K. Yamauchi
    Novel Abrasive-Free Chemical Planarization of 4H-SiC 8°off Wafer Using a Catalyst
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 64-65 (Feb 16-17, 2009, Osaka, Japan)

  • T. Kato, Y. Sano, T. Hori, K. Yamamura, H. Mimura, Y. Katsuyama, and K. Yamauchi
    Thinning of SiC Wafers by Plasma Chemical Vaporization Machining
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 72-73 (Feb 16-17, 2009, Osaka, Japan)

  • H. Ishikura, H. Mimura, S, Matsuyama, Y. Sano, and K. Yamauchi
    Development of Electroforming for Ultraprecise Mirror Fabrication
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 74-75 (Feb 16-17, 2009, Osaka, Japan)

  • S. Kamisaka, Y. Sano, H. Mimura, S. Matsuyama, and K. Yamauchi
    Improvement of Thickness Uniformity of SOI (Silicon On Insulator) Layer by Numerically Controlled Sacrificial Oxidation Using Atmospheric-Pressure Plasma
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 70-71 (Feb 16-17, 2009, Osaka, Japan)

  • H. Kubo, H. Furukawa, R. Tsutsumi, K. Yamauchi, Y. Nishino, T. Ishikawa, E. Matsubara, and Y. Takahashi
    Recent Progress of Coherent X-ray Diffraction Microscophy for Nanostructure Analysis of Metallic Materials
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 76-77 (Feb 16-17, 2009, Osaka, Japan)

  • M. Fujii, S. Matsuyama, T. Wakioka, H. Mimura, Y. Sano, and K. Yamauchi
    Development of Advanced Kirkpatrick-Baez System for X-ray Nano-Imaging
    First International Symposium on Atomically Controlled Fabrication Technology, p2.6, (2009).

  • D. Yamakawa, H. Mimura, T. Kimura, S. Matsuyama, Y. Sano, and K. Yamauchi
    Development of X-ray Free Electron Lasers Focusing System with 400mm Long Mirror
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 68-69 (Feb 16-17, 2009, Osaka, Japan)

  • T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of an adaptive mirror for synchrotron x-ray optics
    The 13th Hiroshima International Symposium on Synchrotron Radiation (March 10-11, Hiroshima, Japan) Abstracts pp.45

  • K. Yamauchi
    Recent Progress of Hard X-ray Focusing using Mirror Optics
    GCOE International Workshop on Phase Retrieval in the Visible to Hard X-ray Regions (March 26th, 2009, Osaka, Japan)

  • H. Mimura
    Surface figure Measurement of X-ray mirror Using Phase Retrieval
    GCOE International Workshop on Phase Retrieval in the Visible to Hard X-ray Regions (March 26th, 2009, Osaka, Japan)

  • Y. Takahashi
    Nanostructure Analysis of Metallic Materials by Coherent X-ray Diffraction Microscopy
    GCOE International Workshop on Phase Retrieval in the Visible to Hard X-ray Regions (March 26th, 2009, Osaka, Japan)

  • T. Kimura
    Development of Adaptive Mirror System for Controlling Wavefront of Hard X-ray Focused Beam
    GCOE International Workshop on Phase Retrieval in the Visible to Hard X-ray Regions (March 26th, 2009, Osaka, Japan)

  • H. Mimura, S. Handa, T. Kimura, H. Yumoto, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T, Ishikawa, K. Yamauchi
    Graded multilayer mirror for sub-10nm hard x-ray focusing
    SPIE Optics Photonics 2009，7448-11 (Aug, 2009, San Diego, USA)

  • K. Yamauchi
    Development and application of X-ray mirror in Japan
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)

  • D. Yamakawa, H. Mimura, T. Kimura, S. Matsuyama, Y. Sano and K. Yamauchi
    Development of X-ray Free Electron Lasers focusing system with 400mm long mirror
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)

  • H. Ishikura, H. Mimura, S, Matsuyama, Y. Sano, K. Yamauchi
    Development of electroforming for ultraprecise mirror fabrication
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)

  • H. Yumoto, H. Mimura, S. Handa, T. Kimura, S. Matsuyama, Y. Sano, H. Ohashi, T. Ishikawa, and K. Yamauchi
    Stitching-angle measurable microscope-interferometer:surface-figure metrology tool for hard x-ray nanofocusing mirrors with large curvature
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)

  • T. Kimura, H. Ohashi, H. Mimura, H, Yumoto, D. Yamakawa, T. Tsumura, H. Okada, T. Masunaga, Y. Senba, T. Goto, T. Ishikawa and K. Yamauchi
    Development of Stitching Interferometric System for Large-Size X-Ray Mirror
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)

  • H. Yumoto, H. Mimura, S. Handa, T. Kimura, S. Matsuyama, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, H. Ohashi, T. Ishikawa, and K. Yamauchi
    Recording of interference fringe nano-patterns of hard-x-ray focusing beam
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)

  • S. Handa, T. Kimura, H. Mimura, H. Yumoto, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, and K. Yamauchi
    A Method for High-Precision Determination of the Wavefields of X-ray Nanobeams
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)

  • H. Mimura, S. Handa, H. Yokoyama, T. Kimura, K. Yamauchi
    Ray-tracing analysis of aberration of a depth-graded multilayer mirror
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)

  • H. Mimura, T. Kimura, S. Handa, H. Yumoto, D. Yamakawa, H. Yokoyama, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
    Hard X-ray Nanofocusing with Adaptive Optical System
    The 10th international conference on synchrotoron radiation instrumentation (Sep, 2009, Melbourne, Australia)

  • T. Kimura, S. Handa, H. Mimura, H, Yumoto, D. Yamakawa, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa and K. Yamauchi
    Development of Wavefront Determination Method for Hard X-ray Nanobeam
    The 10th international conference on synchrotoron radiation instrumentation (Sep, 2009, Melbourne, Australia)

  • H. Yokoyama, H. Soichiro, H. Mimura, T. Kimura, S. Matsuyama, K. Tamasaku, T. Ishikawa, K. Yamauchi
    Design and Performance Simulation of Graded Multilayer Mirror for Hard X-ray focusing
    The 10th international conference on synchrotoron radiation instrumentation (Sep, 2009, Melbourne, Australia)

  • K. Yamauchi (invited)
    Ultraprecision deterministic figuring methods to fabricate X-ray nanofocusing optics
    Colloquium at Tianjin University (Apr, 2009, Tianjin, China)

  • Y. Sano (invited)
    Machining of Semiconductor Substrates Using Atmospheric Pressure Plasma
    Colloquium at Tianjin University (Apr, 2009, Tianjin, China)

  • J. Murata (invited)
    Planarization of SiC and GaN Surface by Catalyst-referred Etching
    Colloquium at Tianjin University (Apr, 2009, Tianjin, China)

  • Y. Sano, T. Kato, K. Yamamura, H. Mimura, S. Matsuyama, K. Yamauchi
    Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma
    Proceedings of 31st International Symposium on Dry Process，215-216 (Sep, 2009, Busan, Korea)

  • S. Kamisaka, Y. Sano, H. Mimura, S. Matsuyama, and K. Yamauchi
    Improvement of Thickness Uniformity of SOI Layer by Numerically Controlled Sacrificial Oxidation using Atmospheric-Pressure Plasma with Electrode Array System
    Proceedings of 31st International Symposium on Dry Process，217-218 (Sep, 2009, Busan, Korea)

  • Y. Sano, T. Kato, T. Hori, K. Yamamura, H. Mimura, Y. Katsuyama, and K. Yamauchi
    Thinning of SiC wafer by plasma chemical vaporization machining
    Technical Digest of International Conference on Silicon Carbide and Related Materials 2009，II108 (Oct, 2009, Nurnberg, Germany)

  • T. Okamoto, Y. Sano, H. Hara, T. Hatayama, K. Arima, K. Yagi, J. Murata, H. Mimura, T. Fuyuki and K. Yamauchi
    Reduction of surface roughness by catalyst-referred etching
    Technical Digest of International Conference on Silicon Carbide and Related Materials 2009，I156 (Oct, 2009, Nurnberg, Germany)

  • S. Sadakuni, J. Murata, K. Yagi, Y. Sano, T. Okamoto, K. Arima, H. Mimura, and K. Yamauchi
    Planarization of GaN using photoelectrochemical process and solid catalyst
    Technical Digest of International Conference on Silicon Carbide and Related Materials 2009，I160 (Oct, 2009, Nurnberg, Germany)

  • Y. Sano (invited)
    Machining of semiconductor substrates using atmospheric pressure plasma
    Colloquium at the Leibniz Institute of Surface Modification (Oct, 2009, Leipzig, Germany)

  • Yukio Takahashi, Yoshinori Nishino, Ryosuke Tsutsumi, Hideto Kubo, Hayato Furukawa, Hidekazu Mimura, Satoshi Matsuyama, Nobuyuki Zettsu, Tetsuya Ishikawa, Kazuto Yamauchi
    Development and application of high-resolution diffraction microscopy using syhncrotron x-ray beam focused Kirkpatrick-Baez mirros
    The 10th international conference on synchrotron radiation instrumentation 173 (Sep, 2009, Melbourne,Australia)

  • S. Matsuyama, M. Fujii, T. Wakioka, H. Mimura, S. Handa, T. Kimura, Y. Nishino, K. Tamasaku, Y. Makina, T. Ishikawa and K. Yamauchi
    Development of Hard X-ray Imaging Optics with Two Pairs of Elliptical and Hyperbolic Mirrors
    The 10th international conference on synchrotron radiation instrumentation 78-79 (Sep, 2009, Melbourne,Australia)

  • K. Yamauchi (invited)
    Mirror Optics for Coherent X-rays and Overview of the Osaka International Workshop on X-ray Mirror Design, Fabrication and Metrology
    The 10th international conference on synchrotron radiation instrumentation (Sep, 2009, Melbourne,Australia)

  • Yukio Takahashi, Yoshinori Nishino, Ryosuke Tsutsumi, Hideto Kubo, Hayato Furukawa, Hidekazu Mimura, Satoshi Matsuyama, Nobuyuki Zettsu, Tetsuya Ishikawa, Kazuto Yamauchi
    High-resolution diffraction microscopy using synchrotron X-ray beam focused by Kirkpatrick-Baez mirrors
    International Workshop on X-ray Mirror Design, Fabrication, and Metrology 94-95 (Sep, 2009, Osaka. Japan)

  • S. Matsuyama, M. Fujii T. Wakioka, H. Mimura, T. Kimura, S. Handa, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa and K. Yamauchi
    Development of Advanced Kirkpatrick-Baez System for Hard X-ray Nano-Imaging
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka. Japan)

  • K. Yamauchi (invited)
    Hard X-ray Nanofocusing by Kirkpatrick-Baez (KB) mirrors
    ICXOM20 XO-l1 (Sep, 2009, Krlsruhe, Germany)

  • K. Yamauchi (invited)
    Hard X-ray Nanofocusing by Kirkpatrick-Baez (KB) mirrors
    ICXOM20 XO-l1 (Sep, 2009, Krlsruhe, Germany)

  • K. Yamauchi (invited)
    10nm-Level Focusing of Hard X-Rays by KB Mirrors
    OSA'S 93rd ANNUAL MEETING FThG3 (Oct, 2009, San Jose, California, USA)

  • Masahiko Kanaoka, Hideo Takino, Kazushi Nomura, Hidekazu Mimura, Kazuto Yamauchi, Yuzo Mori (invited)
    Spatial wavelength range of surface roughness improved using elastic emission machining
    The 9th International euspen Conference O8.1 (Jun, 2009, San Sebastian, Spanish)

  • T. Okamoto, Y. Sano, H. Hara, T. Hatayama, K. Arima, K. Yagi, J. Murata, T.　Fuyuki and K. Yamauchi
    Abrasive-free Planarization of 4H-SiC Substrates for Epitaxial Growth
    3rd International Conference of Asian Society for Precision Engineering and　Nanotechnology (ASPEN2009) 1B-13 (Nov, 2009, Kitakyusyu, Japan)

  • Shun Sadakuni, Junji Murata, Keita Yagi, Kenta Arima, Yasuhisa Sano, Takeshi　Okamoto, Hidekazu Mimura and Kazuto Yamauchi
    Planarization of GaN Surface using Photo-electro Chemical Process and Solid Acid　Catalyst
    3rd International Conference of Asian Society for Precision Engineering and　Nanotechnology (ASPEN2009) 1B-14 (Nov, 2009, Kitakyusyu, Japan)

  • Kohei Aida, Yasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama　and Kazuto Yamauchi
    Dicing of SiC wafer by Plasma Chemical Vaporization Machining
    3rd International Conference of Asian Society for Precision Engineering and　Nanotechnology (ASPEN2009) 2P1-9 (Nov, 2009, Kitakyusyu, Japan)

  • T. Okamoto, Y. Sano, K. Tachibana, K. Arima, A. N. Hattori, K. Yagi, J. Murata,　S. Sadakuni and K. Yamauchi
    Abrasive-Free Chemical Planarization of 4H-SiC 8°off Wafer Using a Catalyst
    Second International Symposium on Atomically Controlled Fabrication Technology, 172-173 (Nov, 2009, Osaka, Japan)

