Publication

  • 山内和人,稲垣耕司,三村秀和,杉山和久,広瀬喜久治,森 勇藏
    Elastic Emission Machiningにおける表面原子除去過程の解析とその機構の電子論的な解釈
    精密工学会誌,68, 456-460 (2002).

  • 森 勇藏,山内和人,山村和也,三村秀和,佐野泰久,齋藤 彰,Alexei Souvorov, 玉作賢治, 矢橋牧名,石川哲也
    プラズマCVMおよびEEMによるシンクロトロン放射X線用楕円ミラーの作製と集光特性の評価
    精密工学会誌,68, 1347-1350 (2002).

  • Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku and T. Ishikawa
    Sub-micron focusing by reflective optics for scanning x-ray microscopy
    Proc. SPIE 4782, Seattle 58-64 (2002).

  • K. Yamamura, H. Mimura, K. Yamauchi, Y. Sano, A. Saito, T. Kinoshita, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa and Y. Mori
    Aspheric surface fabrication in nm-level accuracy by numerically controlled plasma CVM and EEM
    Proc. SPIE 4782, Seattle 265-270 (2002).

  • K. Yamauchi, K. Yamamura, H. MimuraY. Sano, A. Saito, M. Kanaoka, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa and Y. Mori
    Wave-optical analysis of sub-micron focusing by reflective optics
    Proc. SPIE 4782, Seattle 271-275 (2002).

  • Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Alexei Souvorov, Makina Yabashi, Kenji Tamasaku, Tetsuya Ishikawa and Yuzo Mori
    Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror
    J. Synchrotron rad., 9, 313-316 (2002).

  • A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori, K. Yamauchi, K. Yamamura, and A. Saito
    Deterministic retrieval of surface waviness by means of topography with coherent x-rays
    J. Synchrotron Rad, 9, 223-228 (2002).

  • K. Yamauchi, H. Mimura, K. Inagaki, and Y. Mori
    Figuring with subnanometer-level accuracy by numerically controlled elastic emission machining
    Rev. Sci. Instrum., 73, 4028-4033 (2002).

  • 森 勇藏, 山村和也, 佐野泰久
    数値制御プラズマCVM (Chemical Vaporization Machining)によるSOIの薄膜化−加工装置の開発と超薄膜SOIウエハの試作−
    精密工学会誌, 68 (12), 1590-1594 (2002).

  • K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori
    Microstitching interferometry for x-ray reflective optics
    Rev. Sci. Instrum., 74 (5), 2894-2898 (2003).

  • 森 勇藏, 佐野泰久, 山村和也, 森田論, 森田瑞穂, 大嶋一郎, 斉藤祐司, 須川成利, 大見忠弘
    数値制御プラズマCVM (Chemical Vaporization Machining)によるSOIの薄膜化−デバイス用基板としての加工面の評価−
    精密工学会誌, 69 (5), 721-725 (2003).

  • 山内和人, 山村和也, 三村秀和, 佐野泰久, 久保田章亀, 関戸康裕, 上野一匡, Alexei Souvorov, 玉作賢治, 矢橋牧名, 石川哲也, 森 勇藏
    高精度X線ミラーのための干渉計を利用した形状計測システムの開発
    精密工学会誌, 69 (6), 856-860 (2003).

  • 山内和人, 山村和也, 三村秀和, 佐野泰久, 齋藤 彰, 久保田章亀, 金岡政彦, Alexei Souvorov, 玉作賢治, 矢橋牧名, 石川哲也, 森 勇藏
    硬X線用斜入射平面ミラーの形状誤差が反射X線強度・位相分布に及ぼす影響の波動光学的評価
    精密工学会誌,69 (7), 997-1001 (2003).

  • Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, A. Saito,Y. Sano, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku and T. Ishikawa M. Shimura, Y. Ishizaka Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy
    Proc. SPIE 5193, pp.11-17, San Diego (2003).

  • Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku and T. Ishikawa
    Developement of figure correction method having spatial resolution close to 0.1mm.
    Proc. SPIE 5193, 105-111, San Diego (2003).

  • Y. Mori, K. Hirose, K. Yamauchi, H. Goto, K. Yamamura and Y. Sano
    Ultra-Precision Machining based on Physics and Chemistry
    Sensors and Materials, 15 (1) 1-19 (2003).

