International Conference

　　　
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  • Y. Sano, K. Yamamura, and K. Yamauchi
    Development of Ultraprecision Machining Technologies for Semiconductor Substrates
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 16-17 (Feb 16-17, 2009, Osaka, Japan)

  • H. Hara, Y. Morikawa, Y. Sano, and K. Yamauchi
    First-principles Calculation of Surface Energy at 4H-SiC(0001)-1×1
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 62-63 (Feb 16-17, 2009, Osaka, Japan)

  • S. Handa, T. Kimura, H. Mimura, H. Yumoto, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, and K. Yamauchi
    Development of Graded Multilayer Mirrors for Hard-X-ray Focusing
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 56-57 (Feb 16-17, 2009, Osaka, Japan)

  • J. Murata, S. Sadakuni, K. Yagi, H. Hara, K. Arima, T. Okamoto, H. Mimura, K. Yamauchi
    Photo-enhanced Chemical Planarization of Gallium Nitride Using a Solid Acidic Catalyst
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 60-61 (Feb 16-17, 2009, Osaka, Japan)

  • T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, Y. Sano, K. Tamasaku1, Y. Nishino, M. Yabashi, T. Ishikawa, and K. Yamauchi
    Development of an Adaptive Mirror for Controlling Wavefront of X-ray Beam
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 58-59 (Feb 16-17, 2009, Osaka, Japan)

  • T. Okamoto, Y. Sano, H. Hara, T. Hatayama, K. Arima, K. Yagi, J. Murata, H. Mimura, T. Fuyuki and K. Yamauchi
    Novel Abrasive-Free Chemical Planarization of 4H-SiC 8°off Wafer Using a Catalyst
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 64-65 (Feb 16-17, 2009, Osaka, Japan)

  • T. Kato, Y. Sano, T. Hori, K. Yamamura, H. Mimura, Y. Katsuyama, and K. Yamauchi
    Thinning of SiC Wafers by Plasma Chemical Vaporization Machining
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 72-73 (Feb 16-17, 2009, Osaka, Japan)

  • H. Ishikura, H. Mimura, S, Matsuyama, Y. Sano, and K. Yamauchi
    Development of Electroforming for Ultraprecise Mirror Fabrication
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 74-75 (Feb 16-17, 2009, Osaka, Japan)

  • S. Kamisaka, Y. Sano, H. Mimura, S. Matsuyama, and K. Yamauchi
    Improvement of Thickness Uniformity of SOI (Silicon On Insulator) Layer by Numerically Controlled Sacrificial Oxidation Using Atmospheric-Pressure Plasma
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 70-71 (Feb 16-17, 2009, Osaka, Japan)

  • H. Kubo, H. Furukawa, R. Tsutsumi, K. Yamauchi, Y. Nishino, T. Ishikawa, E. Matsubara, and Y. Takahashi
    Recent Progress of Coherent X-ray Diffraction Microscophy for Nanostructure Analysis of Metallic Materials
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 76-77 (Feb 16-17, 2009, Osaka, Japan)

  • M. Fujii, S. Matsuyama, T. Wakioka, H. Mimura, Y. Sano, and K. Yamauchi
    Development of Advanced Kirkpatrick-Baez System for X-ray Nano-Imaging
    First International Symposium on Atomically Controlled Fabrication Technology, p2.6, (2009).

  • D. Yamakawa, H. Mimura, T. Kimura, S. Matsuyama, Y. Sano, and K. Yamauchi
    Development of X-ray Free Electron Lasers Focusing System with 400mm Long Mirror
    Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, 68-69 (Feb 16-17, 2009, Osaka, Japan)

  • T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamakawa, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of an adaptive mirror for synchrotron x-ray optics
    The 13th Hiroshima International Symposium on Synchrotron Radiation (March 10-11, Hiroshima, Japan) Abstracts pp.45

  • K. Yamauchi
    Recent Progress of Hard X-ray Focusing using Mirror Optics
    GCOE International Workshop on Phase Retrieval in the Visible to Hard X-ray Regions (March 26th, 2009, Osaka, Japan)

  • H. Mimura
    Surface figure Measurement of X-ray mirror Using Phase Retrieval
    GCOE International Workshop on Phase Retrieval in the Visible to Hard X-ray Regions (March 26th, 2009, Osaka, Japan)