  • J. Murata, Y. Shirasawa, Y. Sano, S. Sadakuni, K. Yagi, T. Okamoto, and K. Yamauchi
    Improvement of Schottky Diode Properties on GaN(0001) Surface Using Damage-free　Planarization
    Second International Symposium on Atomically Controlled Fabrication Technology, 174-175 (Nov, 2009, Osaka, Japan)

  • S. Sadakuni, J. Murata, K. Yagi, Y. Sano, K. Arima, A. Hattori, T. Okamoto, H.　Mimura and K. Yamauchi
    Development of palanarization method for gallium nitrideusing　photoelectrochemical process
    Second International Symposium on Atomically Controlled Fabrication Technology, 184-185 (Nov, 2009, Osaka, Japan)

  • K. Aida, Y. Sano, K. Yamamura, H. Mimura, S. Matsuyama and K. Yamauchi
    Dicing of SiC wafer by Plasma Chemical Vaporization Machining with wire electrode
    Second International Symposium on Atomically Controlled Fabrication Technology, 188-189 (Nov, 2009, Osaka, Japan)

  • S. Kamisaka, Y. Sano, K. Yoshinaga, H. Mimura, S. Matsuyama, and K. Yamauchi
    Improvement of Thickness Uniformity of SOI Layer by Numerically Controlled　Sacrificial Oxidation using Arrayed Atmospheric-Pressure Plasma
    Second International Symposium on Atomically Controlled Fabrication Technology, 190-191 (Nov, 2009, Osaka, Japan)

  • Y. Shirasawa, Y. Sano, T. Okamoto, and K. Yamauchi
    Evaluation of Schottky Barrier Diodes on Surface of Processed 4H-SiC(0001)
    Second International Symposium on Atomically Controlled Fabrication Technology, 192-193 (Nov, 2009, Osaka, Japan)

  • Hiroki Fujiwara & Kenji Tamada
    Study of a long-life thrust needle roller bearing lubricated with low　viscous lubricant
    World Tribology Congress 2009, p. 350

  • Hiroki Fujiwara, Takuji Kobayashi, Tatsuo Kawase & Kazuto Yamauchi
    Optimized Logarithmic Roller Crowning Design of Cylindrical Roller　Bearings and Its Experimental Demonstration
    The ASME/STLE International Joint Tribology Conference 2009 (CD-ROM)

  • Yukio Takahashi
    Development of coherent x-ray diffraction microscopy and its application in materials science
    TMS annual meeting (February 14-18 2010, Seattle, Washington, USA)

  • S. Matsuyama
    Nanometer Focusing of Coherent Hard X-rays with Ultraprecise Mirrors
    EuroFEL Workshop on Photon Beamlines & Diagnostics (28-30 June 2010, Hamburg, Germany)

  • H. Mimura (Invited)
    Hard X-ray sub-10nm focusing by adaptive optical system
    International workshop on Phase retrieval and Coherent Scattering (Coherence 2010), (6-10 July 2010, Rostock-Warnemunde, Germany)

  • Yukio Takahashi
    Development of coherent x-ray diffraction microscopy and its application in materials science
    The 7th International Conference on Synchrotron Radiation in Materials Science (July 11-14 2010, Oxford, UK)

  • H. Mimura, T. Kimura, H. Yokoyama, H. Yumoto, S. Matsuyama, K. Tamasaku, Y. Koumura, M. Yabashi, T. Ishikawa, K. Yamauchi
    An adaptive optical system for sub-10nm hard x-ray focusing
    SPIE Optics+Photonics, Proc SPIE, 7803, 780304, 2010 (1-5 August 2010, SanDiego, USA)

  • S. Matsuyama, T. Wakioka, H. Mimura, T. Kimura, N. Kidani, Y. Sano, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa and K. Yamauchi
    Hard X-ray Imaging Optics with Elliptical mirrors and Hyperbolic Mirrors
    SPIE Optics+Photonics, Technical Program, p191, 7802-01 (1-5 August 2010, SanDiego, USA)

  • Yasuhisa Sano, Kohei Aida, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, and Kazuto Yamauchi
    Dicing of SiC wafer by atmospheric-pressure plasma etching process with wire electrode
    The 16th International Conference on Crystal Growth (ICCG-16) (August 8-13, 2010, Beijing, China)

  • Yukio Takahashi, Yoshinori Nishino, Eiichiro Matsubara, Tetsuya Ishikawa, Kazuto Yamauchi
    Development and application of high-resolution diffraction microscopy using focused hard X-ray beam
    the 10th International Conference of X-ray Microscopy (Aug. 15-20 2010, elbour, elbourn, U.S.A.)

  • Y. Sano, T. Kato, K. Yamamura, H. Mimura, S. Matsuyama, and K. Yamauchi
    Thinning of 2-inch SiC wafer by plasma chemical vaporization machining
    The 8th European Conference on Silicon Carbide and Related Materials，Abstract Booklet, TP-155 (Aug 29-Sep 2, 2010, Oslo, Norway)

  • T. Okamoto, Y. Sano, K. Tachibana, K. Arima, A. N. Hattori, K. Yagi, J. Murata, S. Sadakuni and K. Yamauchi
    Abrasive-free planarization of 3-inch 4H-SiC substrate by catalyst-referred etching
    The 8th European Conference on Silicon Carbide and Related Materials，Abstract Booklet, TP-160 (Aug 29-Sep 2, 2010, Oslo, Norway)

  • S. Sadakuni, N. X. Dai, Y. Sano, K. Arima, A. N. Hattori, K. Yagi, J. Murata, T. Okamoto, K. Tachibana, and K. Yamauchi
    High-resolution TEM observation of SiC surface flattened by catalyst-referred etching
    The 8th European Conference on Silicon Carbide and Related Materials，Abstract Booklet, TP-158 (Aug 29-Sep 2, 2010, Oslo, Norway)

  • Shun Sadakuni, Junji Murata, Keita Yagi, Kenta Arima, Yasuhisa Sano, Takeshi Okamoto, Kazuma Tachibana, and Kazuto Yamauchi
    Abrasive-free planarization of GaN using photoelectrochemical reaction
    International Workshop on Nitride Semiconductors (IWN2010), Program & Abstracts, 166 (19-24 Sep. 2010, Tampa, USA)

  • Yasuhisa Sano, Keinosuke Yoshinaga, Shohei Kamisaka, Hidekazu Mimura, Satoshi Matsuyama, and Kazuto Yamauchi (invited)
    Numerically Controlled Sacrificial Plasma Oxidation Using Array-Type Electrode toward High-Throughput Deterministic Machining
    The 2nd International Conference on Nanomanufacturing, proceedings, 169 (24-26 SEP, 2010，Tianjin, China)

  • K. Yamauchi (invited)
    Atomically Controlled Polishing of Single-Crystalline SiC and GaN
    The 2nd International Conference on Nanomanufacturing (24-26 SEP, 2010，Tianjin, China)

  • Y. Sano, S. Kamisaka, K. Yoshinaga, H. Mimura, S. Matsuyama, and K. Yamauchi
    Numerically Controlled Sacrificial Plasma Oxidation Using Array of Electrodes for Improving Thickness Uniformity of SOI
    2010 IEEE International SOI Conference, Proceedings 68-69(October 11-14, 2010/ Catamaran Resort Hotel & Spa, San Diego, California, USA)

  • Ryosuke Tsutsumi, Yukio Takahashi, Nobuyuki Zettsu, Akihiro Suzuki, Yoshinori Nishino, Eiichiro Matsubara, Tetsuya Ishikawa, Kazuto Yamauchi
    Development of high-resolution X-ray diffraction microscopy using Kirkpatrick and Baez mirrors
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 84-85(24-26 Nov, 2010, Osaka, Japan)

  • Yukio Takahashi
    Development and application of high-resolution X-ray diffraction microscopy using advanced mirror optics
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 8-9(24-26 Nov, 2010, Osaka, Japan)

  • T. Okamoto, Y. Sano, K. Tachibana, K. Arima, A. N. Hattori, K. Yagi, J. Murata, S. Sadakuni, and K. Yamauchi
    Processing Characteristics in Catalyst-Referred Etching of 4H-SiC (0001) Substrates
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 28-29(24-26 Nov, 2010, Osaka, Japan)

  • Y. Sano, K. Yamamura, K. Arima and K. Yamauchi
    Development of Chemical Processing Methods for Silicon Carbide Wafering and Device Processing
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 54-55(24-26 Nov, 2010, Osaka, Japan)

  • K. Yoshinaga, Y. Sano, H. Mimura, S. Matsuyama, and K. Yamauchi
    Improvement of Thickness Uniformity of Si Layer in SOI Wafer by Numerically Controlled Sacrificial Oxidation Using Atmospheric-Pressure Plasma with Electrode Array System
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 102-103(24-26 Nov, 2010, Osaka, Japan)

  • S. Sadakuni, J. Murata, K. Yagi, Y. Sano, K. Arima, T. Okamoto, K. Tachibana and K. Yamauchi
    Improvement of the Removal Rate of Planarization Technique for GaN by Applying Bias
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 186-187(24-26 Nov, 2010, Osaka, Japan)

  • K. Aida, Y. Sano, H. Nishikawa, K. Yamamura, H. Mimura, S. Matsuyama and K. Yamauchi
    Thinning of SiC Wafer by Plasma Chemical Vaporization Machining
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 190-191(24-26 Nov, 2010, Osaka, Japan)

  • S. Matsuyama, T. Wakioka, H. Mimura, T. Kimura, N. Kidani, Y. Sano, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    One-Dimensional Wolter Mirror for Achromatic Hard X-ray Microscopy
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 60-61(24-26 Nov, 2010, Osaka, Japan)

  • T. Wakioka, S. Matsuyama, N. Kidani, H. Mimura, Y. Sano and K. Yamauchi
    Development of Side-By-Side Kirkpatrick-Baez mirror for high-density X-ray nanobeam
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 70-71(24-26 Nov, 2010, Osaka, Japan)

  • N. Kidani, S. Matsuyama, T. Wakioka, S. Kitamura, H. Mimura and K. Yamauchi
    Development of Advanced Kirkpatrick-Baez mirror for achromatic hard X-ray microscopy
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 62-63(24-26 Nov, 2010, Osaka, Japan)

  • T. Kimura, S. Handa, H. Mimura, H. Yumoto, H. Yokoyama, S. Imai, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Kohmura, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of Wavefront Measurement Method for Hard X-ray Adaptive Optics System
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 86-87(24-26 Nov, 2010, Osaka, Japan)

  • H. Yokoyama, H. Mimura, T. Kimura, S. Imai, S. Matsuyama, Y. Sano, K. Yamauchi
    Ray-tracing Analysis of a Graded Multilayer Mirror
    Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 74-75(24-26 Nov, 2010, Osaka, Japan)

  • K. Yoshinaga, Y. Sano, H. Mimura, S. Matsuyama, K. Yamauchi
    Improved Thickness Uniformity of Si Layer in SOI wafer by Numerically Controlled Sacrificial Oxidation using Atmospheric-Pressure Plasma with Electrode Array System
    Proceedings of 32nd International Symposium on Dry Process 91-92(Nov, 2010, Tokyo, Japan)

  • S. Matsuyama, T. Wakioka, H. Mimura, T. Kimura, N. Kidani, Y. Sano, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Hard X-ray Imaging Optics with Elliptical mirrors and Hyperbolic Mirrors
    SPIE Optics+Photonics, Technical Program 191(Aug, 2010, San Diego, California, USA)

  • K. Yamauchi(invited)
    Crystallographically highly-ordered GaN (0001) surface prepared by catalyst referred etching
    IWBNS7 (15-20 March 2011, Koyasan, Wakayama, Japan)

  • K. Yamauchi, H. Mimura, T. Kimura, H. Yokoyama, H. Yumoto, S. Matsuyama, H. Nakamori, Y. Sano, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa(invited)
    Single-nanometer focusing of hard x-rays using novel adaptive optical system
    Programme of ACTOP11 (15-20 April 2011, Diamond Light Source, Oxfordshire, UK)

  • Hiroki Nakamori, Satoshi Matsuyama, Takashi Kimura, Shouta Imai, Hidekazu Mimura, Yasuhisa Sano, Kazuto Yamauchi
    Simulation Study of Adaptive Mirror for Hard X-ray Focusing
    Programme of ACTOP11, P46 (15-20 April 2011, Diamond Light Source, Oxfordshire, UK)

  • K. Yamauchi(invited)
    Current status of precision mirror development for coherent X-rays
    SPIE Optics + Optoelectronics (18-21 April 2011, Clarion Congress Hotel, Prague, Czech Republic)

  • S. Matsuyama, N. Kidani, H. Mimura, Y. Sano, K. Tamasaku, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of hard x-ray imaging optics with four aspherical mirrors
    SPIE Optics+Photonics, Technical Program, pp. 181, 8139-04 (21-25 May 2011, SanDiego, California, USA)

  • K. Yamauchi(invited)
    Deterministic fabrication process for precision X-ray mirrors
    The 2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011) (23-25 May 2011, ICM, Munich, Germany)