  • K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, and Y. Mori
    Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining
    Rev. Sci. Instrum., 74 (10), 4549-4553 (2003).

  • K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku,T. Ishikawa and Y. Mori
    Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining
    Jpn. J. Appl. Phys. Part1. 42 (11), 7129-7134 (2003).

  • 森勇藏、山内和人、三村秀和、稲垣耕司、久保田章亀、遠藤勝義
    EEM(Elastic Emission Machining)によるSi(001)表面の平坦化(第1報)-超清浄EEM加工システムの開発ー
    精密工学会誌論文集,70, 391-396 (2004).

  • 山内和人、三村秀和、久保田章亀、有馬健太、稲垣耕司、遠藤勝義、森勇藏
    EEM(Elastic Emission Machining)によるSi(001)表面の平坦化(第2報)-加工表面の原子像観察と構造評価ー
    精密工学会誌論文集, 70, 547-551 (2004).

  • Y. Mori, K. Yamamura, and Y. Sano
    Thinning of Silicon-on-Insulator Wafer by Numerically Controlled Plasma Chemical Vaporization Machining,
    Review of scientific instruments, Volume 75 (4), 942-946 (2004).

  • H. Mimura, K. Yamauchi, K. Yamamura, A. Kubota, S. Matsuyama, Y. Sano, K. Ueno, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa and Y. Mori
    Image quality improvement in hard X-ray projection microscope using total reflection mirror optics
    Journal of Synchrotoron Radiation, 11, 343-346 (2004).

  • K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, S. Matsuyama, H. Yumoto, K. Ueno, M. Shibahara, K. Endo, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and Y. Mori
    Fabrication technology of ultraprecise mirror optics to realize hard X-ray nanobeam
    Proc. SPIE Int. Soc. Opt. Eng, 5533, 116-123 (2004).

  • H. Mimura, H. Yumoto, K. Yamamura, Y. Sano, S. Matsuyama, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and K. Yamauchi
    Microstitching Interferometry for hard X-ray nanofocusing mirrors
    Proc. SPIE Int. Soc. Opt. Eng, 5533, 171-180 (2004) .

  • S. Matsuyama, H. Mimura, K. Yamamura, H. Yumoto, Y. Sano, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and K. Yamauchi
    Wave-optical and ray-tracing analysis to establish a two dimensional focusing unit using K-B arrangement.
    Proc. SPIE Int. Soc. Opt. Eng. 5533, 181-191 (2004) .

  • H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa and K. Yamauchi
    Relative angle determinable stitching interferometry for hard X-ray reflective optics
    Review of Scientfic Instruments, 76, 045102 (2005).

  • H. Mimura, S. Matsuyama, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, M. Shibahara, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa and K. Yamauchi
    Hard X-ray Diffraction-Limited Nanofocusing with Kirkpatrick-Baez Mirrors
    Japanese Journal of Applied Physics Part 2, 44 (18), L539-L542 (2005).

  • 久保田章亀, 三村秀和,佐野泰久,山村和也,山内和人,森 勇藏
    EEM (Elastic Emission Machining)による4H-SiC(0001)表面の平滑化
    精密工学会誌論文集, 71(4), 477-480 (2005).

  • A. Kubota, H. Mimura, K. Inagaki, Y. Mori and K. Yamauchi
    Preparation of Ultrasmooth and defect-free 4H-SiC(0001) Surfaces by Elastic Emission Machining,
    Journal of Electronic Material, 34(4), 439-443 (2005).

  • 久保田章亀, 三村秀和, 湯本博勝,森 勇藏, 山内和人
    EEM (Elastic Emission Machining)プロセスにおける加工液がSi(001)表面のラフネスに及ぼす影響
    精密工学会誌論文集,71 (5), 628-632 (2005).

  • H. Yumoto, H. Mimura, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, Y. Nishino, M. Yabashi, K. Tamasaku, T. Ishikawa, and K. Yamauchi
    Fabrication of elliptically figured mirror for focusing hard X-rays to size less than 50 nm
    Review of Scientific Instruments, 76, 063708 (2005).

