International Conference
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J. Yamada
"Precise wavefront control of focused hard X-ray FEL at SACLA"
SACLA Users' Meeting 2023, Oral (2-3 March, ONLINE)
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K. Yamauchi(Invited)
"Generation of extremely intense photon field by condensation of X-ray free electron laser SACLA less than
10 nm"
International Conference on X-ray Optics and Applications (XOPT2023), XOPTj-02 (18-20 April, Pacifico
Yokohama, Kanagawa, Japan)
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J. Yamada, T. Inoue, S. Matsuyama, N. Nakamura, Y. Tanaka, A. Ito, K. Shioi, T. Osaka, I. Inoue, Y.
Inubushi, Y. Sano, M. Yabashi, and K. Yamauchi
"Design, fabrication, and implementation of XFEL sub-10 nm focusing mirrors"
International Conference on X-ray Optics and Applications (XOPT2023), XOPT7-02 (18-20 April, Pacifico
Yokohama, Kanagawa, Japan)
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S. Matsumura, I. Ogasahara, T. Osaka, I. Inoue, K. Yamauchi, M. Yabashi and Y, Sano
"Surface finishing of a micro channel-cut crystal monochromator using high-pressure plasma etching"
International Conference on X-ray Optics and Applications (XOPT2023), XOPTp-20 (18-20 April, Pacifico
Yokohama, Kanagawa, Japan)
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A. Ito, J. Yamada, Y. Tanaka, K. Shioi, S. Matsuyama, T. Inoue, I. Inoue, T. Osaka, Y. Inubushi, M. Yabashi,
T. Ishikawa, and K. Yamauchi
"Direct focus characterization of sub-10 nm XFEL using speckle patterns from random nanoparticles"
International Conference on X-ray Optics and Applications (XOPT2023), XOPTp-22 (18-20 April, Pacifico
Yokohama, Kanagawa, Japan)
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I. Ogasahara, S. Matsumura, T. Osaka, K. Yamauchi, M. Yabashi and Y, Sano
"Development of distortion-free processing for narrow-gap channel-cut crystal monochromators using plasma
chemical vaporization machining with a wire electrode"
International Conference on X-ray Optics and Applications (XOPT2023), XOPTp-23 (18-20 April, Pacifico
Yokohama, Kanagawa, Japan)
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K. Shioi, J. Yamada, A. Ito, Y. Tanaka, S. Matsuyama, T. Inoue, T. Osaka, I. Inoue, Y. Inubushi, M. Yabashi,
T. Ishikawa, and K. Yamauchi
"Beam diameter characterization of sub-10 nm XFEL using ptychography"
International Conference on X-ray Optics and Applications (XOPT2023), XOPTp-24 (18-20 April, Pacifico
Yokohama, Kanagawa, Japan)
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A. Yakushigawa, J. Yamada, Y. Tanaka, Y. Sano, H. Takano, M. Yabashi, T. Ishikawa, and K. Yamauchi
"Development of phase-contrast imaging method for X-ray nanotomography with full-field X-ray microscope
based on AKB mirror"
International Conference on X-ray Optics and Applications (XOPT2023), XOPTp-26 (18-20 April, Pacifico
Yokohama, Kanagawa, Japan)
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S. Matsumura, I. Ogasahara, T. Osaka, K. Yamauchi, M. Yabashi and Y. Sano
"High-precision finihing method for a narrow-gap channel-cut crystal X-ray monochromators using
atmospheric-pressure plasma with a wire electrode"
Optical Fabrication and Testing (OF&T), OW1B.6 (4-8 June, Quebec City Convention Centre, Quebec City,
Canada)
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K. Yamauchi(Invited)
"Catalyst Referred Etching Method for High Precision Optical Elements"
International Conference on Precision Engineering and Sustainable Manufacturing 2023(PRESM2023) (16-21 July,
Bankoku Shinryokan, Okinawa, Japan)
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J. Yamada(Invited)
"Advanced Mirror-Based Optics for Hard X-Ray Focusing and Imaging Applications"
Gordon Research Conference: X-ray Scienece 2023 (23-28 July, Stonehill College, Easton, MA, United
States)
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J. Yamada (Invited)
"XFEL sub-10 nm focusing with 10^22 W/cm^2 intensity: wavefront corrected mirror and focus
characterization"
PhotonMEADOW2023 (12-14 Sept. 2023, International Centre for Theoretical Physics, Trieste,
Italy)
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A. Ito, J. Yamada, Y. Tanaka, K. Shioi, I. Inoue, T. Osaka, G. Yamaguchi, Y. Inubushi, M. Yabashi and K.