  • Yukio Takahashi(invited)
    Development of high-resolution coherent X-ray diffraction microscopy and its application in materials science
    International Conference on Processing & Manufacturing of Advanced Materials, Abstracts, pp. 411 (1-5 Aug 2011, Quebec, Canada)

  • K. Yamauchi(invited)
    Mirror‐based optical systems for nanofocusing and nanoimaging of hard x‐rays
    The 4th International Workshop on FEL Science (29 Aug-2 Sep 2011, Palm Cove, Cairns, Australia)

  • Yukio Takahashi(invited)
    Development and application of high-resolution diffraction microscopy using focused hard x-ray beam
    The 4th International Workshop on FEL Science "Science Challenges of XFEL", pp. 21 (29 Aug-2 Sep 2011, Palm Cove, Cairns, Australia)

  • Yasuhisa Sano, Kohei Aida, Takehiro Kato, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, and Kazuto Yamauchi
    Cutting of SiC Wafer by Atmospheric-Pressure Plasma Etching with Wire Electrode
    International Conference on Silicon Carbide and Related Materials 2011, We-P-28 (11-16 Sep 2011, Cleveland, Ohio, USA)

  • Bui Van Pho, Shun Sadakuni, Takeshi Okamoto, Kenta Arima, Yasuhisa Sano, and Kazuto Yamauchi
    HRTEM observation of 4H-SiC (0001) surface planarized by catalyst-referred etching
    International Conference on Silicon Carbide and Related Materials 2011, We-P-32 (11-16 Sep 2011, Cleveland, Ohio, USA)

  • Yukio Takahashi(invited)
    High-resolution coherent diffraction imaging using focused hard x-ray beam at SPring-8
    ARC Center of Excellence for Coherent X-ray Science 6th Annual Workshop, pp. 22 (10-12 Oct, The University of Melboume, Melboume, Australia)

  • T. Osaka, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, K. Yamauchi
    Thin-crystal & auto-correlator development at SPring-8
    Fourth XFEL 3-Site Meeting (30 Oct-3 Nov, RIKEN SPring-8 Center, Hyogo, Japan)

  • Akihiro Suzuki, Yukio Takahashi, Nobuyuki Zettsu, Yoshiki Kohmura, Kazuto Yamauchi, and Tetsuya Ishikawa
    Development of High-Resolution Ptychographic X-ray Diffraction Microscopy using Focused Hard X-ray Beam
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, pp. 76-77 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • Yukio Takahashi, Akihiro Suzuki, Nobuyuki Zettsu, Yoshiki Kohmura, Kazuto Yamauchi, and Tetsuya Ishikawa
    Element-Specific Ptychographic X-ray Diffraction Microscopy using Anomalous Scattering
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, pp. 78-79 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • Satoshi Matsuyama, Naotaka Kidani, Yoji Emi, Yasuhisa Sano, Yoshiki Kohmura, Tetsuya Ishikawa, and Kazuto Yamauchi
    Development of Hard X-ray Imaging Optics for Achromatic Full-Field X-ray Microscopy
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, pp. 84-85, P-5 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • H. Nakamori, S. Matsuyama, S. Imai, H. Yokoyama, T. Kimura, H. Mimura, Y. Sano, Y. Kohmura, T. Ishikawa, K. Yamauchi
    Development of an Adaptive X-Ray Focusing Mirror with Large NA -Evaluation of Reproducibility of Deformable Mirror
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, pp. 86-87, P-6 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • S. Imai, S. Matsuyama, H. Nakamori, T. Kimura, H. Yokoyama, H. Mimura, Y. Sano, Y. Kohmura, T. Ishikawa, K. Yamauchi
    Development of an adaptive hard X-ray focusing system with adaptive mirrors
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, pp. 90-91, P-8 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • H. Yokoyama, T. Kimura, H. Mimura, S. Imai, S. Matsuyama, Y. Kohmura, T. Ishikawa, K. Yamauchi
    Determination of Had X-ray Focusing Mirror Aberration using Phase Retrieval with Transverse Translation Diversity
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, pp. 98-99, P-12 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • Jangwoo Kim, Hikaru Yokoyama, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi
    Reflectivity improvement using PtC/C multilayers for X-ray mirrors
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, pp. 100-101, P-13 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • S. Sadakuni, J. Murata, T. Okamoto, Y. Sano, K. Yagi, K. Tachibana, H. Asano and K. Yamauchi
    Fabrication of Atomically Controlled Flat GaN (0001) Surfaces Using Catalyst-Referred Etching in Water
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, P-28 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • T. Okamoto, Y. Sano, K. Tachibana, K. Arima, K. Inagaki, K. Yagi, S. Sadakuni, A. Isohashi, Y. Morikawa and K. Yamauchi
    Improvement of the removal rate in catalyst-referred etching of 4H-SiC using catalytic platinum and hydrofluoric acid
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, P-33 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • Bui Van Pho, Shun Sadakuni, Takeshi Okamoto, Ryusuke Sagawa, Kenta Arima, Yasuhisa Sano , Kazuto Yamauchi
    Atomic Structure of 4H-SiC (0001) Surface Planarized by Catalyst-Referred Etching
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, P-38 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • K. Tachibana, Y. Sano, T. Okamoto, K. Arima, K. Inagaki, K. Yagi, S. Sadakuni, A. Isohashi, Y. Morikawa and K. Yamauchi
    Study of Reactive Species in Catalyst-referred Etching of 4H-SiC Using Platinum and Hydrofluoric Acid
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, P-41 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • H. Nishikawa, Y. Sano, K. Aida, T. Chaiyapat, K. Yamamura, S. Matsuyama, and K. Yamauchi
    Cutting of SiC substrates by atmospheric-pressure plasma etching with slit mask for plasma confinement
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, P-49 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • H. Asano, S. Sadakuni, K. Yagi, Y. Sano, T. Okamoto, K. Tachibana and K. Yamauchi
    Removal rate improvement by an ultraviolet irradiation in GaN (0001) surface planarization using catalyst-referred etching
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, P-61 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • K. Yamauchi(invited)
    X-ray nanofocusing by mirror optical systems
    JSPS-DFG二国間セミナー (Oct, Kyoto University, Kyoto, Japan)

  • Hiroki Nakamori, Satoshi Matsuyama, Takashi Kimura, Shouta Imai, Yoshiki Kohmura, Tetsuya Ishikawa, Yoshinori Nishino, Kazuto Yamauchi
    Development of an ultra-precise deformable mirror for hard X-ray nanofocusing
    Program of 7th Handai Nanoscience and Nanotechnology International Symposium, pp. 172-173, PII-46 (10-11 Nov, Osaka University, Osaka, Japan)

  • Y. Sano, K. Aida , H. Nishikawa, K. Yamamura, S. Matsuyama, and K. Yamauchi
    Back-Side Thinning of Silicon Carbide Wafer by Plasma Etching using Atmospheric-Pressure Plasma
    4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 0038 (16-18 Nov, Langham Place Kong Hotel, Hong Kong, China)

  • S. Sadakuni, B.V. Pho, N.X. Dai, Y. Sano, K. Yagi, J. Murata, T. Okamoto, K.Tachibana and K. Yamauchi
    Surface Observation of 4H-SiC (0001) Planarized by Catalyst-Referred Etching
    4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 0176 (16-18 Nov, Langham Place Kong Hotel, Hong Kong, China)

  • Yasuhisa Sano, Kohei Aida, Hiroaki Nishikawa, Kazuya Yamamura, Satoshi Matsuyama, and Kazuto Yamauchi(invited)
    Plasma Chemical Vaporization Machining of Silicon Carbide Wafer Using Flat-bar Electrode with Multiple Gas Nozzles
    The 8th CHINA-JAPAN Conference on Ultra-Precision Machining (Nov, Hangzhou, China)

  • Y. Sano (invited)
    Fabrication technology for atomically flat SiC surfaces
    Symposium on Surface and Nano Science 2012, G-4 (9-12 Jan, Iwate, Japan)

  • K. Yamauchi(invited)
    10KeV mirror project
    XTS - Breakout Meeting (2 Feb, National Astronomical Observatory of Japan, Tokyo, Japan)

  • K. Yamauchi(invited)
    Current status of mirror-based optics for coherent x-ray science
    Third Ringberg Workshop on Science with FELs, (May 2012, Bavaria, Germany)

  • Yukio Takahashi, Akihiro Suzuki, Shin Furutaku, Kazuto Yamauchi, Yoshiki Kohmura and Tetsuya Ishikawa(invited)
    High-resolution X-ray ptychography using focused hard X-ray beam
    Coherence 2012, P13 (18-21 June 2012, Hilton Fukuoka Sea Hawk, Fukuoka, Japan)

  • K. Yamauchi(invited)
    Nanofocusing and wavefront analysis of SACLA
    Coherence 2012 (18-21 June 2012, Hilton Fukuoka Sea Hawk, Fukuoka, Japan)

  • Akihiro Suzuki, Yukio Takahashi, Nobuyuki Zettsu, Yoshiki Kohmura, Kazuto Yamauchi and Tetsuya Ishikawa
    Development of high-resolution X-ray ptychography using drift-compensation method
    Coherence 2012, PS-2 (18-21 June 2012, Hilton Fukuoka Sea Hawk, Fukuoka, Japan)

  • H. Nakamori, S. Matsuyama, S. Imai, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of piezoelectric deformable mirrors for X-ray focusing
    Coherence 2012, PS-16, (18-21 June 2012, Hilton Fukuoka Sea Hawk, Fukuoka, Japan)

  • Taito Osaka, Makina Yabashi, Yasuhisa Sano, Kensuke Tono, Yuichi Inubushi, Takahiro Sato, Satoshi Matsuyama, Tetsuya Ishikawa, and Kazuto Yamauchi
    Fabrication of a Bragg beam splitter for an X-ray autocorrelator
    Coherence 2012, PS-17, (18-21 June 2012, Hilton Fukuoka Sea Hawk, Fukuoka, Japan)

  • K. Yamauchi(invited)
    Progress of Mirror-based Focusing Optics for X-ray Free Electron Laser
    5th Asian Workshop on Generation and Application of Coherent XUV and X-ray Radiation (5th AWCXR), (27-29 June 2012, Kashiwa, Chiba, Japan)

  • K. Yamauchi(invited)
    Hard X-ray nanofocusing and wavefront diagnosis
    4th international workshop on Metrology for X-ray Optics, Mirror Design, and Fabrication Barcelona IWXM, (4-6 July 2012, Barcelona, Spain)

  • H. Nakamori, S. Matsuyama, S. Imai, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of an ultra-precise deformable mirror for x-ray focusing
    4th international workshop on Metrology for X-ray Optics, Mirror Design, and Fabrication Barcelona IWXM, P59 (4-6 July 2012, Barcelona, Spain)

  • OSAKA Taito, YABASHI Makina, SANO Yasuhisa, TONO Kensuke, INUBUSHI Yuichi, SATO Takahiro, MATSUYAMA Satoshi, ISHIKAWA Tetsuya, YAMAUCHI Kazuto
    Fabrication of a Bragg beam splitter for hard X-ray free-electron laser
    11th International Conference on Synchrotron Radiation Instrumentation, WE-E-P-37 (9-13 July 2012, the Centre de Congres, Lyon, France)

  • Satoshi Matsuyama, Youji Emi, Naotaka Kidani, Yoshiki Kohmura, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
    Development of Achromatic Full-Field Hard X-ray Microscopy Using Four Total-Reflection Mirrors
    11th International Conference on X-ray Microscopy, P60 (5-10 Aug 2012, Shanghai, China)

  • Yukio Takahashi, Akihiro Suzuki, Nobuyuki Zettsu, Yoshiki Kohmura, Yasunori Senba, Haruhiko Ohashi, Kazuto Yamauchi and Tetsuya Ishikawa
    High-resolution ptychography using focused hard X-ray beam
    11th International Conference on X-ray Microscopy, P82 (5-10 Aug 2012, Shanghai, China)

  • Akihiro Suzuki, Yukio Takahashi, Nobuyuki Zettsu, Yoshiki Kohmura, Yasunori Senba, Haruhiko Ohashi, Kazuto Yamauchi and Tetsuya Ishikawa
    Drift-Compensation method for High-Resolution X-ray Ptychography
    11th International Conference on X-ray Microscopy, P205 (5-10 Aug 2012, Shanghai, China)

  • K. Yamauchi(invited)
    Nanofocusing optics for hard x-ray free electron laser
    SPIE Optics+Photonics, Technical Program (Aug 2012, SanDiego, USA)

  • S. Matsuyama, T. Kimura, H. Nakamori, S. Imai, H. Yokoyama, J. Kim, R. Fukui, H. Mimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of piezoelectric deformable mirror for hard X-ray nanofocusing
    SPIE Optics+Photonics, Technical Program, P197, 8503-02 (Aug 2012, SanDiego, USA)