  • Y. Takahashi
    Nanostructure Analysis of Metallic Materials by Coherent X-ray Diffraction Microscopy
    GCOE International Workshop on Phase Retrieval in the Visible to Hard X-ray Regions (March 26th, 2009, Osaka, Japan)

  • T. Kimura
    Development of Adaptive Mirror System for Controlling Wavefront of Hard X-ray Focused Beam
    GCOE International Workshop on Phase Retrieval in the Visible to Hard X-ray Regions (March 26th, 2009, Osaka, Japan)

  • H. Mimura, S. Handa, T. Kimura, H. Yumoto, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T, Ishikawa, K. Yamauchi
    Graded multilayer mirror for sub-10nm hard x-ray focusing
    SPIE Optics Photonics 2009，7448-11 (Aug, 2009, San Diego, USA)

  • K. Yamauchi
    Development and application of X-ray mirror in Japan
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)

  • D. Yamakawa, H. Mimura, T. Kimura, S. Matsuyama, Y. Sano and K. Yamauchi
    Development of X-ray Free Electron Lasers focusing system with 400mm long mirror
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)

  • H. Ishikura, H. Mimura, S, Matsuyama, Y. Sano, K. Yamauchi
    Development of electroforming for ultraprecise mirror fabrication
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)

  • H. Yumoto, H. Mimura, S. Handa, T. Kimura, S. Matsuyama, Y. Sano, H. Ohashi, T. Ishikawa, and K. Yamauchi
    Stitching-angle measurable microscope-interferometer:surface-figure metrology tool for hard x-ray nanofocusing mirrors with large curvature
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)

  • T. Kimura, H. Ohashi, H. Mimura, H, Yumoto, D. Yamakawa, T. Tsumura, H. Okada, T. Masunaga, Y. Senba, T. Goto, T. Ishikawa and K. Yamauchi
    Development of Stitching Interferometric System for Large-Size X-Ray Mirror
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)

  • H. Yumoto, H. Mimura, S. Handa, T. Kimura, S. Matsuyama, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, H. Ohashi, T. Ishikawa, and K. Yamauchi
    Recording of interference fringe nano-patterns of hard-x-ray focusing beam
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)

  • S. Handa, T. Kimura, H. Mimura, H. Yumoto, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, and K. Yamauchi
    A Method for High-Precision Determination of the Wavefields of X-ray Nanobeams
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)

  • H. Mimura, S. Handa, H. Yokoyama, T. Kimura, K. Yamauchi
    Ray-tracing analysis of aberration of a depth-graded multilayer mirror
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka, Japan)

  • H. Mimura, T. Kimura, S. Handa, H. Yumoto, D. Yamakawa, H. Yokoyama, S. Matsuyama, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
    Hard X-ray Nanofocusing with Adaptive Optical System
    The 10th international conference on synchrotoron radiation instrumentation (Sep, 2009, Melbourne, Australia)

  • T. Kimura, S. Handa, H. Mimura, H, Yumoto, D. Yamakawa, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa and K. Yamauchi
    Development of Wavefront Determination Method for Hard X-ray Nanobeam
    The 10th international conference on synchrotoron radiation instrumentation (Sep, 2009, Melbourne, Australia)

  • H. Yokoyama, H. Soichiro, H. Mimura, T. Kimura, S. Matsuyama, K. Tamasaku, T. Ishikawa, K. Yamauchi
    Design and Performance Simulation of Graded Multilayer Mirror for Hard X-ray focusing
    The 10th international conference on synchrotoron radiation instrumentation (Sep, 2009, Melbourne, Australia)

  • K. Yamauchi (invited)
    Ultraprecision deterministic figuring methods to fabricate X-ray nanofocusing optics
    Colloquium at Tianjin University (Apr, 2009, Tianjin, China)

  • Y. Sano (invited)
    Machining of Semiconductor Substrates Using Atmospheric Pressure Plasma
    Colloquium at Tianjin University (Apr, 2009, Tianjin, China)

  • J. Murata (invited)
    Planarization of SiC and GaN Surface by Catalyst-referred Etching
    Colloquium at Tianjin University (Apr, 2009, Tianjin, China)

  • Y. Sano, T. Kato, K. Yamamura, H. Mimura, S. Matsuyama, K. Yamauchi
    Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma
    Proceedings of 31st International Symposium on Dry Process，215-216 (Sep, 2009, Busan, Korea)

