International Conference

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  • K. Yamauchi(invited)
    Crystallographically highly-ordered GaN (0001) surface prepared by catalyst referred etching
    IWBNS7 (15-20 March 2011, Koyasan, Wakayama, Japan)

  • K. Yamauchi, H. Mimura, T. Kimura, H. Yokoyama, H. Yumoto, S. Matsuyama, H. Nakamori, Y. Sano, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa(invited)
    Single-nanometer focusing of hard x-rays using novel adaptive optical system
    Programme of ACTOP11 (15-20 April 2011, Diamond Light Source, Oxfordshire, UK)

  • Hiroki Nakamori, Satoshi Matsuyama, Takashi Kimura, Shouta Imai, Hidekazu Mimura, Yasuhisa Sano, Kazuto Yamauchi
    Simulation Study of Adaptive Mirror for Hard X-ray Focusing
    Programme of ACTOP11, P46 (15-20 April 2011, Diamond Light Source, Oxfordshire, UK)

  • K. Yamauchi(invited)
    Current status of precision mirror development for coherent X-rays
    SPIE Optics + Optoelectronics (18-21 April 2011, Clarion Congress Hotel, Prague, Czech Republic)

  • S. Matsuyama, N. Kidani, H. Mimura, Y. Sano, K. Tamasaku, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi
    Development of hard x-ray imaging optics with four aspherical mirrors
    SPIE Optics+Photonics, Technical Program, pp. 181, 8139-04 (21-25 May 2011, SanDiego, California, USA)

  • K. Yamauchi(invited)
    Deterministic fabrication process for precision X-ray mirrors
    The 2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011) (23-25 May 2011, ICM, Munich, Germany)

  • Yukio Takahashi(invited)
    Development of high-resolution coherent X-ray diffraction microscopy and its application in materials science
    International Conference on Processing & Manufacturing of Advanced Materials, Abstracts, pp. 411 (1-5 Aug 2011, Quebec, Canada)

  • K. Yamauchi(invited)
    Mirror]based optical systems for nanofocusing and nanoimaging of hard x]rays
    The 4th International Workshop on FEL Science (29 Aug-2 Sep 2011, Palm Cove, Cairns, Australia)

  • Yukio Takahashi(invited)
    Development and application of high-resolution diffraction microscopy using focused hard x-ray beam
    The 4th International Workshop on FEL Science "Science Challenges of XFEL", pp. 21 (29 Aug-2 Sep 2011, Palm Cove, Cairns, Australia)

  • Yasuhisa Sano, Kohei Aida, Takehiro Kato, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, and Kazuto Yamauchi
    Cutting of SiC Wafer by Atmospheric-Pressure Plasma Etching with Wire Electrode
    International Conference on Silicon Carbide and Related Materials 2011, We-P-28 (11-16 Sep 2011, Cleveland, Ohio, USA)

  • Bui Van Pho, Shun Sadakuni, Takeshi Okamoto, Kenta Arima, Yasuhisa Sano, and Kazuto Yamauchi
    HRTEM observation of 4H-SiC (0001) surface planarized by catalyst-referred etching
    International Conference on Silicon Carbide and Related Materials 2011, We-P-32 (11-16 Sep 2011, Cleveland, Ohio, USA)

  • Yukio Takahashi(invited)
    High-resolution coherent diffraction imaging using focused hard x-ray beam at SPring-8
    ARC Center of Excellence for Coherent X-ray Science 6th Annual Workshop, pp. 22 (10-12 Oct, The University of Melboume, Melboume, Australia)

  • T. Osaka, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, K. Yamauchi
    Thin-crystal & auto-correlator development at SPring-8
    Fourth XFEL 3-Site Meeting (30 Oct-3 Nov, RIKEN SPring-8 Center, Hyogo, Japan)