  • Yasuhisa Sano, Hiroaki Nishikawa, Kohei Aida, Chaiyapat Tangpatjaroen, Kazuya Yamamura, Satoshi Matsuyama, Kazuto Yamauchi
    Basic experiment on atmospheric-pressure plasma etching with slit aperture for high-efficiency dicing of SiC wafer
    The 9th European Conference on Silicon Carbide and Related Materials, We8-5 (2-6 Sep 2012, Saint-Petersburg, Russia)

  • P. V. Bui, S. Sadakuni, T. Okamoto, K. Arima, Y. Sano, K. Yamauchi
    A Study of Terminated Species on 4H-SiC (0001) Surfaces Planarized using Hydrofluoric Acid
    The 9th European Conference on Silicon Carbide and Related Materials, TuP-42 (2-6 Sep 2012, Saint-Petersburg, Russia)

  • Ai Isohashi, Yasuhisa Sano, Takeshi Okamoto, Kazuma Tachibana, Kenta Arima, Koji Inagaki, Keita Yagi, Shun Sadakuni, Yoshitada Morikawa and Kazuto Yamauchi
    Study on Reactive Species in Catalyst-Referred Etching of 4H-SiC using Platinum and Hydrofluoric Acid
    The 9th European Conference on Silicon Carbide and Related Materials, TuP-71 (2-6 Sep 2012, Saint-Petersburg, Russia)

  • H. Takei, K. Yoshinaga, Y. Sano, S. Matsuyama, and K. Yamauchi
    Improving the Accuracy of Numerically Controlled Sacrificial Plasma Oxidation Using Array of Electrodes to Improve the Thickness Uniformity of SOI
    2012 IEEE International SOI Conference, 4.7 (1-4 Oct, Napa, CA USA)

  • Shun Sadakuni, Hiroya Asano, Bui Van Pho, Ai Isohashi, Yasuhisa Sano, Satoshi Matsuyama, and Kazuto Yamauchi
    Catalyst-referred etching and an investigation of the reaction mechanism
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 24-25, S1-1, P-2 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • K. Yamauchi
    Recent progress on mirror-based optics for the 3rd and 4th generation synchrotron radiation sources
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 48-49, 3.3 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Yukio Takahashi
    Coherent X-ray Diffractive Imaging at SPring-8: Recent Progress and Outlook
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 52-53, 3.5 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Hiroki Nakamori, Satoshi Matsuyama, Shota Imai, Takashi Kimura, Yasuhisa Sano, Yoshiki Kohmura, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi
    Development of ultraprecise piezoelectric deformable mirror for adaptive X-ray focusing
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 58-59, S2-3, P-34 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Ai Isohashi, Yasuhisa Sano, Mari Oue, Shun Sadakuni, Yoshitada Morikawa, and Kazuto Yamauchi
    Etching Mechanism of Catalyst-Referred Etching with Pure Water
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 112-113, P-1 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • H. Asano, S. Sadakuni, Y. Sano, K. Yagi, S. Matsuyama, and K. Yamauchi
    Planarization of Gallium Nitride Wafers Using a Platinum Catalyst and Characterization of the Step-and-Terrace Structure
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 116-117, P-3 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Bui Van Pho, Kouji Inagaki, Yasuhisa Sano, Kazuto Yamauchi, Yoshitada Morikawa
    First-Principle Study of Platinum Catalyst-Assisted Hydrogen Fluoride Adsorption on SiC surfaces
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 122-123, P-6 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Ryosuke Fukui, Hikaru Yokoyama, Satoshi Matsuyama, Yoshiki Kohmura, Kenji Tamasaku, Makina Yabashi, Wataru Yashiro, Atsushi Momose, Tetsuya Ishikawa, and Kazuto Yamauchi
    Wavefront measurement for a hard-X-ray nanobeam using single-grating interferometry based on a phase grating and Fourier transform method
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 166-167, P-28 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Yoji Emi, Satoshi Matsuyama, Yoshiki Kohmura, Tetsuya Ishikawa, and Kazuto Yamauchi
    Development of a High-resolution Full-field Hard X-ray Imaging Microscope Based On Four Aspherical Mirrors
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 170-171, P-30 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Taito Osaka, Makina Yabashi, Yasuhisa Sano, Kensuke Tono, Yuichi Inubushi, Takahiro Sato, Satoshi Matsuyama, Tetsuya Ishikawa, and Kazuto Yamauchi
    Fabrication of a Bragg Beam Splitter Based on Ultrathin Silicon Single Crystal
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 172-173, P-31 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Jangwoo Kim, Ayaka Nagahira, Satoshi Matsuyama, Yasuhisa Sano, and Kazuto Yamauchi
    Study of Pt/C multilayers for X-ray mirrors improvement of reflectivity
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 176-177, P-33 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Shin Furutaku, Yukio Takahashi, Akihiro Suzuki, Kazuto Yamauchi, Yoshiki Kohmura, and Tetsuya Ishikawa
    Visualization of Dislocation Strain Fields in Silicon by Bragg X-ray Ptychography
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 180-181, P-35 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Akihiro Suzuki, Yukio Takahashi, Shin Furutaku, Kazuto Yamauchi, Yoshiki Kohmura, and Tetsuya Ishikawa
    X-ray Ptychography Using Defocused Hard X-ray Beam
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 182-183, P-36 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Shinichi Kitamura, Satoshi Matsuyama, Yasuhisa Sano, and Kazuto Yamauchi
    Fabrication of ultraprecise X-ray mirrors by ion beam figuring system: Fabrication and evaluation of aspheric shape on silicon surface
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 184-185, P-37 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • Shota Imai, Hiroki Nakamori, Satoshi Matsuyama, Takashi Kimura, Yoshiki Kohmura, Tetsuya Ishikawa, and Kazuto Yamauchi
    Development of an adaptive hard X-ray focusing system with deformable mirrors
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 188-189, P-39 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • H. Nishikawa, Y. Sano, K. Aida, T. Chaiyapat, Y. Okada, K. Yamamura, S. Matsuyama, and K. Yamauchi
    Cutting of SiC substrates by atmospheric-pressure plasma etching with slit mask for plasma confinement
    Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology, pp. 192-193, P-41 (22-24 Oct 2012, Osaka University Nakanoshima Center, Osaka, Japan)

  • T. Osaka, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, K. Yamauchi
    Fabrication of ultrathin Bragg beam splitter by plasma chemical vaporization machining
    14th International Conference on Precision Engineering (ICPE2012), A13 (8-10 Nov 2012, Awaji Yumebutai International Conference Center, Hyogo, Japan)

  • H. Asano, S. Sadakuni, K. Yagi, Y. Sano, S. Matsuyama, T. Okamoto, K. Tachibana, K. Yamauchi
    Rapid planarization method by ultraviolet light irradiation for gallium nitride using platinum catalyst
    14th International Conference on Precision Engineering (ICPE2012), A14 (8-10 Nov 2012, Awaji Yumebutai International Conference Center, Hyogo, Japan)

  • H. Nakamori, S. Matsuyama, S. Imai, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of an ultraprecise piezoelectric deformable mirror for adaptive X-ray optics
    14th International Conference on Precision Engineering (ICPE2012), A15 (8-10 Nov 2012, Awaji Yumebutai International Conference Center, Hyogo, Japan)

  • P. V. Bui, K. Inagaki, Y. Sano, K. Yamauchi, Y. Morikawa
    First-Principles Study of Reaction Process of SiC and HF Molecules in Catalyst-Referred Etching
    14th International Conference on Precision Engineering (ICPE2012), A37 (8-10 Nov 2012, Awaji Yumebutai International Conference Center, Hyogo, Japan)

  • J. Kim, S. Matsuyama, Y. Sano, K. Yamauchi
    Improvement of interface roughness in platinum/carbon multilayers for X-ray mirrors
    14th International Conference on Precision Engineering (ICPE2012), E11 (8-10 Nov 2012, Awaji Yumebutai International Conference Center, Hyogo, Japan)

  • K. Yamauchi (invited)
    Mirror optics of beam delivery & spectrometers
    European XFEL Users' Meeting (Jan, DESY, Humburg, Germany)

  • H. Takei, S. Kurio, Y. Sano, S. Matsuyama, and K. Yamauchi
    Numerically controlled sacrificial oxidation using atmospheric-pressure plasma to improve SOI layer uniformity
    8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing (ICRP-8/SPP-31), 4P-PM-S07-P08 (4-7 Feb, Fukuoka, Japan)

  • K. Yamauchi (invited), M. Yabashi, H. Mimura, H. Yumoto, T. Koyama, K. Tono, T. Togashi, Y. Inubushi, T. Sato, T. Katayama, S. Matsuyama, J. Kim, R. Fukui, Y. Sano, W. Yashiro, T. Ohmori, S. Goto, H. Ohashi, A. Momose, and T. Ishikawa
    Nanofocusing and single shot wavefront diagnosis of SACLA
    SPIE Optics+Optelectronics, Technical Abstracts, pp. 105, 8778-14 (17-18 Apr, Clarion Congress Hotel, Prague, Czech)

  • Y. Takahashi(invited)
    High-resolution and High-sensitivity X-ray Ptychography Using Focused Hard X-ray Beam
    International conference on the state and future of ptychography (5-7 May, Hohenkammer, Germany)

  • A. Suzuki, S. Furutaku, K. Yamauchi, Y. Kohmura, T. Ishikawa, and Y. Takahashi
    Multimode X-ray Ptychography: Complementary Use of Focused and Defocused X-ray Beams
    International conference on the state and future of ptychography (5-7 May, Hohenkammer, Germany)

  • K. Yamauchi (invited)
    Progress on mirror-based optical systems for XFEL science
    The 25th Synchrotron Radiation User's Workshop, (Aug. Pohan, Korea)

  • H. Nakamori, S. Matsuyama, S. Imai, T. Goto, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of ultra-precise piezoelectric deformable mirrors for x-ray nanofocusing
    SPIE Optics+Photonics, Technical Program, p182, 8848-2 (26-29 Aug, San Diego, USA)

  • T. Osaka, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, K. Yamauchi
    Thin crystal development and applications for hard x-ray free-electron lasers
    SPIE Optics+Photonics, Technical Program, p182, 8848-3 (26-29 Aug, San Diego, USA)

  • J. Kim, T. Koyama, H. Yumoto, A. Nagahira, S. Matsuyama, Y. Sano, M. Yabashi, H. Ohashi, T. Ishikawa, K. Yamauchi
    Damage characteristics of platinum/carbon multilayers under focused x-ray free-electron laser irradiation
    SPIE Optics+Photonics, Technical Program, p183, 8848-26 (26-29 Aug, San Diego, USA)

  • S. Matsuyama (invited), Y. Emi, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of full-field hard x-ray microscopy with four aspherical mirrors
    SPIE Optics+Photonics, Technical Program, p190, 8851-6 (26-29 Aug, San Diego, USA)

  • Y. Takahashi (invited)
    High-resolution ptychographic imaging
    22nd International Congress on X-ray Optics and Microanalysis (2-6 Sep, Hamburg, Germany)

  • Y. Sano (invited), K. Arima, and K. Yamauchi
    Planarization of GaN Wafer Using Novel Polishing Technique Utilizing Catalyst Surface Reaction
    2013 JSPA-MRS Joint Symposia, Symposium J, 17p-M6-5 (16-19 Sep, Kyoto, Japan)

  • A. Isohashi, Y. Sano, S. Sadakuni, K. Yamauchi
    Chemical Etching of 4H-SiC using Catalyst-referred etching with pure water
    The International Conference on Silicon Carbide and Related Materials, Th-3A-02 (29 Sep - 4 Oct, Miyazaki, Japan)

  • Y. Okada, H. Nishikawa, Y. Sano, K. Yamamura, K. Yamauchi
    Thinning of a two-inch silicon carbide wafer by plasma chemical vaporization machining using a slit electrode
    The International Conference on Silicon Carbide and Related Materials, Th-3A-04 (29 Sep - 4 Oct, Miyazaki, Japan)

  • Y. Sano, H. Nishikawa, Y. Okada, K. Yamamura, S. Matsuyama, and K. Yamauchi
    Dicing of SiC Wafer by Atmospheric-Pressure Plasma Etching Process with Slit Mask for Plasma Confinement
    The International Conference on Silicon Carbide and Related Materials, Th-P-23 (29 Sep - 4 Oct, Miyazaki, Japan)

  • P. V. Bui, K. Inagaki, Y. Sano, K. Yamauchi, and Y. Morikawa
    Barrier Heights Investigation of Dissociative Adsorption of HF on SiC
    The International Conference on Silicon Carbide and Related Materials, Th-P-25 (29 Sep - 4 Oct, Miyazaki, Japan)

  • W. Yamaguchi, S. Sadakuni, A. Isohashi, H. Asano, Y. Sano, M. Imade, M. Maruyama, M. Yoshimura, Y. Mori, K. Yamauchi
    Planarization of the gallium nitride substrate grown by the Na flux method applying the catalyst-referred etching
    The International Conference on Silicon Carbide and Related Materials, We-P-59 (29 Sep - 4 Oct, Miyazaki, Japan)

  • K. Yamauchi (invited)
    Nanofocusing of X-ray free electron laser for coherent X-ray science
    X-ray lasers in biology (14-15 Oct, The Royal Society, London, UK)