  • M. Shimura, A. Saito, S. Matsuyama, T. Sakuma, Y. Terui, K. Ueno, H. Yumoto, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, M. Yabashi, K. Tamasaku, K. Nishio, Y. Nishino, K. Endo, K. Hatake, Y. Mori, Y. Ishizaka and T. Ishikawa
    Element Array by Scanning X-ray Fluorescence Microscopy after Cis-Diamminedichloro-Platinum(II) Treatment
    Cancer Research, 65 (12),. 4998-5002, (2005).

  • A. Kubota, H. Mimura, K. Inagaki, H. Yumoto, Y. Mori and K. Yamauchi
    Morphological Stability of Si (001) Surface in Mixture Fluid of Ultrapure Water and Silica Powder Particles in Elastic Emission Machining
    Japanese Journal of Applied Physics, Vol. 44, No. 8, 2005, pp. 5893-5897

  • S. Matsuyama, H. Mimura, H. Yumoto, K. Yamamura, Y. Sano, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa and K. Yamauchi
    Diffraction-limited two-dimensional hard-X-rays focusing in 100nm level using K-B mirror arrangement
    Revew of Scientific Instrument. 76, 083114 (2005).

  • Y. Ichii, Y. Mori , K. Hirose, K. Endo, K. Yamauchi and H. Goto
    Electrochemical Etching Using Surface Carboxylated Graphite Electrodes in Ultrapure Water
    Electrochemica Acta, 50(27), 5379-5383 (2005).

  • K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano,A. Saito, K. Ueno, A. Souvorov, K. Tamasaku, M. Yabashi, T. Ishikawa, Y. Mori,
    Wave-optical evaluation of interference fringes and wavefront phase in hard X-ray beam totally reflected by mirror optics
    Appl. Opt. 44, 6927-6932 (2005)

  • 湯本博勝, 三村秀和, 松山智至, 山村和也, 佐野泰久, 上野一匡, 遠藤勝義, 森 勇藏, 西野吉則, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人
    硬X線ナノ集光用超高精度楕円ミラーの作製と1次元集光性能の評価,
    精密工学会誌論文集, 71(9), 1137-1140 (2005).

  • L. Assoufid, A. Rommeveaux, H. Ohashi, K. Yamauchi, H. Mimura, J. Qian, O. Hignette, T. Ishikawa, C. Morawe, A. Macrander, A. Khounsary and S. Goto
    Results of x-ray mirror round-robin metrology measurements at the APS, ESRF, and SPring-8 optical metrology laboratories
    Proc. SPIE Int. Soc. Opt. Eng. 5921, 59210J (2005)

  • S. Matsuyama, H. Mimura, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi
    Hard x-ray nano-focusing at 40nm level using K-B mirror optics for nanoscopy/spectroscopy
    Proc. SPIE Int. Soc. Opt. Eng. 5918, 591804 (2005)

  • Jun Katoh, Kenta Arima, Akihisa Kubota, Hidekazu Mimura, Kouji Inagaki, Yuzo Mori, Kazuto Yamauchi, and Katsuyoshi Endo
    Atomic-Scale Evaluation of Si(111) Surfaces Finished by the Planarization Process Utilizing SiO2 Particles Mixed with Water
    Journal of The Electrochemical Society, vol. 153, no. 6, G560-G565 (2006).

  • H. Hara, Y. Sano, H. Mimura, K. Arima, A. Kubota, K.Yagi, J. Murata and K.Yamauchi
    Novel abrasive-free planarization of 4H-SiC (0001) using catalyst
    Journal of Electronic Materials, 35, L11-L14 (2006)

  • Makina Yabashi, Jerome B. Hastings, Max S. Zolotorev, Hidekazu Mimura, Hirokatsu Yumoto, Satoshi Matsuyama, Kazuto Yamauchi, and Tetsuya Ishikawa
    Single-Shot Spectrometry for X-Ray Free-Electron Lasers
    Phys. Rev. Lett. 97, 084802 (2006)

  • Kenta Arima, Akihisa Kubota, Hidekazu Mimura, Kouji Inagaki, Katsuyoshi Endo, Yuzo Mori and Kazuto Yamauchi
    Highly resolved scanning tunneling microscopy study of Si(001) surfaces flattened in aqueous environment
    Surface Science Letters 600 (15) L185-L188 (2006)

  • Yasuhisa Sano, Masayo Watanabe, Kazuya Yamamura, Kazuto Yamauchi,Takeshi Ishida, Kenta Arima, Akihisa Kubota and Yuzo Mori
    Polishing characteristics of silicon carbide by plasma chemical vaporization machining
    Japanese Journal of Applied Physics, Vol. 45, No. 10B, 8277-8280(2006).

