International Conference

2025”N 2024”N 2023”N 2022”N 2021”N 2020”N 2019”N 2018-2003”N
  • J. Yamada (Invited)
    "Ultra-intense hard X-ray FEL with sub-10 nm focusing"
    13th Ringberg Workshop: Science with FELs (11-14 Feb. 2024, Tagungsstätte Schloss Ringberg of Max Planck society, Tegernsee, Germany)

  • J. Yamada
    "Developement of extreme focusing optics and future perspectives"
    SACLA Users' Meeting 2024 (11-12 March 2024, SACLA, Hyogo, Japan)

  • K. Shioi, J. Yamada, A. Ito, I. Inoue, T. Osaka, G. Yamaguchi, Y. Inubushi, D. Toh, Y. Sano, M. Yabashi, and K. Yamauchi
    "Development of X-ray wavefront-corrected multilayer mirrors for high-resolution holography imaging"
    International Conference on X-ray Optics and Applications (XOPT2024), XOPTp-15 (23-25 April 2024, Pacifico Yokohama, Kanagawa, Japan)

  • A. Yakushigawa, J. Yamada, T. Uruga, H. Takano, M. HirosukeCD.Toh, Y. Sano, M. Yabashi, and K.Yamauchi
    "XAFS-imaging & phase-contrast imaging via a full-field X-ray microscope based on Advanced Kirkpatrick?Baez mirror"
    International Conference on X-ray Optics and Applications (XOPT2024), XOPTp-18 (23-25 April 2024, Pacifico Yokohama, Kanagawa, Japan)

  • A. Nagamatsu, J. Yamada, A. Yakushigawa, A. Takeuchi, K. Uesugi, D. Toh, Y. Sano, M. Yabashi, and K. Yamauchi
    "Development of scanning-imaging X-ray microscope using advanced Kirkpatrick-Baez mirror"
    International Conference on X-ray Optics and Applications (XOPT2024), XOPTp-19 (23-25 April 2024, Pacifico Yokohama, Kanagawa, Japan)

  • M. Miyake, S. Matsumura, I. Ogasahara, T. Osaka, K. Yamauchi, M. Yabashi, Y. Sano
    "High-pressure plasma etching for a finish processing of a micro channel-cut crystal monochromator"
    International Conference on X-ray Optics and Applications (XOPT2024), XOPTp-17 (23-25 April 2024, Pacifico Yokohama, Kanagawa, Japan)

  • J. Yamada(invited)
    "Ultra-intense XFEL 7 nm focusing with advanced KB mirror"
    16th International Conference on X-Ray Microscopy (XRM2024), Tue04K (12-16 August 2024, Stadshallen, Lund, Sweden)

  • A. Yakushigawa, J. Yamada, A. Nagamatsu, T. Uruga, H. Takano, H. Matsui, D. Toh, Y. Sano, M. Yabashi, and K. Yamauchi
    "XAFS imaging & phase-contrast imaging using full-field X-ray microscope based on advanced KB mirror"
    16th International Conference on X-Ray Microscopy (XRM2024), P_B37 (12-16 August 2024, Stadshallen, Lund, Sweden)

  • J. Yamada(invited)
    "Ultra-intense sub-10 nm focusing at a hard X-ray FEL"
    15th International Conference on Synchrotron Radiation Instrumentation (SRI2024) (26-30 August 2024, CCH, Hamburg, Germany)

  • K. Hanada, S. Matsuzaka, J. Yamada, H. Nakamori, D. Toh, Y. Sano, K. Yamauchi, and M. Kanaoka
    "Development of EUV-FEL nanofocusing optics using OSAKA Mirror technology"
    15th International Conference on Synchrotron Radiation Instrumentation (SRI2024) Poster-ID 1.121 (26-30 August 2024, CCH, Hamburg, Germany)

  • A. Nagamatsu, J. Yamada, A. Yakushigawa, A. Takeuchi, K. Uesugi, D. Toh, Y. Sano, M. Yabashi, and K Yamauchi
    "Development of scanning-imaging X-ray microscope using advanced Kirkpatrick-Baez mirror"
    15th International Conference on Synchrotron Radiation Instrumentation (SRI2024) Poster-ID 2.25 (26-30 August 2024, CCH, Hamburg, Germany)

  • M. Nabata, G. Nakaue, D. Toh, J. Yamada, K. Yamauchi and Y. Sano
    "Improvement of etching rate of gallium nitride substrates by atmospheric pressure plasma with H2/O2/He gas"
    The 20th International Conference on Precision Engineering (ICPE2024), Oral, OS20-13 (23-26 October, Tohoku University Aobayama Campus, Miyagi, Japan)

  • M. Miyake, S. Matsumura, I. Ogasahara, T. Osaka, J. Yamada, D. Toh, K. Yamauchi, M. Yabashi and Y. Sano
    "Damage-free Processing of Extremely Narrow Spaces via High-precision Etching Using High-pressure Plasma That Exceeds Atmospheric Pressure"
    The 20th International Conference on Precision Engineering (ICPE2024), Oral, OS20-14 (23-26 October, Tohoku University Aobayama Campus, Miyagi, Japan)