  • Y. Sano (invited)
    Planarization of Gallium Nitride Wafers Using Novel Polishing Technique Utilizing Catalyst Surface Reaction
    WUPP for III-Nitride (Workshop on Ultra-Precision Processing for III-Nitride), 2013 (16-18 Oct, Santa Barbara, USA)

  • A. Isohashi, Y. Sano, T. Okamoto, S. Sadakuni, P. V. Bui, K. Yagi, and K. Yamauchi
    Wet Chemical Planarization of Single-Crystalline SiC Using Catalyst-Referred Etching
    28th The American Society for Precision Engineering Annual Meeting, Extended Abstracts, pp153-156 (20-25 Oct, St. Paul, USA)

  • T. Osaka, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, and K. Yamauchi
    Fabrication of Thin Si Crystal for X-Ray Beam Splitter
    28th The American Society for Precision Engineering Annual Meeting, Extended Abstracts, pp239-242 (20-25 Oct, St. Paul, USA)

  • Y. Emi
    Development of a full-field hard X-ray imaging microscope based on Advanced Kirkpatrick-Baez mirror optics
    The MEADOW 2013 (MEtrology, Astronomy, Diagnostics and Optics Workshop), (28-30 Oct, Trieste, Italy)

  • K. Yamauchi
    Adaptive focusing optics of hard X-rays with piezoelectric deformable KB mirrors
    The MEADOW 2013 (MEtrology, Astronomy, Diagnostics and Optics Workshop), (28-30 Oct, Trieste, Italy)

  • A. Kime
    Development of an X-ray slope profiler for Wolter type telescope mirrors - Performance evaluation using geometric and wave-optical simulator
    The MEADOW 2013 (MEtrology, Astronomy, Diagnostics and Optics Workshop), (28-30 Oct, Trieste, Italy)

  • Y. Sano (invited), K. Arima, and K. Yamauchi
    Abrasive-Free Polishing of SiC Wafer Utilizing Catalyst Surface Reaction
    224th ECS (The Electrochemical Society) Meeting, 1952 (27 Oct-01 Nov, San Francisco, CA, USA)

  • Y. Sano, T. Doi, S. Kurokawa, H. Aida, O. Ohnishi, M. Ueda, Y. Okada, H. Nishikawa, and K. Yamauchi
    Basic Study on Etching Selectivity of Plasma Chemical Vaporization Machiningby Introducing Crystallographic Damage into Work Surface
    5th International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN2013), 1207 (12-15 Nov, Taipei, Taiwan)

  • Y. Takahashi (invited)
    High-resolution ptychography using focused hard X-ray beam
    The 12th symposium on X-ray Imaging Optics, Abstract pp. 37-38, O-22 (18-20 Nov, Osaka, Japan)

  • S. Matsuyama (invited)
    Development of achromatic full-field hard X-ray microscopy using four total-reflection mirrors
    The 12th symposium on X-ray Imaging Optics, Abstract pp. 51-52, O-29 (18-20 Nov, Osaka, Japan)

  • Y. Emi, S. Matsuyama, H. Kino, Y. Kohmura, T. Ishikawa, and K. Yamauchi
    Development of a High-resolution Full-field Hard X-ray Imaging Microscope with Compact AKB Mirror Optics
    The 12th symposium on X-ray Imaging Optics, Abstract pp. 67-68, P-11 (18-20 Nov, Osaka, Japan)

  • H. Kino, S. Matsuyama, Y. Emi, H. Okada, Y. Sano, and K. Yamauchi
    Development of one-dimensional Wolter Mirror figured on a single substrate for full-field X-ray microscopy
    The 12th symposium on X-ray Imaging Optics, Abstract pp. 93-94, P-25 (18-20 Nov, Osaka, Japan)

  • R. Fukui, J. Kim, S. Matsuyama, H. Yumoto, Y. Inubushi, K. Tono, T. Koyama, T. Kimura, H. Mimura, H. Ohashi, M. Yabashi, T. Ishikawa, and K. Yamauchi
    Single-shot wavefront measurement of XFEL nanobeam
    The 12th symposium on X-ray Imaging Optics, Abstract pp. 97-98, P-27 (18-20 Nov, Osaka, Japan)

  • H. Nakamori, S. Matsuyama, T. Goto, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi
    Two-dimensional X-ray nanofocusing using piezoelectric deformable mirrors
    The 12th symposium on X-ray Imaging Optics, Abstract pp. 99-100, P-28 (18-20 Nov, Osaka, Japan)

  • K. Yamauchi (invited)
    Recent progress of the K-B nano-focusing system
    ALBA-SSRF Bilateral Workshop (16-18 Dec. Shanghai, China)

  • T. Sugiura, A. Isohashi, W. Yamaguchi, S. Matsuyama, Y. Sano, and K. Yamauchi
    "A novel abrasive-free chemical planarization of oxide materials using pure water and Pt catalyst"
    European society for precision engineering & nanotechnology 2014 (Euspen 2014), Extended Abstracts, pp. 351-354, P7-14 (2-6 June, Dubrovnik, Croatia)

  • S. Matsuyama (invited)
    "Development of Achromatic Full-field X-ray Microscopy Based on Total Reflection Mirrors"
    Collaborative Conference on 3D & Materials Research (CC3DMR 2014), Abstract, pp. 142 (23-27 June, Incheon/Soul, South Korea)

  • H. Takei, S. Kurio, Y. Sano, S. Matsuyama, and K. Yamauchi
    "Improving the Accuracy of Numerically Controlled Sacrificial Plasma Oxidation Using an Array of Electrodes to Produce Ultra-uniform SOI"
    15th International Conference on Precision Engineering (ICPE2014), Abstracts, pp. 32, B15 (22-25 July, Kanazawa, Japan)

  • P. V. Bui, K. Inagaki, Y. Sano, K. Yamauchi, and Y. Morikawa
    "Removal Mechanism in Catalyst-Referred Etching Process for SiC Planarization"
    15th International Conference on Precision Engineering (ICPE2014), Abstracts, pp. 50, P05 (22-25 July, Kanazawa, Japan)

  • K. Shiozawa, Y. Sano, T. Doi, S. Kurokawa, H. Aida, O. Ohnishi, M. Uneda, Y. Okada, and K. Yamauchi
    "Removal Rate of Plasma Chemical Vaporization Machining of Intentionally Damaged Surface by Mechanical Action"
    15th International Conference on Precision Engineering (ICPE2014), Abstracts, pp. 53, P22 (22-25 July, Kanazawa, Japan)

  • Y. Takahashi (invited)
    "Coherent Diffraction Imaging with Focused Hard X-ray Beams"
    NSS-8 (The 8th International Workshop on Nanoscale Spectroscopy and Nanotechnology), (28-31 July, Chicago, US)

  • J. Kim, S. Matsuyama, Y. Sano, and K. Yamauchi
    "Development of high-precision figure measurement system for x-ray optics using laser focus microscope"
    SPIE Optics+Photonics2014, 9206-11 (17-21 August, San Diego, CA, US)

  • S. Matsuyama, Y. Emi, H. Kino, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Development of achromatic full-field hard X-ray microscopy and its application to X-ray absorption near edge structure spectromicroscopy"
    SPIE Optics+Photonics2014, 9207-27 (17-21 August, San Diego, CA, US)

  • T. Goto, S. Matsuyama, H. Nakamori, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Development of a two-stage x-ray focusing system with ultraprecise deformable mirrors"
    SPIE Optics+Photonics2014, 9208-1 (17-21 August, San Diego, CA, US)

  • T. Osaka (invited), T. Hirano, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, K. Ogawa, S. Matsuyama, T. Ishikawa, and K. Yamauchi
    "Development of split-delay x-ray optics using Si(220) crystals at SACLA"
    SPIE Optics+Photonics2014, 9210-8 (17-21 August, San Diego, CA, US)

  • Y. Sano (invited)
    "High-speed Etching of Wide-gap Semiconductors Using Atmospheric Pressure Plasma"
    Workshop on Ultra-Precision Processing (WUPP) for Wide-gap Semiconductors 2014, Abstracts pp. 8 (20-22 August, Bath, United Kingdom)

  • Y. Takahashi (invited)
    "Recent Progress of Hard X-ray Ptychography at SPring-8"
    International Workshop on Phase Retrieval and Coherent Scattering (Coherence2014), (2-5 September, Northwestern University, Evanston, Illinois, US)

  • W. Roseker, S. Lee, M. Walther, H. Schulte-Schrepping, T. Osaka, M. Sikorski, S. Song, P. H. Fuoss, G. B. Stephenson, A. Robert, and G. Grubel
    "Hard X-ray Delay Line for X-ray Photon Correlation Spectroscopy"
    International Workshop on Phase Retrieval and Coherent Scattering (Coherence2014), (2-5 September, Northwestern University, Evanston, Illinois, US)

  • A. Suzuki and Y. Takahashi
    "A Method for Ptychographic X-ray Imaging of Weak-Phase Objects"
    International Workshop on Phase Retrieval and Coherent Scattering (Coherence2014), (2-5 September, Northwestern University, Evanston, Illinois, US)

  • K. Shimomura, A. Suzuki, M. Hirose, and Y. Takahashi
    "High-resolution multislice x-ray ptychography in combination with precession measurement"
    International Workshop on Phase Retrieval and Coherent Scattering (Coherence2014), Poster number 28, (2-5 September, Northwestern University, Evanston, Illinois, US)

  • T. Osaka, T. Hirano, Y. Inubushi, M. Yabashi, Y. Sano, S. Matsuyama, K. Tono, T. Sato, K. Ogawa, T. Ishikawa, and K. Yamauchi
    "Development of Hard X-Ray Split-Delay Optics Based on Si(220) Crystals"
    JSAP-OSA Joint Symposia 2014 (The 75th JSAP Autumn Meeting 2014), Extended Abstracts pp.18-136, 17p-C4-3 (17-20 September, Hokkaido University, Hokkaido, Japan)

  • A. Isohashi, Y. Sano, T. Kato, and K. Yamauchi
    "Planarization of 6-in 4H-SiC wafer by Catalyst-referred etching"
    2014 European Conference on Silicon Carbide and Relative Materials (ECSCRM2014), Extended Abstracts pp.77, TU-P-20 (21-25 September, Grenoble, France)

  • P. V. Bui, K. Inagaki, Y. Sano, K. Yamauchi, and Y. Morikawa
    "First-Principles Study of HF Etching at Step Edges SiC Surfaces in Catalyst-Referred Etching Process"
    2014 European Conference on Silicon Carbide and Relative Materials (ECSCRM2014), Extended Abstracts pp.85, TU-P-48 (21-25 September, Grenoble, France)

  • A. Suzuki, K. Shimomura, S. Furutaku, K. Yamauchi, Y. Kohmura, T. Ishikawa, and Y. Takahashi
    "High-resolution hard x-ray ptychography of extended thick objects using multislice approach"
    International Conference on X-ray Microscopy (XRM2014), Conference Program Handbook pp.97 (26-31 October, Melbourne Convention and Exibition Center, Melbourne, Australia)

  • S. Matsuyama, Y. Emi, H. Kino, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Achromatic full-field X-ray microscopy using four total-reflection mirror"
    International Conference on X-ray Microscopy (XRM2014), Conference Program Handbook pp.103 (26-31 October, Melbourne Convention and Exibition Center, Melbourne, Australia)

  • K. Shimomura, A. Suzuki, M. Hirose, and Y. Takahashi
    "High-resolution multislice x-ray ptychography with precession measurement"
    International Conference on X-ray Microscopy (XRM2014), Conference Program Handbook pp.198 (26-31 October, Melbourne Convention and Exibition Center, Melbourne, Australia)

  • T. Hirano, T. Osaka, Y. Inubushi, M. Yabashi, Y. Sano, S. Matsuyama, K. Tono, K. Ogawa, T. Ishikawa, and K. Yamauchi
    "Development of Autocorrelator for Hard X-ray Free-Electron Laser"
    The 1st International Symposium on Interactive Materials Science Cadet Program (iSIMSC), PP-13 (16-19 November, Osaka, Japan)

  • K. Yamauchi (invited)
    "Atomically Controlled Surfacing of Single Crystalline SiC and GaN by Catalyst-Referred Etching"
    2014 International Conference on Planarization/CMP Technology (ICPT2014), Proceedings pp. 139-141, 8-1 (19-21 November, Kobe, Japan)

  • A. Isohashi, Y. Sano, and K. Yamauchi
    "Planarization of 4H-SiC(0001) by Catalyst-Referred Etching Using Pure Water Etchant"
    2014 International Conference on Planarization/CMP Technology (ICPT2014), Proceedings pp. 273-274, P25 (19-21 November, Kobe, Japan)

  • K. Shiozawa, Y. Sano, T. Doi, S. Kurokawa, H. Aida, K. Oyama, T. Miyashita, H. Sumizawa, and K. Yamauchi
    "Development of Basic-Type CMP/P-CVM Fusion Processing System (Type A) and Its Fundamental Characteristics"
    2014 International Conference on Planarization/CMP Technology (ICPT2014), Proceedings pp. 275-278, P26 (19-21 November, Kobe, Japan)