Yamauchi
"Determination of astigmatism in XFEL sub-10 nm focusing system using speckle patterns from random
nanoparticles"
PhotonMEADOW2023, 23 (12-14 September, International Centre for Theoretical Physics, Trieste, Italy)
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Y. Sano, Y. Nakanishi, M. Oshima, S. Iden, J. Yamada, D. Toh and K. Yamauchi
"Dicing process for 4H-SiC wafers by plasma etching using high-pressure SF6 plasma with metal masks"
International Conference on Silicon Carbide and Related Materials (ICSCRM2023), We.B.5 (17-22 September,
Hilton Sorrento Palace Conference Centre, Sorrento, Italy)
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D. Toh, K. Kayao, K. Yamauchi and Y. Sano
"High-speed planarization of GaN (0001) substrate using catalyst-referred etching enhanced with
positive-biased photoelectrochemical oxidation"
International Conference on Silicon Carbide and Related Materials (ICSCRM2023), We.B.16 (17-22 September,
Hilton Sorrento Palace Conference Centre, Sorrento, Italy)
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K. Kayao, D. Toh, K. Yamauchi and Y. Sano
"Characteristics of Photoelectrochemical Oxidation Enabling High-efficiency Polishing of Gallium
Nitride"
International Conference on Silicon Carbide and Related Materials (ICSCRM2023), We.B.20 (17-22 September,
Hilton Sorrento Palace Conference Centre, Sorrento, Italy)
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G. Nakaue, M. Nabata, J. Yamada, D. Toh, K. Yamauchi and Y. Sano
"Plasma Polishing of Gallium Nitride Substrate Using Atmospheric-Pressure Plasma with Hydrogen Gas"
American Society for Precision Engineering (ASPE) 2023 Annual Meeting, Poster (12-17 November, Boston,
USA)
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I. Ogasahara, S. Matsumura, K. Yamauchi and Y. Sano (Osaka University); T. Osaka, M. Yabashi (RIKEN Spring-8
Center)
"Distortion-free Processing Method Using Plasma Chemical Vaporization Machining with a Wire Electrode for
Narrow-gap Channel-cut Crystal Monochromators"
American Society for Precision Engineering (ASPE) 2023 Annual Meeting, Poster (12-17 November, Boston,
USA)
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Y. Yoshida, K. Kayao, D. Toh, K. Yamauchi and Y. Sano
"Surface Planarization of YAG Ceramics Using Catalyst-Referred Etching"
American Society for Precision Engineering (ASPE) 2023 Annual Meeting, Poster (12-17 November, Boston,
USA)
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J. Yamada (Invited, Keynote speech)
“Sub-10 nm focusing of hard X-ray free-electron laser for reaching 1022 W/cm2 intensity”
The International Conference on Optical and Photonic Engineering (icOPEN) 2023 (27 Nov.- 1 Dec.
2023, Holiday Inn Singapore Atrium, Singapore)
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K. Yamauchi (Plenary speech)
“Ultimate condensation of X-ray free electron laser down to single nanometer size by precision mirror devices”
The 10th International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN) 2023 (21 - 24 November 2023, The Hong Kong Polytechnic University, Hotel ICON, 1/F, Silverox Ballroom, Hong Kong SAR, China)
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D. Takeuchi, R. Asada, D. Toh, J. Yamada, K. Yamauchi and Y. Sano
“Temperature Dependence of Plasma Etching Properties of SiO2 Using High-Pressure Plasma”
The 10th International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN) 2023, Poster, P-36 (ASPEN2023P_075) (21 - 24 November 2023, The Hong Kong Polytechnic University, Hotel ICON, 1/F, Silverox Ballroom, Hong Kong SAR, China)