  • S. Iden, Y. Matsumura, J. Yamada, D. Toh, K. Yamauchi and Y. Sano
    "Basic study of plasma dicing for SiC wafer using high-pressure plasma"
    The 20th International Conference on Precision Engineering (ICPE2024), Oral, GS17-05 (23-26 October, Tohoku University Aobayama Campus, Miyagi, Japan)

  • K. Shioi, J. Yamada, G. Yamaguchi, D. Toh, K. Yamaguchi, M. Yabashi and Y. Sano
    "Development of ultraprecise X-ray multilayer mirrors for nanometer-resolution phase-contrast imaging"
    The 20th International Conference on Precision Engineering (ICPE2024), Oral, OS17-13 (23-26 October, Tohoku University Aobayama Campus, Miyagi, Japan)

  • Y. Yoshida, K. Kayao, D. Toh, J. Yamada, K. Yamauchi and Y. Sano
    "Surface polishing of YAG ceramics using catalyst-referred etching"
    The 20th International Conference on Precision Engineering (ICPE2024), Oral, OS08-08 (23-26 October, Tohoku University Aobayama Campus, Miyagi, Japan)

  • K. Kayao, T. Fukagawa, D. Toh, J. Yamada, K. Yamauchi and Y. Sano
    "High-efficiency Polishing of GaN(0001) Substrates Using Catalyst-referred Etching Assisted by Photoelectrochemical Reaction"
    The 20th International Conference on Precision Engineering (ICPE2024), Oral, OS08-09 (23-26 October, Tohoku University Aobayama Campus, Miyagi, Japan)

  • H. Yamasaki, K. Kayao, D. Toh, J. Yamada, K. Yamauchi and Y. Sano
    "Planarization of substrate with metal wiring using catalyst-referred etching -Etching characteristic of wiring metal-"
    The 20th International Conference on Precision Engineering (ICPE2024), Oral, OS08-19 (23-26 October, Tohoku University Aobayama Campus, Miyagi, Japan)

  • T. Fukagawa, K. Kayao, T. Daisetsu, J. Yamada, K. Yamauchi and Y. Sano
    "Highly Efficient Etching of GaN (0001) Substrate by Photoelectrochemical Etching"
    The 20th International Conference on Precision Engineering (ICPE2024), Oral, OS08-20 (23-26 October, Tohoku University Aobayama Campus, Miyagi, Japan)

  • D. Toh, K. Kayao, T. Fukagawa, J. Yamada, K. Yamauchi and Y. Sano
    "High-efficiency GaN polishing by photoelectrochemical etching-assisted catalyst-referred etching"
    The 19th International Conference on Planarization/CMP Technology 2024 (ICPT2024), Oral, SESSION 7 (15-18 October, Kurhaus Wiesbaden, Wiesbaden, Germany)

  • Y. Yoshida, K. Kayao, D. Toh, J. Yamada, K. Yamauchi and Y. Sano
    "Surface polishing of polycrystalline silicon carbide using catalyst-referred etching"
    The 19th International Conference on Planarization/CMP Technology 2024 (ICPT2024), Oral, SESSION 8 (15-18 October, Kurhaus Wiesbaden, Wiesbaden, Germany)

  • Y. Miyaji, K. Kayao, D. Toh, J. Yamada, K. Yamauchi and Y. Sano
    "Preparation of a highly smoothed Si surface via catalyst-referred etching"
    The 19th International Conference on Planarization/CMP Technology 2024 (ICPT2024), Poster, P5 (15-18 October, Kurhaus Wiesbaden, Wiesbaden, Germany)

  • H. Yamasaki, K. Kayao, D. Toh, J. Yamada, K. Yamauchi and Y. Sano
    "Planarization of substrate with metal wiring using catalyst-referred etching ? Etching characteristic of wiring metal ?"
    The 19th International Conference on Planarization/CMP Technology 2024 (ICPT2024), Poster, P13 (15-18 October, Kurhaus Wiesbaden, Wiesbaden, Germany)

  • T. Fukagawa, K. Kayao, D. Toh, J. Yamada, K. Yamauchi and Y. Sano
    "Development of High-Efficiency Crystallographic Damage Removal Method for Seed GaN Crystal Using Photoelectrochemical Etching"
    12th International Workshop on Nitride Semiconductors (IWN2024), Oral, 182 (3-8 November, Hilton Hawaiian Village, Honolulu, Hawaifi, USA)

  • K. Kayao, T. Fukagawa, D. Toh, J. Yamada, K. Yamauchi and Y. Sano
    "Leakage current reduction with an atomically smooth GaN (0001) surface fabricated by photoelectrochemical reaction-assisted catalyst-referred etching"
    12th International Workshop on Nitride Semiconductors (IWN2024), Poster, P71 (3-8 November, Hilton Hawaiian Village, Honolulu, Hawaifi, USA)