  • W. Yamaguchi, S. Sadakuni, A. Isohashi, H. Asano, Y. Sano, M. Imade, M. Maruyama, M. Yoshimura, Y. Mori, and K. Yamauchi
    "Atomic scale flattening of gallium nitride substrate grown by Na flux method applying catalyst referred etching"
    2014 International Conference on Planarization/CMP Technology (ICPT2014), Proceedings pp. 337-339, P47 (19-21 November, Kobe, Japan)

  • T. Osaka (invited)
    "Current status of a hard x-ray split-and-delay scheme at SACLA"
    Pre-conference satellite meeting on dynamic imaging: from AMO/Chemistry to Bio. (HeKKSaGOn University Consortium The 4th Japanese-German University Presidents' Conference), (16 April, Tohoku University, Sendai, Japan)

  • K. Yamauchi (invited)
    "X-ray focusing optics at SACLA"
    HeKKSaGOn University Consortium The 4th Japanese-German University Presidents' Conference, (16-18 April, Tohoku University, Sendai, Japan)

  • Y. Sano, K. Shiozawa, T. Doi, S. Kurokawa, H. Aida, K. Oyama, T. Miyashita, H. Sumizawa and K. Yamauchi
    "Damage-induced increase of removal rate of atmospheric-pressure plasma etching of diamond substrate"
    9th International Conference on New Diamond and Nano Carbons, 6-3 (24-28 May 2015, Shizuoka, Japan)

  • A. Isohashi, S. Sadakuni, T. Sugiura, N. Kidani, T. Inada, W. Yamaguchi, K. Inagaki, Y. Sano and K. Yamauchi
    "A new mirror-like finish method for oxide materials by catalytically induced chemical etching in pure water"
    EUSPEN 15th International Conference and Exhibition, P5.22 (1-5 June, Leuven, Belgium)

  • K. Yamauchi
    "High precision multilayer mirror for nanofocusing X-ray free electron laser"
    The 2nd FELs of Europe Workshop on FEL Photon Diagnostics, Instrumentation, and Beamlines Design (PhotonDiag2015), (8-10 June, Torieste, Italy)

  • Y. Sano, K. Shiozawa, T. Doi, S. Kurokawa, H. Aida, T. Miyashita and K. Yamauchi
    "High-efficiency planarization method for hard-to-machine semiconductor substrates combining mechanical polishing and atmospheric-pressure plasma etching"
    2015 JSME-IIP/ASME-ISPS Joint Conference on Micromechatronics for Information and Precision Equipment (MIPE2015), WeC-2-5 (14-17 June, Kobe, Japan)

  • S. Matsuyama, H. Kino, S. Yasuda, Y. Kohmura, H. Okada, M. Yabashi, T. Ishikawa and K. Yamauchi
    "Achromatic X-ray Imaging Optics Based on Advanced Kirkpatric-Baez Mirrors"
    The 12th International Conference on Synchrotron Radiation Instrumentation (SRI2015), Oral Abstracts pp. 58 (6-10 July, Marriott Marquis, New York, US)

  • K. Yamauchi, J. Kim, H. Yumoto, S. Matsuyama, H. Ohashi, M. Yabashi and T. Ishikawa
    "Challenges Toward Single Nanometer Focusing of X-ray Free Electron Laser"
    The 12th International Conference on Synchrotron Radiation Instrumentation (SRI2015), Oral Abstracts pp. 83 (6-10 July, Marriott Marquis, New York, US)

  • T. Osaka, T. Hirano, Y. Inubushi, Y. Sano, S. Matsuyama, K. Tono, T. Katayama, T. Ishikawa, K. Yamauchi and M. Yabashi
    "Demonstration of Feasibility of X-ray Pump-X-ray Probe Experiments Using Hard X-ray Split-and-Delay Optics Combined with Focusing Mirrors"
    The 12th International Conference on Synchrotron Radiation Instrumentation (SRI2015),Oral Abstracts pp. 133 (6-10 July, Marriott Marquis, New York, US)

  • J. Kim, A. Nagahira, A. Nishikawa, S. Matsuyama, H. Yumoto, Y. Senba, T. Koyama, Y. Sano, H. Ohashi, M. Yabashi, T. Ishikawa and K. Yamauchi
    "X-ray mirror surface metrology using optical and at-wavelength techniques for hard XFEL single-nanometer focusing"
    The 12th International Conference on Synchrotron Radiation Instrumentation (SRI2015), Poster Abstracts pp. 299, THU-P-015 (6-10 July, Marriott Marquis, New York, US)

  • H. Nakamori, T. Goto, S. Matsuyama, T. Kimura, Y. Sano, H. Okada, S. Aono, S. Shiroma, A. Ueda, T. Tsumura, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa and K. Yamauchi
    "Development of a two-stage adaptive X-ray focusing system using piezoelectric deformable mirrors"
    International Workshop on X-Ray Optics and Metrology (IWXM2015), Abstracts pp. 20 (13-16 July, Berkeley, CA, US)

  • K. Yamauchi
    "Challenges in ultimate focusing of X-ray free electron laser"
    International Workshop on X-Ray Optics and Metrology (IWXM2015), Abstracts pp. 22 (13-16 July, Berkeley, CA, US)

  • T. Goto, S. Matsuyama, H. Nakamori, T. Kimura, S. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa and K. Yamauchi
    "Development of an adaptive K-B mirror for hard x-ray nanofocusing using piezoelectric deformable mirrors"
    SPIE Optics+Photonics2015, 9588-5 (9-13 August, San Diego, CA, US)

  • T. Hirano, T. Osaka, Y. Inubushi, Y. Sano, S. Matsuyama, K. Tono, T. Ishikawa, K. Kazuto and M. Yabashi
    "Development of split-delay optics with wide range of photon energy for XFEL pump/XFEL probe experiments"
    SPIE Optics+Photonics2015, 9588-15 (9-13 August, San Diego, CA, US)

  • S. Matsuyama, H. Kino, S. Yasuda, Y. Kohmura, H. Okada, T. Ishikawa and K. Yamauchi
    "Development of achromatic full-field hard x-ray microscopy with two monolithic imaging mirrors"
    SPIE Optics+Photonics2015, 9592-7 (9-13 August, San Diego, CA, US)

  • J. Yamada, S. Matsuyama, Y. Sano and K. Yamauchi
    "Fabrication of X-ray mirror with a shape accuracy of 1 nm using ion beam figuring system with electrostatic deflection"
    6th International Conference on Asian Society for Precision Engineering and Nanotechnology (ASPEN2015), Oral Abstracts pp. 37 (15-19 August, Harbin, P. R. China)

  • K. Yamauchi (Invited)
    "Mirror-based optical system for the 3rd and 4th generation synchrotron radiation sources"
    23rd International Congress on X-ray Optics and Microanalysis (ICXOM23), Oral Abstracts pp. 19 (14-18 September, NY, USA)

  • Yasuhisa Sano, Kousuke Shiozawa, Toshiro Doi, Syuhei Kurokawa, Hideo Aida, Koki Oyama, Tadakazu Miyashita, Haruo Sumizawa and Kazuto Yamauchi
    "Optimization of Machining Conditions of BasicType CMP/P-CVM Fusion Processing Using SIC Substrate" International Conference on Planarization/CMP Technology (2015 ICPT) (September 30-October 2, Chandler AZ)

  • A. Isohashi, W. Yamaguchi, T. Sugiura, T. Inada, S. Matsuyama, Y. Sano and K. Yamauchi
    "Effect of catalyst potential on removal reaction in catalyst‐referred etching for 4H-SiC(0001) in pure water"
    The International Conference on Silicon Carbide and Related Materials (ICSCRM) 2015, We-3B-5 (4-9 October, Giardini Naxos, Italy)

  • P. V. Bui, K. Inagaki, H. Kizaki, Y. Sano, K. Yamauchi and Y. Morikawa
    "First‐Principles Simulations of Initial Etching Process of SiC with Water Assisted by Platinum Catalyst"
    The International Conference on Silicon Carbide and Related Materials (ICSCRM) 2015, Mo-P-14 (4-9 October, Giardini Naxos, Italy)

  • M. Hirose, A. Suzuki, K. Shimomura, N. Burdet and Y. Takahashi
    "Simultaneous reconstruction of isolated objects and probe functions from multiple diffraction intensities"
    The 13th Symposium on X-ray Imaging Optics, P-18 (17-18 November, Nagoya, Japan)

  • S. Yaduda, S. Matsuyama, H. Okada, S. Aono, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa and K. Yamauchi
    "Development of a full-field X-ray microscope with two monolithic imaging mirrors"
    The 13th Symposium on X-ray Imaging Optics, P-26 (17-18 November, Nagoya, Japan)

  • J. Yamada, S. Matsuyama and K. Yamauchi
    "Simulation study of full-field x-ray microscope utilizing advanced Kirkpatrick-Baez mirror based on the Wolter type III optics"
    The 13th Symposium on X-ray Imaging Optics, P-27 (17-18 November, Nagoya, Japan)

  • T. Goto, H. Nakamori, S. Matsuyama, T. Kimura, K. P. Khakurel, Y. Sano, Y. Kohmura, M. Yabashi, Y. Nishino, T. Ishikawa and K. Yamauchi
    "Development of a two-stage adaptive Kirkpatrick-Baez mirror system for hard x-ray focusing using piezoelectric deformable mirrors"
    The 13th Symposium on X-ray Imaging Optics, P-30 (17-18 November, Nagoya, Japan)

  • A. Nishihara, S. Matsuyama, J. Kim, S. kawai, H. Yumoto, T. Koyama, K. Tono, Y. Inubushi, H. Ohashi, S. Goto, M. Yabashi, T. Ishikawa and K. Yamauchi
    "Wavefront measurement of x-ray laser nanobeam using phase diffraction grating"
    The 13th Symposium on X-ray Imaging Optics, P-31 (17-18 November, Nagoya, Japan)

  • T. Hirano, T. Osaka, Y. Sano, Y. Inubushi, S. Matsuyama, K. Tono, T. Ishikawa, K. Yamauchi and M. Yabashi
    "Development of Split-delay Optics for Capturing femtosecond-scale Dynamics with Hard X-ray Lasers"
    The 2nd International Symposium of Interactive Materials Science Cadet Program, PP-3 (18-19 November, Osaka, Japan)

  • T. Osaka (invited)
    "Current status of hard x-ray split-and-delay optics using Si(220) crystals at SACLA"
    7th Ringberg Workshop on Science with FELs —from first results to future perspectives (7-10 February, Scholoss Ringberg, Kreuth, Germany)

  • B. V. Pho
    "First-Principles Calculations of Initial Etching Process of SiC with Water Assisted by Platinum Catalyst"
    12th International Conference of Computational Methods in Sciences and Engineering (ICCMSE2016) (17-20 March, Metropolitan Hotel, Athens, Greece)

  • A. Isohashi
    "Investigation of the mechanism of a catalytic etching method in pure water for SiO2 using first-principles calculations"
    12th International Conference of Computational Methods in Sciences and Engineering (ICCMSE2016) (17-20 March, Metropolitan Hotel, Athens, Greece)

  • Y. Takahashi (invited)
    "High-resolution Bragg Ptychography Using Focused Hard X-ray Beams"
    2016 International Workshop on Bragg Coherent Diffractive Imaging (23-24 March, NSRRC, Hsinchu, Taiwan)

  • S. Matsuyama
    "Measurement of shape errors on an imaging mirror using an X-ray grating interferometer"
    Advanced Optical Manufacturing and Testing Technologies (AOMATT2016) (26-29 April, Suzhou, China)

  • T. Goto
    "In-situ slope error measurement for adaptive hard x-ray focusing optics"
    Advanced Optical Manufacturing and Testing Technologies (AOMATT2016) (26-29 April, Suzhou, China)

  • S.Matsuyama, S. Yashuda, H. Okada, Y. Kohmura, Y. Sano, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Achromatic and high-resolution full-field X-ray microscopy based on four total-reflection mirrors"
    International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016 (XOPT2016), XOPT3-3, (18-20 May, Pacifico Yokohama, Kanagawa, Japan)

  • J. Yamada, S. Matsuyama, and K. Yamauchi
    "Development of a compact x-ray imaging optical system using two pairs of concave and convex mirrors"
    International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016 (XOPT2016), XOPT3-4, (18-20 May, Pacifico Yokohama, Kanagawa, Japan)

  • K. Yamauchi (invited)
    "Progress of mirror-based optical system for X-ray nanofocusing and imaging"
    International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016 (XOPT2016), XOPT6-1, (18-20 May, Pacifico Yokohama, Kanagawa, Japan)

  • T. Osaka, T. Hirano, Y. Sano, Y. Inubushi, S. Matsuyama, K. Tono, T. Ishikawa, K. Yamauchi, and M. Yabashi
    "Wavelength-tunable hard X-ray split-and-delay optics at SACLA"
    International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016 (XOPT2016), XOPT7-1, (18-20 May, Pacifico Yokohama, Kanagawa, Japan)