  • Yoshio Ichii, Yuzo Mori, Kikuji Hirose, Katsuyoshi Endo, Kazuto Yamauchi and Hidekazu Goto
    Electrochemical Etching Using Surface-Sulfonated Electrodes in Ultrapure Water
    Journal of The Electrochemical Society, 153 (5), C344-C348

  • Yoshio Ichii and Hidekazu Goto
    Development of Eco-Friendly Electrochemical Etching Process of Silicon on Cathode
    Journal of The Electrochemical Society, 153 (10), C694-C700 (2006)

  • Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Soichiro Handa, Yasuhisa Sano, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, and Kazuto Yamauchi.
    At-wavelength figure metrology of hard x-ray focusing mirrors
    Review of Scientific Instruments 77, 063712 (2006).

  • Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
    Development of mirror manipulator for hard X-ray nanofocusing at sub-50 nm level
    Review of Scientfic Instruments, 77, 093107 (2006).

  • Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Yasuhisa Sano, Kazuya Yamamura, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
    Development of scanning X-ray fluorescence microscope with spatial resolution of 30nm using K-B mirrors optics
    Review of Scientific Instruments, 77, 103102 (2006)

  • 森田健一、後藤英和、山内和人、遠藤勝義、森 勇藏
    超純水・高速せん断流による洗浄法の開発(第2報)−超純水・高速せん断流によるCu除去メカニズムの研究ー
    精密工学会誌(2006)

  • Kazuya Yamamura, Yasuhisa Sano, Masafumi Shibahara, Kazuto Yamauchi, Hidekazu Mimura, Katsuyoshi Endo and Yuzo Mori
    Ultraprecision Machining Utilizing Numerically Controlled Scanning of Localized Atmospheric Pressure Plasma
    Japanese Journal of Applied Physics, Vol. 45, No. 10B, 2006, pp. 8270-8276

  • A. Kubota, H. Mimura, K. Inagaki, Y. Mori and K. Yamauchi
    Effect of Particle Morphology on Removal Rate and Surface Topography in Elastic Emission Machining
    Journal of Electrochemical Society, 153, G874-G878 (2006)

  • H. Mimura, H. Yumoto, S. Matsuyama, Y. Sano, K. Yamamura, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi
    Efficient focusing of hard x rays to 25 nm by a total reflection mirror
    Applied Physics Letters 90, 051903 (2007)

  • A. Kubota, Y. Shinbayashi, H. Mimura, Y. Sano, K. Inagaki, Y. Mori and K. Yamauchi
    Investigation of Surface Removal Process of Silicon Carbide in Elastic Emission Machining
    Journal of Electronic Materials, 36, 92-97 (2007)

  • Yoshio Ichii and Hidekazu Goto
    Fabrication of flat silicon surfaces using ion-exchange particles in ultrapure water
    Electrochimica Acta, 52, 2927-2932 (2007)

  • Yasuhisa Sano, Masayo Watanabe, Kazuya Yamamura, Kazuto Yamauchi, Takeshi Ishida, Kenta Arima, Akihisa Kubota, Yuzo Mori
    Polishing Characteristics of 4H-SiC Si-Face and C-Face by Plasma Chemical Vaporization Machining
    Materials Science Forum, 556-557, 757-760 (2007)

  • Hideyuki Hara, Yasuhisa Sano, Hidekazu Mimura, Kenta Arima, Akihisa Kubota, Keita Yagi, Junji Murata and Kazuto Yamauchi
    Damage-free Planarization of 4H-SiC (0001) by Catalyst-Referred Etching
    Materials Science Forum, 556-557, 749-751 (2007)

  • Kenta Arima, Hideyuki Hara, Junji Murata, Takeshi Ishida, Ryota Okamoto, Keita Yagi, Yasuhisa Sano, Hidekazu Mimura and Kazuto Yamauchi
    Atomic-scale flattening of SiC surfaces by electroless chemical etching in HF solution with Pt catalyst
    Applied Physics Letters, Vol. 90, No. 20, 202106 1-3 (2007).

  • Yasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi, and Yuzo Mori
    Fabrication of ultrathin and highly uniform silicon on insulator by numerically controlled plasma chemical vaporization machining
    Rev. Sci. Instrum. 78, 086102 (2007).

  • H. Hara, Y. Sano, K. Arima, K. Yagi, J. Murata, A. Kubota, H. Mimura, K. Yamauchi
    CAtalyst-Referred Etching of Silicon
    Science and Technology of Advanced Materials 8 162-165 (2007).

  • K. Yagi, J. Murata, H. Hara, Y. Sano, K. Yamauchi, H. Goto.
    Fabrication of damascene Cu wirings using solid acidic catalyst
    Science and Technology of Advanced Materials 8 166-169 (2007).

  • Y. Takahashi, Y. Nishino, T. Ishikawa, E. Matsubara
    Coherent x-ray diffraction pattern of a SnZn cast alloy
    Journal of Physics: Conference Series 83, 012018 (2007)

  • M. Kanaoka, C, Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi
    Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics
    J. Vac. Sci. Technol. B 25(6), Nov/Dec 2007, 2110-2113.

  • J. Murata, A. Kubota, K. Yagi, Y. Sano, H. Hara, K. Arima, T. Okamoto, H. Mimura, K. Yamauchi
    Chemical planarization of GaN using hydroxyl radicals generated on a catalyst plate in H2O2 solution
    Journal of Crstal Growth, 310 (2008) 1637-1641

  • H. Jiang, D. Ramunno-Johnson, C. Song, H. Wang, B. Amirbekian, Y. Kohmura, Y. Nishino, Y. Takahashi, T. Ishikawa, Lila Graham, M. J. Glimcher, J. Miao
    Nanoscale imaging of mineral crystals inside biological composite materials using x-ray diffraction microscopy
    Physical Review Letters, 100 (2008) 038103

  • S. Matsuyama, H. Mimura, K. Katagishi, H. Yumoto, S. Handa, M. Fujii, Y. Sano, M. Shimura, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, and K. Yamauchi
    Trace element mapping using a high-resolution scanning X-ray fluorescence microscope equipped with a Kirkpatrick-Baez mirror system
    Surfece and Interface Analysis, 40 (2008) 1042-1045

  • H. Mimura, H. Yumoto,S. Matsuyama, S. Handa, T. Kimura, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, and K. Yamauchi
    Direct Determination of the Wave Field of an X-ray Nanobeam
    Physical Review A, 77 (2008) 015812

  • M. Kanaoka, C, Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, and K. Yamauchi
    Processing efficiency of elastic emission machining for low-thermal-expansion material
    Surface and Interface Analysis, 40 (2008) 1002-1006

  • Y. Sano, T. Masuda, H. Mimura, and K. Yamauchi
    Ultraprecision finishing technique by numerically controlled sacrificial oxidation
    Journal of Crystal Growth, 310 (2008) 2173-2177

  • H. Mimura, S. Morita, T. Kimura, D. Yamakawa, W. Lin, Y. Uehara, S. Matsuyama, H. Yumoto, H. Ohashi, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, H. Ohmori, and K. Yamauchi
    Focusing mirror for x-ray free-electron lasers
    Review of Scientific Instruments, 79 (2008) 083104
    Press release (Japanese)

  • Y. Takahashi, H. Furukawa, H. Kubo, K. Yamauchi, Y. Nishino, T. Ishikawa, and E. Matsubara
    Coherent x-ray diffraction measurements of Cu thin lines
    Surface and Interface Analysis, 40 (2008) 1046-1049

  • Y. Takahashi, H. Kubo, H. Furukawa, K. Yamauchi, E. Matsubara, T. Ishikawa, and Y. Nishino
    Element-specific hard-x-ray diffraction microscopy
    Physical Review B, 78 (2008) 092105

  • S. Handa, H. Mimura, H. Yumoto, T. Kimura, S. Matsuyama, Y. Sano, and K. Yamauchi
    Highly accurate differential deposition for X-ray reflective optics
    Surface and Interface Analysis, 40 (2008) 1019-1022

  • 藤原宏樹,山内和人
    円筒ころ軸受における部分円弧クラウニングと対数クラウニングの実験的比較
    日本機械学会論文集,72C(2008),2308-2314.