  • S. Kamisaka, Y. Sano, H. Mimura, S. Matsuyama, and K. Yamauchi
    Improvement of Thickness Uniformity of SOI Layer by Numerically Controlled Sacrificial Oxidation using Atmospheric-Pressure Plasma with Electrode Array System
    Proceedings of 31st International Symposium on Dry Process，217-218 (Sep, 2009, Busan, Korea)

  • Y. Sano, T. Kato, T. Hori, K. Yamamura, H. Mimura, Y. Katsuyama, and K. Yamauchi
    Thinning of SiC wafer by plasma chemical vaporization machining
    Technical Digest of International Conference on Silicon Carbide and Related Materials 2009，II108 (Oct, 2009, Nurnberg, Germany)

  • T. Okamoto, Y. Sano, H. Hara, T. Hatayama, K. Arima, K. Yagi, J. Murata, H. Mimura, T. Fuyuki and K. Yamauchi
    Reduction of surface roughness by catalyst-referred etching
    Technical Digest of International Conference on Silicon Carbide and Related Materials 2009，I156 (Oct, 2009, Nurnberg, Germany)

  • S. Sadakuni, J. Murata, K. Yagi, Y. Sano, T. Okamoto, K. Arima, H. Mimura, and K. Yamauchi
    Planarization of GaN using photoelectrochemical process and solid catalyst
    Technical Digest of International Conference on Silicon Carbide and Related Materials 2009，I160 (Oct, 2009, Nurnberg, Germany)

  • Y. Sano (invited)
    Machining of semiconductor substrates using atmospheric pressure plasma
    Colloquium at the Leibniz Institute of Surface Modification (Oct, 2009, Leipzig, Germany)

  • Yukio Takahashi, Yoshinori Nishino, Ryosuke Tsutsumi, Hideto Kubo, Hayato Furukawa, Hidekazu Mimura, Satoshi Matsuyama, Nobuyuki Zettsu, Tetsuya Ishikawa, Kazuto Yamauchi
    Development and application of high-resolution diffraction microscopy using syhncrotron x-ray beam focused Kirkpatrick-Baez mirros
    The 10th international conference on synchrotron radiation instrumentation 173 (Sep, 2009, Melbourne,Australia)

  • S. Matsuyama, M. Fujii, T. Wakioka, H. Mimura, S. Handa, T. Kimura, Y. Nishino, K. Tamasaku, Y. Makina, T. Ishikawa and K. Yamauchi
    Development of Hard X-ray Imaging Optics with Two Pairs of Elliptical and Hyperbolic Mirrors
    The 10th international conference on synchrotron radiation instrumentation 78-79 (Sep, 2009, Melbourne,Australia)

  • K. Yamauchi (invited)
    Mirror Optics for Coherent X-rays and Overview of the Osaka International Workshop on X-ray Mirror Design, Fabrication and Metrology
    The 10th international conference on synchrotron radiation instrumentation (Sep, 2009, Melbourne,Australia)

  • Yukio Takahashi, Yoshinori Nishino, Ryosuke Tsutsumi, Hideto Kubo, Hayato Furukawa, Hidekazu Mimura, Satoshi Matsuyama, Nobuyuki Zettsu, Tetsuya Ishikawa, Kazuto Yamauchi
    High-resolution diffraction microscopy using synchrotron X-ray beam focused by Kirkpatrick-Baez mirrors
    International Workshop on X-ray Mirror Design, Fabrication, and Metrology 94-95 (Sep, 2009, Osaka. Japan)

  • S. Matsuyama, M. Fujii T. Wakioka, H. Mimura, T. Kimura, S. Handa, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa and K. Yamauchi
    Development of Advanced Kirkpatrick-Baez System for Hard X-ray Nano-Imaging
    International workshop on X-ray mirror design, fabrication and metrology (Sep, 2009, Osaka. Japan)

  • K. Yamauchi (invited)
    Hard X-ray Nanofocusing by Kirkpatrick-Baez (KB) mirrors
    ICXOM20 XO-l1 (Sep, 2009, Krlsruhe, Germany)

  • K. Yamauchi (invited)
    Hard X-ray Nanofocusing by Kirkpatrick-Baez (KB) mirrors
    ICXOM20 XO-l1 (Sep, 2009, Krlsruhe, Germany)

  • K. Yamauchi (invited)
    10nm-Level Focusing of Hard X-Rays by KB Mirrors
    OSA'S 93rd ANNUAL MEETING FThG3 (Oct, 2009, San Jose, California, USA)