  • S. Kawai, S. Matsuyama, A. Nishihara, H. Yumoto, Y. Inubushi, T. Koyama, K. Tono, H. Ohashi, T. Katayama, S. Goto, T. Ishikawa, M. Yabashi, and K. Yamauchi
    "Wavefront measurement of sub-10-nm XFEL nanobeam produced by multilayer focusing mirrors"
    International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016 (XOPT2016), XOPTp8-4, (18-20 May, Pacifico Yokohama, Kanagawa, Japan)

  • H. Hayashi, T. Goto, H. Nakamori, S. Matsuyama, T. Kimura, K. P. Khakurel, Y. Sano, Y. Kohmura, M. Yabashi, Y. Nishino, T. Ishikawa, and K. Yamauchi
    "A variable-numerical-aperture x-ray focusing system using a two-stage adaptive Kirkpatrick-Baez mirrors based on piezo electric deformable mirrors"
    International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016 (XOPT2016), XOPTp8-5, (18-20 May, Pacifico Yokohama, Kanagawa, Japan)

  • T. Goto, H. Nakamori, S. Matsuyama, H. Hayashi, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Size-controllable X-ray beam collimation using a two-stage adaptive Kirkpatrick-Baez mirror system based on piezoelectric deformable mirrors"
    International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016 (XOPT2016), XOPTp8-6, (18-20 May, Pacifico Yokohama, Kanagawa, Japan)

  • S. Yasuda, S. Matsuyama, H. Okada, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "High-resolution imaging XAFS using advanced Kirkpatrick-Baez mirror optics"
    International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016 (XOPT2016), XOPTp8-7, (18-20 May, Pacifico Yokohama, Kanagawa, Japan)

  • T. Hirano, T. Osaka, Y. Sano, Y. Inubushi, S. Matsuyama, K. Tono, T. Ishikawa, M. Yabashi, and K. Yamauchi
    "Fabrication of Strain-Free Crystal Optics for a Hard X-ray Split-and-Delay Optical System"
    International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016 (XOPT2016), XOPTp8-8, (18-20 May, Pacifico Yokohama, Kanagawa, Japan)

  • Y. Takahashi (invited)
    "High-resolution coherent X-ray diffraction imaging at SPring-8 and SACLA"
    The 15th International Conference on X-Ray Lasers, I-14 (22-27 May, Nara Kasugano International Forum, Nara, Japan)

  • A. Isohashi, T. Inada, D. Toh, Y. Nakahira, T. Sugiura, N. Kidani, K. Inagaki, Y. Sano, S. Matsuyama, and K. Yamauchi
    "Investigation of catalytic metals for a catalyst referred etching in pure water"
    Euspen's 16th International Conference, O6.1 (30 May - 3 June, University of Nottingham, Nottingham, UK)

  • M. Hirose
    "Multiple defocused CXDI: A method for simultaneous reconstruction of isolated samples and probe using XFELs"
    International Workshop on Phase Retrieval and Coherent Scattering (COHERENCE2016) (7-10 June, Palais des Congrès Le Grand Large, Saint-Malo, France)

  • K. Shimomura, N. Burdet, M. Hirose, A. Suzuki, and Y. Takahashi
    "Efficient Use of Coherent X-rays in Ptycography"
    International Workshop on Phase Retrieval and Coherent Scattering (COHERENCE2016), PO-44 (7-10 June, Palais des Congrès Le Grand Large, Saint-Malo, France)

  • K. Yamauchi(invited)
    "Advanced mirror-based optics for full field imaging and zoon condenser systems"
    13th International Conference on X-ray Microscopy (XRM2016), Mon4-CoherentImaging-1 (15-19 August, University of Oxford, Oxford, UK)

  • M. Hirose, A. Suzuki, K. Shimomura, N. Burdet, and Y. Takahashi
    "High-resolution imaging XAFS using X-ray ptychography"
    13th International Conference on X-ray Microscopy (XRM2016), Wed2a-DiffractionImaging-1 (15-19 August, University of Oxford, Oxford, UK)

  • T. Goto, H. Nakamori, S. Matsuyama, H. Hayashi, T. Kimura, K. P. Khakurel, Y. Sano, Y. Kohmura, M. Yabashi, Y. Nishino, T. Ishikawa, and K. Yamauchi
    "A Two-stage Adaptive X-ray Focusing System using Four Piezoelectric Deformable Mirrors"
    13th International Conference on X-ray Microscopy (XRM2016), S1-P1-06 (15-19 August, University of Oxford, Oxford, UK)

  • S. Matsuyama, S. Yasuda, H. Okada, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Achromatic full-field X-ray microscope with 50 nm resolution and its applications"
    13th International Conference on X-ray Microscopy (XRM2016), S1-P1-33 (15-19 August, University of Oxford, Oxford, UK)

  • J. Yamada, S. Matsuyama, and K. Yamauchi
    "Development of Concave-convex Imaging Mirror System For Compact Full-field X-Ray Microscope"
    13th International Conference on X-ray Microscopy (XRM2016), S2-P7-02 (15-19 August, University of Oxford, Oxford, UK)

  • K. Shimomura, N. Burdet, M. Hirose, A. Suzuki, and Y. Takahashi
    "Efficent use of choherent X-rays in ptycography: Towards high-resolution and high-throughput observation of weak-phase object"
    13th International Conference on X-ray Microscopy (XRM2016), S3-P12-12 (15-19 August, University of Oxford, Oxford, UK)

  • S. Matsuyama, A. Kime, T. Sakao, Y. Suematsu, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Novel shape measurement method for imaging mirrors using an x-ray grating interferometer"
    SPIE Optics+Photonics2016, 9962-12 (28 August - 1 September, San Diego Convention Ceter, California, United States)

  • S. Matsuyama, J. Yamada, Y. Sano, and K. Yamauchi
    "Development of an x-ray imaging optical system based on a combination of concave and convex mirrors"
    SPIE Optics+Photonics2016, 9963-19 (28 August - 1 September, San Diego Convention Ceter, California, United States)

  • T. Goto, S. Matsuyama, H. Nakamori, H. Hayashi, T. Kimura, K. P. Khakurel, Y. Kohmura, Y. Sano, M. Yabashi, T. Ishikawa, Y. Nishino, and K. Yamauchi
    "Development of an x-ray adaptive optical system using four deformable mirrors for focusing and collimating"
    SPIE Optics+Photonics2016, 9965-1 (28 August - 1 September, San Diego Convention Ceter, California, United States)

  • P. V. Bui, A. Isohashi, K. Inagaki, Y. Sano, K. Yamauchi, and Y. Morikawa
    "First-Principles Simulations of Platinum-Assisted Water Etching of SiC"
    ECOSS32 - European Conference on Surface Science, O16-SCR_150 (28 August- 2 September, ALPES CONGRES, Grenoble, France)

  • B. V. Pho, A. Isohashi, Y. Sano, and K. Yamauchi
    "Wet Chemical Planarization of SiC Surface"
    VJSE2016 - Vietnamese-Japanese Students' Scientific Exchange Meeting, Session 1 Oral (17 September, Kyushu University, Fukuoka, Japan)

  • T. Hirano, T. Osaka, Y. Sano, Y. Inubushi, S. Matsuyama, K. Tono, T. Ishikawa, M. Yabashi, and K. Yamauchi
    "Performance of a split-and-delay optics at SACLA"
    Pre-conference satellite meeting on dynamic imaging (HeKKSaGOn ―German-Japanese University Network 5th Japanese-German University President’s Conference), (28 September, Heidelberg, Germany)

  • A. Isohashi, T. Inada, S. Matsuyama, Y. Sano, and K. Yamauchi
    "Planarization of SiC and GaN Wafers by Catalyst-Referred Etching Employing a Photo-electrochemical Reaction"
    11th European Conference on Silicon Carbide and Related Materials (ECSCRM 2016), MoP.19 (25-29 September, Porto Carras Grand Resort, Halkidiki, Greece)

  • D. Toh, A. Isohashi, P. V. Bui, T. Inada, Y. Nakahira, Y. Sano, S. Matsuyama, and K. Yamauchi
    "Study on the catalytic activities of transition metals in the catalyst-referred etching of SiC"
    11th European Conference on Silicon Carbide and Related Materials (ECSCRM 2016), MoP.19 (25-29 September, Porto Carras Grand Resort, Halkidiki, Greece)

  • Y. Sano (invited), K. Arima, and K. Yamauchi
    "Atomic-scale Planarization of SiC and GaN Substrates Using Catalyst-referred Etching"
    WUPP for Wide Band Gap Semiconductors, 2016 Workshop on Ultra-precision Processing for wide band Gap Semiconductors (Oct.31-Nov.2, 2016, Hsinchu, Taiwan)

  • K. Yamauchi (invited), Y. Sano, and Y. Morikawa
    "Atomically smoothing SiC and GaN surfaces by catalyst referred etching"
    International Workshop on Advanced Materials and Nanotechnology 2016 (IWAMN 2016) (Nov. 3-5, 2016, Hanoi, Vietnam)

  • Pho Van Bui, Ai Isohashi, Yasuhisa Sano, Yoshitada Morikawa, and Kazuto Yamauchi
    "Wet-Chemical Planarization of SiC Wafers for Advanced Optoelectronics Applications"
    8th International Workshop on Advanced Materials Scienve and Nanotechnology (IWAMSN 2016) (Nov. 8-12, 2016, Ha Long City, Vietnam)

  • Y. Sano, H. Takei, S. Matsuyama, and K. Yamauchi
    "Thickness uniformization of the silicon layer in a silicon‐on‐insulator wafer by a numerically controlled plasma process using an array‐type electrode"
    The 7th International Symposium on Advanced Science and Technology of Silicon Materials (JSPS Si Symposium), F-02 (21‐25 November, 2016, Sheraton Kona Resort & Spa at Keauhou Bay, Hawaii, US)

  • T. Inada, A. Isohashi, S. Matsuyama, Y. Sano, K. Yamauchi
    "Planarization of GaN Wafers by Catalyst-Referred Etching Employing Photoelectrochemical Oxidation"
    Global Nanophotonics 2016, P-47 (Nov. 30- Dec. 1, Osaka International Convention Center, Grand Cube, Osaka, Japan)

  • T. Osaka (invited)
    "Hard x-ray split-delay optics at SACLA -Current status and future perspectives"
    International Workshop on Frontiers of XFEL science (Dec. 7-9, POSTECH, Pohang, Korea)

  • K.Yamauchi (invited)
    "Nano-focusing and nano-imaging optics for advanced synchrotron radiation sources"
    International Workshop on Frontiers of XFEL science (Dec. 7-9, POSTECH, Pohang, Korea)

  • Y. Takahashi(invited)
    "High-resolution hard X-ray spectro-ptychography"
    International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017, XOPT1-2 (18-21 April, Pacifico Yokohama, Kanagawa, Japan)

  • S. Matsuyama, J. Yamada, S. Yasuda, Y. Kohmura, H. Okadam, Y. Sano, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Achromatic and High-Resolution Full-Field X-ray Microscope and its Applicaiton"
    International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017, XOPT2-3 (18-21 April, Pacifico Yokohama, Kanagawa, Japan)

  • T. Hirano, T. Osaka, Y. Sano, Y. Inubushi, T. Togashi, I. Inoue, S. Matsuyama, K. Tono, K. Yamauchi, and M. Yabashi
    "Hard X-ray Split-and-Delay Optics with wavefront Division at SACLA"
    International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017, XOPT6-1 (18-21 April, Pacifico Yokohama, Kanagawa, Japan)

  • H. Nakamori, H. Okada, S. Aono, A. Ueda, K. Yamauchi, and T. Tsumura
    "Development of Measurement System for 1 m-long, large-curvature and ellipsoidal synchrotron mirrors"
    International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017, XOPTp8-3 (18-21 April, Pacifico Yokohama, Kanagawa, Japan)

  • T. Inoue, S. Matsuyama, S. Kawai, H. Yumoto, Y. Inubushi, T. Koyama, K. Tono, H. Ohashi, T. Katayama, S. Goto, T. Ishikawa, M. Yabashi, and K. Yamauchi
    "Development of calibration method for X-ray single-grating interferometry"
    International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017, XOPTp8-7 (18-21 April, Pacifico Yokohama, Kanagawa, Japan)

  • S. Kawai, S. Matsuyama, T. Inoue, H. Yumoto, Y. Inubushi, T. Osaka, T. Koyama, K. Tono, H. Ohashi, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Development of a multilayer KB mirror sysem for sub-10nm XFEL focusing"
    International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017, XOPTp8-8 (18-21 April, Pacifico Yokohama, Kanagawa, Japan)

  • J. Yamada, S. Matsuyama, S. Yasuda, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "High-magnification X-ray imaging mirror system consisting of elliptical concave and hyperbolic convex mirrors"
    International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017, XOPTp8-11 (18-21 April, Pacifico Yokohama, Kanagawa, Japan)

  • T. Goto, S. Matsuyama, H. Hayashi, J. Sonoyama, K. Akiyama, H. Nakamori, Y. Sano, and K. Yamauchi
    "Development of an adaptive x-ray focusing system based on the combination of piezoelectric bimorph mirror and mirror bender"
    International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017, XOPTp8-16 (18-21 April, Pacifico Yokohama, Kanagawa, Japan)