  • Akihiro Suzuki, Yukio Takahashi, Nobuyuki Zettsu, Yoshiki Kohmura, Kazuto Yamauchi, and Tetsuya Ishikawa
    Development of High-Resolution Ptychographic X-ray Diffraction Microscopy using Focused Hard X-ray Beam
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, pp. 76-77 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • Yukio Takahashi, Akihiro Suzuki, Nobuyuki Zettsu, Yoshiki Kohmura, Kazuto Yamauchi, and Tetsuya Ishikawa
    Element-Specific Ptychographic X-ray Diffraction Microscopy using Anomalous Scattering
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, pp. 78-79 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • Satoshi Matsuyama, Naotaka Kidani, Yoji Emi, Yasuhisa Sano, Yoshiki Kohmura, Tetsuya Ishikawa, and Kazuto Yamauchi
    Development of Hard X-ray Imaging Optics for Achromatic Full-Field X-ray Microscopy
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, pp. 84-85, P-5 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • H. Nakamori, S. Matsuyama, S. Imai, H. Yokoyama, T. Kimura, H. Mimura, Y. Sano, Y. Kohmura, T. Ishikawa, K. Yamauchi
    Development of an Adaptive X-Ray Focusing Mirror with Large NA -Evaluation of Reproducibility of Deformable Mirror
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, pp. 86-87, P-6 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • S. Imai, S. Matsuyama, H. Nakamori, T. Kimura, H. Yokoyama, H. Mimura, Y. Sano, Y. Kohmura, T. Ishikawa, K. Yamauchi
    Development of an adaptive hard X-ray focusing system with adaptive mirrors
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, pp. 90-91, P-8 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • H. Yokoyama, T. Kimura, H. Mimura, S. Imai, S. Matsuyama, Y. Kohmura, T. Ishikawa, K. Yamauchi
    Determination of Had X-ray Focusing Mirror Aberration using Phase Retrieval with Transverse Translation Diversity
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, pp. 98-99, P-12 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • Jangwoo Kim, Hikaru Yokoyama, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi
    Reflectivity improvement using PtC/C multilayers for X-ray mirrors
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, pp. 100-101, P-13 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • S. Sadakuni, J. Murata, T. Okamoto, Y. Sano, K. Yagi, K. Tachibana, H. Asano and K. Yamauchi
    Fabrication of Atomically Controlled Flat GaN (0001) Surfaces Using Catalyst-Referred Etching in Water
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, P-28 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • T. Okamoto, Y. Sano, K. Tachibana, K. Arima, K. Inagaki, K. Yagi, S. Sadakuni, A. Isohashi, Y. Morikawa and K. Yamauchi
    Improvement of the removal rate in catalyst-referred etching of 4H-SiC using catalytic platinum and hydrofluoric acid
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, P-33 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • Bui Van Pho, Shun Sadakuni, Takeshi Okamoto, Ryusuke Sagawa, Kenta Arima, Yasuhisa Sano , Kazuto Yamauchi
    Atomic Structure of 4H-SiC (0001) Surface Planarized by Catalyst-Referred Etching
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, P-38 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • K. Tachibana, Y. Sano, T. Okamoto, K. Arima, K. Inagaki, K. Yagi, S. Sadakuni, A. Isohashi, Y. Morikawa and K. Yamauchi
    Study of Reactive Species in Catalyst-referred Etching of 4H-SiC Using Platinum and Hydrofluoric Acid
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, P-41 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • H. Nishikawa, Y. Sano, K. Aida, T. Chaiyapat, K. Yamamura, S. Matsuyama, and K. Yamauchi
    Cutting of SiC substrates by atmospheric-pressure plasma etching with slit mask for plasma confinement
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, P-49 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • H. Asano, S. Sadakuni, K. Yagi, Y. Sano, T. Okamoto, K. Tachibana and K. Yamauchi
    Removal rate improvement by an ultraviolet irradiation in GaN (0001) surface planarization using catalyst-referred etching
    Extended Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, P-61 (31 Oct-2 Nov, Osaka University Nakanoshima Center, Osaka, Japan)

  • K. Yamauchi(invited)
    X-ray nanofocusing by mirror optical systems
    JSPS-DFG“ρ‘ŠΤƒZƒ~ƒi[ (Oct, Kyoto University, Kyoto, Japan)

  • Hiroki Nakamori, Satoshi Matsuyama, Takashi Kimura, Shouta Imai, Yoshiki Kohmura, Tetsuya Ishikawa, Yoshinori Nishino, Kazuto Yamauchi
    Development of an ultra-precise deformable mirror for hard X-ray nanofocusing
    Program of 7th Handai Nanoscience and Nanotechnology International Symposium, pp. 172-173, PII-46 (10-11 Nov, Osaka University, Osaka, Japan)

  • Y. Sano, K. Aida , H. Nishikawa, K. Yamamura, S. Matsuyama, and K. Yamauchi
    Back-Side Thinning of Silicon Carbide Wafer by Plasma Etching using Atmospheric-Pressure Plasma
    4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 0038 (16-18 Nov, Langham Place Kong Hotel, Hong Kong, China)

  • S. Sadakuni, B.V. Pho, N.X. Dai, Y. Sano, K. Yagi, J. Murata, T. Okamoto, K.Tachibana and K. Yamauchi
    Surface Observation of 4H-SiC (0001) Planarized by Catalyst-Referred Etching
    4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 0176 (16-18 Nov, Langham Place Kong Hotel, Hong Kong, China)

  • Yasuhisa Sano, Kohei Aida, Hiroaki Nishikawa, Kazuya Yamamura, Satoshi Matsuyama, and Kazuto Yamauchi(invited)
    Plasma Chemical Vaporization Machining of Silicon Carbide Wafer Using Flat-bar Electrode with Multiple Gas Nozzles
    The 8th CHINA-JAPAN Conference on Ultra-Precision Machining (Nov, Hangzhou, China)