  • Masahiko Kanaoka, Hideo Takino, Kazushi Nomura, Hidekazu Mimura, Kazuto Yamauchi, Yuzo Mori (invited)
    Spatial wavelength range of surface roughness improved using elastic emission machining
    The 9th International euspen Conference O8.1 (Jun, 2009, San Sebastian, Spanish)

  • T. Okamoto, Y. Sano, H. Hara, T. Hatayama, K. Arima, K. Yagi, J. Murata, T.　Fuyuki and K. Yamauchi
    Abrasive-free Planarization of 4H-SiC Substrates for Epitaxial Growth
    3rd International Conference of Asian Society for Precision Engineering and　Nanotechnology (ASPEN2009) 1B-13 (Nov, 2009, Kitakyusyu, Japan)

  • Shun Sadakuni, Junji Murata, Keita Yagi, Kenta Arima, Yasuhisa Sano, Takeshi　Okamoto, Hidekazu Mimura and Kazuto Yamauchi
    Planarization of GaN Surface using Photo-electro Chemical Process and Solid Acid　Catalyst
    3rd International Conference of Asian Society for Precision Engineering and　Nanotechnology (ASPEN2009) 1B-14 (Nov, 2009, Kitakyusyu, Japan)

  • Kohei Aida, Yasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama　and Kazuto Yamauchi
    Dicing of SiC wafer by Plasma Chemical Vaporization Machining
    3rd International Conference of Asian Society for Precision Engineering and　Nanotechnology (ASPEN2009) 2P1-9 (Nov, 2009, Kitakyusyu, Japan)

  • T. Okamoto, Y. Sano, K. Tachibana, K. Arima, A. N. Hattori, K. Yagi, J. Murata,　S. Sadakuni and K. Yamauchi
    Abrasive-Free Chemical Planarization of 4H-SiC 8°off Wafer Using a Catalyst
    Second International Symposium on Atomically Controlled Fabrication Technology, 172-173 (Nov, 2009, Osaka, Japan)

  • J. Murata, Y. Shirasawa, Y. Sano, S. Sadakuni, K. Yagi, T. Okamoto, and K. Yamauchi
    Improvement of Schottky Diode Properties on GaN(0001) Surface Using Damage-free　Planarization
    Second International Symposium on Atomically Controlled Fabrication Technology, 174-175 (Nov, 2009, Osaka, Japan)

  • S. Sadakuni, J. Murata, K. Yagi, Y. Sano, K. Arima, A. Hattori, T. Okamoto, H.　Mimura and K. Yamauchi
    Development of palanarization method for gallium nitrideusing　photoelectrochemical process
    Second International Symposium on Atomically Controlled Fabrication Technology, 184-185 (Nov, 2009, Osaka, Japan)

  • K. Aida, Y. Sano, K. Yamamura, H. Mimura, S. Matsuyama and K. Yamauchi
    Dicing of SiC wafer by Plasma Chemical Vaporization Machining with wire electrode
    Second International Symposium on Atomically Controlled Fabrication Technology, 188-189 (Nov, 2009, Osaka, Japan)

  • S. Kamisaka, Y. Sano, K. Yoshinaga, H. Mimura, S. Matsuyama, and K. Yamauchi
    Improvement of Thickness Uniformity of SOI Layer by Numerically Controlled　Sacrificial Oxidation using Arrayed Atmospheric-Pressure Plasma
    Second International Symposium on Atomically Controlled Fabrication Technology, 190-191 (Nov, 2009, Osaka, Japan)

  • Y. Shirasawa, Y. Sano, T. Okamoto, and K. Yamauchi
    Evaluation of Schottky Barrier Diodes on Surface of Processed 4H-SiC(0001)
    Second International Symposium on Atomically Controlled Fabrication Technology, 192-193 (Nov, 2009, Osaka, Japan)

  • Hiroki Fujiwara & Kenji Tamada
    Study of a long-life thrust needle roller bearing lubricated with low　viscous lubricant
    World Tribology Congress 2009, p. 350

  • Hiroki Fujiwara, Takuji Kobayashi, Tatsuo Kawase & Kazuto Yamauchi
    Optimized Logarithmic Roller Crowning Design of Cylindrical Roller　Bearings and Its Experimental Demonstration
    The ASME/STLE International Joint Tribology Conference 2009 (CD-ROM)