  • M.Hirose, K. Shimomura, N. Burdet, and Y. Takahashi
    "Multiple defocused coherent diffraction imaging: method for simultaneously reconstructing objects and probe using XFELs"
    International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017, XOPTp8-34 (18-21 April, Pacifico Yokohama, Kanagawa, Japan)

  • T. Osaka, T. Hirano, Y. Morioka, Y. Sano, Y. Inubushi, T. Togashi, I. Inoue, K. Tono, S. Matsuyama, K. Yamauchi, and M. Yabashi
    "Measuring Temporal Profile of Femtosecond X-Ray Pulses with a Hard X-Ray Split-and-Delay Optical System at SACLA"
    International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017, XOPTp8-36 (18-21 April, Pacifico Yokohama, Kanagawa, Japan)

  • T. Osaka(invited)
    "A hard x-ray split-and-delay optics with wavefront dividing crystals at SACLA"
    SPIE OPTICS+OPTOELECTRONICS 2017, 10237-25,(25-27 April, Clarion Congress Hotel Prague, Prague, Czech Republic)

  • T. Hirano, T. Osaka, Y. Sano, Y. Inubushi, T. Togashi, I. Inoue, S. Matsuyama, K. Tono, K. Yamauchi, and M. Yabashi
    “Characterizing temporal coherence property of SACLA-XFEL pulses using hard X-ray split-and-delay optics”
    Workshop on FEL Photon Diagnostics, Instrumentation, and Beamline Design (PhotonDiag2017), 19 (1–3 May, SLAC National Accelerator Laboratory, Menlo Park, USA)

  • T. Hirano, T. Osaka, Y. Sano, Y. Inubushi, T. Togashi, I. Inoue, S. Matsuyama, K. Tono, K. Yamauchi, and M. Yabashi
    “Development of Hard X-Ray Split-and-Delay Optical System for Capturing Atomic-Scale Dynamics with Femtosecond X-Ray Pulses”
    Interdisciplinary Symposium for Up-and-coming Material Scientists 2017 (ISUMS2017), P10 (8–9 June, Osaka University, Osaka, Japan)

  • P. V. Ban, A. Isohashi, D. Toh, S. Matsuyama, K. Inagaki, Y. Sano, and K. Yamauchi
    "Planarization of SiC and oxide surfaces by using Catalyst-Referred Etching with water"
    The European Society for Precision Engineering and Nanotechnology - 17th International Conference and Exhibition (EUSPEN2017), (29 May - 2 June, Hannover Congress Centre, Hannover, Germany)

  • K. Yamauchi(invited)
    "Advances and future prospects of precision X-ray mirror optics"
    Light Conference 2017, Advances in X-ray Optics, Keynote Speech (17-18 June, Changchun International Conference & Exhibition Center Changchun, China)

  • P. Bui, D. Toh, A. Isohashi, Y. Sano, K. Yamauchi
    "Ultra-smooth SiC and oxide surfaces planarized using catalyst-referred etching"
    Nanophysics: from Fundamentals to Applications, p.22(30 July - 5 August, 2017, Quy Nhon, Vietnam)

  • Y. Sano (invited), K. Arima, K. Yamauchi
    "Fabrication of atomically at silicon carbide surface using catalyst-referred etching (CARE)"
    Nanophysics: from Fundamentals to Applications, p.38(30 July - 5 August, 2017, Quy Nhon, Vietnam)

  • R. Mukai, K. Yamauchi, Y. Sano, S. Matsuyama, Y. Inoue
    "Damage-free dry etching processing of SiC substrates by using high-pressure plasma"
    Nanophysics: from Fundamentals to Applications, p.50(30 July - 5 August, 2017, Quy Nhon, Vietnam)

  • S. Okayama, H. Takei, S. Matsuyama, K. Yamauchi, Y. Sano
    "Nanoprecision process for improving thickness uniformity of top silicon layer of silicon-on-insulator wafer by using a multi-electrode plasma generator"
    Nanophysics: from Fundamentals to Applications, p.51(30 July - 5 August, 2017, Quy Nhon, Vietnam)

  • S. Matsuyama, J. Yamada, S. Yasuda, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Development of full-field x-ray fluorescence microscope using total-reflection mirrors"
    SPIE Optics+Photonics2017, oral10389-5 (6-10 Aug., San DIego Convention Center, San Diego, California, US)

  • K. Shimomura, M. Hirose, N. Burdet, and Y. Takahashi
    "Multislice x-ray ptychography towards 3D high-resolution imaging"
    SPIE Optics+Photonics2017, oral10389-11 (6-10 Aug., San DIego Convention Center, San Diego, California, US)

  • M. Hirose, K. Shimomura, N. Burdet, and Y. Takahashi
    "High-resolution chemical imaging using hard x-ray spectro-ptychography"
    SPIE Optics+Photonics2017, oral10389-23 (6-10 Aug., San DIego Convention Center, San Diego, California, US)

  • H. Nakamori, Y. Ichii, H. Okada, A. Ueda, T. Tsumura, S. Matsuyama, and K. Yamauchi
    "Development of measurement system for ellipsoidal mirrors"
    SPIE Optics+Photonics2017, oral10385-30 (6-10 Aug., San DIego Convention Center, San Diego, California, US)

  • J. Yamada, S. Matsuyama, S. Yasuda, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Development of concave-convex imaging mirror system for a compact and achromatic full-field x-ray microscope"
    SPIE Optics+Photonics2017, oral10386-12 (6-10 Aug., San DIego Convention Center, San Diego, California, US)

  • T. Goto, S. Matsuyama, H. Hayashi, J. Sonoyama, K. Akiyama, H. Nakamori, Y. Sano, and K. Yamauchi
    "Development of hybrid adaptive x-ray focusing system based on piezoelectric bimorph mirror and mirror bender"
    SPIE Optics+Photonics2017, oral10386-18 (6-10 Aug., San DIego Convention Center, San Diego, California, US)

  • T. Hirano, T. Osaka, Y. Sano, Y. Inubushi, T. Togashi, I. Inoue, S. Matsuyama, K. Tono, K. Yamauchi, and M. Yabashi
    "Development of crystal-based split-and-delay optics with wavefront splitting at SACLA"
    SPIE Optics+Photonics2017, oral10386-20 (6-10 Aug., San DIego Convention Center, San Diego, California, US)

  • Y. Sano (invited), K. Arima, K. Yamauchi
    "Planarization of Silicon Carbide Wafer Using Catalyst-Referred Etching"
    Clarkson University 21st International Symposium on Chemical-Mechanical Planarization, Session VII(13-16 August, 2017, Crowne Plaza Lake Placid, New York, US)

  • J. Yamada, S. Matsuyama, S. Yasuda, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Development of an X-ray imaging optical system consisting of concave and convex mirrors"
    The 24th Congress of the International Comission for Optics, X-ray and High-energy Optics, M1N-05 (21-25 Aug., Keio Plaza Hotel, Tokyo, Japan)

  • K. Shimomura, M. Hirose, N. Burdet, and Y. Takahashi
    "Feasibility study of multislice X-ray ptychography with precession measurement towards high-resolution 3D imaging of thick objects"
    The 24th Congress of the International Comission for Optics, X-ray and High-energy Optics, Tu1N-03 (21-25 Aug., Keio Plaza Hotel, Tokyo, Japan)

  • S. Matsuyama, S. Yasuda, J. Yamada, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi
    "Full-field X-ray fluorescence imaging based on total-reflection imaging mirrors"
    The 24th Congress of the International Comission for Optics, X-ray and High-energy Optics, P10-01 (21-25 Aug., Keio Plaza Hotel, Tokyo, Japan)

  • M. Hirose, K. Shimomura, N. Burdet, and Y. Takahashi
    "Use of Kramers–Kronig Relation in Hard X-ray Spectro-ptychography"
    The 24th Congress of the International Comission for Optics, X-ray and High-energy Optics, P10-02 (21-25 Aug., Keio Plaza Hotel, Tokyo, Japan)

  • T. Inoue, S. Matsuyama, and S. Kawai
    "Development of Precise Wavefront Measurement Method for X-Ray Free Electron Laser Focusing System"
    The 24th Congress of the International Comission for Optics, Optical Metrology, P3-20 (21-25 Aug., Keio Plaza Hotel, Tokyo, Japan)

  • T. Osaka, I. Inoue, T. Hirano, Y. Morioka, Y. Sano, Y. Inubushi, T. Togashi, K. Tono, K. Yamauchi, and M. Yabashi
    "Hard x-ray split-delay optics for time-domain high-resolution x-ray spectroscopy with XFELs"
    10th International Conference on Inelastic X-ray scattering (IXS2017) (28 Aug. - 1 Sept., DESY, Hamburg, Germany)

  • Y. Sano (invited)
    "Ultra-precision manufacturing technologies"
    3rd International Summer School: Trends in energy and particle beam ultra-precision optical surface engineering, L4(28 August – 1 September, 2017, Leibniz Institute of Surface Modification (IOM) in Leipzig, Germany)

  • D. Toh, A. Isohashi, T. Inada, Y. Nakahira, H. Kida, S. Matsuyama, Y. Sano, and K. Yamauchi
    "Stabilization method of transition metal catalyst for high efficiency catalyst-referred etching (CARE) of silicon carbide"
    International Conference on Planarization/CMP Technology (ICPT2017) (11- 13 Oct.,Katholieke Universiteit Leuven, Leuven, Belguim)

  • Y. Nakahira, A. Isohashi, P. V. Bui, T. Inada, D. Toh, H. Kida, S. Matsuyama, Y. Sano, and K. Yamauchi
    "Stabilization of removal rate of silica glass on catalyst referred etching by cleaning catalyst surface"
    International Conference on Planarization/CMP Technology (ICPT2017) (11- 13 Oct.,Katholieke Universiteit Leuven, Leuven, Belguim)

  • H. Kida, A. Isohashi, T. Inada, S. Matsuyama, Y. Sano, and K. Yamauchi
    "High-efficiency Planarization of GaN Wafers by Catalyst-Referred Etching Employing Photoelectrochemical Oxidation"
    International Conference on Planarization/CMP Technology (ICPT2017) (11- 13 Oct.,Katholieke Universiteit Leuven, Leuven, Belguim)

  • J. Yamada, S. Matsuyama, S. Yasuda, Y. Sano, and K. Yamauchi
    "Fabrication of X-ray imaging mirror for an achromatic and high-resolution full-field X-ray microscope"
    The 32nd Annual Meeting of American Society for Precision Engineering (ASPE2017) Oral Session 6 (30 Oct.-3 Nov., The Westin Charlotte, Charlotte North Carolina, US)

  • R. Ryokume, T. Miyazaki, S. Matsuyama, Y. Sano, and K. Yamauchi
    "Dry planarization method using a transport of reactive species"
    The 32nd Annual Meeting of American Society for Precision Engineering (ASPE2017) Poster No.80 (30 Oct.-3 Nov., The Westin Charlotte, Charlotte North Carolina, US)

  • Y. Sano(invited), K. Arima, K. Yamauchi
    "Planarization of Silicon Carbide and Gallium Nitride Wafers Using Catalyst-Referred Etching (CARE)"
    Workshop on Ultra-Precision Processing for Wide Band Gap Semiconductors 2017 (WUPP2017), p.9(5-7 November, 2017, Sanctuary Beach Resort, Monterey, CA, US)

  • Y. Inoue, R. Mukai, S. Matsuyama, K. Yamauchi, and Y. Sano
    "Thinning of SiC wafer by Plasma Chemical Vaporization Machining at sub-atmospheric pressure condition"
    International Conference of Asian Society for Precision Engineering and Nanotechnology 2017 (ASPEN2017), 2017ASPEN-116 (14-17 Nov., COEX, Seoul, Korea)

  • Y. Morioka, T. Hirano, Y. Sano, S. Matsuyama, T. Katayama, T. Osaka, M. Yabashi, and K. Yamauchi
    "High-precision etching method using atmospheric-pressure plasma for channel-cut crystal X-ray monochromators"
    International Conference of Asian Society for Precision Engineering and Nanotechnology 2017 (ASPEN2017), 2017ASPEN-122 (14-17 Nov., COEX, Seoul, Korea)

  • K. Yamauchi(invited)
    "Abrasive-free Planarization of Functional Materials by Catalyst Referred Etching"
    The 17th International Manufacturing Conference in China (IMCC2017) (23-26 Nov., Shenzhen Kylin Villa, Shenzhen, China)

  • S. Matsuyama
    "Wavefront sensing for nano-focusing characterization"
    9th Hard X-ray FEL Collaboration Meeting (5-way meeting 2017), Oral, Photon: Session 1 (13-15 Dec., SACLA and Kannnabe, Hyogo, Japan)

  • J. Yamada
    "High performance X-ray focusing system using advanced KB mirror"
    9th Hard X-ray FEL Collaboration Meeting (5-way meeting 2017), Poster, Photon: Night session (13-15 Dec., SACLA and Kannnabe, Hyogo, Japan)